DE60212906D1 - Feder mit leitfähiger Beschichtung - Google Patents
Feder mit leitfähiger BeschichtungInfo
- Publication number
- DE60212906D1 DE60212906D1 DE60212906T DE60212906T DE60212906D1 DE 60212906 D1 DE60212906 D1 DE 60212906D1 DE 60212906 T DE60212906 T DE 60212906T DE 60212906 T DE60212906 T DE 60212906T DE 60212906 D1 DE60212906 D1 DE 60212906D1
- Authority
- DE
- Germany
- Prior art keywords
- spring
- conductive coating
- conductive
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00642—Manufacture or treatment of devices or systems in or on a substrate for improving the physical properties of a device
- B81C1/0065—Mechanical properties
- B81C1/00666—Treatments for controlling internal stress or strain in MEMS structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/00468—Releasing structures
- B81C1/00476—Releasing structures removing a sacrificial layer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
- G01R1/06727—Cantilever beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/70—Coupling devices
- H01R12/71—Coupling devices for rigid printing circuits or like structures
- H01R12/712—Coupling devices for rigid printing circuits or like structures co-operating with the surface of the printed circuit or with a coupling device exclusively provided on the surface of the printed circuit
- H01R12/716—Coupling device provided on the PCB
- H01R12/718—Contact members provided on the PCB without an insulating housing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4092—Integral conductive tabs, i.e. conductive parts partly detached from the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0307—Anchors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/51—Fixed connections for rigid printed circuits or like structures
- H01R12/52—Fixed connections for rigid printed circuits or like structures connecting to other rigid printed circuits or like structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
- H01R13/035—Plated dielectric material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/22—Contacts for co-operating by abutting
- H01R13/24—Contacts for co-operating by abutting resilient; resiliently-mounted
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49147—Assembling terminal to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
- Y10T29/49208—Contact or terminal manufacturing by assembling plural parts
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/904,370 US6560861B2 (en) | 2001-07-11 | 2001-07-11 | Microspring with conductive coating deposited on tip after release |
US904370 | 2001-07-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60212906D1 true DE60212906D1 (de) | 2006-08-17 |
DE60212906T2 DE60212906T2 (de) | 2007-01-18 |
Family
ID=25419030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60212906T Expired - Lifetime DE60212906T2 (de) | 2001-07-11 | 2002-07-03 | Feder mit leitfähiger Beschichtung |
Country Status (4)
Country | Link |
---|---|
US (2) | US6560861B2 (de) |
EP (1) | EP1277696B1 (de) |
JP (1) | JP2003097617A (de) |
DE (1) | DE60212906T2 (de) |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7247035B2 (en) * | 2000-06-20 | 2007-07-24 | Nanonexus, Inc. | Enhanced stress metal spring contactor |
US7382142B2 (en) * | 2000-05-23 | 2008-06-03 | Nanonexus, Inc. | High density interconnect system having rapid fabrication cycle |
US20070245553A1 (en) * | 1999-05-27 | 2007-10-25 | Chong Fu C | Fine pitch microfabricated spring contact structure & method |
US6799976B1 (en) * | 1999-07-28 | 2004-10-05 | Nanonexus, Inc. | Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies |
US6812718B1 (en) | 1999-05-27 | 2004-11-02 | Nanonexus, Inc. | Massively parallel interface for electronic circuits |
US7579848B2 (en) * | 2000-05-23 | 2009-08-25 | Nanonexus, Inc. | High density interconnect system for IC packages and interconnect assemblies |
US7952373B2 (en) * | 2000-05-23 | 2011-05-31 | Verigy (Singapore) Pte. Ltd. | Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies |
US6595787B2 (en) * | 2001-02-09 | 2003-07-22 | Xerox Corporation | Low cost integrated out-of-plane micro-device structures and method of making |
JP3794586B2 (ja) * | 2001-08-24 | 2006-07-05 | ナノネクサス インク | スパッタされた膜において、均一な等方性の応力を生じさせるための方法および装置 |
US6794737B2 (en) * | 2001-10-12 | 2004-09-21 | Xerox Corporation | Spring structure with stress-balancing layer |
US8914590B2 (en) * | 2002-08-07 | 2014-12-16 | Pact Xpp Technologies Ag | Data processing method and device |
US6866255B2 (en) * | 2002-04-12 | 2005-03-15 | Xerox Corporation | Sputtered spring films with low stress anisotropy |
US7265565B2 (en) | 2003-02-04 | 2007-09-04 | Microfabrica Inc. | Cantilever microprobes for contacting electronic components and methods for making such probes |
US20060053625A1 (en) * | 2002-05-07 | 2006-03-16 | Microfabrica Inc. | Microprobe tips and methods for making |
US20060051948A1 (en) * | 2003-02-04 | 2006-03-09 | Microfabrica Inc. | Microprobe tips and methods for making |
US10416192B2 (en) | 2003-02-04 | 2019-09-17 | Microfabrica Inc. | Cantilever microprobes for contacting electronic components |
US20080211524A1 (en) * | 2003-02-04 | 2008-09-04 | Microfabrica Inc. | Electrochemically Fabricated Microprobes |
US20080157793A1 (en) * | 2003-02-04 | 2008-07-03 | Microfabrica Inc. | Vertical Microprobes for Contacting Electronic Components and Method for Making Such Probes |
US7015584B2 (en) * | 2003-07-08 | 2006-03-21 | Xerox Corporation | High force metal plated spring structure |
US6881074B1 (en) * | 2003-09-29 | 2005-04-19 | Cookson Electronics, Inc. | Electrical circuit assembly with micro-socket |
US6890185B1 (en) * | 2003-11-03 | 2005-05-10 | Kulicke & Soffa Interconnect, Inc. | Multipath interconnect with meandering contact cantilevers |
US7410590B2 (en) | 2003-12-19 | 2008-08-12 | Palo Alto Research Center Incorporated | Transferable micro spring structure |
US20080108221A1 (en) * | 2003-12-31 | 2008-05-08 | Microfabrica Inc. | Microprobe Tips and Methods for Making |
JP4747562B2 (ja) * | 2004-06-25 | 2011-08-17 | 株式会社日立製作所 | 希土類磁石及びその製造方法、並びに磁石モータ |
JP4382593B2 (ja) | 2004-06-29 | 2009-12-16 | 山一電機株式会社 | プローブユニット及びその製造方法 |
US7082684B2 (en) * | 2004-08-04 | 2006-08-01 | Palo Alto Research Center Incorporated | Intermetallic spring structure |
US20060030179A1 (en) * | 2004-08-05 | 2006-02-09 | Palo Alto Research Center, Incorporated | Transmission-line spring structure |
US8330485B2 (en) * | 2004-10-21 | 2012-12-11 | Palo Alto Research Center Incorporated | Curved spring structure with downturned tip |
US7230440B2 (en) | 2004-10-21 | 2007-06-12 | Palo Alto Research Center Incorporated | Curved spring structure with elongated section located under cantilevered section |
US20060180927A1 (en) * | 2005-02-14 | 2006-08-17 | Daisuke Takai | Contact structure and method for manufacturing the same |
US7550855B2 (en) * | 2005-12-02 | 2009-06-23 | Palo Alto Research Center Incorporated | Vertically spaced plural microsprings |
JP4654897B2 (ja) | 2005-12-09 | 2011-03-23 | イビデン株式会社 | 部品実装用ピンを有するプリント配線板の製造方法 |
JP4848752B2 (ja) * | 2005-12-09 | 2011-12-28 | イビデン株式会社 | 部品実装用ピンを有するプリント配線板及びこれを使用した電子機器 |
JP2007165383A (ja) | 2005-12-09 | 2007-06-28 | Ibiden Co Ltd | 部品実装用ピンを形成したプリント基板 |
CN100439234C (zh) * | 2005-12-29 | 2008-12-03 | 中国科学院上海微系统与信息技术研究所 | 二氟化氙气体腐蚀过程中锚的制作方法 |
US7982290B2 (en) * | 2006-01-12 | 2011-07-19 | Palo Alto Research Center, Inc. | Contact spring application to semiconductor devices |
TWI332086B (en) * | 2006-10-24 | 2010-10-21 | Ind Tech Res Inst | Multi-layer electric probe and fabricating method |
US20090140433A1 (en) * | 2007-11-30 | 2009-06-04 | Alces Technology, Inc. | MEMS chip-to-chip interconnects |
US7927905B2 (en) * | 2007-12-21 | 2011-04-19 | Palo Alto Research Center Incorporated | Method of producing microsprings having nanowire tip structures |
DE202008001997U1 (de) * | 2008-02-14 | 2008-04-03 | Rosenberger Hochfrequenztechnik Gmbh & Co. Kg | Kontaktfeder |
US8278748B2 (en) | 2010-02-17 | 2012-10-02 | Maxim Integrated Products, Inc. | Wafer-level packaged device having self-assembled resilient leads |
