CN100447795C - Method of using a manhattan layout to realize non-manhatton shaped optical structures - Google Patents
Method of using a manhattan layout to realize non-manhatton shaped optical structures Download PDFInfo
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- CN100447795C CN100447795C CNB2004800095241A CN200480009524A CN100447795C CN 100447795 C CN100447795 C CN 100447795C CN B2004800095241 A CNB2004800095241 A CN B2004800095241A CN 200480009524 A CN200480009524 A CN 200480009524A CN 100447795 C CN100447795 C CN 100447795C
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Abstract
A system and method for providing the layout of non-Manhattan shaped integrated circuit elements using a Manhattan layout system utilizes a plurality of minimal sized polygons (e.g., rectangles) to fit within the boundaries of the non-Manhattan element. The rectangles are fit such that at least one vertex of each rectangle coincides with a grid point on the Manhattan layout system. Preferably, the rectangles are defined by using the spacing being adjacent grid points as the height of each rectangle. As the distance between adjacent grid points decreases, the layout better matches the actual shape of the non-Manhattan element. The system and method then allows for electrical and optical circuit elements to be laid out simultaneously, using the same layout software and equipment.
Description
The cross-reference of related application
The application requires the right of priority of No. 60/461696 provisional application of submission on April 10th, 2003.
Technical field
The present invention relates to be fit to the design tool of IC industry mask generation software packaging, particularly utilize the Manhattan to define the technology that realizes non-Manhattan geometric configuration, allow electronics and optical device to merge in the same mask device.
Background technology
Because current IC industry mainly has the device of Manhattan geometric configuration (i.e. 45 ° and 90 ° of bendings) based on use, so just there is challenge during with non-Manhattan planar optical device and the merging of conditional electronic device.Especially, typical optical device comprises such as elements such as splitter/combiner, waveguide, Waveguide array structure, semi-conductor optical amplifier, Mach-Zehnder interferometer, modulators, all needs to use the geometric configuration of crooked and various angles.
Because the photonic industry trend is ripe, so the demand that can use IC standard instrument and processing technology to make these devices will increase.Especially, mask generation process will become utilize with microelectronic industry now in the identical IC instrument that uses and the technology committed step that realizes optical device.
In addition, there is the effective demand of introducing and deriving optical texture and do not sacrifice the suitable tools of optics surface quality of exploitation in optical analogy and the modeling industry.Non-Manhattan optical element is introduced directly into from optical simulation software caused former non-Manhattan shape to convert the discrete polygon of low geometric configuration resolution to the IC design tool.Introduce optical device for producing, current available IC design software is packaged in its available summit and quantitatively is restricted.In the prior art, be used for some design software packing that optics or integrated circuit use because its 12 bit arithmetic and only be restricted to 4096 summits.The summit limited amount has caused the modification of optical device.Optical device can cause unexpected optics behavior in this modification that it is introduced in the integrated circuit mask design software process, and this can only could find after optical device is made.If photonic industry plans to benefit from the high yield manufacturing mode of IC industry, the then introducing of optical design software packing/derivation restriction just must be solved.Provide the high resolution conversion of discrete polygonal representation also to have problems from a series of input formation curves from mathematical equation.
Summary of the invention
The demand that is kept in the prior art is solved by the present invention, the present invention relates to be fit to the design tool of IC industry mask machining software packing, more specifically, relate to the technology of utilizing the Manhattan to define to realize non-Manhattan geometric configuration, allow electronics and optical device to merge in the same mask device.
According to the present invention, by using continuous polygon (preferred rectangle) to realize to design complicated optical device, the adjacent polygonal summit of match is the profile of identical optical device.Be used to realize to realize the polygonal quantity (promptly reducing each polygonal size) of match mating preferably by increase.In limited field, polygonal quantity is only limited by the minimum grid pitch that is used for mask processing.
An advantage of the invention is: " fitted rectangle " design technology really is fit to any traditional integrated circuit software design packing, and will reduce to continue to provide more high-resolution optical surface with mask address beam sizes.Therefore, technology of the present invention allows to use same mask design technology to realize optics and electron device.
According to one embodiment of present invention, provide a kind of method of utilizing the Manhattan grid system to form the integrated circuit (IC) design of non-Manhattan curve shape element, the method comprising the steps of:
A) determine that concrete Manhattan is designed and the minimum gate lattice resolution of the system that mask is made;
B) minimum spacing between the adjacent vertex of rectangle is defined as distance between a pair of selected grid point;
C) in the grid system of Manhattan, add non-Manhattan curve shape element;
D) by locate at least one summit of each rectangle, a plurality of rectangles of match in the restriceted envelope of non-Manhattan curve shape element at the periphery of non-Manhattan curve shape element.According to another embodiment of the invention, provide a kind of method that generates the integrated circuit (IC) design of at least one non-Manhattan curve shape optical element and at least one Manhattan electronic component, the method comprising the steps of:
Simulate one group of predetermined optical function to generate the physical Design of at least one non-Manhattan curve shape optical element;
The described physical Design of at least one non-Manhattan curve shape optical element converts the design that is fit to the Manhattan grid system to this, and this switch process comprises:
A) determine that concrete Manhattan is designed and the minimum gate lattice resolution of the system that mask is made;
B) minimum spacing between the adjacent vertex of rectangle is defined as distance between a pair of selected grid point;
C) in the grid system of Manhattan, add non-Manhattan curve shape element;
D) by locate at least one summit of each rectangle, a plurality of rectangles of match in the restriceted envelope of non-Manhattan curve shape element at the periphery of non-Manhattan curve shape element;
Simulate one group of predetermined electrical functions to generate the physical Design of at least one Manhattan electronic component;
The input of the switched Manhattan design of the Manhattan design of at least one electronic component and at least one optical element as the mask manufacturing system is provided; And
On the grid system of Manhattan, generate the mask that comprises optics and electronic component design.
By the reference accompanying drawing, other and further advantage of the present invention will be very obvious.
Brief Description Of Drawings
Referring now to accompanying drawing,
Fig. 1 comprises the AS chart, the interaction of expression fitted rectangle optical device designs instrument and traditional masks machining tool and electronic device design instrument.
Fig. 2 represents the example integrated circuit design grid, and shows first group of design and second group of design that represents non-Manhattan geometry devices that represents the Manhattan geometry devices.
Fig. 3 (a) is to use the circular design of the prior art of present available design tool, and Fig. 3 (b) has been to use the same circular design of fitted rectangle technology of the present invention.
Fig. 4 (a) has been to use the ellipse design of the prior art of present available design tool, and Fig. 4 (b) has been to use the design of the same ellipse of fitted rectangle technology of the present invention.
Fig. 5 represents to use and connects fitted rectangle in a plurality of and form according to curve of the present invention.
Fig. 6 represents to use a plurality of external fitted rectangle to form the curve according to the present invention.
Fig. 7 (a) is to use the concavees lens design of the prior art that can utilize design tool at present, and Fig. 7 (b) has been to use the same concavees lens design of fitted rectangle technology of the present invention.
Fig. 8 (a) is to use the conical design that can utilize the prior art of design tool at present, and Fig. 8 (b) has been to use the same conical design of fitted rectangle technology of the present invention.
Fig. 9 represents exemplary Mach-Zehnder modulators design.
Embodiment
As mentioned above, the present invention relates to the method that the match polygon vertex generates optical device, between optical simulation software packing and IC design software packing in the process of these devices of introducing/derivation, make the positioned opposite (particular importance in the time waveguide need being positioned over the lens focus place) between the size of devices that generates and device remain with enough resolution.Method of the present invention comprises that use has fitted to one group of polygonal independent summit (one or more) of optical device curved profile.Can use the equation of geometric configuration then or generate optical device by CAD software institute drawing image.Select polygonal match summit with used grid in the coupling IC design software.The coupling grid is guaranteed effective input and output of optical device and is made its physical size without any variation.The form of spanned file can be configured to be fit to employed Standard File Format in the IC industry.In fact, the method for the present invention advanced method for example optical near-correction (OPC), far ultraviolet (EUV) and the X-ray lithography that are considered to be fit to mask processing.Fig. 1 represents to utilize system of the present invention in simplified form.Optical device simulator 1 at first produces the physical Design of one group of multiple device in the optical system, the spacing between relative device size and device, and physical Design is suitable scope.Then this information be used as polygon match system of vertices 2 input to generate these shapes, this system will be described in detail below.The output of system 2 is the designs according to the grid distance that is fit to the current design tool that is used for the electricity integrated circuit.This design information is as the traditional mask layout system 3 of input.The optics of complication system and electricity device an advantage of the invention is that electronic component simulator 4 also can provide design information to mask layout system 3, so that can be handled simultaneously in mask layout tool.
Fig. 2 shows exemplary IC layout tool grid for ease of discussion, and shows the design of Manhattan geometric configuration (relevant with electron device usually) and non-Manhattan geometric configuration (relevant with optical device usually).All electron devices 6 all are made of the Manhattan geometric configuration, and it is presented as the straight line with the interconnection of 90 ° or 45 degree.On the contrary, can find out that non-Manhattan geometry devices 8 is presented as curve shape (comprising circle), multiple connection angle and conical component.This multiple non-Manhattan geometric configuration can for example grating, concavees lens, cone, lens, ring resonator and Mach-Zehnder interferometer be relevant with the traditional optical device.In fact, technology of the present invention is considered to be particularly useful for play and uses the diffraction optical device (DOEs) of diffraction of light (opposite with refraction with reflection) so that required optical function effect to be provided.Especially, DOEs is made up of a plurality of curved surfaces (a kind of exemplary arrangement comprises a series of concentric circless) that are difficult to use traditional Manhattan to arrange and design usually.Therefore, method of the present invention, as described below and particularly including diffraction optical device (DOEs), form the curved profile of optical device by utilizing a series of polygons (preferred rectangle), this multiple optical device can be generated by the traditional IC design tool.
Fig. 3 represents to use method of the present invention to convert circle to the IC design tool.Be convenient contrast, Fig. 3 (a) shows the circle of using the prior art that the traditional optical layout tools generated, and is wherein circular by utilizing polygonized structure to form.On the contrary, Fig. 3 (b) represents the circle that use match polygon method of the present invention is generated.For ease of current discussion, will suppose that later on use " rectangle " is used as the match polygon.As mentioned above, the polygonal quantity that is used for the match certain device is only limited by the grid distance of instrument.Should be appreciated that rectangle just is construed to " match " polygonal a kind of exemplary selection, and any other polygon-shaped all can being used in the inventive method, wherein, the profile of selected polygonal summit and optical device is complementary.With reference to Fig. 3 (b), a plurality of rectangle 10-1 are used to the profile of match circle to 10-N.Especially, the point that is restricted on the grid distance with design tool of the summit A of each rectangle 10-i and B is consistent.Like this, the polygonal shape of the prior art by discerning comparable Fig. 3 in summit (a) forms circle more accurately.
As a rule, the used light wavelength of photon light wave platform (for example silicon, silicon dioxide, indium phosphide or polymkeric substance) is less than light wavelength in a vacuum.For example, 1.55 μ m vacuum wavelengths are corresponding to 0.44 mum wavelength in the silicon waveguide.Therefore, based on current mask beam address, the spacing on summit may diminish to 0.02 μ m in the design.As a result, can represent high-quality optical surface (can obtain λ/20 or better optical flatness) according to the optical device that fitted rectangle of the present invention generated.
Fig. 4 shows the design of the exemplary elliptical optical component (for example lens) of using fitted rectangle technology of the present invention, wherein, Fig. 4 (a) shows the limitation of using polygon to form the prior art design tool of optical device, and Fig. 4 (b) shows the fitted rectangle technology of the application of the invention with contrasting and improving aspect the coupling elliptic contour.The same with circle, a plurality of rectangle 12-1 are used to " match " oval profile to 12-M, and the summit A of each rectangle 12-i and B are selected consistent with the IC design grid, shown in Fig. 4 (b).The same with in the multiple design that is generated by fitted rectangle technology of the present invention each, can use the quantity of separate rectangular of (because controlling) directly relevant with obtainable " match " by grid distance.
Fig. 5 show use according to the present invention connect in a plurality of fitted rectangle 30-1 to 30-P with " match " exemplary curve 32.Should be noted that Fig. 5 does not draw in proportion, but for the sake of clarity amplify.As shown in the figure, one group of summit 34-1 is restricted to the grid point that meets with curve 32 to 34-P.Fig. 6 in a similar manner (also being) with magnification ratio show use a plurality of external fitted rectangle 40-1 to 40-Q with " match " exemplary curve 42.Equally, summit 44-1 is restricted to the grid point that meets with curve 42 to 44-Q.Should be appreciated that according to instruction of the present invention, in connect or boundary rectangle all can be used to provide required match.
Use a plurality of fitted rectangle 52-1 to the design of the concavees lens 50 of 52-R shown in Fig. 7 (b), Fig. 7 (a) shows the prior art polygon with making comparisons.Shown in Fig. 7 (b), the height of each rectangle 52 is limited and is limited by the minimum distinguishable characteristic dimension of the mask that is used to design.Then, control the height l of each rectangle, so that the curve 56 of related top 54 the most suitable mirrors 50.The generation of linear cone 60 is shown in Figure 8, and wherein, Fig. 8 (a) shows the fit technique of using polygonal prior art, and according to the present invention by using improvement that a plurality of fitted rectangle obtain shown in Fig. 8 (b).With reference to figure 8 (b), control each rectangle 62-1 to the length of 62-S to generate the required cone T of specific linear cone 60.
Should be appreciated that the above embodiment of the present invention is only for according to utilizing the IC design tool to come a plurality of rectangles of match with the profile that forms any required optical device feature of the present invention to be described.For example, can use fitted rectangle technology of the present invention to generate the design of multiple other optical device or form the combination of the optical device of optical system.Especially, Fig. 9 shows the design that comprises the optical devices of formed Mach-Zehnder modulators 70 according to the present invention.Design a package and draw together level crossing 72,74 so that light turns to and focuses in the waveguide.Separation vessel 76 and combiner 78 is as light being imported and derives separating and parallel waveguide arm 80,82 of the active region 84 that forms Mach-Zehnder modulators 70.Because the active region 84 of Mach-Zehnder modulators 70 also comprises the active electrons device and controls the optical characteristics that guided light that mask level defines optics and electron device (for example by using the system shown in Fig. 1).Therefore, generally speaking, the scope of the invention is only defined by the appended claims.
Claims (7)
1. method of utilizing the Manhattan grid system to form the integrated circuit (IC) design of non-Manhattan curve shape element, the method comprising the steps of:
A) determine that concrete Manhattan is designed and the minimum gate lattice resolution of the system that mask is made;
B) minimum spacing between the adjacent vertex of rectangle is defined as distance between a pair of selected grid point;
C) in the grid system of Manhattan, add non-Manhattan curve shape element;
D) by locate at least one summit of each rectangle, a plurality of rectangles of match in the restriceted envelope of non-Manhattan curve shape element at the periphery of non-Manhattan curve shape element.
2. the method for claim 1 is wherein at execution in step b) in, a pair of selected grid point is the adjacent gate lattice point.
3. the method for claim 1, wherein non-Manhattan curve shape element is an optical element.
4. method as claimed in claim 3, the electricity component that wherein also comprises the Manhattan shape, the electricity component of described Manhattan shape is included in the grid identical with non-Manhattan curve shape optical element, allows optics and electricity component to be arranged in simultaneously on the same grid.
5. the method for claim 1 wherein also comprises the geometric configuration that is set to import to determine non-Manhattan curve shape element by the equation of prespecified geometric.
6. the method for claim 1 is wherein at execution in step d) in, a plurality of summits of at least one rectangle are located in the periphery of non-Manhattan curve shape element.
7. method that generates the integrated circuit (IC) design of at least one non-Manhattan curve shape optical element and at least one Manhattan electronic component, the method comprising the steps of:
Simulate one group of predetermined optical function to generate the physical Design of at least one non-Manhattan curve shape optical element;
The described physical Design of at least one non-Manhattan curve shape optical element converts the design that is fit to the Manhattan grid system to this, and this switch process comprises:
A) determine that concrete Manhattan is designed and the minimum gate lattice resolution of the system that mask is made;
B) minimum spacing between the adjacent vertex of rectangle is defined as distance between a pair of selected grid point;
C) in the grid system of Manhattan, add non-Manhattan curve shape element;
D) by locate at least one summit of each rectangle, a plurality of rectangles of match in the restriceted envelope of non-Manhattan curve shape element at the periphery of non-Manhattan curve shape element;
Simulate one group of predetermined electrical functions to generate the physical Design of at least one Manhattan electronic component;
The input of the switched Manhattan design of the Manhattan design of at least one electronic component and at least one optical element as the mask manufacturing system is provided; And
On the grid system of Manhattan, generate the mask that comprises optics and electronic component design.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46169603P | 2003-04-10 | 2003-04-10 | |
| US60/461,696 | 2003-04-10 | ||
| US10/820,356 | 2004-04-08 |
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| Publication Number | Publication Date |
|---|---|
| CN1771499A CN1771499A (en) | 2006-05-10 |
| CN100447795C true CN100447795C (en) | 2008-12-31 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2004800095241A Expired - Fee Related CN100447795C (en) | 2003-04-10 | 2004-04-12 | Method of using a manhattan layout to realize non-manhatton shaped optical structures |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111367149B (en) * | 2020-04-10 | 2021-04-20 | 联合微电子中心有限责任公司 | Optical proximity correction method for curve pattern |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4820928A (en) * | 1986-10-09 | 1989-04-11 | Hitachi, Ltd. | Lithography apparatus |
| US5943487A (en) * | 1996-07-12 | 1999-08-24 | Intel Corporation | Method for extracting a resistor network from an integrated circuit polygon layout |
| US6269472B1 (en) * | 1996-02-27 | 2001-07-31 | Lsi Logic Corporation | Optical proximity correction method and apparatus |
| CN1403873A (en) * | 2001-08-16 | 2003-03-19 | 联华电子股份有限公司 | Optical proximity effect correcting method |
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2004
- 2004-04-12 CN CNB2004800095241A patent/CN100447795C/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4820928A (en) * | 1986-10-09 | 1989-04-11 | Hitachi, Ltd. | Lithography apparatus |
| US6269472B1 (en) * | 1996-02-27 | 2001-07-31 | Lsi Logic Corporation | Optical proximity correction method and apparatus |
| US5943487A (en) * | 1996-07-12 | 1999-08-24 | Intel Corporation | Method for extracting a resistor network from an integrated circuit polygon layout |
| CN1403873A (en) * | 2001-08-16 | 2003-03-19 | 联华电子股份有限公司 | Optical proximity effect correcting method |
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| CN1771499A (en) | 2006-05-10 |
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