CA679731A - Bonded abrasive articles - Google Patents

Bonded abrasive articles

Info

Publication number: CA679731A
Authority: CA; Canada
Prior art keywords: bonded abrasive; abrasive articles; articles; bonded; abrasive
Prior art date: 1964-02-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA679731A

Inventor

H. Sandmeyer Karl

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Unifrax 1 LLC

Original Assignee

Carborundum Co

Publication date

1964-02-11

1964-02-11 Application granted granted Critical

1964-02-11 Publication of CA679731A publication Critical patent/CA679731A/en

Status Expired legal-status Critical Current

Links

CA679731A Bonded abrasive articles Expired CA679731A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CA679731T

Publications (1)

Publication Number	Publication Date
CA679731A true CA679731A (en)	1964-02-11

Family

ID=35980815

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA679731A Expired CA679731A (en)			Bonded abrasive articles

Country Status (1)

Country	Link
CA (1)	CA679731A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5297364A (en) *	1990-01-22	1994-03-29	Micron Technology, Inc.	Polishing pad with controlled abrasion rate
US6203407B1 (en)	1998-09-03	2001-03-20	Micron Technology, Inc.	Method and apparatus for increasing-chemical-polishing selectivity
USRE37997E1 (en)	1990-01-22	2003-02-18	Micron Technology, Inc.	Polishing pad with controlled abrasion rate

0
- CA CA679731A patent/CA679731A/en not_active Expired

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5297364A (en) *	1990-01-22	1994-03-29	Micron Technology, Inc.	Polishing pad with controlled abrasion rate
USRE37997E1 (en)	1990-01-22	2003-02-18	Micron Technology, Inc.	Polishing pad with controlled abrasion rate
US6203407B1 (en)	1998-09-03	2001-03-20	Micron Technology, Inc.	Method and apparatus for increasing-chemical-polishing selectivity
US6325702B2 (en)	1998-09-03	2001-12-04	Micron Technology, Inc.	Method and apparatus for increasing chemical-mechanical-polishing selectivity
US6893325B2 (en)	1998-09-03	2005-05-17	Micron Technology, Inc.	Method and apparatus for increasing chemical-mechanical-polishing selectivity

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