DE69616813D1 - Halographisches aufzeichnungsmaterial und verfahren - Google Patents
Halographisches aufzeichnungsmaterial und verfahrenInfo
- Publication number
- DE69616813D1 DE69616813D1 DE69616813T DE69616813T DE69616813D1 DE 69616813 D1 DE69616813 D1 DE 69616813D1 DE 69616813 T DE69616813 T DE 69616813T DE 69616813 T DE69616813 T DE 69616813T DE 69616813 D1 DE69616813 D1 DE 69616813D1
- Authority
- DE
- Germany
- Prior art keywords
- halographic
- recording material
- recording
- halographic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
- C08G59/306—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing silicon
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US54012595A | 1995-10-06 | 1995-10-06 | |
PCT/US1996/015600 WO1997013183A1 (en) | 1995-10-06 | 1996-09-30 | Holographic medium and process |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69616813D1 true DE69616813D1 (de) | 2001-12-13 |
DE69616813T2 DE69616813T2 (de) | 2002-07-18 |
Family
ID=24154115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69616813T Expired - Lifetime DE69616813T2 (de) | 1995-10-06 | 1996-09-30 | Halographisches aufzeichnungsmaterial und verfahren |
Country Status (5)
Country | Link |
---|---|
US (1) | US5759721A (de) |
EP (1) | EP0853774B1 (de) |
JP (1) | JP3604700B2 (de) |
DE (1) | DE69616813T2 (de) |
WO (1) | WO1997013183A1 (de) |
Families Citing this family (111)
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US6139147A (en) * | 1998-11-20 | 2000-10-31 | Novartis Ag | Actively controllable multifocal lens |
US6139146A (en) * | 1997-12-29 | 2000-10-31 | Novartis Ag | Programmable corrective lenses |
EP1044097B1 (de) * | 1997-12-29 | 2005-11-23 | Novartis AG | Verfahren zur herstellung einer holographischen opthalmischen linse |
US5997140A (en) * | 1997-12-29 | 1999-12-07 | Novartis Ag | Actively controllable multifocal lens |
US6020985A (en) * | 1998-01-30 | 2000-02-01 | Siros Technologies, Inc. | Multilayer reflection microhologram storage in tape media |
US6212148B1 (en) | 1998-01-30 | 2001-04-03 | Siros Technologies, Inc. | Optical data storage by selective localized alteration of a format hologram |
US6147782A (en) * | 1998-05-01 | 2000-11-14 | Siros Technologies, Inc. | Positive unit magnification reflective optics for holographic storage |
US6124076A (en) | 1998-07-01 | 2000-09-26 | Lucent Technologies Inc. | Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom |
US6322933B1 (en) | 1999-01-12 | 2001-11-27 | Siros Technologies, Inc. | Volumetric track definition for data storage media used to record data by selective alteration of a format hologram |
US6512606B1 (en) | 1999-07-29 | 2003-01-28 | Siros Technologies, Inc. | Optical storage media and method for optical data storage via local changes in reflectivity of a format grating |
US6322931B1 (en) | 1999-07-29 | 2001-11-27 | Siros Technologies, Inc. | Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings |
US6310850B1 (en) | 1999-07-29 | 2001-10-30 | Siros Technologies, Inc. | Method and apparatus for optical data storage and/or retrieval by selective alteration of a holographic storage medium |
JP4132546B2 (ja) * | 2000-02-29 | 2008-08-13 | 富士フイルム株式会社 | 光拡散板、光拡散板の製造方法および表示装置 |
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EP1598699A3 (de) | 2000-05-23 | 2009-05-20 | Aprilis, Inc. | Datenspeichermedium das ein kolloidales Metall enthält und Verfahren zur Herstellung |
JP4786858B2 (ja) * | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | 封入光学素子を提供するための多光子硬化 |
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US7790353B2 (en) * | 2000-06-15 | 2010-09-07 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
DE60139620D1 (de) * | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
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TW202240286A (zh) | 2021-03-19 | 2022-10-16 | 美商元平台技術有限公司 | 記錄潛在的全像光柵及其動態範圍之擴大 |
TW202239016A (zh) | 2021-03-19 | 2022-10-01 | 美商元平台技術有限公司 | 全訊光柵中的空間變化動態範圍 |
US20220332896A1 (en) | 2021-03-31 | 2022-10-20 | Facebook Technologies, Llc | Halogenated monomers and polymers for volume bragg gratings |
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JPS60260666A (ja) * | 1984-05-16 | 1985-12-23 | メルク・パテント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 照射硬化性接着剤 |
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DE69131158T2 (de) * | 1990-11-22 | 1999-12-16 | Canon Kk | Photoempfindliches Aufzeichnungsmedium enthaltendes Volumen-Phasenhologram und Verfahren zum Herstellen von einem Volumen-Phasenhologram mit diesem Medium |
US5086192A (en) * | 1990-12-14 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions and photoinitiators therefor |
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JP2873126B2 (ja) * | 1991-04-17 | 1999-03-24 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物 |
JPH05273900A (ja) * | 1992-03-27 | 1993-10-22 | Nippon Paint Co Ltd | カラーホログラム用多層体 |
JPH06295149A (ja) * | 1993-02-09 | 1994-10-21 | Toyo Ink Mfg Co Ltd | ホログラム記録用材料並びにホログラム記録用媒体、及びそれを使用するホログラムの製造方法 |
JPH06295150A (ja) * | 1993-02-09 | 1994-10-21 | Toyo Ink Mfg Co Ltd | ホログラム記録用組成物、ホログラム記録用媒体およびそれを用いたホログラムの製造方法 |
JPH06295151A (ja) * | 1993-02-09 | 1994-10-21 | Toyo Ink Mfg Co Ltd | ホログラム記録用組成物、ホログラム記録用媒体およびそれを用いたホログラムの製造方法 |
JPH06266272A (ja) * | 1993-03-12 | 1994-09-22 | Toyo Ink Mfg Co Ltd | ホログラム記録用材料並びにホログラム記録用媒体及びそれを使用するホログラムの製造方法 |
JPH06298911A (ja) * | 1993-04-16 | 1994-10-25 | Toyo Ink Mfg Co Ltd | 感光性組成物 |
JPH06298912A (ja) * | 1993-04-16 | 1994-10-25 | Toyo Ink Mfg Co Ltd | 可視光感光性組成物 |
JPH0743901A (ja) * | 1993-07-30 | 1995-02-14 | New Oji Paper Co Ltd | 光硬化性組成物およびそれを用いたシート状光記録材料 |
-
1996
- 1996-09-30 DE DE69616813T patent/DE69616813T2/de not_active Expired - Lifetime
- 1996-09-30 JP JP51433897A patent/JP3604700B2/ja not_active Expired - Fee Related
- 1996-09-30 EP EP96933179A patent/EP0853774B1/de not_active Expired - Lifetime
- 1996-09-30 WO PCT/US1996/015600 patent/WO1997013183A1/en active IP Right Grant
- 1996-11-01 US US08/743,419 patent/US5759721A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH11512847A (ja) | 1999-11-02 |
US5759721A (en) | 1998-06-02 |
JP3604700B2 (ja) | 2004-12-22 |
DE69616813T2 (de) | 2002-07-18 |
EP0853774A1 (de) | 1998-07-22 |
WO1997013183A1 (en) | 1997-04-10 |
EP0853774B1 (de) | 2001-11-07 |
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8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: POLAROID CORP., WALTHAM, MASS., US |
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8327 | Change in the person/name/address of the patent owner |
Owner name: SENSHIN CAPITAL, LLC, WILMINGTON, DEL., US |