DE3581010D1 - Entwicklung-endpunktnachweisverfahren. - Google Patents

Entwicklung-endpunktnachweisverfahren.

Info

Publication number
DE3581010D1
DE3581010D1 DE8585304867T DE3581010T DE3581010D1 DE 3581010 D1 DE3581010 D1 DE 3581010D1 DE 8585304867 T DE8585304867 T DE 8585304867T DE 3581010 T DE3581010 T DE 3581010T DE 3581010 D1 DE3581010 D1 DE 3581010D1
Authority
DE
Germany
Prior art keywords
end point
development end
point procedure
procedure
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585304867T
Other languages
English (en)
Inventor
Kaoru Kanda
Kunihiko Kanda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sigma Corp
Original Assignee
Sigma Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14055184A external-priority patent/JPS6120043A/ja
Priority claimed from JP60007365A external-priority patent/JPH06103393B2/ja
Priority claimed from JP12233285A external-priority patent/JPS61280622A/ja
Application filed by Sigma Corp filed Critical Sigma Corp
Application granted granted Critical
Publication of DE3581010D1 publication Critical patent/DE3581010D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process
DE8585304867T 1984-07-09 1985-07-08 Entwicklung-endpunktnachweisverfahren. Expired - Fee Related DE3581010D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP14055184A JPS6120043A (ja) 1984-07-09 1984-07-09 現像の終点検出方法
JP60007365A JPH06103393B2 (ja) 1985-01-21 1985-01-21 現像の終点検出方法
JP12233285A JPS61280622A (ja) 1985-06-05 1985-06-05 電極の接続方法

Publications (1)

Publication Number Publication Date
DE3581010D1 true DE3581010D1 (de) 1991-02-07

Family

ID=27277580

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585304867T Expired - Fee Related DE3581010D1 (de) 1984-07-09 1985-07-08 Entwicklung-endpunktnachweisverfahren.

Country Status (3)

Country Link
US (1) US4621037A (de)
EP (1) EP0171195B1 (de)
DE (1) DE3581010D1 (de)

Families Citing this family (48)

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JP2509572B2 (ja) * 1985-08-19 1996-06-19 株式会社東芝 パタ−ン形成方法及び装置
JPS62152864A (ja) * 1985-12-27 1987-07-07 Canon Inc 液体噴射記録ヘツドの製造方法
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置
JP3013377B2 (ja) * 1990-03-07 2000-02-28 日産自動車株式会社 半導体基板のエッチング方法
US5264328A (en) * 1992-04-24 1993-11-23 International Business Machines Corporation Resist development endpoint detection for X-ray lithography
US5582746A (en) * 1992-12-04 1996-12-10 International Business Machines Corporation Real time measurement of etch rate during a chemical etching process
US5788801A (en) * 1992-12-04 1998-08-04 International Business Machines Corporation Real time measurement of etch rate during a chemical etching process
US5573624A (en) * 1992-12-04 1996-11-12 International Business Machines Corporation Chemical etch monitor for measuring film etching uniformity during a chemical etching process
US5501766A (en) * 1994-06-30 1996-03-26 International Business Machines Corporation Minimizing overetch during a chemical etching process
US5445705A (en) * 1994-06-30 1995-08-29 International Business Machines Corporation Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process
US5516399A (en) * 1994-06-30 1996-05-14 International Business Machines Corporation Contactless real-time in-situ monitoring of a chemical etching
US5480511A (en) * 1994-06-30 1996-01-02 International Business Machines Corporation Method for contactless real-time in-situ monitoring of a chemical etching process
US5489361A (en) * 1994-06-30 1996-02-06 International Business Machines Corporation Measuring film etching uniformity during a chemical etching process
US5988896A (en) * 1996-10-26 1999-11-23 Applied Science Fiction, Inc. Method and apparatus for electronic film development
US6069714A (en) 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
US6017688A (en) 1997-01-30 2000-01-25 Applied Science Fiction, Inc. System and method for latent film recovery in electronic film development
ATE224622T1 (de) 1998-02-23 2002-10-15 Applied Science Fiction Inc Progressive flächenabtastung in der elektronischen filmentwicklung
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
AU6202100A (en) 1999-06-29 2001-01-31 Applied Science Fiction, Inc. Slot coating device for electronic film development
AU6914900A (en) 1999-08-17 2001-03-13 Applied Science Fiction, Inc. Method and system for using calibration patches in electronic film processing
AU2054401A (en) 1999-12-17 2001-06-25 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
AU2742701A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6540416B2 (en) 1999-12-30 2003-04-01 Applied Science Fiction, Inc. System and method for digital film development using visible light
US6864973B2 (en) 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
US6505977B2 (en) 1999-12-30 2003-01-14 Applied Science Fiction, Inc. System and method for digital color dye film processing
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
US6664034B2 (en) * 1999-12-31 2003-12-16 Eastman Kodak Company Digital film processing method
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
AU2001239745A1 (en) 2000-02-03 2001-08-14 Applied Science Fiction Method, system, and software for signal processing using pyramidal decomposition
US6786655B2 (en) 2000-02-03 2004-09-07 Eastman Kodak Company Method and system for self-service film processing
AU2001238021A1 (en) 2000-02-03 2001-08-14 Applied Science Fiction Match blur system and method
US6990251B2 (en) 2000-02-03 2006-01-24 Eastman Kodak Company Method, system, and software for signal processing using sheep and shepherd artifacts
US6599036B2 (en) 2000-02-03 2003-07-29 Applied Science Fiction, Inc. Film processing solution cartridge and method for developing and digitizing film
US20060182337A1 (en) * 2000-06-28 2006-08-17 Ford Benjamin C Method and apparatus for improving the quality of reconstructed information
US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
TW538382B (en) 2000-09-21 2003-06-21 Applied Science Fiction Inc Dynamic image correction and imaging systems
US6888997B2 (en) 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
US6733960B2 (en) 2001-02-09 2004-05-11 Eastman Kodak Company Digital film processing solutions and method of digital film processing
US6805501B2 (en) 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
KR20060119707A (ko) * 2004-02-13 2006-11-24 소니 가부시끼 가이샤 화상 처리 장치와 화상 처리 방법 및 프로그램

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3874959A (en) * 1973-09-21 1975-04-01 Ibm Method to establish the endpoint during the delineation of oxides on semiconductor surfaces and apparatus therefor
CH596582A5 (de) * 1976-04-08 1978-03-15 Graphicart Int
SU758054A1 (ru) * 1978-07-31 1980-08-23 Inst Elektroniki An Bruss Ssr Способ и устройство для автоматического проявления металлизированных фотошаблонов 1
JPS5531639A (en) * 1978-08-29 1980-03-06 Kunihiko Kanda Forming method for electric wiring
WO1981000646A1 (en) * 1979-08-30 1981-03-05 Western Electric Co Device manufacture involving pattern delineation in thin layers
JPS5895349A (ja) * 1981-11-30 1983-06-06 Fuji Photo Film Co Ltd 感光性プレ−トの現像補充液補充方法
ATE49066T1 (de) * 1982-10-21 1990-01-15 Vickers Plc Verarbeitung von lichtempfindlichen vorrichtungen.
JPS59121047A (ja) * 1982-12-27 1984-07-12 Fuji Photo Film Co Ltd 感光性平版印刷版の現像方法および自動現像装置

Also Published As

Publication number Publication date
EP0171195A1 (de) 1986-02-12
EP0171195B1 (de) 1991-01-02
US4621037A (en) 1986-11-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee