US20050030347A1 - Concentric curvilinear heater resistor - Google Patents
Concentric curvilinear heater resistor Download PDFInfo
- Publication number
- US20050030347A1 US20050030347A1 US10/637,263 US63726303A US2005030347A1 US 20050030347 A1 US20050030347 A1 US 20050030347A1 US 63726303 A US63726303 A US 63726303A US 2005030347 A1 US2005030347 A1 US 2005030347A1
- Authority
- US
- United States
- Prior art keywords
- heater resistor
- substrate
- fluid
- ink
- reservoir
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N10/00—Electric motors using thermal effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/1412—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H29/00—Switches having at least one liquid contact
- H01H2029/008—Switches having at least one liquid contact using micromechanics, e.g. micromechanical liquid contact switches or [LIMMS]
Definitions
- Vapor bubble 1420 displaces a quantity of ink 1418 in contact with concentric curvilinear heater resistor 1406 located in ink reservoir 1404 . Displaced quantity of ink 1418 moves along a displacement path through ink ejection orifice 1410 into ink ejection channel 1412 from which it is expelled in the direction of the medium onto which ink 1418 is to be printed.
Abstract
A concentric curvilinear heater resistor is disclosed. The apparatus includes a substrate with first and second electrical contacts mounted to the substrate. A concentric curvilinear resistive material is deposited on the substrate and coupled between the first and second contacts.
Description
- Heater resistors are commonly used to provide thermal actuation or heating of a fluid that is in contact with the heater resistor. By way of example, when pulsed with a voltage pulse, the surface of the heater resistor heats and transfers thermal energy to the fluid. The fluid, heated by the thermal energy provided by the heater resistor, is then activated to perform its designated function, depending on its intended purpose.
- Unfortunately, during this process, thermal energy may be lost to the circuit substrate rather than being transferred to the actuating fluid. This loss of thermal energy reduces the performance of the actuating fluid and may reduce the over-all efficiency of the circuit. Moreover, due to the uneven distribution of thermal energy at the onset of the voltage pulse and subsequent uneven dissipation of thermal energy at the conclusion of the voltage pulse, the heater resistor and its circuit substrate are subjected to varying tensile and compressive stresses which may lead to premature degradation of both.
- In one embodiment, an apparatus comprising a concentric curvilinear heater resistor is disclosed. The apparatus comprises a substrate with first and second electrical contacts mounted to the substrate. A concentric curvilinear resistive material is deposited on the substrate and coupled between the first and second contacts.
- Illustrative embodiments of the invention are illustrated in the drawings in which:
-
FIG. 1 illustrates an exemplary plan view of a ring-shaped concentric curvilinear heater resistor; -
FIG. 2 is a cross-sectional view of the ring-shaped concentric curvilinear heater resistor shown inFIG. 1 ; -
FIG. 3 is a cross-sectional view of a convex, ring-shaped concentric curvilinear heater resistor; -
FIG. 4 illustrates an exemplary plan view of an oval-shaped concentric curvilinear heater resistor; -
FIGS. 5 and 6 illustrate a thick-film method of producing the concentric curvilinear heater resistor ofFIG. 1 ; -
FIG. 7 is a cross-sectional view of a thick-film, multi-layer concentric curvilinear heater resistor; -
FIG. 8 illustrates a thin-film method of producing the concentric curvilinear heater resistor ofFIG. 1 ; -
FIG. 9 is an exemplary plan view of a first substrate for a switch; -
FIG. 10 is an exemplary plan view of a second substrate for a switch; -
FIG. 11 illustrates exemplary cross-sectional views of theFIGS. 9 and 10 substrates as they are mated to form a switch; -
FIG. 12 illustrates a first exemplary embodiment of a switch comprising a concentric curvilinear heater resistor; -
FIG. 13 illustrates a second exemplary embodiment of a switch comprising a concentric curvilinear heater resistor; and -
FIG. 14 illustrates an exemplary embodiment of an ink cartridge comprising a concentric curvilinear heater resistor. - In the liquid metal micro switch (LIMMS) field of manufacture, the expansion of actuating fluid (e.g., an inert gas or liquid) surrounding the heater resistor located inside the heater cavity provides the necessary pressure increase to cause the LIMMS device to switch. The expansion of the actuating fluid is a result of transfer of thermal energy from the heater resistor to the actuating fluid as initiated by a voltage pulse. Unfortunately, a significant amount of thermal energy produced by the typical thick-film and thin-film rectangular-shaped heater resistor is lost through heat dissipation to the circuit substrate rather than transfer to the actuating fluid itself. This loss and the amount of thermal energy transferred to the actuating fluid are directly proportional to the amount of surface area of the circuit substrate that is covered by the rectangular heater resistor and the amount of parasitic interface area between the rectangular heater resistor and the circuit substrate. Presently disclosed herein is a concentric curvilinear heater resistor that by nature of its concentricity and curvilinear shape covers a smaller surface area of the circuit substrate than the typical rectangular-shaped heater resistor, therefore providing a reduced parasitic interface and an increased surface current.
- A concentric curvilinear
heater resistor apparatus 100 is shown inFIGS. 1 and 2 .Apparatus 100 comprises asubstrate 102 having a first hole or via 200 and a second hole or via 202 mounted tosubstrate 102.Substrate 102 may be comprised of any material capable of sustaining high heat resistance such as mulite, low temperature co-fired ceramic (LTCC), aluminum nitride, alumina, silica, or glass. Mulite or LTCC or alumina are preferred in some embodiments because of their low thermal conductivities and RF electrical properties (good dielectric constant). First and second holes orvias substrate 102 while thesubstrate 102 is in a “green tape” state. Other methods of formingvias metallic paste 110 suitable for exposure to high temperatures. Themetallic paste 110 may be comprised of silver, tungsten or platinum. Tungsten is preferred in some embodiments because of its good electrical conductivity. First via 200 and second via 202 are capped above and belowsubstrate 102 with a minimallyresistive material electrical contact 104 and secondelectrical contact 106, respectively. Platinum is preferred because it is compatible with the liquid metal that it interfaces with. Aheater resistor 108 is coupled to first and secondelectrical contacts Heater resistor 108 may be deposited onsubstrate 102 by various methods, including thick-film and thin-film methods as will be described in more detail herein. - Referring to
FIGS. 1 and 2 ,heater resistor 108 is shown having a concentric, curvilinear shape. Throughout this description and every description disclosed herein, by “concentric” it is meant that theheater resistor 108 has a common center. Throughout this description and every description disclosed herein, by “curvilinear” it is meant that the shape of theheater resistor 108 is formed or enclosed by curved lines. As one example of a curvilinear shape of theheater resistor 108, a circular-shaped concentric curvilinear heater resistor is shown inFIG. 1 . A circular dome-shaped concentriccurvilinear heater resistor 302 is shown inFIG. 3 . An oval-shaped concentriccurvilinear heater resistor 402 is shown inFIG. 4 . There are several advantages to using a concentric curvilinear shape of theheater resistor 108 and in particular, with respect to the field of LIMMS manufacture. One advantage to using a curvilinear shape of theheater resistor 108 is that it can provide better thermal characteristics due to the radial direction of tension forces as compared to the axial direction of tension forces that occur in the standard rectangular design of a heater resistor. This configuration can increase the mechanical strength of the heater resistor and can reduce the likelihood of resistor cracking. Further, the curvilinear shape of theheater resistor 108 can provide higher efficiency at higher power levels and shorter pulses, since the shorter pulses will minimize the heat transfer time between the resistor material and the circuit substrate. Yet another advantage is that the curvilinear shape can contribute to the cooling of theapparatus 100 after completion of the drive pulse. That is, a faster temperature decrease occurs following the completion of the drive pulse due to the greater resistor to fluid contact area, the radial dispersion of heat to the surrounding material and consequential reduction of residual heat in thesubstrate 102 and theheater resistor 108. Still yet another advantage to using a curvilinear shape ofheater resistor 108 is that a reduction in contact (parasitic) interface between theheater resistor 108 and thesubstrate 102 can be achieved. In the case of LIMMS manufacture, this reduction in contact (parasitic) interface allows for a higher concentration of surface current flow through theheater resistor 108, which enables the curvilinearheater resistor apparatus 100 to reach the peak temperature needed for switching with less power, when compared to the conventional rectangular heater resistor. This, in turn, provides heat relief to the entire LIMMS switch system and increased strength, reliability and life-cycle times of the switch. - Referring to
FIGS. 1, 2 , and 5-7, a thick-film method of producing a concentric curvilinear heater resistor will now be described. Referring toFIG. 5 ,substrate 102 may be comprised of any material capable of sustaining high heat resistance such as mulite, LTCC, aluminum nitride, alumina, silica and glass. Mulite or LTCC or alumina are preferred in some embodiments because of their low thermal conductivities and RF electrical properties (good dielectric constant). First and secondelectrical contacts substrate 102. The first and second holes orvias substrate 102 while thesubstrate 102 is in a “green tape” state. First via 200 and second via 202 are filled with ametallic paste 110 suitable for exposure to high temperatures. Themetallic paste 110 may be comprised of silver, tungsten or platinum. Tungsten is preferred in some embodiments because of its good electrical conductivity. First via 200 and second via 202 are capped above and belowsubstrate 102 with a minimallyresistive material FIG. 6 , apatterned screen 600 capable of printing a desired shape ofheater resistor 108, in this case a concentric curvilinear shape, is then deposited onsubstrate 102.Heater resistor 108 is next deposited through thescreen 600 such that when thescreen 600 is removed, a patterned shape, in this case a concentric curvilinear shape, ofheater resistor 108 remains on thesubstrate 102.Heater resistor 108 comprises a thick-film resistive material such as platinum, a mixture of platinum, palladium and silver, gold, or a DuPont™-1700 series thick-film. Platinum is preferred in some embodiments because it is compatible with the liquid metal that it interfaces with. A particular degree of resistance of theheater resistor 108 may be achieved by sizing the thickness of theheater resistor 108 printed on thesubstrate 102 in consideration with the amount of surface area on thesubstrate 102 to be covered. Lastly, thesubstrate 102, now including the printed thick-film heater resistor 108, is baked or “fired” at a high temperature of about 850° C. Referring toFIG. 7 , the concentriccurvilinear heater resistor 702 may comprise multiple thick-film layers by printing one layer of theheater resistor 702 on thesubstrate 102 and then drying it, and then printing and drying successive layers before ultimately baking or “firing” all of the layers at a high temperature (e.g., 850° C.). - A thin-film method of producing a concentric curvilinear heater resistor will now be described. As shown in
FIGS. 1, 2 and 8, asubstrate 102 is provided.Substrate 102 may comprise mulite, LTCC, aluminum nitride, alumina, silica and glass. Mulite or LTCC are preferred in some embodiments because of their low thermal conductivities and RF electrical properties (good dielectric constant). First via 200 and second via 202 are filled with ametallic paste 110 suitable for exposure to high temperatures. Themetallic paste 110 may be comprised of silver, tungsten or platinum. Tungsten is preferred in some embodiments because of its good electrical conductivity. First via 200 and second via 202 are capped above and belowsubstrate 102 with a minimallyresistive material heater resistor 108 is deposited according to the thin-film process as briefly described herein. Referring toFIG. 8 , a photo-resist 800 is deposited onsubstrate 102 by placing a patterned mask (not shown) onsubstrate 102 and providing light-source exposure (not shown) to the mask. Unwanted portions of the mask are removed through light-source exposure, leaving the photo-resist 800. The photo-resist 800 is then hard-baked to prepare for deposition ofheater resistor 108. Heater resistor 108 (not shown inFIG. 8 ) may be deposited onsubstrate 102 and the photo-resist 800 by sputtering or evaporation techniques, after which the remaining portions of the photo-resist 800 are removed. The thickness of the depositedheater resistor 108 may be on the order of approximately a few thousand Angstroms. Theheater resistor 108 may comprise tantalum nitride, platinum or tungsten. Tantalum nitride is preferred in some embodiments because of its superior thermal response characteristic and high-temperature durability. - Given that fluid-based switch manufacture, including the manufacture of liquid metal micro switches (LIMMS), is one potential and intended application for the concentric curvilinear heater resistor of
FIGS. 1-8 , some exemplary fluid-based switches comprising the concentric curvilinear heater resistor will now be described. -
FIG. 12 illustrates a first exemplary embodiment of aswitch 1200. Referring toFIG. 12 , theswitch 1200 comprises afirst substrate 900 as shown inFIG. 9 and asecond substrate 1050 as shown inFIG. 10 and when mated together as shown inFIG. 11 thefirst substrate 900 and thesecond substrate 1050 comprise a number of reservoirs orcavities FIG. 10 , a first concentriccurvilinear heater resistor 1000 is deposited on asecond substrate 1050 comprising a firstelectrical contact 1004 and a secondelectrical contact 1006. First concentriccurvilinear resistor 1000 is coupled between first and secondelectrical contacts FIG. 11 , first concentriccurvilinear heater resistor 1000 is located at a position onsecond substrate 1050 such that whenfirst substrate 900 andsecond substrate 1050 are coupled, first concentriccurvilinear heater resistor 1000 fits withincavity 902 offirst substrate 900. A similar configuration between a second concentriccurvilinear heater resistor 1002,second substrate 1050, and third and fourthelectrical contacts second substrate 1050 such that whenfirst substrate 900 andsecond substrate 1050 are coupled, second concentriccurvilinear heater resistor 1002 fits withincavity 906 offirst substrate 900. - Referring to
FIG. 12 , exposed withincavity 904 are a plurality ofelectrodes fluid 1210. An actuating fluid 1212 (e.g., an inert gas or liquid) held within one or more of the cavities serves to apply the forces to the switchingfluid 1210. In the embodiment shown inFIG. 12 ,actuating fluid 1212 is located incavities - In one embodiment of the
switch 1200, the forces applied to the switchingfluid 1210 result from pressure changes in theactuating fluid 1212. The pressure changes in theactuating fluid 1212 impart pressure changes to the switchingfluid 1210, and thereby cause the switching fluid 1210 to change form, move, part, etc. InFIG. 12 , the pressure of theactuating fluid 1212 held in actuatingfluid cavity 902 applies a force to part the switching fluid 1210 as illustrated. In this state, the rightmost pair ofelectrodes switch 1200 is coupled to one another. If the pressure of theactuating fluid 1212 held incavity 902 is relieved, and the pressure of theactuating fluid 1212 held incavity 904 is increased, the switching fluid 1210 can be forced to part and merge so thatelectrodes electrodes - By way of example, pressure changes in the
actuating fluid 1212 may be achieved by means of heating theactuating fluid 1212 with theheater resistors - Additional details concerning the construction and operation of a switch such as that which is illustrated in
FIG. 12 may be found in the aforementioned patent of Kondoh, et al. and patent application of Marvin Wong. -
FIG. 13 illustrates a second exemplary embodiment of aswitch 1300. Theswitch 1300 comprises afirst substrate 1302 and asecond substrate 1304 mated together. Thesubstrates cavities wettable pads pads fluid 1318 serves to open and blocklight paths 1320/1322, 1324/1326 through one or more of the cavities, in response to forces that are applied to the switchingfluid 1318. By way of example, the light paths may be defined bywaveguides 1320/1322, 1324/1326 that are aligned with translucent windows in thecavity 1308 holding the switchingfluid 1318. Blocking of thelight paths 1320/1322, 1324/1326 may be achieved by virtue of the switching fluid 1318 being opaque. An actuating fluid 1328 (e.g., an inert gas or liquid) held within one or more of the cavities serves to apply the forces to the switchingfluid 1318. - A thin-film first concentric
curvilinear heater resistor 1330 is deposited on asecond substrate 1304. First concentriccurvilinear heater resistor 1330 is coupled between a firstelectrical contact 1332 and a secondelectrical contact 1334. The first concentriccurvilinear heater resistor 1330 is located withincavity 1306. A similar configuration between a thin-film second concentriccurvilinear heater resistor 1336,second substrate 1304, and a thirdelectrical contact 1338 and a fourthelectrical contact 1340 is located at a position onsecond substrate 1304 such that whenfirst substrate 1302 andsecond substrate 1304 are coupled, secondcurvilinear heater resistor 1336 fits withincavity 1310. - Forces may be applied to the switching and
actuating fluids actuating fluids FIG. 12 . By depositing thin-film concentriccurvilinear heater resistors curvilinear heater resistors second substrate 1304 is reduced thereby decreasing the amount of thermal energy lost to thesubstrate 1304 and consequently, transferring more thermal energy to theactuating fluid 1328. - As mentioned elsewhere in the description, concentric curvilinear heater resistors as described herein may be implemented in other technologies besides LIMMS wherein a thermal actuator or situation wherein a heater resistor heats a fluid is required. One such technology is the thermal ink jet technology.
- Referring to
FIG. 14 , a cross-sectional view of anink cartridge apparatus 1400 comprising a plurality ofink reservoirs 1404 and a plurality of concentriccurvilinear heater resistors 1406 for ejecting ink are shown. Within an outer nozzle plate are mounted a plurality ofink reservoirs 1404 comprising ahousing 1408 with an opening orink jet orifice 1410. Operatively connected to theink ejection orifice 1410 is anink ejection channel 1412. A firstelectrical contact 1414 and a secondelectrical contact 1416 are mounted within eachink reservoir 1404. A concentriccurvilinear heater resistor 1406 is coupled to each firstelectrical contact 1414 and each secondelectrical contact 1416 within eachink reservoir 1404. As shown inFIG. 14 , the concentriccurvilinear heater resistor 1406 may be mounted on asubstrate 1402 over whichhousing 1408 may be placed to form anink reservoir 1404. Alternately, the concentriccurvilinear heater resistor 1406 might be mounted to an interior wall ofhousing 1408 beforehousing 1408 is sealed tosubstrate 1402, or elsewhere within theink reservoir 1404. Each concentriccurvilinear heater resistor 1406 is surrounded by a quantity ofink 1418 located in eachink reservoir 1404. When concentriccurvilinear heater resistor 1406 is heated, avapor bubble 1420 forms withinink reservoir 1404.Vapor bubble 1420 displaces a quantity ofink 1418 in contact with concentriccurvilinear heater resistor 1406 located inink reservoir 1404. Displaced quantity ofink 1418 moves along a displacement path throughink ejection orifice 1410 intoink ejection channel 1412 from which it is expelled in the direction of the medium onto whichink 1418 is to be printed. - While illustrative and presently preferred embodiments of the invention have been described in detail herein, it is to be understood that the inventive concepts may be otherwise variously embodied and employed, and that the appended claims are intended to be construed to include such variations, except as limited by the prior art.
Claims (19)
1. An apparatus comprising:
a substrate;
first and second electrical contacts mounted to the substrate; and
a concentric curvilinear heater resistor coupled to the first and second electrical contacts.
2. The apparatus of claim 1 , further comprising:
a) a reservoir, the heater resistor presenting within the reservoir; and
b) a fluid, held within the reservoir and in contact with the heater resistor.
3. The apparatus of claim 2 , wherein the fluid is ink.
4. The apparatus of claim 3 , further comprising a nozzle to eject said ink from said reservoir, the heater resistor being positioned near the nozzle.
5. The apparatus of claim 2 , wherein the fluid is an actuating fluid for a switch.
6. The apparatus of claim 1 , wherein the heater resistor forms a ring.
7. The apparatus of claim 1 , wherein the heater resistor forms an oval.
8. The apparatus of claim 1 , wherein the heater resistor has a domed cross-section.
9. The apparatus of claim 2 , wherein the fluid is of a type that expands when heated.
10. The apparatus of claim 1 , wherein the heater resistor is a thick-film resistive material.
11. The apparatus of claim 1 , wherein the heater resistor is a thin-film resistive material.
12. The apparatus of claim 1 , wherein the heater resistor comprises multiple thick-film layers.
13 The apparatus of claim 1 , wherein the substrate comprises mulite.
14. The apparatus of claim 1 , wherein the substrate comprises a low temperature co-fired ceramic.
15. The apparatus of claim 1 , wherein the heater resistor comprises platinum.
16. The apparatus of claim 1 , wherein the heater resistor comprises tantalum nitride.
17. A switch comprising:
first and second mated substrates defining there between at least portions of a number of cavities;
a switching fluid, held within one or more of the cavities, that is moveable between at least first and second switch states in response to forces that are applied to the switching fluid;
an actuating fluid, held within one or more of the cavities, that applies said forces to said switching fluid; and
a concentric curvilinear heater resistor, deposited on the second substrate, and coupling first and second electrical contacts supported by the second substrate.
18. An ink cartridge, comprising:
an ink reservoir comprising an ink ejection orifice and an ink ejection channel;
first and second electrical contacts mounted to the ink reservoir; and
a concentric curvilinear heater resistor coupled to said first and second electrical contacts interior to the ink reservoir.
19. The ink cartridge of claim 18 , wherein the heater resistor is mounted near the ink ejection channel.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/637,263 US20050030347A1 (en) | 2003-08-08 | 2003-08-08 | Concentric curvilinear heater resistor |
TW093104970A TWI244351B (en) | 2003-08-08 | 2004-02-26 | Concentric curvilinear heater resistor |
US11/323,842 US7119294B2 (en) | 2003-08-08 | 2005-12-29 | Switch with concentric curvilinear heater resistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/637,263 US20050030347A1 (en) | 2003-08-08 | 2003-08-08 | Concentric curvilinear heater resistor |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US11/323,842 Division US7119294B2 (en) | 2003-08-08 | 2005-12-29 | Switch with concentric curvilinear heater resistor |
Publications (1)
Publication Number | Publication Date |
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US20050030347A1 true US20050030347A1 (en) | 2005-02-10 |
Family
ID=34116566
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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US10/637,263 Abandoned US20050030347A1 (en) | 2003-08-08 | 2003-08-08 | Concentric curvilinear heater resistor |
US11/323,842 Expired - Fee Related US7119294B2 (en) | 2003-08-08 | 2005-12-29 | Switch with concentric curvilinear heater resistor |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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US11/323,842 Expired - Fee Related US7119294B2 (en) | 2003-08-08 | 2005-12-29 | Switch with concentric curvilinear heater resistor |
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US (2) | US20050030347A1 (en) |
TW (1) | TWI244351B (en) |
Cited By (6)
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US20060220478A1 (en) * | 2005-04-01 | 2006-10-05 | Canon Kabushiki Kaisha | Positioning system and linear motor |
US20070217471A1 (en) * | 2006-03-20 | 2007-09-20 | Nlight Photonics Corporation | Laser diode stack utilizing a non-conductive submount |
US20070217469A1 (en) * | 2006-03-20 | 2007-09-20 | Nlight Photonics Corporation | Laser diode stack side-pumped solid state laser |
US20080239007A1 (en) * | 2007-03-30 | 2008-10-02 | Canon Kabushiki Kaisha | Print head |
US20090115565A1 (en) * | 2007-11-02 | 2009-05-07 | Yokogawa Electric Corporation | Liquid metal relay |
US10464236B2 (en) * | 2013-07-03 | 2019-11-05 | watttron GmbH | Device for heating preform bodies or flat or preformed semi-finished products from thermoplastic material |
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Cited By (10)
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US10464236B2 (en) * | 2013-07-03 | 2019-11-05 | watttron GmbH | Device for heating preform bodies or flat or preformed semi-finished products from thermoplastic material |
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Publication number | Publication date |
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US20060109317A1 (en) | 2006-05-25 |
US7119294B2 (en) | 2006-10-10 |
TW200507683A (en) | 2005-02-16 |
TWI244351B (en) | 2005-11-21 |
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