DE3674939D1 - Flache magnetron-penning-entladungszerstaeubungsvorrichtung. - Google Patents

Flache magnetron-penning-entladungszerstaeubungsvorrichtung.

Info

Publication number: DE3674939D1
Authority: DE; Germany
Prior art keywords: penning discharge; flat magnetron; discharge sprayer; sprayer; magnetron
Prior art date: 1985-04-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE8686302478T

Other languages

English (en)

Inventor

John C Helmer

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Varian Medical Systems Inc

Original Assignee

Varian Associates Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-04-03

Filing date

1986-04-03

Publication date

1990-11-22

1986-04-03 Application filed by Varian Associates Inc filed Critical Varian Associates Inc

1990-11-22 Application granted granted Critical

1990-11-22 Publication of DE3674939D1 publication Critical patent/DE3674939D1/de

2006-04-04 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3458—Electromagnets in particular for cathodic sputtering apparatus

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electromagnetism (AREA)
Physical Vapour Deposition (AREA)
Thin Magnetic Films (AREA)

DE8686302478T 1985-04-03 1986-04-03 Flache magnetron-penning-entladungszerstaeubungsvorrichtung. Expired - Fee Related DE3674939D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US06/719,182 US4629548A (en)	1985-04-03	1985-04-03	Planar penning magnetron sputtering device

Publications (1)

Publication Number	Publication Date
DE3674939D1 true DE3674939D1 (de)	1990-11-22

Family

ID=24889075

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8686302478T Expired - Fee Related DE3674939D1 (de)	1985-04-03	1986-04-03	Flache magnetron-penning-entladungszerstaeubungsvorrichtung.

Country Status (4)

Country	Link
US (1)	US4629548A (de)
EP (1)	EP0197770B1 (de)
JP (1)	JPS61231170A (de)
DE (1)	DE3674939D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4810347A (en) *	1988-03-21	1989-03-07	Eaton Corporation	Penning type cathode for sputter coating
US5089746A (en) *	1989-02-14	1992-02-18	Varian Associates, Inc.	Production of ion beams by chemically enhanced sputtering of solids
US5080772A (en) *	1990-08-24	1992-01-14	Materials Research Corporation	Method of improving ion flux distribution uniformity on a substrate
DE4218115A1 (de) *	1992-06-02	1993-12-09	Guenter Lauer	Verfahren sowie Aufbereitungsvorrichtung zur Reinwasserherstellung
DE19540794A1 (de) *	1995-11-02	1997-05-07	Leybold Ag	Vorrichtung zum Beschichten eines Substrats von einem elektrisch leitfähigen Target
US6352626B1 (en)	1999-04-19	2002-03-05	Von Zweck Heimart	Sputter ion source for boron and other targets
US7718222B2 (en) *	2002-04-25	2010-05-18	University Of Virginia Patent Foundation	Apparatus and method for high rate uniform coating, including non-line of sight
US20060275624A1 (en) *	2005-06-07	2006-12-07	General Electric Company	Method and apparatus for airfoil electroplating, and airfoil
US8440301B2 (en) *	2006-07-13	2013-05-14	Teer Coatings Limited	Coating apparatus and method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL50072C (de) *	1935-12-28
US3117065A (en) *	1959-09-02	1964-01-07	Magnetic Film And Tape Company	Method and apparatus for making magnetic recording tape
US3353054A (en) *	1964-06-09	1967-11-14	Edwards High Vacuum Int Ltd	Penning type vacuum pumps
US3447072A (en) *	1966-12-22	1969-05-27	Nat Res Corp	Cold cathode penning type gauge for monitoring vacuum level in a sputtering process
US3412310A (en) *	1967-03-06	1968-11-19	Varian Associates	Power supply for glow discharge type vacuum pumps employing a voltagedoubler bridge-rectifier and a soft transformer
US3566185A (en) *	1969-03-12	1971-02-23	Atomic Energy Commission	Sputter-type penning discharge for metallic ions
US3898496A (en) *	1974-08-12	1975-08-05	Us Energy	Means for obtaining a metal ion beam from a heavy-ion cyclotron source
HU179482B (en) *	1979-02-19	1982-10-28	Mikroelektronikai Valalat	Penning pulverizel source
US4324631A (en) *	1979-07-23	1982-04-13	Spin Physics, Inc.	Magnetron sputtering of magnetic materials
CH648690A5 (de) *	1980-10-14	1985-03-29	Balzers Hochvakuum	Kathodenanordnung zur abstaeubung von material von einem target in einer kathodenzerstaeubungsanlage.
US4344019A (en) *	1980-11-10	1982-08-10	The United States Of America As Represented By The United States Department Of Energy	Penning discharge ion source with self-cleaning aperture
CH649578A5 (de) *	1981-03-27	1985-05-31	Ulvac Corp	Hochgeschwindigkeits-kathoden-zerstaeubungsvorrichtung.
JPS58141433A (ja) *	1982-02-16	1983-08-22	Teijin Ltd	磁気記録媒体とその製造方法
DE3223245C2 (de) *	1982-07-23	1986-05-22	Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa	Ferromagnetische Hochgeschwindigkeits-Kathodenzerstäubungs-Vorrichtung
US4431505A (en) *	1982-08-16	1984-02-14	Vac-Tec Systems, Inc.	High rate magnetron sputtering of high permeability materials
US4391697A (en) *	1982-08-16	1983-07-05	Vac-Tec Systems, Inc.	High rate magnetron sputtering of high permeability materials
US4414087A (en) *	1983-01-31	1983-11-08	Meckel Benjamin B	Magnetically-assisted sputtering method for producing vertical recording media
US4500409A (en) *	1983-07-19	1985-02-19	Varian Associates, Inc.	Magnetron sputter coating source for both magnetic and non magnetic target materials
US4564435A (en) *	1985-05-23	1986-01-14	Varian Associates, Inc.	Target assembly for sputtering magnetic material

1985
- 1985-04-03 US US06/719,182 patent/US4629548A/en not_active Expired - Lifetime
1986
- 1986-04-01 JP JP61072661A patent/JPS61231170A/ja active Pending
- 1986-04-03 DE DE8686302478T patent/DE3674939D1/de not_active Expired - Fee Related
- 1986-04-03 EP EP86302478A patent/EP0197770B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0197770A2 (de)	1986-10-15
JPS61231170A (ja)	1986-10-15
EP0197770A3 (en)	1988-01-07
US4629548A (en)	1986-12-16
EP0197770B1 (de)	1990-10-17

Legal Events

Date	Code	Title	Description
1991-11-14	8364	No opposition during term of opposition
1993-04-08	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
IT8619827A0 (it)	1986-03-21	Innesco pirotecnico-esplosivo.
DE3676357D1 (de)	1991-02-07	Ausdehnbare kanuele.
DE68915022T2 (de)	1994-08-18	Entladungslampe.
NO160543C (no)	1989-04-26	Utladningslamper.
DE3582810D1 (de)	1991-06-20	Mikrowellenentladungslichtquelle.
KR860005655A (ko)	1986-08-11	연속 토출 디스펜서
DE3865100D1 (de)	1991-10-31	Elektrodenlose niederdruckentladungslampe.
DE3865553D1 (de)	1991-11-21	Elektrodenlose niederdruckentladungslampe.
DE3674826D1 (de)	1990-11-15	Elektrodenlose niederdruck-entladungslampe.
DE68901343D1 (de)	1992-06-04	Magnetron.
DE68918829D1 (de)	1994-11-17	Entladungslampenanordnung.
DE3676797D1 (de)	1991-02-14	Mikrowellenherd.
DE3854187D1 (de)	1995-08-24	Hochdruckentladungslampe.
NO862891L (no)	1987-01-30	Metallisk mikroboelgehulrom.
DE3865757D1 (de)	1991-11-28	Elektrodenlose niederdruckentladungslampe.
DE68913331T2 (de)	1994-06-09	Magnetron.
DE3674939D1 (de)	1990-11-22	Flache magnetron-penning-entladungszerstaeubungsvorrichtung.
DE3887464T2 (de)	1994-05-11	Kaltkathodenentladungslampe.
DE3575258D1 (de)	1990-02-08	Hochdruckentladungslampe.
DE3670401D1 (de)	1990-05-17	Hochdruckentladungslampe.
DE3668093D1 (de)	1990-02-08	Hochdruckentladungslampe.
ATA35686A (de)	1994-07-15	Kondensatableiter
DE3583006D1 (de)	1991-07-04	Entladungslampe mit mehrfachen einschnuerungen.
DE3579748D1 (de)	1990-10-25	Entladungsbearbeitungsgeraete.
DE3686193T2 (de)	1993-03-11	Natriumhochdruckentladungslampe mit getter.