DE69830782D1 - Verfahren und Vorrichtung zur Korrektur des optischen Proximity-Effekts - Google Patents

Verfahren und Vorrichtung zur Korrektur des optischen Proximity-Effekts

Info

Publication number
DE69830782D1
DE69830782D1 DE69830782T DE69830782T DE69830782D1 DE 69830782 D1 DE69830782 D1 DE 69830782D1 DE 69830782 T DE69830782 T DE 69830782T DE 69830782 T DE69830782 T DE 69830782T DE 69830782 D1 DE69830782 D1 DE 69830782D1
Authority
DE
Germany
Prior art keywords
correcting
optical proximity
proximity effect
optical
effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69830782T
Other languages
English (en)
Other versions
DE69830782T2 (de
Inventor
Mario Garza
John V Jensen
Nicholas K Eib
Keith K Chao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LSI Corp
Original Assignee
LSI Logic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LSI Logic Corp filed Critical LSI Logic Corp
Publication of DE69830782D1 publication Critical patent/DE69830782D1/de
Application granted granted Critical
Publication of DE69830782T2 publication Critical patent/DE69830782T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31769—Proximity effect correction
DE69830782T 1997-12-12 1998-04-08 Verfahren und Vorrichtung zur Korrektur des optischen Proximity-Effekts Expired - Lifetime DE69830782T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US991785 1997-12-12
US08/991,785 US6269472B1 (en) 1996-02-27 1997-12-12 Optical proximity correction method and apparatus

Publications (2)

Publication Number Publication Date
DE69830782D1 true DE69830782D1 (de) 2005-08-11
DE69830782T2 DE69830782T2 (de) 2006-04-27

Family

ID=25537563

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69830782T Expired - Lifetime DE69830782T2 (de) 1997-12-12 1998-04-08 Verfahren und Vorrichtung zur Korrektur des optischen Proximity-Effekts

Country Status (4)

Country Link
US (1) US6269472B1 (de)
EP (1) EP0928012B1 (de)
JP (1) JP3001855B2 (de)
DE (1) DE69830782T2 (de)

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Also Published As

Publication number Publication date
EP0928012A3 (de) 1999-07-14
JP3001855B2 (ja) 2000-01-24
EP0928012B1 (de) 2005-07-06
EP0928012A2 (de) 1999-07-07
US6269472B1 (en) 2001-07-31
JPH11184068A (ja) 1999-07-09
DE69830782T2 (de) 2006-04-27

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