US8686560B2 (en) | 2010-04-07 | 2014-04-01 | Maxim Integrated Products, Inc. | Wafer-level chip-scale package device having bump assemblies configured to mitigate failures due to stress |
US8519534B2 (en) | 2010-09-22 | 2013-08-27 | Palo Alto Research Center Incorporated | Microsprings partially embedded in a laminate structure and methods for producing same |
US8441808B2 (en) | 2010-09-22 | 2013-05-14 | Palo Alto Research Center Incorporated | Interposer with microspring contacts |
US8643140B2 (en) * | 2011-07-11 | 2014-02-04 | United Microelectronics Corp. | Suspended beam for use in MEMS device |
US8525353B2 (en) | 2011-12-19 | 2013-09-03 | Palo Alto Research Center Incorporated | Microspring structures adapted for target device cooling |
JP6379416B2 (ja) * | 2014-10-31 | 2018-08-29 | 北川工業株式会社 | 接触部材 |
DE102015211472A1 (de) * | 2015-06-22 | 2016-07-07 | Carl Zeiss Smt Gmbh | Mikro-elektromechanisches system und verfahren zum herstellen eines mikro-elektromechanischen systems |
US11262383B1 (en) | 2018-09-26 | 2022-03-01 | Microfabrica Inc. | Probes having improved mechanical and/or electrical properties for making contact between electronic circuit elements and methods for making |
US11867721B1 (en) | 2019-12-31 | 2024-01-09 | Microfabrica Inc. | Probes with multiple springs, methods for making, and methods for using |
US11761982B1 (en) | 2019-12-31 | 2023-09-19 | Microfabrica Inc. | Probes with planar unbiased spring elements for electronic component contact and methods for making such probes |
US11201275B1 (en) * | 2020-06-10 | 2021-12-14 | Palo Alto Research Center Incorporated | Superconducting stress-engineered micro-fabricated springs |
US11774467B1 (en) | 2020-09-01 | 2023-10-03 | Microfabrica Inc. | Method of in situ modulation of structural material properties and/or template shape |
US11908782B2 (en) * | 2021-03-22 | 2024-02-20 | Xerox Corporation | Spacers formed on a substrate with etched micro-springs |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3842189A (en) | 1973-01-08 | 1974-10-15 | Rca Corp | Contact array and method of making the same |
US5917707A (en) * | 1993-11-16 | 1999-06-29 | Formfactor, Inc. | Flexible contact structure with an electrically conductive shell |
US6117694A (en) * | 1994-07-07 | 2000-09-12 | Tessera, Inc. | Flexible lead structures and methods of making same |
US5613861A (en) | 1995-06-07 | 1997-03-25 | Xerox Corporation | Photolithographically patterned spring contact |
WO1997043654A1 (en) * | 1996-05-17 | 1997-11-20 | Formfactor, Inc. | Microelectronic spring contact elements |
JPH11504725A (ja) * | 1996-05-17 | 1999-04-27 | フォームファクター,インコーポレイテッド | マイクロエレクトロニクスばね接触部品 |
DE19736674C1 (de) * | 1997-08-22 | 1998-11-26 | Siemens Ag | Mikromechanisches elektrostatisches Relais und Verfahren zu dessen Herstellung |
TW589453B (en) * | 1998-12-02 | 2004-06-01 | Formfactor Inc | Lithographic contact elements |
US6366414B1 (en) * | 1999-09-03 | 2002-04-02 | Agere Systems Guardian Corp. | Micro-electro-mechanical optical device |
US6794725B2 (en) * | 1999-12-21 | 2004-09-21 | Xerox Corporation | Amorphous silicon sensor with micro-spring interconnects for achieving high uniformity in integrated light-emitting sources |
US6827584B2 (en) * | 1999-12-28 | 2004-12-07 | Formfactor, Inc. | Interconnect for microelectronic structures with enhanced spring characteristics |
-
2001
- 2001-07-11 US US09/904,370 patent/US6560861B2/en not_active Expired - Lifetime
-
2002
- 2002-07-03 EP EP02254667A patent/EP1277696B1/de not_active Expired - Fee Related
- 2002-07-03 DE DE60212906T patent/DE60212906T2/de not_active Expired - Lifetime
- 2002-07-04 JP JP2002195437A patent/JP2003097617A/ja active Pending
- 2002-12-17 US US10/323,382 patent/US20030096519A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20030010615A1 (en) | 2003-01-16 |
JP2003097617A (ja) | 2003-04-03 |
US6560861B2 (en) | 2003-05-13 |
EP1277696B1 (de) | 2006-07-05 |
EP1277696A2 (de) | 2003-01-22 |
EP1277696A3 (de) | 2004-04-07 |
DE60212906T2 (de) | 2007-01-18 |
US20030096519A1 (en) | 2003-05-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |