CN1822233A - 一种擦除一个或多个非易失存储器单元的方法、电路和系统 - Google Patents

一种擦除一个或多个非易失存储器单元的方法、电路和系统 Download PDF

Info

Publication number
CN1822233A
CN1822233A CNA2006100054168A CN200610005416A CN1822233A CN 1822233 A CN1822233 A CN 1822233A CN A2006100054168 A CNA2006100054168 A CN A2006100054168A CN 200610005416 A CN200610005416 A CN 200610005416A CN 1822233 A CN1822233 A CN 1822233A
Authority
CN
China
Prior art keywords
voltage
erase
unit
pulse
erasing pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2006100054168A
Other languages
English (en)
Inventor
阿萨夫·沙比尔
夏伊·艾森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Spansion Israel Ltd
Original Assignee
Spansion Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Spansion Israel Ltd filed Critical Spansion Israel Ltd
Publication of CN1822233A publication Critical patent/CN1822233A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F12/00Accessing, addressing or allocating within memory systems or architectures
    • G06F12/14Protection against unauthorised use of memory or access to memory
    • G06F12/1408Protection against unauthorised use of memory or access to memory by using cryptography
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • G11C11/5635Erasing circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • G11C16/16Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/26Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/344Arrangements for verifying correct erasure or for detecting overerased cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/344Arrangements for verifying correct erasure or for detecting overerased cells
    • G11C16/3445Circuits or methods to verify correct erasure of nonvolatile memory cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/349Arrangements for evaluating degradation, retention or wearout, e.g. by counting erase cycles
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • G11C16/0475Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS] comprising two or more independent storage sites which store independent data
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2216/00Indexing scheme relating to G11C16/00 and subgroups, for features not directly covered by these groups
    • G11C2216/12Reading and writing aspects of erasable programmable read-only memories
    • G11C2216/18Flash erasure of all the cells in an array, sector or block simultaneously

Abstract

本发明是一种擦除非易失存储器(“NVM”)阵列或阵列段上的NVM单元的方法、电路或系统。按照本发明的一个例子,一个或多个擦除脉冲参数可与NVM阵列内的每个阵列段相关联。无论何处,个别的擦除脉冲参数可与NVM阵列内一个以至所有阵列段相关联。按本发明的某些例子,施加到阵列段内一个或多个NVM单元上的擦除脉冲的特性(如脉冲振幅、脉冲持续时间等)可至少部分基于一个或多个与给定阵列段相关联的擦除脉冲参数。

Description

一种擦除一个或多个非易失存储器单元的方法、电路和系统
技术领域
本发明涉及非易失存储器(NVM)单元,尤其涉及一种使用一个或多个存储的擦除参数来擦除一个或多个非易失存储器单元的方法、电路和系统。
背景技术
非易失存储器(NVM)单元装配于多种结构内,包括但不限于多晶硅浮栅—如图2A所示,氮化物只读存储器(NROM)—如图2B所示。如图2A所示,浮栅设备一般包括一层引导电荷诱捕层(比如由多晶硅构成),因而只可提供一个电荷存储区。而另一方面,如图2B所示,NROM设备可能包括非传导性的电荷存储层(比如由硅氧化物构成),因而可支持多电荷存储区。NVM的每个电荷存储区均可被视为独立的NVM单元或单位。
为生产大容量数据存储设备(比如闪存卡/棒、多媒体卡等),NVM单元经常用做于阵列相关的单元的大矩阵的一部分,依据己知数种中的一种阵列结构和使用的操作方法,阵列中的每个单元可单独或作为组或批的部分来被设定地址、编程、读及/或擦除。多数单元阵列结构,包括业界熟知的假接地阵列,具有重复形成行列的段的多样性特征。依照某些典型的阵列结构,比如假接地阵列,每个阵列段可包括一个单元区域,该单元区域由四条分段的单元比特线、偶选区域和奇选区域构成。该偶选区域位于该单元区域的一端并包括一条分段的偶接触器比特线和两个选型晶体管用于连接该偶接触器比特线和该段的偶单元比特线。该奇选区域位于该单元区域的相对一端并包括一条分段的奇接触器比特线和两个选型晶体管用于连接该奇接触器比特线和该段的奇单元比特线。一个NVM阵列可能还另外分别包括一偶接触器连接两个相邻偶选区的偶接触器比特线,一个奇接触器连接两个相邻奇选区的奇接触器比特线。
众所周知,一个NVM单元的逻辑状态可决定和受限于其阈电压(“Vt”),即栅极到源/漏极电压,在此电压时,单元开始明显导通电流。每个单元,或多电荷存储区域NVM设备的电荷存储区域,均可具有不同的阈电压,因而可存储其独特的逻辑值。每个单元或每个电荷存储区可从其各自的设备中的独立终端或一套终端进行操作(如被编程、擦除或读取)操作多电荷存储区NVM设备的方法为业内所熟知。前面所述或正在进行的讨论有关NVM单元操作的内容,同时可应用于单电荷存储区设备的单电荷存储区操作和多电荷存储区设备的每个电荷存储区操作。
对每个NVM单元,不同阈电压值具有不同的逻辑状态,且NVM单元阈电压水平可为存于单元电荷存储区电荷量(如电子和空穴)的函数。图1A为电压分布图,描述了二进位非易失性存储器单元可能的阈电压分布,其中竖轴方向为边界单元阈电压Vt值及每个单元可能的逻辑状态。例如,Vt值低于EV水平的单元被视为已校验擦除,Vt值低于PV水平的单元被视为已校验编程。这两个限制定义了完成编程和擦除顺序的逻辑状态,这可在单元上执行。一个编程脉冲的程序顺序可用来促使单元的Vt超过PV,而一个擦除顺序可能用于促使单元的Vt低于EV。同样在图1A中,一条竖轴线指明了在读取操作中常用的读取校验(RV)电平。另外,如果读取时单元的Vt超过RV水平,则被单元视为已被编程;如果单元的Vt低于RV,单元被视为已被编程
图1B为电压分布图,描述了多级非易失性存储器单元(MLC)电荷存储区可能的阈电压分布,其中一组竖轴描述了与每个单元可能的编程校验单元阈电压(如PV00、PV01)相关边界值,而另一组竖轴描述了与每个单元可能的程序状态(如RV00、RV01)下读取校验电平的相关边界值。
对NVM阵列的单独单元不同的编程方法(如注入电荷到电荷存储区)和/或擦除(如从电荷存储区移除电荷)是已知的。多数情形下,当一个或更多编程脉冲作用于单元时,存储于NVM单元存储区的电荷量会增加;与之相反,当一个或更多擦除脉冲作用于NVM单元栅极终端时,存储于NVM单元存储区的电荷量会减少,由此迫使释放从单元捕获区或单元捕获界面捕获的电荷。擦除过程也可选择注入反极性的电荷而不是物理移除电荷。例如,如果编程过程包括注入电子到单元电荷阱,相应的擦除过程就可包括注入空穴到电荷阱。反极性电荷会湮灭或消除彼此的效果。
另外,当讨论擦除一个或更多NROM假接地阵列中NVM单元的程序时,擦除步骤可包括在一个或更多单元栅极上施加强负压脉冲(如-7V),在漏极上施加强正压(如+3V to +7V),并允许单元源极浮动。在单元被擦除时,存储于各自电荷阱区邻近漏结的电荷,少许通过沟道,可被沉于正被擦除单元的漏极(或与注入空穴中和)。
NVM阵列的单元组或群可同时被编程和/或擦除。NVM阵列的单元组或群可由正被编程(或被擦除)成同样逻辑状态单元的组成,或由正被编程(或被擦除)成几种可能状态之一单元的组成,比如MLC阵列的单元中的情形。由于并非所有单元在被编程和/或被擦除时具有同一的磁化系数,单元组里的正接受编程或擦除脉冲的单元不会以同样的速度编程或擦除。在同组其他在同时接收编程或擦除脉冲的单元前,有些单元会达到目标编程状态或擦除状态。
操作NVM单元的方法(如编程、读取和擦除)使用一个或多个参考结构,如参考单元以提供参考电平(如PVs,EVs)每一或多个参考结构可与正在被操作的存储器单元比较,以决定正被操作的存储器单元的条件或状态。一般而言,为决定NVM单元是否处于一特定状态,如被擦除、编程或在多级单元(“MLC”)内的多重可编程状态下的一种编程。单元的阈电平与参考结构比较,而参考结构的阈电平是预设且公知的,并被设在一电压水平,该电压水平与待测试的特定状态相关。NVM单元与参考单元的阈电压之间的比较,常常使用读出放大器完成。为决定NVM单元的状态,而比较NVM单元与一个或多个参考单元的阈电压的各种技术都是公知的。
在将NVM单元编程至所需要的状态时,带有设置阈电压于特定状态下程序校验电平的参考单元可与被编程的单元阈电压比较,以决定电荷存储区域是否已被充分充电而可被视为被编程至需要状态。如在编程脉冲作用于单元后,由于单元阈电压是或高于“编程校验”电平(即相关参考单元的阈电压),单元被确认未被充分充电,即未达目标编程状态,单元会被另一编程脉冲作用以在其电荷存储区充入更多电荷。一旦单元阈值达到或超过“编程校验”电平即已被编程,就不需要更多编程脉冲作用于单元。除将编程脉冲改为擦除脉冲,同样操作原则适用于擦除一个或多个单元时。
刚处理之后,特别是多编程/擦除周期之后,每个NVM单元的编程和擦除磁化系数与任何其他NVM单元的磁化系数都是不一样的,且其在单元的整个生命周期中不断变化。图3表示擦除脉冲电压的示例性分布,该擦除脉冲电压应能使多个阵列段中的每一个上的一组NVM单元中的每个单元达到擦除状态,该多个阵列段是图4所示的阵列一类的NVM阵列。
因此,在本领域内,需要一种NVM产品以提高擦除一个或多个NVM单元的方法、电路和系统。
发明内容
本发明是一种用于擦除非易失存储器(NVM)阵列或阵列段中的一个或多个单元的方法、电路和系统。根据本发明的某些实施例,一个或多个擦除脉冲参数可与NVM阵列中的一定数量的阵列段中的每个阵列段相关。单独的擦除脉冲参数可与NVM阵列中的从一个到全部的阵列段都相关。
根据本发明的某些实施例,对应用到阵列段中一个或多个NVM单元上的擦除脉冲而言,其至少一个特征(如脉冲幅值、脉冲持续时间等)可至少部分地基于一个或多个与给定阵列段相关的擦除脉冲参数。根据本发明另外的一些实施例,该一个或多个与给定阵列段相关的擦除脉冲参数可在NVM阵列的排序过程中被存储。根据本发明其他的一些实施例,该一个或多个与给定阵列段相关的擦除脉冲参数可在一个擦除操作已作用于阵列段中的一个或多个NVM单元后被更新。
所述一个或多个与给定阵列段相关的擦除脉冲参数可与最高擦除脉冲电压相关,该最高擦除脉冲电压用于使阵列段中的一个或多个单元达到阈电压。根据本发明的某些实施例,该一个或多个与给定阵列段相关的擦除脉冲参数实际是指一擦除脉冲电压,在该擦除脉冲电压,阵列段中的一个最慢的擦除NVM单元被促使达到与前述擦除操作或循环过程中的擦除状态相关的阈电压。根据某些其他实施例,该一个或多个擦除脉冲参数可以是一擦除脉冲电压,该擦除脉冲电压由一电压偏移而来并低于该电压,该电压可促使阵列段中的擦除最慢的NVM单元达到与一在先的擦除操作/循环期间的擦除状态相关的阈电压。又根据本发明的其他一些实施例,该一个或多个与给定阵列段相关的擦除脉冲参数可与擦除脉冲电压相关,该擦除脉冲电压可使阵列段中除擦除最慢的单元外的NVM单元达到擦除状态。根据本发明的其他一些实施例,一个或多个与给定阵列段相关的擦除脉冲参数可与擦除脉冲的持续时间相关,该擦除脉冲持续时间可使阵列段中的一个相对较慢的擦除单元达到一在先的擦除操作/循环过程中的擦除状态。对于本领域的普通技术人员而言,显而易见的是:擦除脉冲参数可以是擦除脉冲的任何特性(如振幅、持续时间、斜率、波形等),这些擦除脉冲特征可影响擦除脉冲的使一NVM单元达到与擦除状态相关的阈电压的有效性。
根据本发明的一些实施例,该一个或多个与各个阵列段相关的擦除脉冲参数可被存储到一个或多个与该脉冲参数有关的给定阵列段中的NVM单元中,或存储到一个或多个其它功能上与给定阵列段相关的NVM单元中。该一个或多个与阵列段相关的擦除参数可在排序过程中首先存储在相关的NVM单元中。该一个或多个与给定阵列段相关的擦除参数可随后被更新,更新时间也可在阵列段中的一个或多个单元的每个擦除操作/循环之后,或者间歇地在给定阵列段的某个数量的擦除操作/循环之后。对于本领域的普通技术人员而言,显而易见的是:擦除脉冲参数可存储在任何功能上与阵列段相关的NVM单元中。
根据本发明的一些实施例,存在一个或多个NVM单元,其与NVM阵列段相关,并且可用于存储一个或多个也与NVM阵列段相关擦除脉冲参数。根据本发明的其他一些实施例,存在一个擦除脉冲源(如,电荷泵、控制器等),可用于产生擦除脉冲,其特征是至少部分地基于一个或多个存储在与给定阵列段相关的NVM单元中的擦除脉冲参数。
根据本发明的一些实施例,存在一个控制器,可用于读一个或多个与给定阵列段相关的擦除脉冲参数,且发出擦除脉冲源信号以产生一个或多个至少部分基于所述读擦除脉冲参数的擦除脉冲。根据本发明其他的一些实施例,控制器可用于记录擦除脉冲的与脉冲特性(如,幅值、持续时间等)相关的擦除脉冲参数,该擦除脉冲使NVM单元达到一阈电压,该阈电压与擦除操作/循环过程中的擦除状态相关。该控制器可将擦除脉冲参数存储到NVM单元中,该NVM单元在功能上将阵列段与给定的擦除脉冲参数关联。
附图说明
前已特别指出,并在说明书的结尾部分也明确地提出了本发明的主题。然而仍可参考下面的详细描述并结合附图,以期更好理解本发明,及结合对象、特征和有益效果的操作结构和方法,但均不限于此:
图1A所示是一电压分布图,表示可能的阈电压在二进制非易失存储器单元的电荷存储区域中的分布,其中竖轴表示边界值或者阈电压值,其与单元的各个可能的编程状态的编程校验、读校验和中间编程校验电平相关联;
图1B所示是一电压分布图,表示可能的阈电压在一多电平的非易失存储器单元(“MLC”)的电荷存储区域中的分布,其中竖轴表示边界值或阈电压,其与单元的各个可能状态的编程校验、读校验和中间编程校验电平相关联;
图2A所示是浮栅存储单元的侧截面简图;
图2B所示是具有独特的编程电荷存储区域的氮化物只读存储器(NROM)单元的侧截面简图;
图3所示是擦除脉冲电压值的示例性分布图,该擦除脉冲电压应能使多个阵列段中的每一个上的一组NVM单元中的每个单元达到擦除状态,该多个阵列段是图4所示的阵列一类的NVM阵列;
图4是根据本发明的一些实施例的一个示例性NVM电路和阵列的方块图,其中,通过一个擦除脉冲源进行擦除脉冲初始化,控制器可从初始化之前的表到给定阵列段,来访问与给定阵列段相关的擦除脉冲参数;
图5是包括根据本发明的示例性方法的步骤的流程图,其中该示例性方法的步骤用于与现有技术中的工艺步骤相对照。
以上图形都是非限制性的,为简单和清晰起见,其中所示的元件不一定均按比例绘制,例如,为了某些元件的清晰,其尺度可比其他元件相对大一些。而且,参考数字在插图中可能适当地被重复使用以指示相关的或相似的部分。
具体实施方式
在下面的详细说明中,将提出一些具体细节以便透彻理解本发明。但可以理解的是,对本领域内的普通技术人员来说,没有这些细节,也能够实施本发明。另外,为明晰起见,本文件对一些众所周知的方法和程序将不予详细描述。
除非特别说明,下文讨论中所贯穿使用于本说明书的一些术语如“处理”、“计算”、“计划”、“决定”之类,均表示计算机或计算系统或类似的电子计算设备的动作和/或过程,该动作和/或过程对计算系统的寄存器和/或存储器上的物理(例如电子的)量进行操作和/或转换,使其变为其他数据,类似地,这些数据意指在计算系统的寄存器、存储器或其他类似的可存储、转换或显示信息的设备上的物理量。
本发明的实施例可包括用以执行文中所述操作的设备。该设备可依用途而特制,或可包括一个具有普通用途的计算机,该计算机可通过内置的计算机程序进行选择性激活或重构。
本发明是一种用于擦除非易失存储器阵列或阵列段上的一个或多个非易失存储器(“NVM”)单元的方法、电路和系统。按本发明的某些实施例,一个或多个擦除脉冲参数可与一定数量的NVM阵列内的每个阵列段相关联。单独的擦除脉冲参数可与NVM阵列内的一个至所有中任何数量的阵列段相关联。
按本发明的某些实施例,对施加到阵列段内部的一个或多个NVM单元上的擦除脉冲来说,其至少有一种特性(如,脉冲振幅、脉冲持续时间等)可至少部分基于一个或多个与给定阵列段相关联的擦除脉冲参数而设定。按照本发明的另一些实施例,该一个或多个与给定阵列段相关联的擦除脉冲参数可在该NVM阵列排序期间进行存储,而按照本发明的另外一些实施例,该一个或多个与给定阵列段相关联的擦除脉冲参数可在阵列段的一个或多个NVM单元上执行完擦除操作后予以更新。
该与给定阵列段相关联的一个或多个擦除脉冲参数可与最高擦除脉冲电压相关联,该最高擦除脉冲电压应可促使阵列段上的一个或多个单元达到擦除阈电压。按本发明的某些实施例,该一个或多个与给定阵列段相关联的擦除脉冲参数实际上可以是该擦除脉冲电压,在该电压时,该阵列段上擦除得最慢的NVM单元也可达到阈电压,该阈电压与一在先的擦除操作或循环中的擦除状态相关。按本发明的某些实施例,一个或多个擦除脉冲参数可以是一个擦除脉冲电压,该脉冲电压由偏移且低于另一电压,在该另一电压时,阵列段上擦除得最慢的NVM单元也可达到阈电压,该阈电压与一在先的擦除操作/循环中的擦除状态相关。按本发明的另一些实施例,一个或多个与给定阵列段相关联的擦除脉冲参数可与擦除脉冲电压相关,该擦除脉冲电压可使该阵列段内除擦除得最慢的单元外的NVM单元达到擦除状态。按本发明的某些实施例,一个或多个与给定的阵列段相关联的擦除脉冲参数可与一个擦除脉冲特性相关联(如,电压),该擦除脉冲特性使在一在先的擦除操作/周期中擦除得最快的阵列段内的一个NVM单元达到擦除状态。
按本发明的某些实施例,一个或多个与给定阵列段相关联的擦除脉冲参数可与擦除脉冲的持续时间相关联,该擦除脉冲的持续时间可使该阵列段上擦除速度相对较慢的单元在一在先的擦除操作/循环中达到擦除状态。对本领域内的普通技术人员来说,很明显,一个擦除脉冲参数可以是擦除脉冲的任何特性(如,振幅、持续时间、斜率、波形等),擦除脉冲可促使NVM单元达到与擦除状态相关的阈电压受到该特性影响。
按本发明的某些实施例,该一个或多个与每个阵列段相关联的擦除脉冲参数可存储在给定阵列段内的一个或多个NVM单元上,该给定阵列段与擦除脉冲参数相关,或者,一个或多个NVM单元在功能上以另外的方式与给定阵列段相关联。该一个或多个与阵列段相关的擦除参数可在排序期间首先存储在相关的NVM单元上。该一个或多个与给定阵列段相关联的擦除参数可稍晚,或在该一个或多个阵列内的单元完成所有擦除操作/循环后,或者间歇性地在给定阵列段的某些擦除操作/循环之后,予以更新。对本领域的普通技术人员来说,很明显擦除脉冲参数可存储在任何NVM单元上,该NVM单元在功能上与阵列段相关。
按本发明的某些实施例,存在一个或多个NVM单元,其与NVM阵列段相关,且可用以存储一个或多个也与NVM阵列段相关的脉冲参数。按本发明的另外一些实施例,存在一个脉冲源(如,电荷泵,控制器等),可用以产生一个擦除脉冲,该擦除脉冲的特性至少可部分基于一个或多个擦除脉冲参数设定,当该脉冲源针对该给定阵列段内的单元产生一个擦除脉冲时,该脉冲参数存储在与给定阵列段相关联的NVM单元中。
按照本发明的某些实施例,可采用控制器以读取一个或多个与给定阵列段相关联的擦除脉冲参数,并向擦除脉冲源发出信号以产生一个或多个擦除脉冲,该擦除脉冲至少可部分基于该读擦除脉冲参数。按照本发明的另外一些实施例,可采用控制器以记录与擦除脉冲的脉冲特性(如,振幅、持续时间等)相关联的擦除脉冲参数,该擦除脉冲可促使NVM单元达到阈电压,该阈电压与一个擦除操作/循环中的擦除状态相关联。该控制器可将擦除脉冲参数存储在一个NVM单元内,该NVM单元在功能上与该阵列段相关联,该阵列段与给定的擦除脉冲参数相关。
参看图4,该图表示一个示例性的电路和阵列100,见于本发明某些实施例,其中,通过擦除脉冲源300可进行脉冲初始化,控制器200可从初始化之前的表100到该给定阵列段,读取一个与一给定阵列段(如,2A)相关联的擦除脉冲参数。不论在擦除操作初始化时,或在给定阵列段内的一个或多个单元循环时,不论是基于通过外部界面接受到的信号,还是基于其自身协议,该控制器200均可在阵列段擦除脉冲参数表10中查寻一个或多个与给定阵列段相关联的擦除脉冲参数。
在排列阵列10期间,与每个阵列段相关的一个或多个擦除脉冲参数可初始编入表110,并在给定阵列段进行一在先的擦除操作/循环后更新。与每个阵列段相关的存储擦除参数可以是擦除脉冲的至少一个特性(如,电压和/或持续时间),该擦除脉冲在一在先的擦除操作/循环期间促使特定阵列段的NVM单元达到擦除状态。
控制器200使用与给定阵列段相关的擦除脉冲参数来促使擦除脉冲源300产生一个或一组擦除脉冲,擦除脉冲至少部分基于该一个或多个擦除参数。所产生的擦除脉冲通过X/Y MUX电路400作用于阵列100,这在本领域内是公知的。该擦除可作用于给定阵列中的所有或部分NVM单元
一旦控制器200通过读出放大器读取出接受擦除脉冲的特定阵列段里至少有部分单元已达到了擦除校验电平(不管是第一个单元,最后一个单元,或其中的某些单元),控制器200就通过一个或多个新擦除脉冲参数更新与特定阵列段相关的参数表110的记录,该新擦除脉冲参数与一个擦除脉冲的某些特性相关联,该擦除脉冲使该阵列段中的一个NVM单元在现擦除擦作/周期中达到擦除校验状态。
参看图5,该图是一个流程图,包括本发明一个示例性方法的步骤,其用以与现有技术中的方法相对照。按照图5所示的示例性算法,应初始化设置(如,在排序期间)栅极(Vcvp)和漏极(Vppd)电压,该栅极和漏极电压与一个被施加在阵列段上的擦除脉冲相关联。在一个擦除脉冲被施加到该阵列段(如,单元集合)的一个或多个单元之后,就在这些单元上执行校验操作。如果没有任何子群(标以DQ)完全通过擦除校验,就向漏极电压加一个“强”增量,否则就加一个“弱”增量。该循环一直继续,直到所有单元均通过校验。为可靠起见,每个子群均可收到一个额外的擦除脉冲(其比使单元达到完全擦除的电压高一阶)。作为本发明示例性实施例的一部分,应用在该在先的擦除操作中的最高漏极电压(Vppd)可作为下一擦除操作(对同一单元集合)的初始漏极电压来存储并使用。
在一在先的擦除操作中使用的擦除电压需要存储在专门的单元中,这样后续擦除操作时可从该单元重新取出该电压。
在此虽然叙述了本发明的某些特征,但本领域的技术人员仍可对其做出修改、替代、变化和等效。可以理解的是,本发明的权利要求试图涵盖所有这类修改和变化,其应均属本发明之精神。

Claims (10)

1、一种擦除NVM阵列段上的一个或多个非易失存储器单元的方法,所述方法包括:向NVM单元施加一个擦除脉冲,该擦除脉冲的特性至少部分基于与给定阵列段相关联的可更新的擦除脉冲参数。
2、根据权利要求1所述的方法,其中,该可更新的擦除脉冲参数与一擦除脉冲电压相关联。
3、根据权利要求2所述的方法,其中,该可更新的擦除脉冲参数实际上与一个擦除脉冲电压相关联,该擦除脉冲电压电压可使该阵列段上一个NVM单元达到阈电压,该阈电压与一在先的擦除操作中的擦除状态相关。
4、根据权利要求3所述的方法,其中,该可更新的擦除脉冲参数实际上与一个擦除脉冲电压相关联,该擦除脉冲电压可使该阵列段上擦除相对慢的NVM单元达到阈电压,该阈电压与一在先的擦除操作中的擦除状态相关。
5、根据权利要求3所述的方法,其中,该可更新的擦除脉冲参数由擦除脉冲电压偏移而来且比该电压低,该擦除脉冲电压可使该阵列段上擦除相对慢的NVM单元达到阈电压,该阈电压与一在先的擦除操作中的擦除状态相关。
6、一种擦除非易失存储器单元的电路,包括,一个擦除脉冲源,其产生一个擦除脉冲,该擦除脉冲的特性基于一个可更新的擦除参数,该擦除参数与该给定阵列段相关联。
7、根据权利要求6所述的电路,其中,该可更新擦除脉冲参数与一擦除脉冲电压相关联。
8、根据权利要求7所述的电路,其中,该可更新擦除脉冲参数实际上与一擦除脉冲电压相关联,该擦除脉冲电压可使该阵列段上一个NVM单元达到一阈电压,该阈电压与一在先的擦除操作中的擦除状态相关联。
9、根据权利要求8所述的电路,其中该可更新擦除脉冲参数实际上与一擦除脉冲电压相关联,该擦除脉冲电压可使该阵列段上擦除相对慢的NVM单元达到阈电压,该阈电压与一在先的擦除操作中的擦除状态相关。
10、根据权利要求8所述的方法,其中,该可更新的擦除脉冲参数实际上与一电压相关联,该电压由擦除脉冲电压偏移而来且比擦除脉冲电压低,该擦除脉冲电压可使该阵列段上擦除相对慢的NVM单元达到阈电压,该阈电压与一在先的擦除操作中的擦除状态相关。
CNA2006100054168A 2005-01-19 2006-01-19 一种擦除一个或多个非易失存储器单元的方法、电路和系统 Pending CN1822233A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64456905P 2005-01-19 2005-01-19
US60/644569 2005-01-19

Publications (1)

Publication Number Publication Date
CN1822233A true CN1822233A (zh) 2006-08-23

Family

ID=36143177

Family Applications (3)

Application Number Title Priority Date Filing Date
CNA2006100059975A Pending CN1838323A (zh) 2005-01-19 2006-01-18 可预防固定模式编程的方法
CNA2006100059960A Pending CN1838328A (zh) 2005-01-19 2006-01-18 擦除存储器阵列上存储单元的方法
CNA2006100054168A Pending CN1822233A (zh) 2005-01-19 2006-01-19 一种擦除一个或多个非易失存储器单元的方法、电路和系统

Family Applications Before (2)

Application Number Title Priority Date Filing Date
CNA2006100059975A Pending CN1838323A (zh) 2005-01-19 2006-01-18 可预防固定模式编程的方法
CNA2006100059960A Pending CN1838328A (zh) 2005-01-19 2006-01-18 擦除存储器阵列上存储单元的方法

Country Status (4)

Country Link
US (3) US7468926B2 (zh)
EP (3) EP1684307A1 (zh)
JP (3) JP2006228407A (zh)
CN (3) CN1838323A (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102119425A (zh) * 2008-08-12 2011-07-06 美光科技公司 存储器装置及将数据存储于存储器装置上的方法
CN102136295A (zh) * 2011-04-22 2011-07-27 上海宏力半导体制造有限公司 一种或非型闪存的数据擦除方法
CN104882166A (zh) * 2014-02-27 2015-09-02 北京兆易创新科技股份有限公司 Flash存储装置、擦除方法及编程方法
CN102136295B (zh) * 2011-04-22 2016-12-14 上海华虹宏力半导体制造有限公司 一种或非型闪存的数据擦除方法
CN111564380A (zh) * 2019-02-13 2020-08-21 东芝存储器株式会社 半导体存储装置、存储系统及不良检测方法

Families Citing this family (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070103980A1 (en) * 2005-11-10 2007-05-10 Gert Koebernick Method for operating a semiconductor memory device and semiconductor memory device
EP2070090B1 (en) 2006-09-08 2014-01-08 SanDisk Technologies Inc. Pseudo random and command driven bit compensation for the cycling effects in flash memory and methods therefor
US7606966B2 (en) 2006-09-08 2009-10-20 Sandisk Corporation Methods in a pseudo random and command driven bit compensation for the cycling effects in flash memory
US7734861B2 (en) * 2006-09-08 2010-06-08 Sandisk Corporation Pseudo random and command driven bit compensation for the cycling effects in flash memory
US7885112B2 (en) * 2007-09-07 2011-02-08 Sandisk Corporation Nonvolatile memory and method for on-chip pseudo-randomization of data within a page and between pages
US7619934B2 (en) * 2006-12-20 2009-11-17 Spansion Llc Method and apparatus for adaptive memory cell overerase compensation
US8127200B2 (en) 2006-12-24 2012-02-28 Sandisk Il Ltd. Flash memory device and system with randomizing for suppressing errors
US8370561B2 (en) * 2006-12-24 2013-02-05 Sandisk Il Ltd. Randomizing for suppressing errors in a flash memory
WO2008078314A1 (en) * 2006-12-24 2008-07-03 Sandisk Il Ltd Flash memory device, system and method with randomizing for suppressing error
JP4498370B2 (ja) * 2007-02-14 2010-07-07 株式会社東芝 データ書き込み方法
JP2008217857A (ja) * 2007-02-28 2008-09-18 Toshiba Corp メモリコントローラ及び半導体装置
US8320191B2 (en) 2007-08-30 2012-11-27 Infineon Technologies Ag Memory cell arrangement, method for controlling a memory cell, memory array and electronic device
US7945050B2 (en) * 2007-09-28 2011-05-17 Intel Corporation Suppressing power supply noise using data scrambling in double data rate memory systems
US20090150595A1 (en) * 2007-10-24 2009-06-11 Avi Lavan Balanced programming rate for memory cells
JP4554660B2 (ja) * 2007-11-01 2010-09-29 株式会社コナミデジタルエンタテインメント 記憶処理装置、情報提供サーバ、動作方法、ならびに、プログラム
US7843728B2 (en) * 2007-11-20 2010-11-30 Kabushiki Kaisha Toshiba Nonvolatile semiconductor storage device
JP2009163782A (ja) * 2007-12-13 2009-07-23 Toshiba Corp 半導体記憶装置
US7995392B2 (en) 2007-12-13 2011-08-09 Kabushiki Kaisha Toshiba Semiconductor memory device capable of shortening erase time
JP5019611B2 (ja) * 2007-12-27 2012-09-05 株式会社東芝 メモリシステム
US8301912B2 (en) * 2007-12-31 2012-10-30 Sandisk Technologies Inc. System, method and memory device providing data scrambling compatible with on-chip copy operation
US7813169B2 (en) * 2008-01-18 2010-10-12 Qimonda Flash Gmbh Integrated circuit and method to operate an integrated circuit
KR101378365B1 (ko) 2008-03-12 2014-03-28 삼성전자주식회사 하이브리드 메모리 데이터 검출 장치 및 방법
KR101517185B1 (ko) * 2008-04-15 2015-05-04 삼성전자주식회사 메모리 시스템 및 그것의 동작 방법
US8154918B2 (en) * 2008-06-30 2012-04-10 Sandisk Il Ltd. Method for page- and block based scrambling in non-volatile memory
US8130552B2 (en) * 2008-09-11 2012-03-06 Sandisk Technologies Inc. Multi-pass programming for memory with reduced data storage requirement
US8145855B2 (en) 2008-09-12 2012-03-27 Sandisk Technologies Inc. Built in on-chip data scrambler for non-volatile memory
WO2010030701A1 (en) * 2008-09-12 2010-03-18 Sandisk Corporation Built in on-chip data scrambler for non-volatile memory
US8429330B2 (en) 2008-09-12 2013-04-23 Sandisk Technologies Inc. Method for scrambling data in which scrambling data and scrambled data are stored in corresponding non-volatile memory locations
JP5492679B2 (ja) * 2009-06-30 2014-05-14 パナソニック株式会社 記憶装置およびメモリコントローラ
US8874825B2 (en) 2009-06-30 2014-10-28 Sandisk Technologies Inc. Storage device and method using parameters based on physical memory block location
US8036044B2 (en) * 2009-07-16 2011-10-11 Sandisk Technologies Inc. Dynamically adjustable erase and program levels for non-volatile memory
KR20110055178A (ko) * 2009-11-19 2011-05-25 삼성전자주식회사 플래시 메모리 장치 및 그것을 포함한 메모리 시스템
US8130551B2 (en) 2010-03-31 2012-03-06 Sandisk Technologies Inc. Extra dummy erase pulses after shallow erase-verify to avoid sensing deep erased threshold voltage
KR20120002760A (ko) * 2010-07-01 2012-01-09 삼성전자주식회사 낸드 플래쉬 메모리의 동작 신뢰성을 향상시키는 데이터 기록 방법 및 데이터 기록 장치
KR101710089B1 (ko) 2010-08-26 2017-02-24 삼성전자주식회사 불휘발성 메모리 장치, 그것의 동작 방법, 그리고 그것을 포함하는 메모리 시스템
US8953318B1 (en) * 2010-09-13 2015-02-10 The Board Of Trustees Of The University Of Alabama, For And On Behalf Of The University Of Alabama In Huntsville Passive cooling systems and methods for electronics
US9009547B2 (en) 2011-01-27 2015-04-14 Apple Inc. Advanced programming verification schemes for analog memory cells
US9293194B2 (en) 2011-01-27 2016-03-22 Apple Inc. Programming and erasure schemes for analog memory cells
US8649200B2 (en) 2011-01-27 2014-02-11 Apple Inc. Enhanced programming and erasure schemes for analog memory cells
KR20120096212A (ko) * 2011-02-22 2012-08-30 삼성전자주식회사 비휘발성 메모리 장치, 메모리 컨트롤러, 및 이들의 동작 방법
WO2012117263A1 (en) * 2011-03-02 2012-09-07 Sandisk Il Ltd. Method of data storage in non-volatile memory
US8843693B2 (en) 2011-05-17 2014-09-23 SanDisk Technologies, Inc. Non-volatile memory and method with improved data scrambling
CN104067348B (zh) * 2012-01-24 2017-04-05 苹果公司 用于模拟存储器单元的编程及擦除方案
WO2013112332A1 (en) 2012-01-24 2013-08-01 Apple Inc. Enhanced programming and erasure schemes for analog memory cells
US9454493B1 (en) * 2012-05-04 2016-09-27 Amazon Technologies, Inc. Systems and methods for wiped storage devices
US9317217B1 (en) * 2012-05-04 2016-04-19 Amazon Technologies, Inc. Wiping and verifying storage devices
KR20130127234A (ko) 2012-05-14 2013-11-22 삼성전자주식회사 메모리의 구동 방법
US8787088B2 (en) 2012-06-29 2014-07-22 Sandisk Technologies Inc. Optimized erase operation for non-volatile memory with partially programmed block
US8971125B2 (en) * 2012-07-02 2015-03-03 Micron Technology, Inc. Erase operations with erase-verify voltages based on where in the erase operations an erase cycle occurs
US9292428B2 (en) 2012-09-05 2016-03-22 Kabushiki Kaisha Toshiba Memory system
KR101949987B1 (ko) * 2012-12-18 2019-02-20 에스케이하이닉스 주식회사 데이터 저장 장치 및 그것의 동작 방법
WO2014137928A2 (en) 2013-03-04 2014-09-12 Sandisk Technologies Inc. Dynamic erase depth for improved endurance of non-volatile memory
KR102218735B1 (ko) 2014-01-21 2021-02-23 삼성전자주식회사 불휘발성 메모리 장치를 포함하는 메모리 시스템 및 그것의 소거 방법
EP3210396A1 (en) 2014-10-20 2017-08-30 Axon Enterprise, Inc. Systems and methods for distributed control
US9343171B1 (en) 2015-02-09 2016-05-17 Sandisk Technologies Inc. Reduced erase-verify voltage for first-programmed word line in a memory device
US9236139B1 (en) 2015-02-11 2016-01-12 Sandisk Technologies Inc. Reduced current program verify in non-volatile memory
US9343160B1 (en) 2015-02-11 2016-05-17 Sandisk Technologies Inc. Erase verify in non-volatile memory
US10417122B2 (en) * 2015-09-30 2019-09-17 Seagate Technology Llc Data randomization using memory block access counts
US10580506B2 (en) 2017-12-07 2020-03-03 Micron Technology, Inc. Semiconductor memory device and erase method including changing erase pulse magnitude for a memory array
US10535412B2 (en) 2018-02-09 2020-01-14 Sandisk Technologies Llc Single pulse verification of memory cells
CN110838329B (zh) * 2018-08-17 2022-04-01 北京兆易创新科技股份有限公司 一种存储器的擦除方法和系统
JP2020149745A (ja) 2019-03-13 2020-09-17 キオクシア株式会社 半導体記憶装置
US20210303715A1 (en) * 2020-03-25 2021-09-30 SK Hynix Inc. Data scrambler for memory systems and method thereof

Family Cites Families (236)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1392599A (en) 1971-07-28 1975-04-30 Mullard Ltd Semiconductor memory elements
US3881180A (en) 1971-11-30 1975-04-29 Texas Instruments Inc Non-volatile memory cell
US3895360A (en) 1974-01-29 1975-07-15 Westinghouse Electric Corp Block oriented random access memory
US4016588A (en) 1974-12-27 1977-04-05 Nippon Electric Company, Ltd. Non-volatile semiconductor memory device
US4017888A (en) 1975-12-31 1977-04-12 International Business Machines Corporation Non-volatile metal nitride oxide semiconductor device
US4151021A (en) 1977-01-26 1979-04-24 Texas Instruments Incorporated Method of making a high density floating gate electrically programmable ROM
US4145703A (en) 1977-04-15 1979-03-20 Supertex, Inc. High power MOS device and fabrication method therefor
US4173766A (en) 1977-09-16 1979-11-06 Fairchild Camera And Instrument Corporation Insulated gate field-effect transistor read-only memory cell
US4173791A (en) 1977-09-16 1979-11-06 Fairchild Camera And Instrument Corporation Insulated gate field-effect transistor read-only memory array
US4373248A (en) * 1978-07-12 1983-02-15 Texas Instruments Incorporated Method of making high density semiconductor device such as floating gate electrically programmable ROM or the like
DE2832388C2 (de) 1978-07-24 1986-08-14 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von MNOS- und MOS-Transistoren in Silizium-Gate-Technologie auf einem Halbleitersubstrat
US4360900A (en) 1978-11-27 1982-11-23 Texas Instruments Incorporated Non-volatile semiconductor memory elements
US4247861A (en) * 1979-03-09 1981-01-27 Rca Corporation High performance electrically alterable read-only memory (EAROM)
DE2923995C2 (de) 1979-06-13 1985-11-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von integrierten MOS-Schaltungen mit MOS-Transistoren und MNOS-Speichertransistoren in Silizium-Gate-Technologie
JPS5656677A (en) 1979-10-13 1981-05-18 Toshiba Corp Semiconductor memory device
US4281397A (en) 1979-10-29 1981-07-28 Texas Instruments Incorporated Virtual ground MOS EPROM or ROM matrix
DE2947350A1 (de) 1979-11-23 1981-05-27 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von mnos-speichertransistoren mit sehr kurzer kanallaenge in silizium-gate-technologie
JPS56120166A (en) 1980-02-27 1981-09-21 Hitachi Ltd Semiconductor ic device and manufacture thereof
US4342102A (en) 1980-06-18 1982-07-27 Signetics Corporation Semiconductor memory array
US4380057A (en) 1980-10-27 1983-04-12 International Business Machines Corporation Electrically alterable double dense memory
US4521796A (en) 1980-12-11 1985-06-04 General Instrument Corporation Memory implant profile for improved channel shielding in electrically alterable read only memory semiconductor device
EP0056195B1 (en) 1980-12-25 1986-06-18 Fujitsu Limited Nonvolatile semiconductor memory device
US4448400A (en) 1981-07-13 1984-05-15 Eliyahou Harari Highly scalable dynamic RAM cell with self-signal amplification
US4404747A (en) 1981-07-29 1983-09-20 Schur, Inc. Knife and sheath assembly
US4389705A (en) 1981-08-21 1983-06-21 Mostek Corporation Semiconductor memory circuit with depletion data transfer transistor
US4388705A (en) 1981-10-01 1983-06-14 Mostek Corporation Semiconductor memory circuit
US4435786A (en) * 1981-11-23 1984-03-06 Fairchild Camera And Instrument Corporation Self-refreshing memory cell
US4494016A (en) 1982-07-26 1985-01-15 Sperry Corporation High performance MESFET transistor for VLSI implementation
US4527257A (en) 1982-08-25 1985-07-02 Westinghouse Electric Corp. Common memory gate non-volatile transistor memory
JPS5949022A (ja) 1982-09-13 1984-03-21 Toshiba Corp 多値論理回路
US4613956A (en) 1983-02-23 1986-09-23 Texas Instruments Incorporated Floating gate memory with improved dielectric
JPS59174080A (ja) * 1983-03-24 1984-10-02 Sony Corp テレビジヨン信号受信装置
US4769340A (en) 1983-11-28 1988-09-06 Exel Microelectronics, Inc. Method for making electrically programmable memory device by doping the floating gate by implant
US4725984A (en) 1984-02-21 1988-02-16 Seeq Technology, Inc. CMOS eprom sense amplifier
JPS60182174A (ja) 1984-02-28 1985-09-17 Nec Corp 不揮発性半導体メモリ
US5352620A (en) 1984-05-23 1994-10-04 Hitachi, Ltd. Method of making semiconductor device with memory cells and peripheral transistors
US4663645A (en) 1984-05-23 1987-05-05 Hitachi, Ltd. Semiconductor device of an LDD structure having a floating gate
US4907273A (en) * 1984-10-12 1990-03-06 Wiedemer John D High security pay television system
US4908834A (en) * 1984-10-12 1990-03-13 Wiedemer John D High security pay television system
US4665426A (en) 1985-02-01 1987-05-12 Advanced Micro Devices, Inc. EPROM with ultraviolet radiation transparent silicon nitride passivation layer
US4761764A (en) 1985-04-18 1988-08-02 Nec Corporation Programmable read only memory operable with reduced programming power consumption
US4667217A (en) 1985-04-19 1987-05-19 Ncr Corporation Two bit vertically/horizontally integrated memory cell
JPH0831789B2 (ja) * 1985-09-04 1996-03-27 沖電気工業株式会社 出力回路
US4742491A (en) 1985-09-26 1988-05-03 Advanced Micro Devices, Inc. Memory cell having hot-hole injection erase mode
US4760555A (en) 1986-04-21 1988-07-26 Texas Instruments Incorporated Memory array with an array reorganizer
JPH0828431B2 (ja) 1986-04-22 1996-03-21 日本電気株式会社 半導体記憶装置
US4758869A (en) 1986-08-29 1988-07-19 Waferscale Integration, Inc. Nonvolatile floating gate transistor structure
US5168334A (en) 1987-07-31 1992-12-01 Texas Instruments, Incorporated Non-volatile semiconductor memory
US4780424A (en) 1987-09-28 1988-10-25 Intel Corporation Process for fabricating electrically alterable floating gate memory devices
US4870470A (en) 1987-10-16 1989-09-26 International Business Machines Corporation Non-volatile memory cell having Si rich silicon nitride charge trapping layer
US4839705A (en) 1987-12-16 1989-06-13 Texas Instruments Incorporated X-cell EEPROM array
JPH07120720B2 (ja) 1987-12-17 1995-12-20 三菱電機株式会社 不揮発性半導体記憶装置
US5159570A (en) 1987-12-22 1992-10-27 Texas Instruments Incorporated Four memory state EEPROM
US4888735A (en) 1987-12-30 1989-12-19 Elite Semiconductor & Systems Int'l., Inc. ROM cell and array configuration
US4857770A (en) 1988-02-29 1989-08-15 Advanced Micro Devices, Inc. Output buffer arrangement for reducing chip noise without speed penalty
US4941028A (en) 1988-08-10 1990-07-10 Actel Corporation Structure for protecting thin dielectrics during processing
JPH0271493A (ja) 1988-09-06 1990-03-12 Mitsubishi Electric Corp 半導体メモリ装置
US5042009A (en) 1988-12-09 1991-08-20 Waferscale Integration, Inc. Method for programming a floating gate memory device
US5293563A (en) * 1988-12-29 1994-03-08 Sharp Kabushiki Kaisha Multi-level memory cell with increased read-out margin
US5120672A (en) 1989-02-22 1992-06-09 Texas Instruments Incorporated Fabricating a single level merged EEPROM cell having an ONO memory stack substantially spaced from the source region
US5142495A (en) 1989-03-10 1992-08-25 Intel Corporation Variable load for margin mode
DE3931596A1 (de) 1989-03-25 1990-10-04 Eurosil Electronic Gmbh Spannungsvervielfacherschaltung
US5172338B1 (en) 1989-04-13 1997-07-08 Sandisk Corp Multi-state eeprom read and write circuits and techniques
US4961010A (en) 1989-05-19 1990-10-02 National Semiconductor Corporation Output buffer for reducing switching induced noise
US5104819A (en) 1989-08-07 1992-04-14 Intel Corporation Fabrication of interpoly dielctric for EPROM-related technologies
US5081675A (en) * 1989-11-13 1992-01-14 Kitti Kittirutsunetorn System for protection of software in memory against unauthorized use
US5027321A (en) 1989-11-21 1991-06-25 Intel Corporation Apparatus and method for improved reading/programming of virtual ground EPROM arrays
US4992391A (en) * 1989-11-29 1991-02-12 Advanced Micro Devices, Inc. Process for fabricating a control gate for a floating gate FET
JP2697231B2 (ja) * 1990-03-12 1998-01-14 松下電器産業株式会社 Catvシステム
JPH043395A (ja) * 1990-04-20 1992-01-08 Mitsubishi Electric Corp 不揮発性半導体記憶装置
US5204835A (en) 1990-06-13 1993-04-20 Waferscale Integration Inc. Eprom virtual ground array
EP0461904A3 (en) 1990-06-14 1992-09-09 Creative Integrated Systems, Inc. An improved semiconductor read-only vlsi memory
US5075245A (en) 1990-08-03 1991-12-24 Intel Corporation Method for improving erase characteristics of buried bit line flash EPROM devices without using sacrificial oxide growth and removal steps
US5091938B1 (en) * 1990-08-06 1997-02-04 Nippon Denki Home Electronics Digital data cryptographic system
US5289406A (en) * 1990-08-28 1994-02-22 Mitsubishi Denki Kabushiki Kaisha Read only memory for storing multi-data
US5117389A (en) 1990-09-05 1992-05-26 Macronix International Co., Ltd. Flat-cell read-only-memory integrated circuit
KR920006991A (ko) * 1990-09-25 1992-04-28 김광호 반도체메모리 장치의 고전압발생회로
US5081371A (en) 1990-11-07 1992-01-14 U.S. Philips Corp. Integrated charge pump circuit with back bias voltage reduction
JP3002309B2 (ja) * 1990-11-13 2000-01-24 ウエハスケール インテグレーション, インコーポレイテッド 高速epromアレイ
JP2987193B2 (ja) 1990-11-20 1999-12-06 富士通株式会社 半導体記憶装置
US5086325A (en) 1990-11-21 1992-02-04 Atmel Corporation Narrow width EEPROM with single diffusion electrode formation
US5094968A (en) 1990-11-21 1992-03-10 Atmel Corporation Fabricating a narrow width EEPROM with single diffusion electrode formation
JP2612969B2 (ja) 1991-02-08 1997-05-21 シャープ株式会社 半導体装置の製造方法
US5270979A (en) * 1991-03-15 1993-12-14 Sundisk Corporation Method for optimum erasing of EEPROM
JPH04311900A (ja) 1991-04-10 1992-11-04 Sharp Corp 半導体読み出し専用メモリ
JP2930440B2 (ja) 1991-04-15 1999-08-03 沖電気工業株式会社 半導体集積回路
US5142496A (en) 1991-06-03 1992-08-25 Advanced Micro Devices, Inc. Method for measuring VT 's less than zero without applying negative voltages
US5245572A (en) 1991-07-30 1993-09-14 Intel Corporation Floating gate nonvolatile memory with reading while writing capability
JP2965415B2 (ja) 1991-08-27 1999-10-18 松下電器産業株式会社 半導体記憶装置
US5305262A (en) 1991-09-11 1994-04-19 Kawasaki Steel Corporation Semiconductor integrated circuit
US5175120A (en) 1991-10-11 1992-12-29 Micron Technology, Inc. Method of processing a semiconductor wafer to form an array of nonvolatile memory devices employing floating gate transistors and peripheral area having CMOS transistors
JPH05110114A (ja) 1991-10-17 1993-04-30 Rohm Co Ltd 不揮発性半導体記憶素子
US5355178A (en) * 1991-10-24 1994-10-11 Eastman Kodak Company Mechanism for improving television display of still images using image motion-dependent filter
JP3358663B2 (ja) 1991-10-25 2002-12-24 ローム株式会社 半導体記憶装置およびその記憶情報読出方法
US5428568A (en) * 1991-10-30 1995-06-27 Mitsubishi Denki Kabushiki Kaisha Electrically erasable and programmable non-volatile memory device and a method of operating the same
US5338954A (en) 1991-10-31 1994-08-16 Rohm Co., Ltd. Semiconductor memory device having an insulating film and a trap film joined in a channel region
US5357134A (en) 1991-10-31 1994-10-18 Rohm Co., Ltd. Nonvolatile semiconductor device having charge trap film containing silicon crystal grains
JPH05129284A (ja) 1991-11-06 1993-05-25 Sony Corp プラズマSiN成膜条件の設定方法及び半導体装置の製造方法
US5260593A (en) 1991-12-10 1993-11-09 Micron Technology, Inc. Semiconductor floating gate device having improved channel-floating gate interaction
JP2564067B2 (ja) 1992-01-09 1996-12-18 株式会社東芝 センス回路を有する読み出し出力回路
US6222762B1 (en) * 1992-01-14 2001-04-24 Sandisk Corporation Multi-state memory
US5293328A (en) * 1992-01-15 1994-03-08 National Semiconductor Corporation Electrically reprogrammable EPROM cell with merged transistor and optiumum area
JP2851962B2 (ja) * 1992-01-21 1999-01-27 シャープ株式会社 半導体読み出し専用メモリ
DE69231356T2 (de) * 1992-01-22 2000-12-28 Macronix Int Co Ltd Nichtflüchtige Speicherzelle und Anordnungsarchitektur
US5324675A (en) 1992-03-31 1994-06-28 Kawasaki Steel Corporation Method of producing semiconductor devices of a MONOS type
JPH05290584A (ja) * 1992-04-08 1993-11-05 Nec Corp 半導体記憶装置
WO1993024959A1 (en) * 1992-05-29 1993-12-09 Citizen Watch Co., Ltd. Semiconductor nonvolatile storage device, semiconductor device, and its manufacture method
JPH065823A (ja) 1992-06-19 1994-01-14 Toshiba Corp 不揮発性半導体記憶装置及びその使用方法
US5289412A (en) * 1992-06-19 1994-02-22 Intel Corporation High-speed bias-stabilized current-mirror referencing circuit for non-volatile memories
EP0596198B1 (en) * 1992-07-10 2000-03-29 Sony Corporation Flash eprom with erase verification and address scrambling architecture
US5315541A (en) 1992-07-24 1994-05-24 Sundisk Corporation Segmented column memory array
JP3036565B2 (ja) 1992-08-28 2000-04-24 日本電気株式会社 不揮発性半導体記憶装置の製造方法
US5280420A (en) 1992-10-02 1994-01-18 National Semiconductor Corporation Charge pump which operates on a low voltage power supply
JP2825217B2 (ja) * 1992-11-11 1998-11-18 シャープ株式会社 フラッシュメモリ
US5418743A (en) * 1992-12-07 1995-05-23 Nippon Steel Corporation Method of writing into non-volatile semiconductor memory
JPH07114792A (ja) * 1993-10-19 1995-05-02 Mitsubishi Electric Corp 半導体記憶装置
US5515173A (en) * 1993-03-05 1996-05-07 Gemstar Developement Corporation System and method for automatically recording television programs in television systems with tuners external to video recorders
US5393701A (en) * 1993-04-08 1995-02-28 United Microelectronics Corporation Layout design to eliminate process antenna effect
JP3317459B2 (ja) * 1993-04-30 2002-08-26 ローム株式会社 不揮発性記憶素子およびこれを利用した不揮発性記憶装置、この記憶装置の駆動方法、ならびにこの記憶素子の製造方法
US5335198A (en) 1993-05-06 1994-08-02 Advanced Micro Devices, Inc. Flash EEPROM array with high endurance
US5350710A (en) 1993-06-24 1994-09-27 United Microelectronics Corporation Device for preventing antenna effect on circuit
US5400286A (en) * 1993-08-17 1995-03-21 Catalyst Semiconductor Corp. Self-recovering erase scheme to enhance flash memory endurance
US5666516A (en) * 1993-12-16 1997-09-09 International Business Machines Corporation Protected programmable memory cartridge having selective access circuitry
US5440505A (en) * 1994-01-21 1995-08-08 Intel Corporation Method and circuitry for storing discrete amounts of charge in a single memory element
FR2715782B1 (fr) * 1994-01-31 1996-03-22 Sgs Thomson Microelectronics Bascule bistable non volatile programmable, à état initial prédéfini, notamment pour circuit de redondance de mémoire.
FR2715758B1 (fr) * 1994-01-31 1996-03-22 Sgs Thomson Microelectronics Bascule bistable non volatile programmable par la source, notamment pour circuit de redondance de mémoire.
TW241394B (en) * 1994-05-26 1995-02-21 Aplus Integrated Circuits Inc Flat-cell ROM and decoder
US5608679A (en) * 1994-06-02 1997-03-04 Intel Corporation Fast internal reference cell trimming for flash EEPROM memory
JP3725911B2 (ja) * 1994-06-02 2005-12-14 株式会社ルネサステクノロジ 半導体装置
EP0691729A3 (en) * 1994-06-30 1996-08-14 Sgs Thomson Microelectronics Charge pump circuit with feedback control
EP0696050B1 (en) * 1994-07-18 1998-10-14 STMicroelectronics S.r.l. EPROM and Flash-EEPROM non-volatile memory and method of manufacturing the same
JP3730272B2 (ja) * 1994-09-17 2005-12-21 株式会社東芝 不揮発性半導体記憶装置
US5612642A (en) * 1995-04-28 1997-03-18 Altera Corporation Power-on reset circuit with hysteresis
JPH08115597A (ja) * 1994-10-17 1996-05-07 Mitsubishi Electric Corp 半導体ディスク装置
US5561714A (en) * 1994-12-12 1996-10-01 Tektronix, Inc. Scrambling system for serial digital video
US5599727A (en) * 1994-12-15 1997-02-04 Sharp Kabushiki Kaisha Method for producing a floating gate memory device including implanting ions through an oxidized portion of the silicon film from which the floating gate is formed
JP4183290B2 (ja) * 1994-12-27 2008-11-19 マクロニクス インターナショナル カンパニイ リミテッド ベリファイ機能を備えた不揮発性半導体装置
KR100566466B1 (ko) * 1995-01-31 2006-03-31 가부시끼가이샤 히다치 세이사꾸쇼 반도체 메모리 장치
US5518942A (en) * 1995-02-22 1996-05-21 Alliance Semiconductor Corporation Method of making flash EPROM cell having improved erase characteristics by using a tilt angle implant
JPH08306196A (ja) * 1995-04-28 1996-11-22 Toshiba Corp 不揮発性半導体記憶装置
US6034896A (en) * 1995-07-03 2000-03-07 The University Of Toronto, Innovations Foundation Method of fabricating a fast programmable flash E2 PROM cell
US5751944A (en) * 1995-07-28 1998-05-12 Micron Quantum Devices, Inc. Non-volatile memory system having automatic cycling test function
JP3251164B2 (ja) * 1995-12-14 2002-01-28 シャープ株式会社 半導体装置及びその製造方法
KR100223747B1 (ko) * 1995-12-28 1999-10-15 김영환 고속 저잡음 출력 버퍼
US5712815A (en) * 1996-04-22 1998-01-27 Advanced Micro Devices, Inc. Multiple bits per-cell flash EEPROM capable of concurrently programming and verifying memory cells and reference cells
US5715193A (en) * 1996-05-23 1998-02-03 Micron Quantum Devices, Inc. Flash memory system and method for monitoring the disturb effect on memory cell blocks due to high voltage conditions of other memory cell blocks
WO2004090908A1 (ja) * 1996-06-11 2004-10-21 Nobuyoshi Takeuchi ベリファイ機能を有する不揮発性記憶装置
JPH1011990A (ja) * 1996-06-26 1998-01-16 Nkk Corp ベリファイ機能を有する不揮発性記憶装置
JP2882370B2 (ja) * 1996-06-28 1999-04-12 日本電気株式会社 半導体記憶装置
US6037627A (en) * 1996-08-02 2000-03-14 Seiko Instruments Inc. MOS semiconductor device
US5787484A (en) * 1996-08-08 1998-07-28 Micron Technology, Inc. System and method which compares data preread from memory cells to data to be written to the cells
US5717635A (en) * 1996-08-27 1998-02-10 International Business Machines Corporation High density EEPROM for solid state file
US5873113A (en) * 1996-09-24 1999-02-16 Altera Corporation System and method for programming eprom cells using shorter duration pulse(s) in repeating the programming process of a particular cell
JPH10133754A (ja) * 1996-10-28 1998-05-22 Fujitsu Ltd レギュレータ回路及び半導体集積回路装置
US5717632A (en) * 1996-11-27 1998-02-10 Advanced Micro Devices, Inc. Apparatus and method for multiple-level storage in non-volatile memories
TW318283B (en) * 1996-12-09 1997-10-21 United Microelectronics Corp Multi-level read only memory structure and manufacturing method thereof
US5870335A (en) * 1997-03-06 1999-02-09 Agate Semiconductor, Inc. Precision programming of nonvolatile memory cells
US6028324A (en) * 1997-03-07 2000-02-22 Taiwan Semiconductor Manufacturing Company Test structures for monitoring gate oxide defect densities and the plasma antenna effect
JP4253052B2 (ja) * 1997-04-08 2009-04-08 株式会社東芝 半導体装置
TW381325B (en) * 1997-04-15 2000-02-01 United Microelectronics Corp Three dimensional high density deep trench ROM and the manufacturing method thereof
US5880620A (en) * 1997-04-22 1999-03-09 Xilinx, Inc. Pass gate circuit with body bias control
US6768165B1 (en) * 1997-08-01 2004-07-27 Saifun Semiconductors Ltd. Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping
US5867429A (en) * 1997-11-19 1999-02-02 Sandisk Corporation High density non-volatile flash memory without adverse effects of electric field coupling between adjacent floating gates
US5963465A (en) * 1997-12-12 1999-10-05 Saifun Semiconductors, Ltd. Symmetric segmented memory array architecture
US6020241A (en) * 1997-12-22 2000-02-01 Taiwan Semiconductor Manufacturing Company Post metal code engineering for a ROM
US6148435A (en) * 1997-12-24 2000-11-14 Cypress Semiconductor Corporation Optimized programming/erase parameters for programmable devices
US6292490B1 (en) * 1998-01-14 2001-09-18 Skystream Corporation Receipts and dispatch timing of transport packets in a video program bearing stream remultiplexer
US6351474B1 (en) * 1998-01-14 2002-02-26 Skystream Networks Inc. Network distributed remultiplexer for video program bearing transport streams
US6195368B1 (en) * 1998-01-14 2001-02-27 Skystream Corporation Re-timing of video program bearing streams transmitted by an asynchronous communication link
US6195196B1 (en) * 1998-03-13 2001-02-27 Fuji Photo Film Co., Ltd. Array-type exposing device and flat type display incorporating light modulator and driving method thereof
US6030871A (en) * 1998-05-05 2000-02-29 Saifun Semiconductors Ltd. Process for producing two bit ROM cell utilizing angled implant
US6188211B1 (en) * 1998-05-13 2001-02-13 Texas Instruments Incorporated Current-efficient low-drop-out voltage regulator with improved load regulation and frequency response
US6348711B1 (en) * 1998-05-20 2002-02-19 Saifun Semiconductors Ltd. NROM cell with self-aligned programming and erasure areas
US6034403A (en) * 1998-06-25 2000-03-07 Acer Semiconductor Manufacturing, Inc. High density flat cell mask ROM
JO2117B1 (en) * 1998-07-15 2000-05-21 كانال + تيكنولوجيز سوسيته انونيم A method and device for the secure communication of information between a group of audio-visual devices that operate with numbers
EP0987715B1 (en) * 1998-09-15 2005-02-09 STMicroelectronics S.r.l. Method for maintaining the memory of non-volatile memory cells
US6044019A (en) * 1998-10-23 2000-03-28 Sandisk Corporation Non-volatile memory with improved sensing and method therefor
US6282145B1 (en) * 1999-01-14 2001-08-28 Silicon Storage Technology, Inc. Array architecture and operating methods for digital multilevel nonvolatile memory integrated circuit system
US6587315B1 (en) * 1999-01-20 2003-07-01 Alps Electric Co., Ltd. Magnetoresistive-effect device with a magnetic coupling junction
US6346442B1 (en) * 1999-02-04 2002-02-12 Tower Semiconductor Ltd. Methods for fabricating a semiconductor chip having CMOS devices and a fieldless array
US6181597B1 (en) * 1999-02-04 2001-01-30 Tower Semiconductor Ltd. EEPROM array using 2-bit non-volatile memory cells with serial read operations
US6337502B1 (en) * 1999-06-18 2002-01-08 Saifun Semicinductors Ltd. Method and circuit for minimizing the charging effect during manufacture of semiconductor devices
JP3438669B2 (ja) * 1999-09-14 2003-08-18 日本電気株式会社 移動通信端末装置及びその制御方法並びにその制御プログラムを記録した記録媒体
JP2001101870A (ja) * 1999-09-30 2001-04-13 Fujitsu Ltd 半導体集積回路
US6181605B1 (en) * 1999-10-06 2001-01-30 Advanced Micro Devices, Inc. Global erase/program verification apparatus and method
US6175523B1 (en) * 1999-10-25 2001-01-16 Advanced Micro Devices, Inc Precharging mechanism and method for NAND-based flash memory devices
US7039614B1 (en) * 1999-11-09 2006-05-02 Sony Corporation Method for simulcrypting scrambled data to a plurality of conditional access devices
JP2001143487A (ja) * 1999-11-15 2001-05-25 Nec Corp 半導体記憶装置
JP4360736B2 (ja) * 2000-01-27 2009-11-11 株式会社ルネサステクノロジ 不揮発性半導体記憶装置および不揮発性半導体記憶装置のデータ消去方法
US6185143B1 (en) * 2000-02-04 2001-02-06 Hewlett-Packard Company Magnetic random access memory (MRAM) device including differential sense amplifiers
US6343033B1 (en) * 2000-02-25 2002-01-29 Advanced Micro Devices, Inc. Variable pulse width memory programming
WO2001080238A1 (en) * 2000-04-05 2001-10-25 Infineon Technologies North America Corp. Improved read/write channel
US6292394B1 (en) * 2000-06-29 2001-09-18 Saifun Semiconductors Ltd. Method for programming of a semiconductor memory cell
JP4707803B2 (ja) * 2000-07-10 2011-06-22 エルピーダメモリ株式会社 エラーレート判定方法と半導体集積回路装置
US6519182B1 (en) * 2000-07-10 2003-02-11 Advanced Micro Devices, Inc. Using hot carrier injection to control over-programming in a non-volatile memory cell having an oxide-nitride-oxide (ONO) structure
US6563741B2 (en) * 2001-01-30 2003-05-13 Micron Technology, Inc. Flash memory device and method of erasing
US6898037B2 (en) * 2001-02-20 2005-05-24 Seagate Technology Llc Optical equipment assemblies and techniques
US6348381B1 (en) * 2001-02-21 2002-02-19 Macronix International Co., Ltd. Method for forming a nonvolatile memory with optimum bias condition
DE10110150A1 (de) * 2001-03-02 2002-09-19 Infineon Technologies Ag Verfahren zum Herstellen von metallischen Bitleitungen für Speicherzellenarrays, Verfahren zum Herstellen von Speicherzellenarrays und Speicherzellenarray
US6351415B1 (en) * 2001-03-28 2002-02-26 Tower Semiconductor Ltd. Symmetrical non-volatile memory array architecture without neighbor effect
US6677805B2 (en) * 2001-04-05 2004-01-13 Saifun Semiconductors Ltd. Charge pump stage with body effect minimization
US6493266B1 (en) * 2001-04-09 2002-12-10 Advanced Micro Devices, Inc. Soft program and soft program verify of the core cells in flash memory array
US6438037B1 (en) * 2001-05-09 2002-08-20 Advanced Micro Devices, Inc. Threshold voltage compacting for non-volatile semiconductor memory designs
US6522585B2 (en) * 2001-05-25 2003-02-18 Sandisk Corporation Dual-cell soft programming for virtual-ground memory arrays
EP1262995B1 (en) * 2001-05-30 2010-01-27 STMicroelectronics S.r.l. A semiconductor memory system
JP2002367380A (ja) * 2001-06-05 2002-12-20 Sony Corp 不揮発性半導体メモリ装置
US6512701B1 (en) * 2001-06-21 2003-01-28 Advanced Micro Devices, Inc. Erase method for dual bit virtual ground flash
US6462387B1 (en) * 2001-06-29 2002-10-08 Chinatech Corporation High density read only memory
US6525969B1 (en) * 2001-08-10 2003-02-25 Advanced Micro Devices, Inc. Decoder apparatus and methods for pre-charging bit lines
US6614689B2 (en) * 2001-08-13 2003-09-02 Micron Technology, Inc. Non-volatile memory having a control mini-array
US6981188B2 (en) * 2001-08-16 2005-12-27 Tower Semiconductor Ltd. Non-volatile memory device with self test
JP2003068086A (ja) * 2001-08-28 2003-03-07 Mitsubishi Electric Corp 不揮発性半導体記憶装置
US6549468B2 (en) * 2001-08-30 2003-04-15 Micron Technology, Inc. Non-volatile memory with address descrambling
ITRM20010556A1 (it) * 2001-09-12 2003-03-12 Micron Technology Inc Decodificatore per decodificare i comandi di commutazione a modo di test di circuiti integrati.
EP1293905A1 (en) * 2001-09-17 2003-03-19 STMicroelectronics S.r.l. A pointer circuit
US6440797B1 (en) * 2001-09-28 2002-08-27 Advanced Micro Devices, Inc. Nitride barrier layer for protection of ONO structure from top oxide loss in a fabrication of SONOS flash memory
US6510082B1 (en) * 2001-10-23 2003-01-21 Advanced Micro Devices, Inc. Drain side sensing scheme for virtual ground flash EPROM array with adjacent bit charge and hold
US6643181B2 (en) * 2001-10-24 2003-11-04 Saifun Semiconductors Ltd. Method for erasing a memory cell
US6639271B1 (en) * 2001-12-20 2003-10-28 Advanced Micro Devices, Inc. Fully isolated dielectric memory cell structure for a dual bit nitride storage device and process for making same
US6674138B1 (en) * 2001-12-31 2004-01-06 Advanced Micro Devices, Inc. Use of high-k dielectric materials in modified ONO structure for semiconductor devices
US6700818B2 (en) * 2002-01-31 2004-03-02 Saifun Semiconductors Ltd. Method for operating a memory device
US7190620B2 (en) * 2002-01-31 2007-03-13 Saifun Semiconductors Ltd. Method for operating a memory device
FR2835521B1 (fr) * 2002-02-04 2004-04-09 Inst Francais Du Petrole Composition catalytique contenant un aluminoxane pour la dimerisation, la co-dimerisation et l'oligomerisation des olefines
WO2003073431A1 (fr) * 2002-02-28 2003-09-04 Renesas Technology Corp. Memoire a semi-conducteurs non volatile
JP3891863B2 (ja) * 2002-03-07 2007-03-14 松下電器産業株式会社 半導体装置及び半導体装置の駆動方法
US6706595B2 (en) * 2002-03-14 2004-03-16 Advanced Micro Devices, Inc. Hard mask process for memory device without bitline shorts
US6587383B1 (en) * 2002-03-19 2003-07-01 Micron Technology, Inc. Erase block architecture for non-volatile memory
US6690602B1 (en) * 2002-04-08 2004-02-10 Advanced Micro Devices, Inc. Algorithm dynamic reference programming
CN1292356C (zh) * 2002-04-17 2006-12-27 松下电器产业株式会社 非易失性半导体存储装置及其机密保护方法
JP4260434B2 (ja) * 2002-07-16 2009-04-30 富士通マイクロエレクトロニクス株式会社 不揮発性半導体メモリ及びその動作方法
US6813189B2 (en) * 2002-07-16 2004-11-02 Fujitsu Limited System for using a dynamic reference in a double-bit cell memory
JP2004079602A (ja) * 2002-08-12 2004-03-11 Fujitsu Ltd トラップ層を有する不揮発性メモリ
US6992932B2 (en) * 2002-10-29 2006-01-31 Saifun Semiconductors Ltd Method circuit and system for read error detection in a non-volatile memory array
US7447667B2 (en) * 2002-12-11 2008-11-04 International Business Machines Corporation Method and knowledge structures for reasoning about concepts, relations, and rules
WO2005015775A1 (en) * 2003-08-11 2005-02-17 Nortel Networks Limited System and method for embedding ofdm in cdma systems
US7447847B2 (en) * 2004-07-19 2008-11-04 Micron Technology, Inc. Memory device trims

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102119425A (zh) * 2008-08-12 2011-07-06 美光科技公司 存储器装置及将数据存储于存储器装置上的方法
US8595422B2 (en) 2008-08-12 2013-11-26 Micron Technology, Inc. Memory devices and methods of storing data on a memory device
CN102136295A (zh) * 2011-04-22 2011-07-27 上海宏力半导体制造有限公司 一种或非型闪存的数据擦除方法
CN102136295B (zh) * 2011-04-22 2016-12-14 上海华虹宏力半导体制造有限公司 一种或非型闪存的数据擦除方法
CN104882166A (zh) * 2014-02-27 2015-09-02 北京兆易创新科技股份有限公司 Flash存储装置、擦除方法及编程方法
CN111564380A (zh) * 2019-02-13 2020-08-21 东芝存储器株式会社 半导体存储装置、存储系统及不良检测方法
CN111564380B (zh) * 2019-02-13 2023-11-10 铠侠股份有限公司 半导体存储装置、存储系统及不良检测方法

Also Published As

Publication number Publication date
US20060158940A1 (en) 2006-07-20
JP2006228406A (ja) 2006-08-31
EP1684307A1 (en) 2006-07-26
JP2006228407A (ja) 2006-08-31
EP1686592A2 (en) 2006-08-02
US7468926B2 (en) 2008-12-23
US20060181934A1 (en) 2006-08-17
JP2006228405A (ja) 2006-08-31
EP1684308A1 (en) 2006-07-26
US20060158938A1 (en) 2006-07-20
CN1838323A (zh) 2006-09-27
CN1838328A (zh) 2006-09-27
US7369440B2 (en) 2008-05-06
EP1686592A3 (en) 2007-04-25

Similar Documents

Publication Publication Date Title
CN1822233A (zh) 一种擦除一个或多个非易失存储器单元的方法、电路和系统
CN102150216B (zh) 具有降低的数据存储要求的存储器的多遍编程
CN100587841C (zh) 非易失存储器器件及其编程方法
CN102763166B (zh) 选择性的存储器单元编程和擦除
CN102725798B (zh) 使用数量减少的验证操作来编程非易失性存储器
CN102385924B (zh) 借助非易失性存储器的循环的开始编程电压偏移
CN101584005B (zh) 非易失性存储器中的经分割擦除及擦除验证
CN101584006B (zh) 非易失性存储器中的经分割的软编程
CN1902711A (zh) 用于对非易失性存储器阵列编程的方法、系统和电路
CN103843067B (zh) 用于非易失性存储器的片上动态读取
CN102292775B (zh) 存储器的适应性擦除和软编程
CN1819055A (zh) 非易失性存储器存储单元读取方法
CN1949393A (zh) 闪存器件的编程方法
KR100706245B1 (ko) 비트 스캔 방식을 사용한 노어 플래시 메모리 장치 및그것의 프로그램 방법
CN1575496A (zh) 块擦除的非易失性存储器
CN101667446B (zh) 存储器及其读取方法
CN1777960A (zh) 利用自升压技术来避免编程干扰的与非闪存
CN102138182A (zh) 编程并选择性地擦除非易失性存储器
CN1825484A (zh) 一种存储设备的操作方法
CN1826659A (zh) 用于存储器系统的跟踪单元
CN102067233B (zh) 使用索引编程和减少的验证的非易失性存储器和方法
CN101366091A (zh) 使用智能验证的多状态非易失性存储器的编程方法
CN102959634B (zh) 用于减小存储器中的编程噪声的锯齿形多脉冲编程
CN102138183A (zh) 对非易失性存储器的选择性擦除操作
CN101040344A (zh) 用于可编程存储器的自适应编程延迟电路

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication