DE69603217D1 - Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselben - Google Patents
Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselbenInfo
- Publication number
- DE69603217D1 DE69603217D1 DE69603217T DE69603217T DE69603217D1 DE 69603217 D1 DE69603217 D1 DE 69603217D1 DE 69603217 T DE69603217 T DE 69603217T DE 69603217 T DE69603217 T DE 69603217T DE 69603217 D1 DE69603217 D1 DE 69603217D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- same
- exposure apparatus
- projection exposure
- micro device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08821595A JP3450509B2 (ja) | 1995-04-13 | 1995-04-13 | 投影露光装置及び該装置を用いて素子を製造する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69603217D1 true DE69603217D1 (de) | 1999-08-19 |
DE69603217T2 DE69603217T2 (de) | 1999-12-09 |
Family
ID=13936686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69603217T Expired - Lifetime DE69603217T2 (de) | 1995-04-13 | 1996-04-10 | Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselben |
Country Status (5)
Country | Link |
---|---|
US (1) | US5999270A (de) |
EP (1) | EP0737898B1 (de) |
JP (1) | JP3450509B2 (de) |
KR (1) | KR100239623B1 (de) |
DE (1) | DE69603217T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW445514B (en) * | 1998-08-18 | 2001-07-11 | United Microelectronics Corp | Synchronous off-axis alignment exposure device |
KR100400510B1 (ko) * | 2000-12-28 | 2003-10-08 | 엘지.필립스 엘시디 주식회사 | 실리콘 결정화 장치와 실리콘 결정화 방법 |
KR100478758B1 (ko) * | 2002-04-16 | 2005-03-24 | 엘지.필립스 엘시디 주식회사 | 실리콘 결정화방법 |
KR100833956B1 (ko) * | 2005-05-04 | 2008-05-30 | 엘지디스플레이 주식회사 | 비정질 실리콘 결정화용 광학 마스크 |
US20070196613A1 (en) * | 2006-02-07 | 2007-08-23 | Columbia Forest Products, Inc. | Plywood panel with non-contiguous veneer components |
JP2010106358A (ja) * | 2008-09-30 | 2010-05-13 | Canon Inc | 成膜用マスク及びそれを用いた成膜方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3542469A (en) * | 1967-09-30 | 1970-11-24 | Telefunken Patent | Photographic production of semiconductor microstructures |
JPS5825638A (ja) * | 1981-08-08 | 1983-02-15 | Canon Inc | 露光装置 |
GB2146427B (en) * | 1983-08-01 | 1987-10-21 | Canon Kk | Semiconductor manufacture |
US4668089A (en) * | 1983-12-26 | 1987-05-26 | Hitachi, Ltd. | Exposure apparatus and method of aligning exposure mask with workpiece |
JPS61100932A (ja) * | 1984-10-24 | 1986-05-19 | Hitachi Ltd | 露光装置 |
US5137363A (en) * | 1986-06-04 | 1992-08-11 | Canon Kabushiki Kaisha | Projection exposure apparatus |
JPH0789534B2 (ja) * | 1986-07-04 | 1995-09-27 | キヤノン株式会社 | 露光方法 |
JPH065663B2 (ja) * | 1987-06-30 | 1994-01-19 | 株式会社日立製作所 | 半導体露光方法及びその装置 |
JP2683075B2 (ja) * | 1988-12-23 | 1997-11-26 | キヤノン株式会社 | 半導体製造装置及び方法 |
JP2633028B2 (ja) * | 1989-07-31 | 1997-07-23 | キヤノン株式会社 | 観察方法及び観察装置 |
JP2890882B2 (ja) * | 1990-04-06 | 1999-05-17 | キヤノン株式会社 | 位置付け方法、半導体デバイスの製造方法及びそれを用いた投影露光装置 |
JP3109852B2 (ja) * | 1991-04-16 | 2000-11-20 | キヤノン株式会社 | 投影露光装置 |
JP3564735B2 (ja) * | 1994-06-16 | 2004-09-15 | 株式会社ニコン | 走査型露光装置及び露光方法 |
-
1995
- 1995-04-13 JP JP08821595A patent/JP3450509B2/ja not_active Expired - Lifetime
-
1996
- 1996-04-10 EP EP96302526A patent/EP0737898B1/de not_active Expired - Lifetime
- 1996-04-10 US US08/630,137 patent/US5999270A/en not_active Expired - Fee Related
- 1996-04-10 DE DE69603217T patent/DE69603217T2/de not_active Expired - Lifetime
- 1996-04-13 KR KR1019960011121A patent/KR100239623B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR960039107A (ko) | 1996-11-21 |
EP0737898A1 (de) | 1996-10-16 |
JP3450509B2 (ja) | 2003-09-29 |
JPH08288194A (ja) | 1996-11-01 |
DE69603217T2 (de) | 1999-12-09 |
KR100239623B1 (ko) | 2000-01-15 |
US5999270A (en) | 1999-12-07 |
EP0737898B1 (de) | 1999-07-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69531568D1 (de) | Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben | |
DE69412548D1 (de) | Belichtungsapparat und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselben | |
DE69740012D1 (de) | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben | |
DE69621547T2 (de) | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung | |
DE69728126D1 (de) | Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung | |
DE69605337T2 (de) | Positionierungssystem und Verfahren und Apparat zur Herstellung einer Vorrichtung | |
DE69703395T2 (de) | Projektionsapparat zur Abtastbelichtung und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben | |
DE69631260D1 (de) | Abtastbelichtungsapparat, Belichtungsverfahren unter Verwendung desselben und Verfahren zur Herstellung der Vorrichtung | |
DE69807949D1 (de) | Verfahren und Vorrichtung zur Herstellung einer Dünnschicht | |
DE69828461D1 (de) | Verfahren und Apparat zur Herstellung einer Mikroanordnung | |
DE69637666D1 (de) | Abtastbelichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben | |
DE59506365D1 (de) | Vorrichtung und verfahren zur herstellung einer bildsequenz | |
DE69838154D1 (de) | Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung | |
DE69837232D1 (de) | Belichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung | |
DE69511920T2 (de) | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung | |
DE69623361T2 (de) | Verfahren zur Herstellung einer Vorrichtung mittels Projektionslithographie und Gerät dafür | |
DE69413465T2 (de) | Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben | |
DE69616847D1 (de) | Lichtempfindliches Resistmaterial und Verfahren zur Herstellung von Vorrichtung unter Benutzung des lichtempfindlichen Resistmaterials | |
DE69813658D1 (de) | Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung | |
DE69719273D1 (de) | Abtastbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung unter Verwendung desselben | |
DE69523810D1 (de) | Projektionsapparat zur Abtastbelichtung und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselben | |
DE69603217T2 (de) | Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselben | |
DE69602820D1 (de) | Verfahren und vorrichtung zur herstellung einer verbundfolie | |
DE69425862T2 (de) | Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung | |
DE69933903D1 (de) | Lithograpischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |