CA2467030A1 - Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process - Google Patents

Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process Download PDF

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Publication number
CA2467030A1
CA2467030A1 CA002467030A CA2467030A CA2467030A1 CA 2467030 A1 CA2467030 A1 CA 2467030A1 CA 002467030 A CA002467030 A CA 002467030A CA 2467030 A CA2467030 A CA 2467030A CA 2467030 A1 CA2467030 A1 CA 2467030A1
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CA
Canada
Prior art keywords
particles
titanium
solution
crystallization promoter
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002467030A
Other languages
French (fr)
Other versions
CA2467030C (en
Inventor
Xiangdong Feng
Yie-Shein Her
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vibrantz Corp
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2467030A1 publication Critical patent/CA2467030A1/en
Application granted granted Critical
Publication of CA2467030C publication Critical patent/CA2467030C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3607—Titanium dioxide
    • C09C1/3653—Treatment with inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C01P2002/54—Solid solutions containing elements as dopants one element only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/60—Compounds characterised by their crystallite size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/76—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by a space-group or by other symmetry indications
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/90—Other properties not specified above

Abstract

The present invention provides a process for producing particles suitable fo r use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes adding a crystallization promoter such a s Ti[OCH(CH3)2)]4 to an aqueous cerium salt solution, adjusting the pH of the solution to higher than 7.0 using one or more bases, and subjecting the solution to hydrothermal treatment at a temperature of from 90~C to about 500~C to produce the particles.

Claims (13)

1. A process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries comprising adding a crystallization promoter to an aqueous cerium salt solution, adjusting the pH of the solution to above 7.0 using one or more bases, and subjecting said solution to hydrothermal treatment at a temperature of from about 90 °C to about 500 °C
to produce said particles.
2. The process as in claim 1 wherein said particles have a mean average particle size (D50) within the range of from about 5 nm to about 1000 nm.
3. The process as in claim 1 wherein said particles have an average crystallite size of greater than about 60 .ANG..
4. The process as in claim 1 wherein said particles have an average crystallite size of greater than about 200 .ANG..
5. The process as in claim 1 wherein said cerium salt is ammonium cerium(IV) nitrate.
6. The process as in claim 1 wherein said crystallization promoter comprises a titanium compound.
7. The process as in claim 6 wherein said titanium compound is selected from the group consisting of titanium(IV) isopropoxide, titanium chloride, titanium sulfate, titanium bromide, and titanium oxychloride.
8. The process as in claim 6 wherein said titanium compound is titanium(IV) isopropoxide.
9. The process as in claim 1 wherein said crystallization promoter comprises a salt of lanthanum, scandium, aluminum, or a mixture of such salts.
10. The process as in claim 1 wherein said solution further comprises one or more bases selected from the group consisting of ammonium hydroxide, ethyl amine, ethanol amine, and polyethylene imine.
11. The process as in claim 1 wherein said solution further comprises a compound that delays the aqueous decomposition of the crystallization promoter.
12. The process as in claim 11 wherein said compound that delays the aqueous decomposition of the crystallization promoter comprises acetyl acetone.
13. Particles formed according to the process as in claim 1.
CA2467030A 2001-11-16 2002-11-04 Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process Expired - Fee Related CA2467030C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/992,485 2001-11-16
US09/992,485 US6596042B1 (en) 2001-11-16 2001-11-16 Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
PCT/US2002/035373 WO2003044122A1 (en) 2001-11-16 2002-11-04 Particles for use in cmp slurries and method for producing them

Publications (2)

Publication Number Publication Date
CA2467030A1 true CA2467030A1 (en) 2003-05-30
CA2467030C CA2467030C (en) 2010-10-12

Family

ID=25538391

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2467030A Expired - Fee Related CA2467030C (en) 2001-11-16 2002-11-04 Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process

Country Status (7)

Country Link
US (2) US6596042B1 (en)
EP (1) EP1444309A4 (en)
JP (1) JP4202257B2 (en)
KR (1) KR20050043789A (en)
CN (1) CN1296454C (en)
CA (1) CA2467030C (en)
WO (1) WO2003044122A1 (en)

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US6596042B1 (en) * 2001-11-16 2003-07-22 Ferro Corporation Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
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JP6159284B2 (en) * 2014-04-03 2017-07-05 住友金属鉱山株式会社 Method for producing metal oxide fine particles, metal oxide fine particles, and powder, dispersion, dispersion and coated substrate
CN103923570A (en) * 2014-05-06 2014-07-16 济南大学 Preparation method of rare earth-doped silicon carbide composite polishing powder
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Also Published As

Publication number Publication date
CN1585811A (en) 2005-02-23
JP2005509725A (en) 2005-04-14
US6596042B1 (en) 2003-07-22
US20030093957A1 (en) 2003-05-22
CA2467030C (en) 2010-10-12
CN1296454C (en) 2007-01-24
EP1444309A4 (en) 2007-07-18
AU2002357690A1 (en) 2003-06-10
WO2003044122A1 (en) 2003-05-30
US6818030B2 (en) 2004-11-16
KR20050043789A (en) 2005-05-11
EP1444309A1 (en) 2004-08-11
JP4202257B2 (en) 2008-12-24

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