CA2380114A1 - Imprint method and device - Google Patents

Imprint method and device Download PDF

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Publication number
CA2380114A1
CA2380114A1 CA002380114A CA2380114A CA2380114A1 CA 2380114 A1 CA2380114 A1 CA 2380114A1 CA 002380114 A CA002380114 A CA 002380114A CA 2380114 A CA2380114 A CA 2380114A CA 2380114 A1 CA2380114 A1 CA 2380114A1
Authority
CA
Canada
Prior art keywords
support member
template
sealing gasket
substrate
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002380114A
Other languages
French (fr)
Other versions
CA2380114C (en
Inventor
Lennart Olsson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat AB filed Critical Obducat AB
Priority to CA002380114A priority Critical patent/CA2380114C/en
Priority to US10/115,071 priority patent/US7144539B2/en
Publication of CA2380114A1 publication Critical patent/CA2380114A1/en
Application granted granted Critical
Publication of CA2380114C publication Critical patent/CA2380114C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/10—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
    • B29C43/3642—Bags, bleeder sheets or cauls for isostatic pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2791/00—Shaping characteristics in general
    • B29C2791/004—Shaping under special conditions
    • B29C2791/006—Using vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates

Abstract

An imprint process comprises the step of aligning a substrate, supported on a first support member, with a template, supported on a second support member. The substrate has at least one essentially plane surface provided with a moldable film. The template has at least one essentially plane surface provided with a relief pattern. The relief pattern is adapted to interact with the moldable film. The process further comprises the step of arranging a sealing gasket between the template and the second support member, such that a pressure cavity is defined by the second support member, the template and the sealing gasket. The process also comprise the step of applying a static gas pressure to the pressure cavity, in order to provide a pressure between the template and the substrate. The pressure is sufficient to form a pattern in the moldable film. An imprint device is also disclosed.

Claims (36)

1. An imprint process, comprising the steps of:
aligning a substrate, supported on a first support member, with a template, supported on a second support member, said substrate having at least one essentially plane surface provided with a moldable film, said template having at least one essentially plane surface provided with a relief pattern, and said relief pattern facing said moldable film;
arranging a sealing gasket between said template and said second support member, such that a pressure cavity is defined by said second support member, said template and said sealing gasket; and applying a static gas pressure to said pressure cavity, in order to provide a pressure between said template and said substrate, so as to form a pattern in said moldable film.
2. The process as claimed in claim 1, wherein the step of aligning said substrate and said template comprises aligning said template with a recess in a surface of said second support member, said recess being adapted for providing said static fluid pressure on said back surface of said template.
3. The process ae claimed in claim 1, wherein the static fluid pressure is maintained by a contact pressure in the contact surface between said sealing gasket and said template, said contact pressure being achieved by pressing together said second support member and said first support member.
4. The process as claimed in claim 1, further comprising the step of arranging a second sealing gasket between said template and said second support member, said second sealing gasket encircling a second surface area of the second support member.
5. The process as claimed in claim 1, further comprising the step of applying an at least partial vacuum to said pressure cavity, said at least partial vacuum being sufficient to retain said template when the second support member is spaced apart from said first support member.
6. The process as claimed in claim 5, wherein said second support member and said template remain spaced apart throughout the step of applying said at least partial vacuum to said pressure cavity.
7. An imprint process, comprising the steps of:
aligning a substrate, supported on a first support member, with a template, supported on a second support member, said substrate having at least one essentially plane surface provided with a moldable film, said template having at least one essentially plane surface provided with a relief pattern, said relief pattern facing said moldable film;
arranging a sealing gasket between said substrate and said first support member, such that a pressure cavity is defined by said first support member, said substrate and said sealing gasket, and applying a static gas pressure to said pressure cavity, in order to provide a pressure between said substrate and said template, so as to form a pattern in said moldable film.
8. The process as claimed in claim 7, wherein the step of aligning said template and said substrate comprises aligning said substrate with a recess in a surface of said first support member, said recess being adapted for providing said static fluid pressure on said back surface of said substrate.
9. The process as claimed in claim 7, wherein the static fluid pressure, is maintained by a contact pressure in the contact surface between said sealing gasket and said substrate, said contact pressure being achieved by pressing together said first support member and said second support member.
10. The process as claimed in claim 7, further comprising the step of arranging a second sealing gasket between said substrate and said first support member, said second sealing gasket encircling a second surface area of the first support member.
11. The process as claimed in claim 7, further comprising the step of applying an at least partial vacuum to said pressure cavity, said at least partial vacuum being sufficient to retain said substrate when the first support member is spaced apart from said second support member.
12. The process as claimed in claim 11, wherein said first support member and said substrate remain spaced apart throughout the step of applying said at least partial vacuum to said pressure cavity.
13. An imprint prowess, comprising the steps of:
aligning a substrate, with a first and a second template, said substrate having first and second essentially plane surfaces, each surface being provided with a respective moldable film, said first and second templates each having at least one essentially plane surface, which is provided with a respective relief pattern, and each relief pattern one of said moldable films;

said first and second templates being supported on first and second support members, respectively;

arranging a respective sealing gasket between each of said first and second templates and said respective support member, such that a first and a second pressure cavity is defined by said respective support member, said respective template and said respective sealing gasket;
and applying a static gas pressure to said first and second pressure cavities, in order to provide a pressure between said templates and said substrate, in order to form patterns in said first and second moldable films.
14. The process as claimed in claim 13, further comprising the step of arranging said first and second templates on opposite sides of said substrate.
15. An imprint device, comprising:
a first support member for receiving an essentially plane substrate, and a second support member arranged for receiving a first sealing gasket and an essentially plane template, wherein a surface area of said second support member, facing the first support member, said first sealing gasket encircling said surface area and the template define a pressure cavity, and wherein the device is arranged to press said first and second support members towards each other and to provide a static gas pressure within said pressure cavity.
16. The device as claimed in claim 15, wherein said static gas pressure is arranged to assume at least two states:

a first state, wherein the static gas pressure within said pressure cavity is essentially equal to or less than a gas pressure of a surrounding environment, and a second state, wherein the static gas pressure within said pressure cavity is substantially higher than in said first state.
17. The device as claimed in claim 16, wherein an average distance between a back surface of said template and said first surface area of the second support member in said first state is between 0.01 and 4 millimeters, preferably between 0.3 and 1 millimeters and more preferably between 0.4 and 0.6 millimeters.
18. The device as claimed in claim 15, wherein said first surface area is provided with a recess extending over at least a part of the first surface area.
19. The device as claimed in claim 15, further comprising a second sealing gasket encircling a second surface area of the support member.
20. The device as claimed in claim 19, wherein said pressure cavity is defined by the first surface area of said second support member, the first sealing gasket encircling said first surface area, the second sealing gasket encircling the second surface area, and said template.
21. The device as claimed in claim 20, wherein the pressure cavity is defined by a surface area that is located outside said second sealing gasket and inside said first sealing gasket.
22. The device as claimed in claim 20, wherein said second sealing gasket is arranged concentrically with said first sealing gasket.
23. The device as claimed in claim 15, wherein the device is arranged to provide an at least partial vacuum to the pressure cavity, said at least partial vacuum being sufficient to retain said template when the template and the substrate are spaced apart.
24. The device as claimed in claim 23, wherein said at least partial vacuum is low enough for said support member and said template to remain spaced apart while said at least partial vacuum is applied to said pressure cavity.
25. An imprint device, comprising:
a first support member for receiving an essentially plane template, and a second support member arranged for receiving a first sealing gasket and an essentially plane substrate, wherein a surface area of said second support member, facing the first support member, said first sealing gasket encircling said surface area and the substrate define a pressure cavity, and wherein the device is arranged to press said first and second support members towards each other and to provide a static gas pressure within said pressure cavity.
26. The device as claimed in claim 25, wherein said static gas pressure is arranged to assume at least two states:

a first state, wherein the static gas pressure within said pressure cavity is essentially equal to or less than a gas pressure of a surrounding environment, and a second state, wherein the static gas pressure within said pressure cavity is substantially higher than in said first state.
27. The device as claimed in claim 26, wherein an average distance between a back surface of said substrate and said first surface area of the second support member in said first state is between 0.01 and 4 millimeters, preferably between 0.3 and l millimeters and more preferably between 0.4 and 0.6 millimeters.
28. The device as claimed in claim 25, wherein said first surface area is provided with a recess extending over at least a part of the first surface area.
29. The device as claimed in claim 26, further comprising a second sealing gasket encircling a second surface area of the support member.
30. The device as claimed in claim 29, wherein said pressure cavity is defined by the first surface area of said second support member, the first sealing gasket encircling said first surface area, the second sealing gasket encircling the second surface area, and said substrate.
31. The device as claimed in claim 30, wherein the pressure cavity is defined by a surface area that is located outside said second sealing gasket and inside said first sealing gasket.
32. The device as claimed in claim 30, wherein said second sealing gasket is arranged concentrically with said first sealing gasket.
33. The device as claimed in claim 25, wherein the device is arranged to provide an at least partial vacuum to the pressure cavity, said at least partial vacuum being sufficient to retain said substrate when the template and the substrate are spaced apart.
34. The device as claimed in claim 33, wherein said at least partial vacuum is low enough for said support member and said substrate to remain spaced apart while said at least partial vacuum is applied to said pressure cavity.
35. An imprint device, comprising:
a first support member for receiving a first sealing gasket and a first essentially plane template, a second support member for receiving a second sealing gasket and a second essentially plane template wherein a first surface area of said first support member, facing the second support member, said first sealing gasket encircling said first surface area and the first template define a first pressure cavity, wherein a second surface area of said second support member, facing the first support member, said second sealing gasket encircling said second surface area and the second template define a second pressure cavity, and wherein the device is arranged to press said first and second support members towards each other and to provide a static gas pressure within said first and second pressure cavities.
36. The device as claimed in claim 35, wherein said device is arranged to receive an essentially plane substrate having a first and a second moldable film, for interaction with said first and second templates, respectively.
CA002380114A 2002-04-04 2002-04-04 Imprint method and device Expired - Lifetime CA2380114C (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CA002380114A CA2380114C (en) 2002-04-04 2002-04-04 Imprint method and device
US10/115,071 US7144539B2 (en) 2002-04-04 2002-04-04 Imprint method and device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CA002380114A CA2380114C (en) 2002-04-04 2002-04-04 Imprint method and device
US10/115,071 US7144539B2 (en) 2002-04-04 2002-04-04 Imprint method and device

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Publication Number Publication Date
CA2380114A1 true CA2380114A1 (en) 2003-10-04
CA2380114C CA2380114C (en) 2010-01-19

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CA (1) CA2380114C (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9149961B2 (en) 2011-08-30 2015-10-06 Johnson Controls Technology Company System and method for manufacturing a vehicle trim component via concurrent compression forming and injection molding
US10093268B2 (en) 2012-08-27 2018-10-09 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Trim component for vehicle interior
US10464280B2 (en) 2011-08-30 2019-11-05 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Trim component for vehicle interior
US10981532B2 (en) 2018-06-28 2021-04-20 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Vehicle trim component

Families Citing this family (98)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE515607C2 (en) * 1999-12-10 2001-09-10 Obducat Ab Device and method for fabrication of structures
US7717696B2 (en) * 2000-07-18 2010-05-18 Nanonex Corp. Apparatus for double-sided imprint lithography
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
JP4185808B2 (en) * 2003-05-09 2008-11-26 Ｔｄｋ株式会社 Imprint apparatus and imprint method
EP1538482B1 (en) * 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
US7686606B2 (en) 2004-01-20 2010-03-30 Wd Media, Inc. Imprint embossing alignment system
JP4455092B2 (en) * 2004-02-20 2010-04-21 キヤノン株式会社 Processing apparatus and processing method
JP4455093B2 (en) * 2004-02-20 2010-04-21 キヤノン株式会社 Mold, processing apparatus using mold, and processing method using mold
KR100558754B1 (en) * 2004-02-24 2006-03-10 한국기계연구원 Uv nanoimprint lithography process and apparatus for performing the same
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
EP1594001B1 (en) * 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
US20060027036A1 (en) * 2004-08-05 2006-02-09 Biggs Todd L Methods and apparatuses for imprinting substrates
US7641468B2 (en) * 2004-09-01 2010-01-05 Hewlett-Packard Development Company, L.P. Imprint lithography apparatus and method employing an effective pressure
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
US8721952B2 (en) * 2004-11-16 2014-05-13 International Business Machines Corporation Pneumatic method and apparatus for nano imprint lithography having a conforming mask
JP2006165371A (en) * 2004-12-09 2006-06-22 Canon Inc Transfer apparatus and device manufacturing method
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) * 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
KR100729427B1 (en) * 2005-03-07 2007-06-15 주식회사 디엠에스 Apparatus for making etching area on substrate
US7281920B2 (en) * 2005-03-28 2007-10-16 Komag, Inc. Die set utilizing compliant gasket
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) * 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US20080202360A1 (en) * 2005-06-13 2008-08-28 Korea Institute Of Machinery & Materials Imprinting Apparatus For Forming Pattern at Uniform Contact by Additional Constant Pressure
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
DE102005041505B3 (en) * 2005-09-01 2007-04-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for molding structures
US20070129171A1 (en) * 2005-10-12 2007-06-07 Simonds Vincent J Method for Manufacturing a Golf Product
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US20070125475A1 (en) * 2005-12-05 2007-06-07 Huber Engineered Woods Llc Handheld tape applicator and components thereof, and their methods of use
CN104317161A (en) * 2005-12-08 2015-01-28 分子制模股份有限公司 Method and system for double-sided patterning of substrates
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
JP4814682B2 (en) 2006-04-18 2011-11-16 株式会社日立ハイテクノロジーズ Fine structure pattern transfer method and transfer apparatus
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
JP4996150B2 (en) * 2006-07-07 2012-08-08 株式会社日立ハイテクノロジーズ Fine structure transfer apparatus and fine structure transfer method
US20080029686A1 (en) * 2006-08-04 2008-02-07 International Business Machines Corporation Precision fabricated silicon mold
KR101296377B1 (en) 2006-11-10 2013-08-14 주식회사 디엠에스 Stamp for imprint lithography process
JP2008198273A (en) * 2007-02-09 2008-08-28 Fujifilm Corp Transfer method, transfer apparatus, and recording medium
JP4478164B2 (en) * 2007-03-12 2010-06-09 株式会社日立ハイテクノロジーズ MICROSTRUCTURE TRANSFER APPARATUS, STAMPER, AND MICROSTRUCTURE MANUFACTURING METHOD
TW200902332A (en) * 2007-03-26 2009-01-16 Hitachi Maxell Imprinting jig and imprinting apparatus
WO2008153674A1 (en) * 2007-06-09 2008-12-18 Boris Kobrin Method and apparatus for anisotropic etching
US20090028489A1 (en) * 2007-07-17 2009-01-29 Eric Udd High speed fiber optic grating sensor system
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
US20100215794A1 (en) * 2007-09-06 2010-08-26 Entire Technology Co., Ltd. Diffusion film molding tool & manufacturing process thereof
WO2009067308A1 (en) * 2007-11-19 2009-05-28 3M Innovative Properties Company Articles and methods of making articles having a concavity or convexity
NL1036193A1 (en) * 2007-12-06 2009-06-09 Asml Netherlands Bv Imprint lithography.
US8518633B2 (en) 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
US8182982B2 (en) * 2008-04-19 2012-05-22 Rolith Inc Method and device for patterning a disk
EP2238608A4 (en) * 2008-01-22 2012-02-22 Rolith Inc Large area nanopatterning method and apparatus
KR100913222B1 (en) 2008-01-30 2009-08-24 주식회사 에이디피엔지니어링 Apparatus and method for imprinting a fine pattern
US8192920B2 (en) * 2008-04-26 2012-06-05 Rolith Inc. Lithography method
US9330933B2 (en) 2008-06-11 2016-05-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for planarizing a polymer layer
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
JP2012501084A (en) * 2008-08-27 2012-01-12 エーエムオー ゲーエムベーハー Improved nanoimprint method
JP2010067796A (en) * 2008-09-11 2010-03-25 Canon Inc Imprint device
US8529778B2 (en) * 2008-11-13 2013-09-10 Molecular Imprints, Inc. Large area patterning of nano-sized shapes
US20110210480A1 (en) * 2008-11-18 2011-09-01 Rolith, Inc Nanostructures with anti-counterefeiting features and methods of fabricating the same
JP5411557B2 (en) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ Microstructure transfer device
US8261660B2 (en) * 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
US9330685B1 (en) 2009-11-06 2016-05-03 WD Media, LLC Press system for nano-imprinting of recording media with a two step pressing method
US8496466B1 (en) 2009-11-06 2013-07-30 WD Media, LLC Press system with interleaved embossing foil holders for nano-imprinting of recording media
US8402638B1 (en) 2009-11-06 2013-03-26 Wd Media, Inc. Press system with embossing foil free to expand for nano-imprinting of recording media
US20110180127A1 (en) * 2010-01-28 2011-07-28 Molecular Imprints, Inc. Solar cell fabrication by nanoimprint lithography
WO2011155582A1 (en) * 2010-06-11 2011-12-15 株式会社日立ハイテクノロジーズ Stamper for microstructure transfer and microstructure transfer device
CA2807639A1 (en) 2010-08-23 2012-03-01 Rolith, Inc. Mask for near-field lithography and fabrication the same
US8828297B2 (en) 2010-11-05 2014-09-09 Molecular Imprints, Inc. Patterning of non-convex shaped nanostructures
JP2012109487A (en) * 2010-11-19 2012-06-07 Hitachi High-Technologies Corp Double-sided imprint apparatus
JP2012190877A (en) * 2011-03-09 2012-10-04 Fujifilm Corp Nanoimprint method and nanoimprint device for use therein
US10343312B2 (en) * 2012-08-27 2019-07-09 Scivax Corporation Imprint device and imprint method
US9244356B1 (en) 2014-04-03 2016-01-26 Rolith, Inc. Transparent metal mesh and method of manufacture
WO2015183243A1 (en) 2014-05-27 2015-12-03 Rolith, Inc. Anti-counterfeiting features and methods of fabrication and detection
JP7299685B2 (en) * 2018-10-11 2023-06-28 キヤノン株式会社 Film forming apparatus, film forming method, and article manufacturing method
JP7419030B2 (en) * 2019-11-18 2024-01-22 キヤノン株式会社 Holding device, exposure device, and article manufacturing method
SE545980C2 (en) * 2019-12-04 2024-04-02 Camfil Ab Sealing arrangement, method of monitoring leak tightness, and leak tightness monitoring system
CN111399337A (en) * 2020-04-24 2020-07-10 中国科学技术大学 Double-sided metal transfer printing method based on nano-imprint lithography and related device
SE544656C2 (en) * 2020-12-16 2022-10-04 Camfil Ab Sealing device
CN113534606A (en) * 2021-08-06 2021-10-22 宁波舜宇奥来技术有限公司 Pressurization structure
CN113934110A (en) * 2021-11-09 2022-01-14 青岛天仁微纳科技有限责任公司 Nano-imprinting equipment capable of realizing double-sided imprinting

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7710555A (en) * 1977-09-28 1979-03-30 Philips Nv METHOD AND DEVICE FOR MANUFACTURING INFORMATION CONTAINING PLATES.
JP2570402B2 (en) * 1988-09-30 1997-01-08 日本ビクター株式会社 Optical information recording medium molding device
FR2676386A1 (en) * 1991-05-15 1992-11-20 Scient Tech Batimen Centre METHOD AND DEVICE FOR MANUFACTURING BUILDING BLOCKS FROM A HYDRAULIC BINDER SUCH AS PLASTER, AN INERT LOAD SUCH AS SAND AND WATER.
EP0734819A3 (en) * 1992-09-16 1997-11-05 Mino Ganryo Kagaku Corporation Tile having a pattern and its manufacturing method
US5336151A (en) * 1993-09-14 1994-08-09 Energize International, Inc. Body exercise device
US5820769A (en) * 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
JP3241983B2 (en) * 1995-11-28 2001-12-25 株式会社精工技研 Stamper plate attachment / detachment device for optical disk substrate injection mold
IT1294944B1 (en) * 1997-08-01 1999-04-23 Sacmi METHOD FOR FORMING LARGE CERAMIC TILES USING PARTIALLY ISOSTATIC MOLDS, AND DEVICE FOR IMPLEMENTING THE METHOD.
US5947027A (en) * 1998-09-08 1999-09-07 Motorola, Inc. Printing apparatus with inflatable means for advancing a substrate towards the stamping surface
SE515607C2 (en) 1999-12-10 2001-09-10 Obducat Ab Device and method for fabrication of structures
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
TW570290U (en) * 2003-05-02 2004-01-01 Ind Tech Res Inst Uniform pressing device for nanometer transfer-print

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9149961B2 (en) 2011-08-30 2015-10-06 Johnson Controls Technology Company System and method for manufacturing a vehicle trim component via concurrent compression forming and injection molding
US10118325B2 (en) 2011-08-30 2018-11-06 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Vehicle trim component
US10464280B2 (en) 2011-08-30 2019-11-05 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Trim component for vehicle interior
US10507609B2 (en) 2011-08-30 2019-12-17 Shanghai Yanfeng Jianqiao Automotive Trim Systems Co. Ltd. Vehicle trim component
US10093268B2 (en) 2012-08-27 2018-10-09 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Trim component for vehicle interior
US10981532B2 (en) 2018-06-28 2021-04-20 Shanghai Yanfeng Jinqiao Automotive Trim Systems Co. Ltd. Vehicle trim component

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