DE102005013537A1 - Fotoelektrischer Wandler und Herstellverfahren für einen solchen - Google Patents
Fotoelektrischer Wandler und Herstellverfahren für einen solchen Download PDFInfo
- Publication number
- DE102005013537A1 DE102005013537A1 DE102005013537A DE102005013537A DE102005013537A1 DE 102005013537 A1 DE102005013537 A1 DE 102005013537A1 DE 102005013537 A DE102005013537 A DE 102005013537A DE 102005013537 A DE102005013537 A DE 102005013537A DE 102005013537 A1 DE102005013537 A1 DE 102005013537A1
- Authority
- DE
- Germany
- Prior art keywords
- type semiconductor
- semiconductor layer
- photoelectric converter
- manufacturing
- dollar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 4
- 238000006243 chemical reaction Methods 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Abstract
Es wird ein fotoelektrischer Wandler (100) angegeben, der mit Folgendem versehen ist: DOLLAR A - einer fotoelektrischen pin-Wandlungsschicht (10) aus einer p-Halbleiterschicht (12), einer i-Halbleiterschicht (13) und einer n-Halbleiterschicht (14); DOLLAR A - wobei die p-Halbleiterschicht Siliciumatome und Stickstoffatome enthält. DOLLAR A Mit diesem Aufbau ist es möglich, einen hohen fotoelektrischen Wandlungswirkungsgrad zu erzielen.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004086811A JP4441298B2 (ja) | 2004-03-24 | 2004-03-24 | 光電変換装置およびその製造方法 |
JP2004257181A JP4215697B2 (ja) | 2004-09-03 | 2004-09-03 | 光電変換装置およびその製造方法 |
JP2004308381A JP4441377B2 (ja) | 2004-10-22 | 2004-10-22 | 光電変換装置およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE102005013537A1 true DE102005013537A1 (de) | 2005-10-20 |
Family
ID=35034263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102005013537A Withdrawn DE102005013537A1 (de) | 2004-03-24 | 2005-03-23 | Fotoelektrischer Wandler und Herstellverfahren für einen solchen |
Country Status (3)
Country | Link |
---|---|
US (2) | US7915520B2 (de) |
KR (1) | KR100642196B1 (de) |
DE (1) | DE102005013537A1 (de) |
Families Citing this family (21)
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---|---|---|---|---|
US20080128022A1 (en) * | 2006-11-15 | 2008-06-05 | First Solar, Inc. | Photovoltaic device including a tin oxide protective layer |
JP2008181965A (ja) * | 2007-01-23 | 2008-08-07 | Sharp Corp | 積層型光電変換装置及びその製造方法 |
JP2009158667A (ja) * | 2007-12-26 | 2009-07-16 | Mitsubishi Heavy Ind Ltd | 光電変換装置及びその製造方法 |
JP5226562B2 (ja) * | 2008-03-27 | 2013-07-03 | デクセリアルズ株式会社 | 異方性導電フィルム、並びに、接合体及びその製造方法 |
US20090255574A1 (en) * | 2008-04-14 | 2009-10-15 | Sierra Solar Power, Inc. | Solar cell fabricated by silicon liquid-phase deposition |
JP5436017B2 (ja) * | 2008-04-25 | 2014-03-05 | 株式会社半導体エネルギー研究所 | 半導体装置 |
KR100876613B1 (ko) * | 2008-05-27 | 2008-12-31 | 한국철강 주식회사 | 탄뎀 박막 실리콘 태양전지 및 그 제조방법 |
KR101602252B1 (ko) * | 2008-06-27 | 2016-03-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 박막 트랜지스터, 반도체장치 및 전자기기 |
CN102165600B (zh) * | 2008-09-26 | 2013-09-25 | 株式会社半导体能源研究所 | 光电转换器件及其制造方法 |
KR101165911B1 (ko) * | 2008-10-30 | 2012-07-19 | 미츠비시 쥬고교 가부시키가이샤 | 광전 변환 장치 및 광전 변환 장치의 제조 방법 |
JP2010129785A (ja) * | 2008-11-27 | 2010-06-10 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法 |
KR101509765B1 (ko) * | 2008-12-23 | 2015-04-06 | 엘지이노텍 주식회사 | 태양전지 |
KR101022821B1 (ko) * | 2008-12-31 | 2011-03-17 | 한국철강 주식회사 | 광기전력 장치의 제조 방법 |
KR20100096747A (ko) * | 2009-02-25 | 2010-09-02 | 엘지전자 주식회사 | 태양전지 및 그의 제조방법 |
US20100221867A1 (en) * | 2009-05-06 | 2010-09-02 | International Business Machines Corporation | Low cost soi substrates for monolithic solar cells |
WO2011142443A1 (en) * | 2010-05-14 | 2011-11-17 | Semiconductor Energy Laboratory Co., Ltd. | Microcrystalline silicon film, manufacturing method thereof, semiconductor device, and manufacturing method thereof |
US10128396B2 (en) | 2012-10-26 | 2018-11-13 | Stmicroelectronics S.R.L. | Photovoltaic cell |
KR102195003B1 (ko) | 2014-06-18 | 2020-12-24 | 삼성전자주식회사 | 반도체 다이오드, 가변 저항 메모리 장치 및 가변 저항 메모리 장치의 제조 방법 |
IT201600096823A1 (it) * | 2016-09-27 | 2018-03-27 | Enel Green Power Spa | Dispositivo a cella solare e metodo di produzione dello stesso |
JP6896672B2 (ja) * | 2018-03-21 | 2021-06-30 | 株式会社東芝 | 半導体装置及びその製造方法 |
EP4080588A1 (de) * | 2021-04-23 | 2022-10-26 | Pixquanta Limited | Vorrichtung zur detektion kurzwelliger infrarotstrahlung |
Family Cites Families (42)
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JPS57136377A (en) | 1981-02-17 | 1982-08-23 | Kanegafuchi Chem Ind Co Ltd | Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element |
US4385199A (en) * | 1980-12-03 | 1983-05-24 | Yoshihiro Hamakawa | Photovoltaic cell having a hetero junction of amorphous silicon carbide and amorphous silicon |
US4469715A (en) | 1981-02-13 | 1984-09-04 | Energy Conversion Devices, Inc. | P-type semiconductor material having a wide band gap |
JPS57160123A (en) * | 1981-03-30 | 1982-10-02 | Hitachi Ltd | Semiconductor device |
US4438723A (en) * | 1981-09-28 | 1984-03-27 | Energy Conversion Devices, Inc. | Multiple chamber deposition and isolation system and method |
US4419533A (en) * | 1982-03-03 | 1983-12-06 | Energy Conversion Devices, Inc. | Photovoltaic device having incident radiation directing means for total internal reflection |
US4453173A (en) | 1982-04-27 | 1984-06-05 | Rca Corporation | Photocell utilizing a wide-bandgap semiconductor material |
GB2137810B (en) | 1983-03-08 | 1986-10-22 | Agency Ind Science Techn | A solar cell of amorphous silicon |
JPS6150378A (ja) * | 1984-08-20 | 1986-03-12 | Mitsui Toatsu Chem Inc | 非晶質太陽電池の製法 |
JPS6190476A (ja) | 1984-10-09 | 1986-05-08 | Sanyo Electric Co Ltd | 光起電力装置 |
JPS6191974A (ja) * | 1984-10-11 | 1986-05-10 | Kanegafuchi Chem Ind Co Ltd | 耐熱性マルチジヤンクシヨン型半導体素子 |
US4801468A (en) | 1985-02-25 | 1989-01-31 | Canon Kabushiki Kaisha | Process for forming deposited film |
US5140397A (en) | 1985-03-14 | 1992-08-18 | Ricoh Company, Ltd. | Amorphous silicon photoelectric device |
JPH07101751B2 (ja) * | 1985-03-28 | 1995-11-01 | キヤノン株式会社 | 光起電力素子の製造方法 |
US4776894A (en) * | 1986-08-18 | 1988-10-11 | Sanyo Electric Co., Ltd. | Photovoltaic device |
JPS6347987A (ja) | 1986-08-18 | 1988-02-29 | Sanyo Electric Co Ltd | 光起電力装置 |
JPH07105513B2 (ja) | 1986-09-26 | 1995-11-13 | 三洋電機株式会社 | 光起電力装置 |
US4891330A (en) * | 1987-07-27 | 1990-01-02 | Energy Conversion Devices, Inc. | Method of fabricating n-type and p-type microcrystalline semiconductor alloy material including band gap widening elements |
US4775425A (en) | 1987-07-27 | 1988-10-04 | Energy Conversion Devices, Inc. | P and n-type microcrystalline semiconductor alloy material including band gap widening elements, devices utilizing same |
JPH0329373A (ja) | 1989-06-26 | 1991-02-07 | Tonen Corp | 非晶質太陽電池 |
JP2719230B2 (ja) * | 1990-11-22 | 1998-02-25 | キヤノン株式会社 | 光起電力素子 |
US5246506A (en) * | 1991-07-16 | 1993-09-21 | Solarex Corporation | Multijunction photovoltaic device and fabrication method |
JPH0548129A (ja) | 1991-08-21 | 1993-02-26 | Sanyo Electric Co Ltd | 光起電力装置 |
JP3245962B2 (ja) | 1992-06-17 | 2002-01-15 | 富士電機株式会社 | 薄膜太陽電池の製造方法 |
US5382809A (en) * | 1992-09-14 | 1995-01-17 | Sumitomo Electric Industries, Ltd. | Semiconductor device including semiconductor diamond |
JP3377814B2 (ja) | 1992-10-28 | 2003-02-17 | 鐘淵化学工業株式会社 | 多結晶シリコン薄膜およびその形成法 |
JP2695585B2 (ja) | 1992-12-28 | 1997-12-24 | キヤノン株式会社 | 光起電力素子及びその製造方法、並びにそれを用いた発電装置 |
US5866471A (en) * | 1995-12-26 | 1999-02-02 | Kabushiki Kaisha Toshiba | Method of forming semiconductor thin film and method of fabricating solar cell |
JPH09246578A (ja) | 1996-03-11 | 1997-09-19 | Sanyo Electric Co Ltd | 光起電力素子 |
US6184456B1 (en) * | 1996-12-06 | 2001-02-06 | Canon Kabushiki Kaisha | Photovoltaic device |
EP1041646B1 (de) * | 1997-11-10 | 2012-12-12 | Kaneka Corporation | Herstellungsverfahren eines photoelektrischen silizium-dünnschicht-wandlers |
JP3581546B2 (ja) * | 1997-11-27 | 2004-10-27 | キヤノン株式会社 | 微結晶シリコン膜形成方法および光起電力素子の製造方法 |
JPH11233801A (ja) * | 1998-02-17 | 1999-08-27 | Canon Inc | 微結晶シリコン膜の形成方法、および光起電力素子 |
JP4208281B2 (ja) * | 1998-02-26 | 2009-01-14 | キヤノン株式会社 | 積層型光起電力素子 |
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US6252923B1 (en) * | 1999-08-10 | 2001-06-26 | Westinghouse Electric Company Llc | In-situ self-powered monitoring of stored spent nuclear fuel |
JP2001345272A (ja) * | 2000-05-31 | 2001-12-14 | Canon Inc | シリコン系薄膜の形成方法、シリコン系薄膜及び光起電力素子 |
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JP2002016271A (ja) | 2000-06-29 | 2002-01-18 | Fuji Electric Co Ltd | 薄膜光電変換素子 |
US6787692B2 (en) * | 2000-10-31 | 2004-09-07 | National Institute Of Advanced Industrial Science & Technology | Solar cell substrate, thin-film solar cell, and multi-junction thin-film solar cell |
JP3897582B2 (ja) * | 2000-12-12 | 2007-03-28 | キヤノン株式会社 | 真空処理方法、真空処理装置、半導体装置の製造方法および半導体装置 |
US6706336B2 (en) * | 2001-02-02 | 2004-03-16 | Canon Kabushiki Kaisha | Silicon-based film, formation method therefor and photovoltaic element |
-
2005
- 2005-03-23 DE DE102005013537A patent/DE102005013537A1/de not_active Withdrawn
- 2005-03-24 KR KR1020050024615A patent/KR100642196B1/ko active IP Right Grant
- 2005-03-24 US US11/087,819 patent/US7915520B2/en not_active Expired - Fee Related
-
2011
- 2011-02-22 US US13/031,969 patent/US20110146773A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20050229965A1 (en) | 2005-10-20 |
US7915520B2 (en) | 2011-03-29 |
KR100642196B1 (ko) | 2006-11-06 |
KR20060044699A (ko) | 2006-05-16 |
US20110146773A1 (en) | 2011-06-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
R016 | Response to examination communication | ||
R120 | Application withdrawn or ip right abandoned |
Effective date: 20140528 |