US20090154873A1 - Electro-optic integrated circuits with connectors and methods for the production thereof - Google Patents
Electro-optic integrated circuits with connectors and methods for the production thereof Download PDFInfo
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- US20090154873A1 US20090154873A1 US12/357,363 US35736309A US2009154873A1 US 20090154873 A1 US20090154873 A1 US 20090154873A1 US 35736309 A US35736309 A US 35736309A US 2009154873 A1 US2009154873 A1 US 2009154873A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4246—Bidirectionally operating package structures
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/2804—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals forming multipart couplers without wavelength selective elements, e.g. "T" couplers, star couplers
- G02B6/2852—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals forming multipart couplers without wavelength selective elements, e.g. "T" couplers, star couplers using tapping light guides arranged sidewardly, e.g. in a non-parallel relationship with respect to the bus light guides (light extraction or launching through cladding, with or without surface discontinuities, bent structures)
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/36—Mechanical coupling means
- G02B6/3628—Mechanical coupling means for mounting fibres to supporting carriers
- G02B6/3632—Mechanical coupling means for mounting fibres to supporting carriers characterised by the cross-sectional shape of the mechanical coupling means
- G02B6/3636—Mechanical coupling means for mounting fibres to supporting carriers characterised by the cross-sectional shape of the mechanical coupling means the mechanical coupling means being grooves
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/36—Mechanical coupling means
- G02B6/3628—Mechanical coupling means for mounting fibres to supporting carriers
- G02B6/3648—Supporting carriers of a microbench type, i.e. with micromachined additional mechanical structures
- G02B6/3652—Supporting carriers of a microbench type, i.e. with micromachined additional mechanical structures the additional structures being prepositioning mounting areas, allowing only movement in one dimension, e.g. grooves, trenches or vias in the microbench surface, i.e. self aligning supporting carriers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/36—Mechanical coupling means
- G02B6/3628—Mechanical coupling means for mounting fibres to supporting carriers
- G02B6/3684—Mechanical coupling means for mounting fibres to supporting carriers characterised by the manufacturing process of surface profiling of the supporting carrier
- G02B6/3692—Mechanical coupling means for mounting fibres to supporting carriers characterised by the manufacturing process of surface profiling of the supporting carrier with surface micromachining involving etching, e.g. wet or dry etching steps
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/36—Mechanical coupling means
- G02B6/38—Mechanical coupling means having fibre to fibre mating means
- G02B6/3807—Dismountable connectors, i.e. comprising plugs
- G02B6/3873—Connectors using guide surfaces for aligning ferrule ends, e.g. tubes, sleeves, V-grooves, rods, pins, balls
- G02B6/3885—Multicore or multichannel optical connectors, i.e. one single ferrule containing more than one fibre, e.g. ribbon type
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H01—ELECTRIC ELEMENTS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15788—Glasses, e.g. amorphous oxides, nitrides or fluorides
Definitions
- the present invention relates to electro-optic integrated circuits and methods for the production thereof generally and more particularly to wafer level manufacture of chip level electro-optic integrated circuits.
- a transceiver incorporating a connector is known in the art as shown in product descriptions for OptoCube 40 3.35 Gb/s Channel Speed 850 nm Receiver Array 12 Channel Parallel Optical Receivers and OptoCube 40 3.35 Gb/s Channel Speed 850 nm VCSEL Array 12 Channel Parallel Optical Transmitters from Corona Optical Systems, Inc. 450 Eisenhower Lane North, Lombardi, Ill., 60418, USA.
- the present invention seeks to provide improved electro-optic integrated circuits and methods for production thereof.
- an electro-optic integrated circuit including an integrated circuit substrate, at least one optical signal providing element and at least one discrete reflecting optical element, mounted onto the integrated circuit substrate, cooperating with the at least one optical signal providing element and being operative to direct light from the at least one optical signal providing element.
- an electro-optic integrated circuit including an integrated circuit substrate, at least one optical signal receiving element and at least one discrete reflecting optical element mounted onto the integrated circuit substrate and cooperating with the at least one optical signal receiving element and being operative to direct light to the at least one optical signal receiving element.
- an electro-optic integrated circuit including an integrated circuit substrate defining a planar surface, at least one optical signal providing element and at least one reflecting optical element having an optical axis which is neither parallel nor perpendicular to the planar surface, the element cooperating with the at least one optical signal providing element and being operative to direct light from the at least one optical signal providing element.
- an electro-optic integrated circuit including an integrated circuit substrate defining a planar surface, at least one optical signal receiving element and at least one reflecting optical element having an optical axis which is neither parallel nor perpendicular to the planar surface, the element cooperating with the at least one optical signal receiving element and being operative to direct light to the at least one optical signal receiving element.
- a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate, mounting at least one optical signal providing element onto the integrated circuit substrate, mounting at least one optical signal receiving element onto the integrated circuit substrate and providing optical alignment, between the at least one optical signal providing element and the at least one optical signal receiving element, subsequent to mounting thereof, by suitable positioning along an optical path extending therebetween, an intermediate optical element and fixing the intermediate optical element to the integrated circuit substrate.
- the intermediate optical element when fixed to the substrate, has an optical axis which is neither parallel nor perpendicular to a planar surface of the integrated circuit substrate.
- a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate, mounting at least one optical signal providing element on the integrated circuit substrate and mounting at least one discrete reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal providing element and to direct light from the at least one optical signal providing element.
- a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate, mounting at least one optical signal receiving element on the integrated circuit substrate and mounting at least one discrete reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal receiving element and to direct light to the at least one optical signal receiving element.
- a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate defining a planar surface, mounting at least one optical signal providing element on the integrated circuit substrate and mounting at least one reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal providing element and to direct light from the at least one optical signal providing element, wherein an optical axis of the at least one reflecting optical element is neither parallel nor perpendicular to the planar surface.
- a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate defining a planar surface, mounting at least one optical signal receiving element on the integrated circuit substrate and mounting at least one reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal receiving element and to direct light to the at least one optical signal receiving element, wherein an optical axis of the at least one reflecting optical element is neither parallel nor perpendicular to the planar surface.
- the at least one optical element includes a flat reflective surface. Additionally, the at least one optical element includes a concave mirror. Alternatively, the at least one optical element includes a partially flat and partially concave mirror. Additionally, the partially concave mirror includes a mirror with multiple concave reflective surfaces.
- the at least one optical element includes a reflective grating. Additionally, the at least one optical element includes reflective elements formed on opposite surfaces of an optical substrate. Preferably, at least one of the reflective elements includes a flat reflective surface. Alternatively, at least one of the reflective elements includes a concave mirror. Alternatively or additionally, at least one of the reflective elements includes a partially flat and partially concave mirror. Additionally, the mirror includes a mirror with multiple concave reflective surfaces. Alternatively, at least one of the reflective elements includes a reflective grating.
- the at least one optical element is operative to focus light received from the optical signal providing element.
- the at least one optical element is operative to collimate light received from the optical signal providing element.
- the at least one optical element is operative to focus at least one of multiple colors of light received from the optical signal providing element.
- the at least one optical element is operative to collimate at least one of multiple colors of light received from the optical signal providing element.
- the at least one optical element is operative to enhance the optical properties of light received from the optical signal providing element.
- the optical signal providing element includes an optical fiber.
- the optical signal providing element includes a laser diode.
- the optical signal providing element includes a waveguide.
- the optical signal providing element includes an array waveguide grating.
- the optical signal providing element includes a semiconductor optical amplifier.
- the optical signal providing element is operative to convert an electrical signal to an optical signal.
- the optical signal providing element is operative to transmit an optical signal.
- the optical signal providing element also includes an optical signal receiving element.
- the optical signal providing element is operative to generate an optical signal.
- the integrated circuit substrate includes gallium arsenide.
- the integrated circuit substrate includes indium phosphide.
- the integrated circuit includes at least one optical signal providing element and at least one optical element receiving element, the at least one discrete reflecting optical element cooperating with the at least one optical signal providing element and the at least one optical signal receiving element and being operative to direct light from the at least one signal providing element to the at least one optical signal receiving element.
- the at least one optical signal receiving element includes an optical fiber.
- the at least one optical signal receiving element includes a laser diode.
- the at least one optical signal receiving element includes a diode detector.
- the at least one optical signal receiving element is operative to convert an optical signal to an electrical signal. Additionally, the at least one optical signal receiving element is operative to transmit an optical signal. Alternatively, the at least one optical signal receiving element also includes an optical signal providing element.
- the at least one reflecting optical element is operative to focus light received by the optical signal receiving element.
- the at least one reflecting optical element is operative to collimate light received by the optical signal receiving element.
- the at least one reflecting optical element is operative to focus at least one of multiple colors of light received by the optical signal receiving element.
- the at least one reflecting optical element is operative to collimate at least one of multiple colors of light received by the optical signal receiving element.
- the at least one reflecting optical element is operative to enhance the optical properties of light received by the optical signal receiving element.
- an integrated circuit including a first integrated circuit substrate having first electrical circuitry formed thereon and having formed therein at least one recess and at least one second integrated circuit substrate having second electrical circuitry formed thereon, the at least one second integrated circuit substrate being located at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- a method for producing an integrated circuit including providing a first integrated circuit substrate, with first and second planar surfaces, forming first electrical circuitry on the first planar surface, forming at least one recess in the second planar surface, providing at least one second integrated circuit substrate, forming second electrical circuitry on the at least one second integrated circuit substrate and locating the at least one second integrated circuit substrate at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- a method for producing an integrated circuit including providing a first integrated circuit substrate, forming first electrical circuitry on the first substrate, forming at least one recess in the first substrate, providing at least one second integrated circuit substrate, forming second electrical circuitry on the at least one second integrated circuit substrate and locating the at least one second integrated circuit substrate at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- an integrated circuit including a first integrated circuit substrate having first and second planar surfaces, the first planar surface having first electrical circuitry formed thereon and the second planar surface having formed therein at least one recess and at least one second substrate, the at least one second substrate being located at least partially in the at least one recess, the second substrate containing at least one element communicating with the first electrical circuitry.
- an integrated circuit including a first integrated circuit substrate, having electrical circuitry formed thereon and having formed therein at least one recess and at least one second substrate, the at least one second substrate being located at least partially in the at least one recess, the second substrate containing at least one element communicating with the electrical circuitry.
- a method for producing an integrated circuit including providing a first integrated circuit substrate, with first and second planar surfaces, forming first electrical circuitry on the first planar surface, forming at least one recess in the second planar surface, providing at least one second substrate and locating the at least one second substrate at least partially in the at least one recess, the second substrate containing at least one element communicating with the first electrical circuitry.
- an integrated circuit including a silicon integrated circuit substrate having electrical signal processing circuitry formed thereon and at least one discrete optical element mounted thereon, the electrical signal processing circuitry including an electrical signal input and an electrical signal output and the at least one discrete optical element including an optical input and an optical output.
- At least one of the plurality of optical elements includes a flat reflective surface. Additionally, at least one of the plurality of optical elements includes a concave mirror. Additionally or alternatively, at least one of the plurality of optical elements includes a partially flat and partially concave mirror. Alternatively, at least one of the plurality of optical elements includes a mirror with multiple concave reflective surfaces. Additionally or alternatively, at least one of the plurality of optical elements includes a reflective grating. Additionally, at least one of the plurality of optical elements includes reflective elements formed on opposite surfaces of an optical substrate.
- At least one of the plurality of optical elements includes an optical fiber.
- at least one of the plurality of optical elements includes a laser diode.
- at least one of the plurality of optical elements includes a diode detector.
- the first reflective surface is also formed over at least a portion of the surface of the optical substrate.
- at least a portion of the first reflective surface includes a grating.
- the first reflective surface includes aluminum.
- the optical reflector also includes at least one second reflective surface formed on at least a portion of an opposite surface of the substrate. Additionally, at least a portion of the second reflective surface includes a grating. Preferably, the second reflective surface includes aluminum.
- the optical reflector also includes a notch formed in the opposite surface of the substrate.
- the at least one microlens includes photoresist.
- the at least one microlens is formed by photolithography and thermal reflex forming.
- the at least one microlens is formed by photolithography using a grey scale mask forming.
- the at least one microlens is formed by jet printing formation.
- the at least one microlens has an index of refraction which is identical to that of the optical substrate.
- the at least one microlens has an index of refraction which closely approximates that of the optical substrate.
- a packaged electro-optic circuit having integrally formed therein an optical connector and electrical connections.
- a method for wafer scale production of an electro-optic circuit having integrally formed therein an optical connector and electrical connections including wafer scale formation of a multiplicity of electro-optic circuits onto a substrate, wafer scale provision of at least one optical waveguide on the substrate, wafer scale mounting of at least one integrated circuit component onto the substrate, wafer scale formation of at least one optical pathway providing an optical connection between the at least one integrated circuit component and the at least one optical waveguide, wafer scale formation of at least one mechanical connector guide on the substrate, wafer scale formation of at least one packaging layer over at least one surface of the substrate, and thereafter, dicing the substrate to define a multiplicity of electro-optic circuits, each having integrally formed therein an optical connector.
- the at least one optical fiber defines a connector interface.
- a method of mounting an integrated circuit onto an electrical circuit including forming an integrated circuit with a multiplicity of electrical connection pads which generally lie along a surface of the integrated circuit, forming an electrical circuit with a multiplicity of electrical connection contacts which generally protrude from a surface of the electrical circuit and employing at least a conductive adhesive to electrically and mechanically join the multiplicity of electrical connection pads to the multiplicity of electrical connection contacts.
- the method also includes providing an underfill layer.
- FIGS. 1A , 1 B, 1 C, 1 D and 1 E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with a preferred embodiment of the present invention
- FIGS. 2A , 2 B, 2 C, and 2 D are simplified sectional illustrations of further stages in the production of the electro-optic integrated circuit referenced in FIGS. 1A-1E ;
- FIG. 3 is an enlarged simplified optical illustration of a portion of FIG. 2D ;
- FIGS. 4A , 4 B, 4 C, 4 D and 4 E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with another preferred embodiment of the present invention.
- FIGS. 5A , 5 B, 5 C and 5 D are simplified sectional illustrations of further stages in the production of the electro-optic integrated circuit referenced in FIGS. 4A-4E ;
- FIGS. 6A , 6 B and 6 C are enlarged simplified optical illustrations of a portion of FIG. 5D in accordance with preferred embodiments of the present invention.
- FIG. 7 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- FIGS. 8A , 8 B and 8 C are enlarged simplified optical illustrations of a portion of FIG. 7 in accordance with other embodiments of the present invention.
- FIGS. 9A , 9 B, 9 C, 9 D and 9 E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- FIGS. 10A , 10 B, 10 C and 10 D are simplified sectional illustrations of further stages in the production of the electro-optic integrated circuit referenced in FIGS. 9A-9E ;
- FIGS. 11A , 11 B and 11 C are enlarged simplified optical illustrations of a portion of FIG. 10D in accordance with preferred embodiments of the present invention.
- FIG. 12 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- FIGS. 13A , 13 B and 13 C are enlarged simplified optical illustrations of a portion of FIG. 12 in accordance with further preferred embodiments of the present invention.
- FIGS. 14A , 14 B, 14 C and 14 D are simplified sectional illustrations of stages in the production an electro-optic integrated circuit in accordance with another embodiment of the present invention.
- FIGS. 15A , 15 B and 15 C are simplified optical illustrations of FIG. 14D in accordance with preferred embodiments of the present invention.
- FIG. 16 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- FIGS. 17A , 17 B and 17 C are enlarged simplified optical illustrations of a portion of FIG. 16 in accordance with further embodiments of the present invention.
- FIGS. 18A , 18 B, 18 C and 18 D are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 4A-6C in accordance with one embodiment of the present invention
- FIGS. 19A , 19 B, 19 C, 19 D and 19 E are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-6C in accordance with another embodiment of the present invention.
- FIGS. 20A , 20 B, 20 C, 20 D, 20 E and 20 F are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 9A-17C in accordance with yet another embodiment of the present invention.
- FIGS. 21A , 21 B, 21 C, 21 D, 21 E and 21 F are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-17C in accordance with still another embodiment of the present invention.
- FIGS. 22A , 22 B, 22 C, 22 D, 22 E, 22 F and 22 G are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-8C in accordance with a further embodiment of the present invention
- FIGS. 23A , 23 B, 23 C, 23 D, 23 E, 23 F and 23 G are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 9A-17C in accordance with yet a further embodiment of the present invention.
- FIGS. 24A , 24 B, 24 C, 24 D, 24 E, 24 F and 24 G are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-17C in accordance with a still further embodiment of the present invention
- FIGS. 25A , 25 B, 25 C and 25 D are simplified illustrations of multiple stages in the production of a multi-chip module in accordance with a preferred embodiment of the present invention.
- FIG. 26 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including a laser light source;
- FIG. 27 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including an optical detector;
- FIG. 28 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including an electrical element;
- FIG. 29 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including multiple elements located in multiple recesses formed within a substrate;
- FIG. 30 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including multiple stacked elements located in recesses formed within substrates;
- FIGS. 31A , 31 B, 31 C and 31 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention
- FIG. 32 is an enlarged simplified optical illustration of a portion of FIG. 31D ;
- FIGS. 33A , 33 B, 33 C and 33 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention.
- FIG. 34 is an enlarged simplified optical illustration of a portion of FIG. 33D ;
- FIGS. 35A , 35 B, 35 C and 35 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention.
- FIG. 36 is an enlarged simplified optical illustration of a portion of FIG. 35D ;
- FIGS. 37A , 37 B, 37 C and 37 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention.
- FIG. 38 is an enlarged simplified optical illustration of a portion of FIG. 37D ;
- FIGS. 39A , 39 B, 39 C and 39 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with yet another preferred embodiment of the present invention.
- FIG. 40 is a simplified optical illustration of FIG. 39D ;
- FIGS. 41A , 41 B, 41 C and 41 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with still another preferred embodiment of the present invention.
- FIG. 42 is a simplified optical illustration of FIG. 41D ;
- FIG. 43 is a simplified optical illustration of optical communication between connectors of the types shown in FIGS. 40 and 42 ;
- FIG. 44 is a simplified optical illustration of optical communication between two connectors of the type shown in FIG. 40 ;
- FIG. 45 is a simplified optical illustration of optical communication between two connectors of the type shown in FIG. 42 ;
- FIGS. 46A , 46 B, 46 C and 46 D are simplified illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention.
- FIG. 47 is an enlarged simplified optical illustration of a portion of FIG. 46D ;
- FIG. 48 is a simplified optical illustration of optical communication between an electro-optic integrated circuit and an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention.
- FIG. 49 is a simplified optical illustration of optical communication between an optic integrated circuit and an electro-optic integrated circuit in accordance with a preferred embodiment of the present invention.
- FIGS. 50A , 50 B, 50 C, 50 D and 50 E are simplified pictorial illustrations of stages in the production of an electro-optic integrated circuit constructed and operative in accordance with still another preferred embodiment of the present invention.
- FIG. 51 is a simplified functional illustration of a preferred embodiment of the structure of FIG. 50E ;
- FIGS. 52A and 52B are simplified pictorial illustrations of a packaged electro-optic circuit having integrally formed therein an optical connector and electrical connections, alone and in conjunction with a conventional optical connector;
- FIGS. 53A-53F are simplified pictorial and sectional illustrations of a first plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B ;
- FIGS. 54A-54J are simplified pictorial and sectional illustrations of a second plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B ;
- FIGS. 55A-55D are simplified pictorial and sectional illustrations of a third plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B ;
- FIGS. 56A , 56 B and 56 C are enlarged simplified optical illustrations of a portion of FIG. 55D in accordance with various preferred embodiments of the present invention.
- FIG. 57 is a simplified sectional illustration of an electro-optic circuit constructed and operative in accordance with another preferred embodiment of the present invention.
- FIGS. 58A , 58 B and 58 C are enlarged simplified optical illustrations of a portion of FIG. 57 in accordance with various other preferred embodiments of the present invention.
- FIG. 59 is a simplified pictorial illustration corresponding to sectional illustration 55 D;
- FIGS. 60A-60F are simplified pictorial and sectional illustrations of a fourth plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B ;
- FIG. 61 is a simplified illustration of incorporation of packaged electro-optic circuits of the type shown in FIGS. 52A-52B as parts of a larger electrical circuit.
- FIGS. 1A , 1 B, 1 C, 1 D and 1 E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with a preferred embodiment of the present invention.
- one or more electrical circuits 100 are preferably formed onto a first surface 102 of a substrate 104 , preferably a silicon substrate or a substrate that is generally transparent to light within at least part of the wavelength range of 600-1650 nm, typically of thickness between 200-800 microns.
- the electrical circuits 100 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits, and included within a planarized layer 105 formed onto substrate 104 .
- the substrate preferably is then turned over, as indicated by an arrow 106 , and one or more electrical circuits 108 are formed on an opposite surface 110 of substrate 104 , as shown in FIG. 1B .
- an array of parallel, spaced, elongate optical fiber positioning elements 112 is preferably formed, such as by conventional photolithographic techniques, over a planarized layer 114 including electrical circuits 108 ( FIG. 1B ).
- an array of optical fibers 116 is disposed over layer 114 , each fiber being positioned between adjacent positioning elements 112 .
- the fibers are fixed in place relative to positioning elements 112 and to layer 114 of substrate 104 by means of a suitable adhesive 118 , preferably epoxy, as seen in FIG. 1E .
- FIGS. 2A , 2 B, 2 C, and 2 D are simplified sectional illustrations, taken along the lines II-II in FIG. 1E , of further stages in the production of an electro-optic integrated circuit.
- electro-optic components 120 such as diode lasers, are mounted onto electrical circuit 100 (not shown), included within planarized layer 105 .
- electro-optic components 120 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- a transverse notch 124 is preferably formed, at least partially overlapping the locations of the electro-optic components 120 and extending through the adhesive 118 and partially through each optical fiber 116 .
- the notch 124 extends through part of the cladding 126 of each fiber 116 and entirely through the core 128 of each fiber. It is appreciated that the surfaces defined by the notch 124 are relatively rough, as shown.
- a mirror 130 is preferably mounted parallel to one of the rough inclined surfaces 132 defined by notch 124 .
- Mirror 130 preferably comprises a glass substrate 134 , with a surface 135 facing surface 132 defined by notch 124 , having formed on an opposite surface 136 thereof, a metallic layer or a dichroic filter layer 138 .
- the mirror 130 is securely held in place partially by any suitable adhesive 139 , such as epoxy, and partially by an optical adhesive 140 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass.
- optical adhesive 140 may be employed throughout instead of adhesive 139 .
- the adhesive 140 preferably fills the interstices between the roughened surface 132 defined by notch 124 and surface 135 of mirror 130 .
- FIG. 3 is an enlarged simplified optical illustration of a portion of FIG. 2D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 150 of a core 128 , through adhesive 140 and substrate 134 to a reflective surface 152 of layer 138 of mirror 130 and thence through substrate 134 , adhesive 140 and cladding 126 , through layer 114 and substrate 104 , which are substantially transparent to this light.
- the index of refraction of adhesive 140 is close to but not identical to that of cladding 126 and substrate 134 .
- mirror 130 typically reflects light onto electro-optic component 120 ( FIG. 2D ), without focusing or collimating the light.
- FIGS. 4A , 4 B, 4 C, 4 D and 4 E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with a preferred embodiment of the present invention.
- one or more electrical circuits 200 are preferably formed onto a first surface 202 of a substrate 204 , preferably a substrate that is generally transparent to light within at least part of the wavelength range of 400-1650 nm, typically of thickness between 200-1000 microns.
- the electrical circuits 200 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits, and included within a planarized layer 205 formed onto substrate 404 .
- the substrate preferably is then turned over, as indicated by an arrow 206 , and as shown in FIG. 4B .
- an array of parallel, spaced, elongate optical fiber positioning elements 212 is preferably formed, such as by conventional photolithographic techniques, over an opposite surface 210 of substrate 204 .
- an array of optical fibers 216 is disposed over surface 210 of substrate 204 , each fiber being positioned between adjacent positioning elements 212 .
- the fibers 216 are fixed in place relative to positioning elements 212 and to surface 210 of substrate 204 by means of a suitable adhesive 218 , preferably epoxy, as seen in FIG. 4E .
- FIGS. 5A , 5 B, 5 C, and 5 D are simplified sectional illustrations, taken along the lines V-V in FIG. 4E , of further stages in the production of an electro-optic integrated circuit.
- electro-optic components 220 such as diode lasers, are mounted onto electrical circuit 200 (not shown), included within planarized layer 205 .
- electro-optic components 220 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- a transverse notch 224 is preferably formed, at least partially overlapping the locations of the electro-optic components 220 and extending through the adhesive 218 , entirely through each optical fiber 216 and partially into substrate 204 .
- the notch 224 extends through all of cladding 226 of each fiber 216 and entirely through the core 228 of each fiber. It is appreciated that the surfaces defined by the notch 224 are relatively rough, as shown.
- a partially flat and partially concave mirror 230 is preferably mounted parallel to one of the rough inclined surfaces 232 defined by notch 224 .
- Mirror 230 preferably comprises a glass substrate 234 having formed thereon a curved portion 236 over which is formed a curved metallic layer or a dichroic filter layer 238 .
- the mirror 230 is securely held in place partially by any suitable adhesive 239 , such as epoxy, and partially by an optical adhesive 240 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass.
- optical adhesive 240 may be employed throughout instead of adhesive 239 .
- Optical adhesive 240 preferably tills the interstices between the roughened surface 232 defined by notch 224 and a surface 242 of mirror 230 .
- FIG. 6A is an enlarged simplified optical illustration of a portion of FIG. 5D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from an end 250 of a core 228 , through adhesive 240 , substrate 234 and curved portion 236 to a reflective surface 252 of layer 238 and thence through curved portion 236 , adhesive 240 , substrate 204 and layer 205 which are substantially transparent to this light.
- the index of refraction of adhesive 240 is close to but not identical to that of curved portion 236 and substrates 204 and 234 .
- the operation of curved layer 238 is to focus light exiting from end 250 of core 228 onto the electro-optic component 220 .
- FIG. 6B is an enlarged simplified optical illustration of a portion of FIG. 5D in accordance with a further embodiment of the present invention.
- the curvature of curved layer 238 produces collimation rather than focusing of the light exiting from end 250 of core 228 onto the electro-optic component 220 .
- FIG. 6C is an enlarged simplified optical illustration of a portion of FIG. 5D in accordance with yet another embodiment of the present invention wherein a grating 260 is added to curved layer 238 .
- the additional provision of grating 260 causes separation of light impinging thereon according to its wavelength, such that multispectral light exiting from end 250 of core 228 is focused at multiple locations on electro-optic component 220 in accordance with the wavelengths of components thereof.
- FIG. 7 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- the embodiment of FIG. 7 corresponds generally to that described hereinabove with respect to FIG. 5D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface.
- light from optical fiber 316 is directed onto an electro-optic component 320 by a partially flat and partially concave mirror assembly 330 , preferably mounted parallel to one of the rough inclined surfaces 332 defined by notch 324 .
- Mirror assembly 330 preferably comprises a glass substrate 334 having formed thereon a plurality of curved portions 336 over which are formed a curved metallic layer or a dichroic filter layer 338 .
- Mirror assembly 330 also defines a reflective surface 340 , which is disposed on a planar surface 342 generally opposite layer 338 .
- the mirror assembly 330 is securely held in place partially by any suitable adhesive 343 , such as epoxy, and partially by an optical adhesive 344 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 328 of the optical fibers 316 .
- optical adhesive 344 may be employed throughout instead of adhesive 343 .
- the optical adhesive 344 preferably fills the interstices between the roughened surface 332 defined by notch 324 and surface 342 of mirror assembly 330 .
- FIG. 8A is an enlarged simplified optical illustration of a portion of FIG. 7 .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from an end 350 of a core 328 , through adhesive 344 , substrate 334 and first curved portion 336 , to a curved reflective surface 352 of layer 338 and thence through first curved portion 336 and substrate 334 to reflective surface 340 , from reflective surface 340 through substrate 334 and second curved portion 336 to another curved reflective surface 354 of layer 338 and thence through second curved portion 336 , substrate 334 , adhesive 344 , substrate 304 and layer 305 , which are substantially transparent to this light.
- the index of refraction of adhesive 344 is close to but not identical to that of substrates 304 and 334 .
- the operation of curved layer 338 and reflective surface 340 is to focus light exiting from end 350 of core 328 onto the electro-optic component 320 .
- FIG. 8B is an enlarged simplified optical illustration of a portion of FIG. 7 in accordance with a further embodiment of the present invention.
- the curvature of curved layer 338 produces collimation rather than focusing of the light exiting from end 350 of core 328 onto the electro-optic component 320 .
- FIG. 8C is an enlarged simplified optical illustration of a portion of FIG. 7 in accordance with yet another embodiment of the present invention wherein a reflective grating 360 replaces reflective surface 340 .
- the additional provision of grating 360 causes separation of light impinging thereon according to its wavelength, such that multispectral light existing from end 350 of core 328 is focused at multiple locations on electro-optic component 320 in accordance with the wavelengths of components thereof.
- FIGS. 9A , 9 B, 9 C, 9 D and 9 E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- one or more electrical circuits 400 are preferably formed onto a portion of a surface 402 of a substrate 404 , preferably a glass, silicon or ceramic substrate, typically of thickness between 300-1000 microns.
- the electrical circuits 400 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits, and included within a planarized layer 406 formed onto substrate 404 .
- FIG. 9B it is seen that another portion of the surface 402 is formed with an array of parallel, spaced, elongate optical fiber positioning elements 412 by any suitable technique, such as etching or notching.
- an array of optical fibers 416 is engaged with substrate 404 , each fiber being positioned between adjacent positioning elements 412 .
- the fibers are fixed in place relative to positioning elements 412 and to substrate 404 by means of a suitable adhesive 418 , preferably epoxy, as seen in FIG. 9D .
- a suitable adhesive 418 preferably epoxy
- electro-optic component 420 such as diode lasers, are mounted in operative engagement with electrical circuits 400 , each electro-optic component 420 preferably being aligned with a corresponding fiber 416 .
- electro-optic component 420 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- FIGS. 10A , 10 B, 10 C, and 10 D are simplified sectional illustrations, taken along the lines X-X in FIG. 9E , of further stages in the production of an electro-optic integrated circuit.
- electro-optic components 420 are each mounted onto an electrical circuit (not shown), included within planarized layer 406 formed onto substrate 404 .
- a transverse notch 424 is preferably formed to extend through the adhesive 418 entirely through each optical fiber 416 and partially into substrate 404 .
- the notch 424 extends through all of cladding 426 of each fiber 416 and entirely through the core 428 of each fiber. It is appreciated that the surfaces defined by the notch 424 are relatively rough, as shown.
- a partially flat and partially concave mirror assembly 430 is preferably mounted parallel to one of the rough inclined surfaces 432 defined by notch 424 .
- Mirror assembly 430 preferably comprises a glass substrate 434 having formed thereon a curved portion 436 over which is formed a curved metallic layer or a dichroic filter layer 438 .
- Mirror assembly 430 also defines a planar surface 440 , generally opposite layer 438 , having formed thereon a metallic layer or a dichroic filter layer 442 underlying part of the curved portion 436 .
- the mirror assembly 430 is securely held in place partially by any suitable adhesive 444 , such as epoxy, and partially by an optical adhesive 446 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 428 of the optical fibers 416 . It is appreciated that optical adhesive 446 may be employed throughout instead of adhesive 444 .
- FIG. 11A is an enlarged simplified optical illustration of a portion of FIG. 10D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 420 through glass substrate 434 and curved portion 436 of mirror assembly 430 into reflective engagement with layer 438 and thence through curved portion 436 and substrate 434 to layer 442 and reflected from layer 442 through substrate 434 and adhesive 446 to focus at an end 450 of a core 428 .
- the operation of curved layer 438 is to focus light exiting from electro-optic component 420 onto end 450 of core 428 .
- FIG. 11B is an enlarged simplified optical illustration of a portion of FIG. 10D in accordance with a further embodiment of the present invention.
- the curvature of curved layer 438 produces collimation rather than focusing of the light exiting from electro-optic component 420 onto end 450 of core 428 .
- FIG. 11C is an enlarged simplified optical illustration of a portion of FIG. 10D in accordance with yet another embodiment of the present invention wherein a grating 460 is added to curved layer 438 .
- the additional provision of grating 460 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 420 is focused on end 450 of core 428 .
- FIG. 12 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- the embodiment of FIG. 12 corresponds generally to that described hereinabove with respect to FIG. 10D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface.
- an electro-optic component 520 such as a laser diode
- FIG. 12 it is seen that light from an electro-optic component 520 , such as a laser diode, is directed onto a partially flat and partially concave mirror assembly 530 , preferably mounted parallel to one of the rough inclined surfaces 532 defined by notch 524 .
- electro-optic component 520 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- Mirror assembly 530 preferably comprises a glass substrate 534 having formed thereon a plurality of curved portions 536 over which are formed a curved metallic layer or a dichroic filter layer 538 .
- Mirror assembly 530 also defines a reflective surface 540 , which is disposed on a planar surface 542 generally opposite layer 538 .
- the mirror assembly 530 is securely held in place partially by any suitable adhesive 544 , such as epoxy, and partially by an optical adhesive 546 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 528 of the optical fibers 516 . It is appreciated that optical adhesive 546 may be employed throughout instead of adhesive 544 .
- FIG. 13A is an enlarged simplified optical illustration of a portion of FIG. 12 .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 520 through substrate 534 and a first curved portion 536 of mirror assembly 530 into reflective engagement with a part of layer 538 overlying first curved portion 536 and thence through first curved portion 536 and substrate 534 to reflective surface 540 , where it is reflected back through substrate 534 and a second curved portion 536 to another part of layer 538 overlying second curved portion 536 and is reflected back through second curved portion 536 and substrate 534 to reflective surface 540 and thence through substrate 534 and adhesive 546 to focus at an end 550 of a core 528 .
- the operation of curved layer 538 overlying first and second curved portions 536 is to focus light exiting from electro-optic component 520 onto end
- FIG. 13B is an enlarged simplified optical illustration of a portion of FIG. 12 in accordance with a further embodiment of the present invention.
- the curvature of curved layer 538 produces collimation rather than focusing of the light exiting from electro-optic component 520 onto end 550 of core 528 .
- FIG. 13C is an enlarged simplified optical illustration of a portion of FIG. 12 in accordance with yet another embodiment of the present invention wherein a reflective grating 560 replaces part of reflective surface 540 .
- the additional provision of grating 560 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 520 is focused on end 550 of core 528 .
- FIGS. 14A , 14 B, 14 C and 14 D are simplified pictorial illustrations of further stages in the production of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- electro-optic components 600 such as edge emitting diode lasers, are mounted onto an electrical circuit (not shown), included within a planarized layer 602 formed onto a surface 603 of a substrate 604 , at the opposite surface 606 of which are mounted optical fibers 616 by means of adhesive 618 .
- electro-optic components 600 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- a transverse notch 624 is preferably formed, extending completely through substrate 604 and entirely through each optical fiber 616 and partially into adhesive 618 .
- the notch 624 extends through all of cladding 626 of each fiber 616 and entirely through the core 628 of each fiber. It is appreciated that the surfaces defined by the notch 624 are relatively rough, as shown.
- a partially flat and partially concave mirror assembly 630 is preferably mounted parallel to one of the rough inclined surfaces 632 defined by notch 624 .
- Mirror assembly 630 preferably comprises a glass substrate 634 having formed thereon a curved portion 636 .
- a partially planar and partially curved metallic layer or a dichroic filter layer 638 is formed over a surface 640 of substrate 634 and curved portion 636 formed thereon.
- a reflective layer 642 is formed on an opposite surface 643 of substrate 634 opposite layer 638 .
- the mirror assembly 630 is securely held in place partially by any suitable adhesive 644 , such as epoxy, and partially by an optical adhesive 646 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 628 of the optical fibers 616 . It is appreciated that optical adhesive 646 may be employed throughout instead of adhesive 644 .
- FIG. 15A is a simplified optical illustration of FIG. 14D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 600 through glass substrate 634 and curved portion 636 of mirror assembly 630 into reflective engagement with a curved portion 660 of layer 638 and thence through curved portion 636 and substrate 634 into reflective engagement with layer 642 and thence through multiple reflections through substrate 634 between layer 638 and layer 642 , and then through substrate 634 and adhesive 646 to focus at an end 650 of a core 628 .
- the operation of the curved portion of layer 638 is to focus light exiting from electro-optic component 600 onto end 650 of core 628 .
- FIG. 15B is a simplified optical illustration of FIG. 14D in accordance with a further embodiment of the present invention.
- the curvature of the curved portion 660 of layer 638 produces collimation rather than focusing of the light exiting from electro-optic component 600 onto end 650 of core 628 .
- FIG. 15C is a simplified optical illustration of FIG. 14D in accordance with yet another embodiment of the present invention wherein a grating 662 is added to the curved portion 660 of layer 638 .
- the additional provision of grating 662 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 600 is focused on end 650 of core 628 .
- FIG. 16 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with still another preferred embodiment of the present invention.
- the embodiment of FIG. 16 corresponds generally to that described hereinabove with respect to FIG. 14D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface.
- an electro-optic component 720 such as a diode laser
- FIG. 16 it is seen that light from an electro-optic component 720 , such as a diode laser, is directed onto a partially flat and partially concave mirror assembly 730 , preferably mounted parallel to one of the rough inclined surfaces 732 defined by notch 724 .
- electro-optic component 720 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- Mirror assembly 730 preferably comprises a glass substrate 734 having formed thereon a plurality of curved portions 736 over which are formed a curved metallic layer or a dichroic filter layer 738 .
- Mirror assembly 730 also defines a reflective surface 740 , which is disposed on a planar surface 742 generally opposite layer 738 .
- the mirror assembly 730 is securely held in place partially by any suitable adhesive 744 , such as epoxy, and partially by an optical adhesive 746 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. USA, whose refractive index preferably is precisely matched to that of the cores 728 of the optical fibers 716 . It is appreciated that optical adhesive 746 may be employed throughout instead of adhesive 744 .
- FIG. 17A is an enlarged simplified optical illustration of a portion of FIG. 16 .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 720 through glass substrate 734 of mirror assembly 730 into reflective engagement with a part of layer 738 overlying the flat portion thereof, and thence through substrate 734 to reflective surface 740 , where it is reflected back through substrate 734 and a first curved portion 736 into reflective engagement with a part of layer 738 overlying first curved portion 736 , and thence through first curved portion 736 and substrate 734 to reflective surface 740 , where it is reflected back through substrate 734 and a second curved portion 736 to another part of layer 738 overlying second curved portion 736 and is reflected back through second curved surface 736 and substrate 734 to reflective surface 740 and thence through substrate 734 and adhesive 746 to focus at an end 750 of a core 728 .
- FIG. 17B is an enlarged simplified optical illustration of a portion of FIG. 16 in accordance with a further embodiment of the present invention.
- the curvature of curved layer 738 produces collimation rather than focusing of the light exiting from electro-optic component 720 onto end 750 of core 728 .
- FIG. 17C is an enlarged simplified optical illustration of a portion of FIG. 16 in accordance with yet another embodiment of the present invention wherein a reflective grating 760 replaces a middle portion of reflective surface 740 .
- the additional provision of grating 760 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 720 is focused on end 750 of core 728 .
- FIGS. 18A , 18 B, 18 C and 18 D are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 4A-6C in accordance with one embodiment of the present invention.
- a glass substrate 800 typically of thickness 200-400 microns, seen in FIG. 18A , has formed thereon an array of microlenses 802 , typically formed of photoresist, as seen in FIG. 18B .
- the microlenses 802 preferably have an index of refraction which is identical or very close to that of substrate 800 . This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing.
- a thin metal layer 804 is formed over the substrate 800 and microlenses 802 as seen in FIG. 18C , typically by evaporation or sputtering.
- the substrate 800 and the metal layer 804 formed thereon are then diced by conventional techniques, as shown in FIG. 18D , thereby defining individual optical elements 806 , each including a curved portion defined by a microlens 802 .
- FIGS. 19A , 19 B, 19 C, 19 D and 19 E are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-6C in accordance with another embodiment of the present invention.
- a glass substrate 810 typically of thickness 200-400 microns, seen in FIG. 19A , has formed thereon an array of microlenses 812 , typically formed of photoresist, as seen in FIG. 19B .
- the microlenses 812 preferably have an index of refraction which is identical or very close to that of substrate 810 . This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing.
- a thin metal layer 814 is formed over the substrate 810 and microlenses 812 as seen in FIG. 19C , typically by evaporation or sputtering.
- the substrate 810 is then notched from underneath by conventional techniques.
- notches 815 are preferably formed at locations partially underlying microlenses 812 .
- a thin metal layer 824 is formed over the substrate 820 and microlenses 822 as seen in FIG. 20C , typically by evaporation or sputtering.
- An additional metal layer 825 is similarly formed on an opposite surface of substrate 820 .
- Metal layers 824 and 825 are patterned typically by conventional photolithographic techniques to define respective reflective surfaces 826 and 827 as seen in FIG. 20D .
- the substrate 820 is notched from underneath by conventional techniques. As seen in FIG. 20E , notches 828 need not be at locations partially underlying microlenses 822 . Following notching, the substrate 820 is diced by conventional techniques, as shown in FIG. 20F , thereby defining individual optical elements 829 , each including a curved reflective portion defined by a pair of microlenses 822 as well as a flat reflective surface 829 .
- FIGS. 21A , 21 B, 21 C, 21 D, 21 E and 21 F are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-17C in accordance with still another embodiment of the present invention.
- a glass substrate 830 typically of thickness 200-400 microns, seen in FIG. 21A , has formed thereon an array of pairs of microlenses 832 , typically formed of photoresist, as seen in FIG. 21B .
- the microlenses 832 preferably have an index of retraction which is identical or very close to that of substrate 830 . This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing.
- a thin metal layer 834 typically aluminum is formed over the substrate 830 and pairs of microlenses 832 as seen in FIG. 21C , typically by evaporation or sputtering.
- An additional metal layer 835 typically aluminum is similarly formed on an opposite surface of substrate 830 .
- Metal layers 834 and 835 are patterned, typically by conventional photolithographic techniques, to define respective reflective surfaces 836 and 837 as seen in FIG. 21D .
- An array of pairs of microlenses 842 is formed on an opposite surface of substrate 840 , as seen in FIG. 22C .
- the microlenses 842 preferably have an index of refraction which is identical or very close to that of substrate 840 . This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing.
- a thin metal layer 844 is formed over the substrate 840 and pairs of microlenses 842 as seen in FIG. 22D , typically by evaporation or sputtering.
- Metal layer 844 is preferably patterned, typically by conventional photolithographic techniques, to define a reflective surface 846 , as seen in FIG. 22E .
- the substrate 840 is notched from underneath by conventional techniques, defining notches 848 , as seen in FIG. 22F . Following notching, the substrate 840 is diced by conventional techniques, as shown in FIG. 22G , thereby defining individual optical elements 849 , each including a curved reflective portion defined by a pair of microlenses 842 as well as a flat reflective grating 841 .
- FIGS. 23A , 23 B, 23 C, 23 D, 23 E, 23 F and 23 G are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 9A-17C in accordance with yet a further embodiment of the present invention.
- a glass substrate 850 typically of thickness 200-400 microns, seen in FIG. 23A , has formed in an underside surface thereof an array of reflective diffraction gratings 851 , as seen in FIG. 23B , typically by etching.
- the gratings 851 may be formed on the surface of the substrate 850 , typically by lithography or transfer.
- An array of pairs of microlenses 852 is formed on an opposite surface of substrate 850 , as seen in FIG. 23C .
- the microlenses 852 preferably have an index of refraction which is identical or very close to that of substrate 850 . This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing.
- a thin metal layer 854 typically aluminum, is formed over the substrate 850 and pairs of microlenses 852 as seen in FIG. 23D , typically by evaporation or sputtering.
- An additional metal layer 855 is similarly formed on an opposite surface of the substrate 850 .
- Metal layers 854 and 855 are preferably patterned, typically by conventional photolithographic techniques, to define respective reflective surfaces 856 and 857 , as seen in FIG. 23E .
- the substrate 850 is notched from underneath by conventional techniques, defining notches 858 , as seen in FIG. 23F .
- the substrate 850 is diced by conventional techniques, as shown in FIG. 23G , thereby defining individual optical elements 859 , each including a curved reflective portion defined by a pair of microlenses 852 as well as a flat reflective grating 851 and flat reflective surfaces 857 .
- FIGS. 24A , 24 B, 24 C, 24 D, 24 E, 24 F and 24 G are simplified illustrations of a method for fabricating optical elements employed in the embodiments of FIGS. 1A-17C in accordance with a still further embodiment of the present invention.
- a glass substrate 860 typically of thickness 200-400 microns, seen in FIG. 24A , has formed therein an array of reflective diffraction gratings 861 , as seen in FIG. 24B , typically by etching.
- the gratings 861 may be formed on the surface of the substrate 860 , typically by lithography or transfer.
- An array of microlenses 862 is formed on the same surface of substrate 860 , as seen in FIG. 24C .
- the microlenses 862 preferably have an index of refraction which is identical or very close to that of substrate 860 . This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing.
- a thin metal layer 864 is formed over the substrate 860 and microlenses 862 as seen in FIG. 24D , typically by evaporation or sputtering.
- An additional metal layer 865 is similarly formed on an opposite surface of the substrate 860 .
- Metal layers 864 and 865 are preferably patterned, typically by conventional photolithographic techniques, to define respective reflective surfaces 866 and 867 , as seen in FIG. 24E .
- the substrate 860 is notched from underneath by conventional techniques, defining notches 868 , as seen in FIG. 24F . Following notching, the substrate 860 is diced by conventional techniques, as shown in FIG. 24G , thereby defining individual optical elements 869 , each including a curved reflective surface 866 defined by a microlens 862 as well as a flat reflective grating 861 and a flat reflective surface 867 .
- FIGS. 25A , 25 B, 25 C and 25 D are simplified illustrations of multiple stages in the production of a multi-chip module in accordance with a preferred embodiment of the present invention.
- a substrate 900 typically formed of silicon and having a thickness of 300-800 microns, has formed thereon at least one dielectric passivation layer 902 , at least one metal layer 904 and at least one overlying dielectric layer 906 .
- the dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.
- Vias 908 connected to at least one metal layer 904 , extend through layer 902 to the substrate 900 .
- an array of openings 910 is formed by removing portions of substrate 900 at a location underlying vias 908 .
- the entire thickness of the substrate 900 is removed.
- the removal of substrate 900 may be achieved by using conventional etching techniques and, preferably, provides a volume of dimensions of at least 600 microns in width.
- metallic bumps 912 are preferably formed onto the thus exposed surfaces of vias 908 .
- integrated circuit chips 914 are preferably located in openings 910 and operatively engaged with vias 908 by being soldered to bumps 912 , thus creating a multi-chip module, wherein integrated circuit chips 914 reside within the substrate of the module.
- FIG. 26 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including a laser light source 920 formed on an integrated circuit chip 922 , located in an opening 924 formed in a module substrate 926 .
- FIG. 27 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including an optical detector 930 formed on an integrated circuit chip 932 , located in an opening 934 formed in a module substrate 936 .
- FIG. 28 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including an electrical element 940 formed on an integrated circuit chip 942 located in an opening 944 formed in a module substrate 946 .
- FIG. 29 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including multiple elements 950 located in multiple recesses 952 formed within a substrate 954 . These elements may by any suitable electrical or electro-optic element.
- FIG. 30 is a simplified illustration of a multi-chip module of the type referenced in FIGS. 25A-25D , including multiple stacked elements located in recesses formed within substrates.
- a substrate 1000 typically formed of silicon and having a thickness of 500-1000 microns, has formed thereon at least one dielectric passivation layer 1002 , at least one metal layer 1004 and at least one overlying dielectric layer 1006 .
- the dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.
- Vias 1008 connected to at least one metal layer 1004 extend through layer 1002 to the substrate 1000 .
- At least one opening 1010 is formed by removing a portion of substrate 1000 at a location underlying vias 1008 .
- the entire thickness of substrate 1000 is removed.
- the removal of substrate 1000 may be achieved by using conventional etching techniques and provides a volume of dimensions of at least 1000 microns in width.
- Metallic bumps 1012 preferably solder bumps, are preferably formed onto the thus exposed surfaces of vias 1008 .
- a substrate 1020 Disposed within opening 1010 is a substrate 1020 , typically formed of silicon and having a thickness of 300-800 microns, having formed thereon at least one dielectric passivation layer 1022 , at least one metal layer 1024 and at least one overlying dielectric layer 1026 .
- the dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.
- Vias 1028 connected to at least one metal layer 1024 , extend through layer 1022 to the substrate 1020 .
- At least one opening 1030 is formed by removing portions of substrate 1020 at a location underlying vias 1028 . Preferably, the entire thickness of substrate 1020 is removed.
- substrate 1020 may be achieved by using conventional etching techniques and provides a volume of dimensions of at least 600 microns in width.
- Metallic bumps 1032 preferably solder bumps, are preferably formed onto the thus exposed surfaces of vias 1028 .
- Additional metallic bumps 1034 are preferably formed onto ends of vias 1036 which are preferably connected to at least one metal layer 1024 , which need not necessarily be connected to bumps 1032 .
- Bumps 1012 and 1034 are preferably soldered together to mount substrate 1020 within substrate 1000 .
- An integrated circuit chip 1040 is preferably located in opening 1030 and operatively engaged with vias 1028 by being soldered to bumps 1032 , thus creating a multi-chip module, wherein at least one integrated circuit chip 1040 resides within substrate 1020 , which in turn resides within substrate 1000 .
- any suitable number of substrates such as substrates 1000 and 1020 , may be nested within each other, as shown in FIG. 30 , and that each such substrate may have multiple openings formed therein.
- FIGS. 31A , 31 B, 31 C and 31 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention.
- electro-optic components 1120 such as diode lasers, are mounted onto an electrical circuit (not shown), included within a planarized layer 1122 formed onto a substrate 1123 .
- electro-optic components 1120 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- a transverse notch 1124 is preferably formed, at least partially overlapping the locations of the electro-optic components 1120 and extending through an adhesive 1125 and partially through each of a plurality of optical fibers 1126 .
- the notch 1124 extends entirely through the cladding 1127 of each fiber 1126 and entirely through the core 1128 of each fiber. It is appreciated that the surfaces defined by the notch 1124 are relatively rough, as shown.
- a mirror 1130 is preferably mounted parallel to one of the rough inclined surfaces 1132 defined by notch 1124 .
- Mirror 1130 preferably comprises a glass substrate 1134 having formed on a surface 1136 thereof, a metallic layer or a dichroic filter layer 1138 .
- a partially flat and partially concave mirror 1139 is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1140 .
- Mirror 1139 preferably comprises a glass substrate 1142 having formed thereon a curved portion 1144 over which is formed a curved metallic layer or a dichroic filter layer 1146 .
- the mirrors 1130 and 1139 are securely held in place by any suitable adhesive 1148 , such as epoxy, and partially by an optical adhesive 1150 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 1128 of the optical fibers 1126 .
- the adhesive 1150 preferably fills the interstices between the roughened surfaces 1132 and 1140 defined by notch 1124 and respective mirrors 1130 and 1139 .
- optical adhesive 1150 may be employed throughout instead of adhesive 1148 . It is noted that the index of refraction of adhesive 1150 is close to but not identical to that of substrates 1123 , 1134 and 1142 .
- FIG. 32 is an enlarged simplified optical illustration of a portion of FIG. 31D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1151 of a core 1128 , through adhesive 1150 and glass substrate 1134 to a reflective surface 1152 of mirror 1130 and thence through glass substrate 1134 , adhesive 1150 , substrate 1123 and layer 1122 , which are substantially transparent to this light.
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1161 of core 1128 , through adhesive 1150 , glass substrate 1142 and curved portion 1144 to a reflective surface 1162 of mirror 1139 and thence through curved portion 1144 , glass substrate 1142 , adhesive 1150 , substrate 1123 and layer 1122 , which are substantially transparent to this light.
- mirror 1130 typically reflects light onto an electro-optic component 1120 , here designated 1170 , without focusing or collimating the light, while mirror 1139 focuses light reflected thereby onto another electro-optic component 1120 , here designated 1172 . It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed.
- FIGS. 33A , 33 B, 33 C and 33 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention.
- electro-optic components 1220 such as diode lasers, are mounted onto an electrical circuit (not shown), included within a planarized layer 1222 formed onto a substrate 1223 .
- electro-optic components 1220 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- the electro-optic components 1220 are located in openings or recesses formed within the substrate 1223 , similarly to the structure shown in FIG. 29 .
- a transverse notch 1224 is preferably formed, at least partially overlapping the locations of at least one of the electro-optic components 1220 and extending through an adhesive 1225 and partially through each of a plurality of optical fibers 1226 .
- the notch 1224 extends through part of the cladding 1227 of each fiber 1226 and entirely through the core 1228 of each fiber. It is appreciated that the surfaces defined by the notch 1224 are relatively rough, as shown.
- a mirror 1230 is preferably mounted parallel to one of the rough inclined surfaces, here designated 1232 , defined by notch 1224 .
- Mirror 1230 preferably comprises a glass substrate 1234 having formed on a surface 1236 thereof, a metallic layer or a dichroic filter layer 1238 .
- a partially flat and partially concave mirror 1239 is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1240 .
- Mirror 1239 preferably comprises a glass substrate 1242 having formed thereon a curved portion 1244 over which is formed a curved metallic layer or a dichroic filter layer 1246 .
- the mirrors 1230 and 1239 are securely held in place partially by any suitable adhesive 1248 , such as epoxy, and partially by an optical adhesive 1250 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 1228 of the optical fibers 1226 .
- the adhesive 1250 preferably fills the interstices between the roughened surfaces 1232 and 1240 defined by notch 1224 and respective mirrors 1230 and 1239 .
- optical adhesive 1250 may be employed throughout instead of adhesive 1248 . It is noted that the index of refraction of adhesive 1250 is close to but not identical to that of cladding 1227 , substrate 1242 and curved portion 1244 .
- FIG. 34 is an enlarged simplified optical illustration of a portion of FIG. 33D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1251 of a core 1228 , through adhesive 1250 to a reflective surface 1252 of mirror 1230 and thence through adhesive 1250 and cladding 1227 , and then through layer 1222 , which is substantially transparent to this light.
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1261 of core 1228 , through adhesive 1250 , substrate 1242 and curved portion 1244 , to a reflective surface 1262 of mirror 1239 and thence through curved portion 1244 , adhesive 1250 and cladding 1227 , and then through layer 1222 , which is substantially transparent to this light.
- mirror 1230 typically reflects light onto an electro-optic component 1220 , here designated 1270 , without focusing or collimating the light, while mirror 1239 focuses light reflected thereby onto another electro-optic component 1220 , here designated 1272 . It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed.
- FIGS. 35A , 35 B, 35 C and 35 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention.
- electro-optic components 1320 such as diode lasers, are mounted onto an electrical circuit (not shown), included within a planarized layer 1322 formed onto a substrate 1323 .
- electro-optic components 1320 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- FIGS. 35A , 35 B, 35 C and 35 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention.
- electro-optic components 1320 such as diode lasers, are mounted onto an electrical circuit (not shown), included within a planarized layer 1322 formed onto a substrate 1323 .
- electro-optic components 1320 may be any suitable electro-optic component,
- first and second separate fibers 1325 and 1326 are fixed to substrate 1323 , preferably by an adhesive 1327 .
- the fibers 1325 and 1326 may be identical, similar or different, and need not be arranged in a mutually aligned spatial relationship.
- a transverse notch 1328 is preferably formed, at least partially overlapping the locations of the electro-optic components 1320 and extending through adhesive 1327 and partially through at least each of optical fibers 1325 and 1326 .
- the notch 1328 extends entirely through of the cladding 1330 and 1331 and entirely through the cores 1332 and 1333 of fibers 1325 and 1326 respectively. It is appreciated that the surfaces defined by the notch 1328 are relatively rough, as shown.
- a mirror 1334 is preferably mounted parallel to one of the rough inclined surfaces 1335 defined by notch 1328 .
- Mirror 1334 preferably comprises a glass substrate 1336 having formed on a surface 1337 thereof, a metallic layer or a dichroic filter layer 1338 .
- a partially flat and partially concave mirror 1339 is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1340 .
- Mirror 1339 preferably comprises a glass substrate 1342 having formed thereon a curved portion 1344 over which is formed a curved metallic layer or a dichroic filter layer 1346 .
- the mirrors 1334 and 1339 are securely held in place partially by any suitable adhesive 1348 , such as epoxy, and partially by optical adhesive 1350 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive indices preferably are precisely matched to those of the cores 1332 and 1333 of the optical fibers 1325 and 1326 respectively.
- the adhesive 1350 preferably fills the interstices between the roughened surfaces 1335 and 1340 defined by notch 1328 and respective mirrors 1334 and 1339 .
- optical adhesive 1350 may also be employed instead of adhesive 1348 . It is noted that the index of refraction of adhesive 1350 is close to but not identical to that of substrates 1323 , 1336 and 1342 .
- FIG. 36 is an enlarged simplified optical illustration of a portion of FIG. 35D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1352 of a core 1332 of a fiber 1325 , through adhesive 1350 and substrate 1336 to a reflective surface 1354 of mirror 1334 and thence through substrate 1336 , adhesive 1350 , substrate 1323 and layer 1322 , which are substantially transparent to this light.
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1362 of core 1333 of fiber 1326 , through adhesive 1350 , substrate 1342 and curved portion 1344 to a reflective surface 1364 of mirror 1339 and thence through curved portion 1344 , substrate 1342 , adhesive 1350 , substrate 1323 and layer 1322 , which are substantially transparent to this light.
- mirror 1334 typically reflects light onto an electro-optic component 1320 , here designated 1370 , without focusing or collimating the light, while mirror 1339 focuses light reflected thereby onto another electro-optic component 1320 , here designated 1372 . It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed.
- FIGS. 37A , 37 B, 37 C and 37 D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention.
- the embodiment of FIGS. 37A-37D is similar to the embodiments of FIGS. 33A-33D and 35 A- 35 D, described hereinabove.
- electro-optic components 1400 such as diode lasers, are mounted onto an electrical circuit (not shown), included within a planarized layer 1402 formed onto a substrate 1404 .
- electro-optic components 1400 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating and a semiconductor optical amplifier.
- the electro-optic components 1400 are located in openings or recesses formed within the substrate 1404 , similarly to the structure shown in FIG. 33A .
- at least first and second separate fibers 1406 and 1408 are fixed to substrate 1404 , preferably by an adhesive 1410 , similarly to the structure shown in FIG. 35A .
- the fibers 1406 and 1408 may be identical, similar or different and need not be arranged in a mutually aligned spatial relationship.
- a transverse notch 1412 is preferably formed, at least partially overlapping the locations of at least one of the electro-optic components 1400 and extending through an adhesive 1410 and partially through each of a plurality of optical fibers 1406 and 1408 .
- the notch 1412 extends through part of the claddings 1414 and 1416 and entirely through the cores 1418 and 1420 of fibers 1406 and 1408 , respectively. It is appreciated that the surfaces defined by the notch 1412 are relatively rough, as shown.
- a mirror 1430 is preferably mounted parallel to one of the rough inclined surfaces, here designated 1432 , defined by notch 1412 .
- Mirror 1430 preferably comprises a glass substrate 1434 having formed on a surface 1436 thereof, a metallic layer or a dichroic filter layer 1438 .
- a partially flat and partially concave mirror 1439 is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1440 .
- Mirror 1439 preferably comprises a glass substrate 1442 having formed thereon a curved portion 1444 over which is formed a curved metallic layer or a dichroic filter layer 1446 .
- the mirrors 1430 and 1439 are securely held in place partially by any suitable adhesive 1448 , such as epoxy, and partially by an optical adhesive 1450 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 1418 and 1420 of the optical fibers 1406 and 1408 , respectively.
- the adhesive 1450 preferably fills the interstices between the roughened surfaces 1432 and 1440 defined by notch 1412 and respective mirrors 1430 and 1439 .
- optical adhesive 1450 may be employed throughout instead of adhesive 1448 .
- the index of refraction of adhesive 1450 is close to but not identical to that of the curved portion 1444 , substrate 1442 and claddings 1414 and 1416 of the optical fibers 1406 and 1408 , respectively.
- FIG. 38 is an enlarged simplified optical illustration of a portion of FIG. 37D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1451 of a core 1418 , through adhesive 1450 to a reflective surface 1452 of mirror 1430 and thence through adhesive 1450 and cladding 1414 , through layer 1402 , which is substantially transparent to this light.
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from an end 1462 of core 1420 , through adhesive 1450 , substrate 1442 and curved portion 1444 to a reflective surface 1464 of mirror 1439 and thence through curved portion 1444 , adhesive 1450 and cladding 1416 , through layer 1402 , which is substantially transparent to this light.
- mirror 1430 typically reflects light onto an electro-optic component 1400 , here designated 1470 , without focusing or collimating the light, while mirror 1439 focuses light reflected thereby onto another electro-optic component 1400 , here designated 1472 . It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed.
- FIGS. 39A , 39 B, 39 C, and 39 D are simplified sectional illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention.
- electro-optic components 1520 such as a diode laser, are each mounted onto an electrical circuit (not shown), included within a planarized layer 1522 formed onto substrate 1524 .
- electro-optic components 1520 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.
- a transverse cut 1526 is preferably formed to extend partially through the substrate 1524 . It is appreciated that a surface 1528 defined by the cut 1526 is relatively rough, as shown.
- a partially flat and partially concave mirror assembly 1530 is preferably mounted parallel to the rough inclined surface 1528 defined by the cut 1526 .
- Mirror assembly 1530 preferably comprises a glass substrate 1534 having formed thereon a curved portion 1536 over which is formed a curved metallic layer or a dichroic filter layer 1538 .
- Mirror assembly 1530 also defines a flat surface 1540 , having formed thereon a metallic layer or a dichroic filter layer 1542 partially underlying the curved portion 1536 .
- the mirror assembly 1530 is securely held in place by any suitable adhesive 1544 , such as epoxy.
- FIG. 40 is a simplified optical illustration corresponding to FIG. 39D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 1520 through glass substrate 1534 and curved portion 1536 of mirror assembly 1530 into reflective engagement with layer 1538 and thence through curved portion 1536 and substrate 1534 to layer 1542 and reflected from layer 1542 through substrate 1534 as a parallel beam.
- electro-optic integrated circuit described in reference to FIGS. 39A-40 may be configured to operate as either a light transmitter or a light receiver, as described hereinbelow with reference to FIGS. 43-45 .
- FIGS. 41A , 41 B, 41 C, and 41 D are simplified sectional illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention.
- an optical fiber 1620 is mounted onto a substrate 1622 , preferably by means of adhesive 1623 .
- a transverse cut 1624 is preferably formed to extend through the adhesive 1623 , the optical fiber 1620 and the substrate 1622 .
- the cut 1624 extends through the cladding 1626 of fiber 1620 and entirely through the core 1628 of the fiber. It is appreciated that a surface 1629 defined by the cut 1624 is relatively rough, as shown.
- a partially flat and partially concave mirror assembly 1630 is preferably mounted parallel to the rough inclined surface 1629 defined by the cut 1624 .
- Mirror assembly 1630 preferably comprises a glass substrate 1634 having formed thereon a curved portion 1636 over which is formed a curved metallic layer or a dichroic filter layer 1638 .
- Mirror assembly 1630 also defines a flat surface 1640 having formed thereon a metallic layer or a dichroic filter layer 1642 , partially underlying the curved portion 1636 .
- the mirror assembly 1630 is securely held in place by an optical adhesive 1644 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of the cores 1628 of the optical fibers 1620 .
- FIG. 42 is a simplified optical illustration corresponding to FIG. 41D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from an end 1646 of core 1628 of fiber 1620 through adhesive 1644 and substrate 1634 and curved portion 1636 of mirror assembly 1630 into reflective engagement with layer 1638 and thence through curved portion 1636 and substrate 1634 to layer 1642 and reflected from layer 1642 through substrate 1634 as a parallel beam.
- electro-optic integrated circuit described in reference to FIGS. 41A-42 may be configured to operate as either a light transmitter or a light receiver, as described hereinbelow with reference to FIGS. 43-45 .
- FIG. 43 illustrates optical coupling through free space between the electro-optic integrated circuit of FIG. 40 , here designated by reference numeral 1700 and the electro-optic integrated circuit of FIG. 42 , here designated by reference numeral 1702 . It is appreciated that either of electro-optic integrated circuits 1700 and 1702 may transmit light to the other, which receives the light, along a parallel beam.
- FIG. 44 illustrates optical coupling through free space between an electro-optic integrated circuit of FIG. 40 , here designated by reference numeral 1704 and another electro-optic integrated circuit of FIG. 40 , here designated by reference numeral 1706 . It is appreciated that either of electro-optic integrated circuits 1704 and 1706 may transmit light to the other, which receives the light, along a parallel beam.
- FIG. 45 illustrates optical coupling through free space between an electro-optic integrated circuit of FIG. 42 , here designated by reference numeral 1708 and another electro-optic integrated circuit of FIG. 42 , here designated by reference numeral 1710 . It is appreciated that either of electro-optic integrated circuits 1708 and 1710 may transmit light to the other, which receives the light, along a parallel beam.
- FIGS. 46A , 46 B, 46 C, and 46 D are simplified sectional illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention.
- an optical fiber 1800 is fixed in place on substrate 1802 by means of a suitable adhesive 1804 , preferably epoxy.
- a transverse notch 1824 is preferably formed, extending through the adhesive 1804 entirely through the optical fiber 1800 and partially into substrate 1802 .
- the notch 1824 extends through all of cladding 1826 of the fiber 1800 and entirely through the core 1828 of the fiber. It is appreciated that the surfaces defined by the notch 1824 are relatively rough, as shown.
- a partially flat and partially concave mirror 1830 is preferably mounted parallel to one of the rough inclined surfaces 1832 defined by notch 1824 .
- Mirror 1830 preferably comprises a glass substrate 1834 having formed thereon a curved portion 1836 over which is formed a curved metallic layer or a dichroic filter layer 1838 .
- the mirror 1830 is securely held in place partially by any suitable adhesive 1844 , such as epoxy, and partially by an optical adhesive 1846 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass.
- optical adhesive 1846 may be employed throughout instead of adhesive 1844 .
- the optical adhesive 1846 preferably fills the interstices between the roughened surface 1832 defined by notch 1824 and a surface 1848 of mirror 1830 .
- FIG. 47 is an enlarged simplified optical illustration of a portion of FIG. 46D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from an end 1850 of a core 1828 , through adhesive 1846 , substrate 1834 and curved portion 1836 , to a reflective surface 1852 of layer 1838 and thence through curved portion 1836 , adhesive 1846 and substrate 1802 , which are substantially transparent to this light.
- the index of refraction of adhesive 1846 is close to but not identical to that of curved portion 1836 and substrates 1802 and 1834 .
- the operation of curved layer 1838 is to collimate light exiting from end 1850 of core 1828 through substrate 1802 as a parallel beam.
- FIG. 48 illustrates optical coupling through free space between an electro-optic integrated circuit of FIG. 46D , here designated by reference numeral 1900 , and another electro-optic integrated circuit of FIG. 46D , here designated by reference numeral 1902 . It is appreciated that either of electro-optic integrated circuits 1900 and 1902 may transmit light to the other, which receives the light, along a parallel beam.
- FIG. 49 illustrates optical coupling through free space between an electro-optic integrated circuit of FIG. 46D , here designated by reference numeral 1904 , and an optical device 1906 .
- Optical device 1906 may be any optical device that receives or transmits light along a parallel beam. It is appreciated that either of electro-optic integrated circuit 1904 and optical device 1906 may transmit light to the other, which receives the light, along a parallel beam.
- FIGS. 50A , 50 B, 50 C, 50 D and 50 E are simplified pictorial illustrations of stages in the production of an electro-optic integrated circuit constructed and operative in accordance with still another preferred embodiment of the present invention.
- a substrate 2000 typically formed of silicon and having a thickness of 300-800 microns, has formed thereon at least one dielectric passivation layer 2002 , at least one metal layer 2004 and at least one overlying dielectric layer 2006 .
- the dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.
- Vias, (not shown) connected to at least one metal layer 2004 extend through layer 2002 to the substrate 2000 .
- One or more semiconductor functional blocks 2008 are preferably formed on substrate 2000 .
- one or more openings 2010 are formed by removing portions of the substrate 2000 from the underside thereof, as shown for example in FIG. 25B .
- the removal of portions of substrate 2000 may be achieved by using conventional etching techniques and, preferably, provides a volume of dimensions of at least 600 microns in width.
- integrated circuit chips 2014 are preferably located in openings 2010 . These chips may be operatively engaged with vias (not shown) by being soldered to bumps (not shown) as illustrated for example in FIG. 25D , thus creating an optoelectronic integrated circuit, wherein integrated circuit chips 2014 reside within the substrate of the integrated circuit.
- one or more fibers 2016 are fixed to substrate 2000 , preferably by an adhesive (not shown), similarly to that shown in FIG. 37A .
- Multiple fibers 2016 may be identical, similar or different and need not be arranged in a mutually aligned spatial relationship.
- a mirror 2030 is preferably mounted in operative engagement with each fiber 2016 .
- FIG. 51 is a simplified functional illustration of a preferred embodiment of the structure of FIG. 50E .
- a high frequency optical signal 2100 typically of frequency 10 GHz, passes through a fiber 2102 and is reflected by a mirror 2104 onto a diode 2106 , which may be located in a recess 2107 .
- An output electrical signal 2108 from diode 2106 is supplied to an amplifier 2110 , which may be located in a recess 2111 and need not be formed of silicon, but could be formed, for example, of gallium arsenide or indium phosphide.
- the amplified output 2112 of amplifier 2110 may be provided to a serializer/deserializer 2114 , which may be located in a recess 2115 and need not be formed of silicon, but could be formed, for example, of gallium arsenide or indium phosphide.
- An output signal 2116 from serializer/deserializer 2114 is preferably fed to one or more semiconductor functional blocks 2118 for further processing.
- a laser 2120 which may be located in a recess 2122 , may employ an electrical output from a functional block 2118 to produce a modulated light beam 2124 , which is reflected by a mirror 2126 so as to pass through a fiber 2128 .
- electro-optic integrated circuit devices 2106 and 2120 may be configured to operate as either a light transmitter or a light receiver or both.
- the substrates may comprise glass, silicon, sapphire, alumina, aluminum nitride, boron nitride or any other suitable material.
- FIGS. 52A and 52B are simplified pictorial illustrations of a packaged electro-optic circuit 3100 , having integrally formed therein an optical connector and electrical connections, alone and in conjunction with a conventional optical connector.
- a packaged electro-optic circuit 3100 is provided in accordance with a preferred embodiment of the present invention and includes an at least partially transparent substrate 3102 , typically glass. Electrical circuitry (not shown) is formed, as by conventional photolithographic techniques, over one surface of substrate 3102 and is encapsulated by a layer 3104 of a protective material such as BCB, commercially available from Dow Corning of the U.S.A. An array 3106 of electrical connections, preferably in the form of conventional solder bumps, communicates with the electrical circuitry via conductive pathways (not shown) extending through the protective material of layer 3104 .
- optical pathways Formed on a surface of substrate 3102 opposite to that adjacent layer 3104 there are defined optical pathways (not shown) which communicate with an array of optical fibers 3108 , whose ends are aligned along an edge 3110 of the substrate 3102 .
- physical alignment bores 3112 are aligned with the array of optical fibers 3108 .
- the bores 3112 are preferably defined by cylindrical elements, which, together with the optical fibers 3108 and the optical pathways, are encapsulated by a layer 3114 of protective material, preferably epoxy.
- FIG. 52B shows a conventional MPO type optical connector 3116 , such as an MPO connector manufactured by SENKO Advanced Components, Inc. of Marlborough, Mass., USA., arranged for mating contact with the packaged electro-optic circuit 3100 , wherein alignment pins 3118 of connector 3116 are arranged to seat in alignment bores 3112 of the electro-optic circuit 3100 and optical fiber ends (not shown) of connector 3116 are arranged in butting aligned relationship with the ends of the array 3108 of optical fibers in packaged electro-optic circuit 3100 .
- MPO type optical connector 3116 such as an MPO connector manufactured by SENKO Advanced Components, Inc. of Marlborough, Mass., USA.
- FIGS. 53A-53F are simplified pictorial and sectional illustrations of a first plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B .
- electrical circuits 3120 are preferably formed onto a first surface 3122 of substrate 3102 , at least part of which is transparent to light within at least part of the wavelength range of 600-1650 nm.
- Substrate 3102 is preferably of thickness between 200-800 microns.
- the electrical circuits 3120 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits.
- the substrate shown in FIG. 53A is turned over, as indicated by an arrow 3124 and, as seen in FIG. 53B , an array of parallel, spaced, elongate optical fiber positioning elements 3126 is preferably formed, such as by conventional photolithographic techniques, over an opposite surface 3128 of substrate 3102 . It is appreciated that the positions of the array of elements 3126 on surface 3128 are preferably precisely coordinated with the positions of the electrical circuits 3120 on first surface 3122 of the substrate 3102 , as shown in FIG. 53C .
- notches 3130 are preferably formed on surface 3128 , as by means of a dicing blade 3132 , to precisely position and accommodate alignment bore defining cylinders 3134 , as shown in FIG. 53E .
- FIG. 53E illustrates that the centers of alignment bore defining cylinders 3134 preferably lie in the same plane as the centers 3136 of optical fibers 3108 which are precisely positioned between elements 3126 on surface 3128 .
- FIG. 53F illustrates encapsulation of the fibers 3108 , the cylinders 3134 and the positioning elements 3126 by layer 3114 of protective material, preferably epoxy.
- FIGS. 54A-54J are simplified pictorial and sectional illustrations of a second plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B .
- FIG. 54A shows the wafer of FIG. 53F turned over.
- a multiplicity of studs 3140 are formed onto electrical circuits 3120 lying on surface 3122 .
- the studs 3140 are preferably flattened or “coined”, as shown schematically in FIG. 54C , to yield a multiplicity of flattened electrical contacts 3142 , as shown in FIG. 54D .
- the wafer of FIG. 54D is turned over, as indicated by an arrow 3144 , and the electrical contacts 3142 are dipped into a shallow bath 3146 of a conductive adhesive 3148 , such as H20E silver filled epoxy, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, so as to coat the tip of each contact 3142 with adhesive 3148 , as shown.
- the wafer of FIG. 54G is then turned over, as indicated by an arrow 3150 , and a plurality of integrated circuits 3152 is mounted onto the multiplicity of contacts 3142 , as seen in FIG. 54H .
- Integrated circuits 3152 may be electrical or electro-optic integrated circuits as appropriate.
- FIG. 54I illustrates the application of underfill material 3154 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, at the gap between integrated circuits 3152 and electrical circuits 3120 as well as substrate 3102 . If integrated circuits 3152 include electro-optic devices, the underfill material 3154 should be transparent as appropriate.
- underfill material 3154 such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA
- an encapsulation layer 3156 is preferably formed over integrated circuits 3152 , electrical circuits 3120 , substrate 3102 and underfill material 3154 .
- the integrated circuits 3152 are electro-optic devices. It is appreciated that additional integrated circuits (not shown) which are not electro-optic devices, may be electrically connected to the electrical circuits 3120 on substrate 3102 by other techniques, such as wire bonding.
- FIGS. 55A-55D are simplified pictorial and sectional illustrations of a third plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B .
- FIG. 55A illustrates the wafer of FIG. 54J , turned over and notched along lines extending perpendicularly to the array of optical fibers 3108 , producing an inclined cut extending entirely through at least the core 3160 of each fiber 3108 and extending at least partially through cylindrical elements 3134 .
- FIG. 55B-55D are simplified sectional illustrations, taken along the lines LVB-LVB in FIG. 55A , of further stages in the production of the electro-optic integrated circuit.
- the notching preferably forms a notch 3224 , at least partially overlapping the locations of the integrated circuits 3152 , at least some, if not all, of which are electro-optic devices, and extending through the layer 3114 of protective material, entirely through each optical fiber 3108 and partially into substrate 3102 .
- the notch 3224 extends through all of cladding 3226 of each fiber 3108 and entirely through the core 3160 of each fiber. It is appreciated that the surfaces defined by the notch 3224 are relatively rough, as shown.
- a partially flat and partially concave mirror assembly 3230 is preferably mounted parallel to one of the rough inclined surfaces 3232 defined by notch 3224 .
- Mirror assembly 3230 preferably comprises a glass substrate 3234 having formed thereon a curved portion 3236 over which is formed a curved metallic layer or a dichroic filter layer 3238 .
- a preferred method of fabrication of mirror assembly 3230 is described hereinabove with reference to FIGS. 19A-19E .
- the mirror assembly 3230 is securely held in place partially by any suitable adhesive 3239 , such as epoxy, and partially by an optical adhesive 3240 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass.
- optical adhesive 3240 may be employed throughout instead of adhesive 3239 .
- Optical adhesive 3240 preferably fills the interstices between the roughened surface 3232 defined by notch 3224 and a surface 3242 of mirror assembly 3230 .
- FIGS. 56A-56C are enlarged simplified optical illustrations of a portion of FIG. 55D in accordance with preferred embodiments of the present invention.
- FIG. 56A is an enlarged simplified optical illustration of a portion of FIG. 55D .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from an end 3250 of a core 3160 , through adhesive 3240 , substrate 3234 and curved portion 3236 to a reflective surface 3252 of layer 3238 and thence through curved portion 3236 , adhesive 3240 and substrate 3102 and layer 3104 which are substantially transparent to this light.
- the index of refraction of adhesive 3240 is close to but not identical to that of curved portion 3236 and substrates 3102 and 3234 .
- the operation of curved layer 3238 is to focus light exiting from end 3250 of core 3160 onto the electro-optic component 3152 .
- FIG. 56B is an enlarged simplified optical illustration of a portion of FIG. 55D in accordance with a further embodiment of the present invention.
- the curvature of curved layer 3238 produces collimation rather than focusing of the light exiting from end 3250 of core 3160 onto the electro-optic component 3152 .
- FIG. 56C is an enlarged simplified optical illustration of a portion of FIG. 55D in accordance with yet another embodiment of the present invention wherein a grating 3260 is added to curved layer 3238 .
- the additional provision of grating 3260 causes separation of light impinging thereon according to its wavelength, such that multispectral light exiting from end 3250 of core 3160 is focused at multiple locations on electro-optic component 3152 in accordance with the wavelengths of components thereof.
- FIG. 57 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention.
- the embodiment of FIG. 57 corresponds generally to that described hereinabove with respect to FIG. 55D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface.
- light from an optical fiber 3316 is directed onto an electro-optic component 3320 by a partially flat and partially concave mirror assembly 3330 , preferably mounted parallel to one of the rough inclined surfaces 3332 defined by notch 3324 .
- Mirror assembly 3330 preferably comprises a glass substrate 3334 having formed thereon a plurality of curved portions 3336 over which are formed a curved metallic layer or a dichroic filter layer 3338 .
- Mirror assembly 3330 also defines a reflective surface 3340 , which is disposed on a planar surface 3342 generally opposite layer 3338 .
- a preferred method of fabrication of mirror assembly 3330 is described hereinabove with reference to FIGS. 20A-20F .
- the mirror assembly 3330 is securely held in place partially by any suitable adhesive 3343 , such as epoxy, and partially by an optical adhesive 3344 , such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass.
- optical adhesive 3344 may be employed throughout instead of adhesive 3343 .
- the optical adhesive 3344 preferably fills the interstices between the roughened surface 3332 defined by notch 3324 and surface 3342 of mirror assembly 3330 .
- FIG. 58A is an enlarged simplified optical illustration of a portion of FIG. 57 .
- a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from an end 3350 of a core 3328 , through adhesive 3344 , substrate 3334 and first curved portion 3336 , to a curved reflective surface 3352 of layer 3338 and thence through first curved portion 3336 and substrate 3334 to reflective surface 3340 , from reflective surface 3340 through substrate 3334 and second curved portion 3336 to another curved reflective surface 3354 of layer 3338 and thence through second curved portion 3336 , substrate 3334 , adhesive 3344 and substrate 3304 and layer 3305 , which are substantially transparent to this light.
- the index of refraction of adhesive 3344 is close to but not identical to that of substrates 3304 and 3334 .
- the operation of curved layer 3338 and reflective surface 3340 is to focus light exiting from end 3350 of core 3328 onto the electro-optic component 3320 .
- FIG. 58B is an enlarged simplified optical illustration of a portion of FIG. 57 in accordance with a further embodiment of the present invention.
- the curvature of curved layer 3338 produces collimation rather than focusing of the light exiting from end 3350 of core 3328 onto the electro-optic component 3320 .
- FIG. 58C is an enlarged simplified optical illustration of a portion of FIG. 57 in accordance with yet another embodiment of the present invention wherein a reflective grating 3360 replaces reflective surface 3340 .
- a preferred method of fabrication of mirror assembly 3330 with grating 3360 is described hereinbelow with reference to FIGS. 22A-22F .
- the additional provision of grating 3360 causes separation of light impinging thereon according to its wavelength, such that multispectral light existing from end 3350 of core 3328 is focused at multiple locations on electro-optic component 3320 in accordance with the wavelengths of components thereof.
- FIGS. 55C-58C utilize the mirror assemblies whose fabrications are described hereinabove with reference to FIGS. 19A-20F and 22 A- 22 G, any of the mirror assemblies whose fabrications are described hereinabove with reference to FIGS. 18A-24G may alternatively be utilized.
- FIG. 59 is a simplified pictorial illustration corresponding to sectional illustration 55 D.
- FIG. 59 illustrates the wafer of FIG. 55A , with partially flat and partially concave mirror assembly 3230 mounted thereon, parallel to one of the rough inclined surfaces 3232 defined by notch 3224 , as described hereinabove with reference to FIG. 55D . It is appreciated that mirror assembly 3230 extends along the entire length of substrate 3102 .
- FIGS. 60A-60F are simplified pictorial and sectional illustrations of a fourth plurality of stages in the manufacture of the packaged electro-optic circuit of FIGS. 52A and 52B .
- FIG. 60A shows the wafer of FIG. 59 turned over.
- FIG. 60B is a sectional illustration of the wafer of FIG. 60A along lines LXB-LXB.
- FIG. 60C illustrates the formation of holes 3402 by conventional techniques, such as the use of lasers or photolithography, which communicate with electrical circuits 3120 ( FIG. 53A ) on substrate 3102 .
- FIG. 60D shows the formation of solder bumps 3404 in holes 3402 .
- the wafer is preferably diced, providing a plurality of packaged electro-optic circuit chips 3406 , as illustrated in FIG. 60F .
- an optical edge surface 3407 of each of the plurality of packaged electro-optic circuit chips 3406 is polished to provide an optical quality planar surface. It is appreciated that the planar surface defined by the polishing may be either parallel, or at any suitable angle, to the plane defined by the dicing.
- FIG. 61 shows packaged electro-optic circuit chips 3406 mounted on a conventional electrical circuit board 3408 and being interconnected by a conventional optical fiber ribbon 3410 and associated conventional optical fiber connectors 3116 ( FIG. 52B ).
Abstract
An electro-optic integrated circuit including an integrated circuit substrate, at least one optical signal providing element and at least one discrete reflecting optical element, mounted onto the integrated circuit substrate, cooperating with the at least one optical signal providing element and being operative to direct light from the at least one optical signal providing element. An electro-optic integrated circuit including an integrated circuit substrate, at least one optical signal receiving element and at least one discrete reflecting optical element mounted onto the integrated circuit substrate and cooperating with the at least one optical signal receiving element and being operative to direct light to the at least one optical signal receiving element.
Description
- The present application is a Continuation of and claims priority to U.S. patent application Ser. No. 11/365,328, filed on Feb. 28, 2006, by Avner Badehi entitled “Electro-Optic Integrated Circuits With Connectors And Methods For The Production Thereof,” which is a Continuation of U.S. patent application Ser. No. 10/314,088, filed on Dec. 6, 2002, entitled “Electro-Optic Integrated Circuits With Connectors And Methods For The Production Thereof,” now abandoned, which claims the benefit of U.S. Provisional Patent Application Ser. No. 60/373,415, filed on Apr. 16, 2002, entitled “Electro-optic Integrated Circuits and Methods for the Production Thereof.” The contents of which are expressly incorporated by reference herein.
- The present invention relates to electro-optic integrated circuits and methods for the production thereof generally and more particularly to wafer level manufacture of chip level electro-optic integrated circuits.
- The following U.S. patents of the present inventor represent the current state of the art
- 6,117,707; 6,040,235, 6,022,758; 5,980,663; 5,716,759; 5,547,906 and 5,455,455
- The following U.S. patents represent the current state of the art relevant to stud bump mounting of electrical circuits:
- 6,214,642; 6,103,551; 5,844,320; 5,641,996; 5,550,408 and 5,436,503.
- Additionally, the following patents are believed to represent the current state of the art:
- U.S. Pat. Nos. 4,168,883; 4,351,051; 4,386,821; 4,399,541; 4,615,031; 4,810,053; 4,988,159; 4,989,930; 4,989,943; 5,044,720; 5,231,686; 5,841,591; 6,052,498; 6,058,228; 6,234,688; 5,886,971; 5,912,872; 5,933,551; 6,061,169; 6,071,652; 6,096,155; 6,104,690; 6,235,141; 6,295,156; 5,771,218 and 5,872,762.
- A transceiver incorporating a connector is known in the art as shown in product descriptions for OptoCube 40 3.35 Gb/s
Channel Speed 850 nm Receiver Array 12 Channel Parallel Optical Receivers and OptoCube 40 3.35 Gb/sChannel Speed 850 nm VCSEL Array 12 Channel Parallel Optical Transmitters from Corona Optical Systems, Inc. 450 Eisenhower Lane North, Lombardi, Ill., 60418, USA. - The present invention seeks to provide improved electro-optic integrated circuits and methods for production thereof.
- There is thus provided, in accordance with a preferred embodiment of the present invention, an electro-optic integrated circuit including an integrated circuit substrate, at least one optical signal providing element and at least one discrete reflecting optical element, mounted onto the integrated circuit substrate, cooperating with the at least one optical signal providing element and being operative to direct light from the at least one optical signal providing element.
- There is also provided, in accordance with another preferred embodiment of the present invention, an electro-optic integrated circuit including an integrated circuit substrate, at least one optical signal receiving element and at least one discrete reflecting optical element mounted onto the integrated circuit substrate and cooperating with the at least one optical signal receiving element and being operative to direct light to the at least one optical signal receiving element.
- There is further provided, in accordance with yet another preferred embodiment of the present invention, an electro-optic integrated circuit including an integrated circuit substrate defining a planar surface, at least one optical signal providing element and at least one reflecting optical element having an optical axis which is neither parallel nor perpendicular to the planar surface, the element cooperating with the at least one optical signal providing element and being operative to direct light from the at least one optical signal providing element.
- There is also provided, in accordance with still another preferred embodiment of the present invention, an electro-optic integrated circuit including an integrated circuit substrate defining a planar surface, at least one optical signal receiving element and at least one reflecting optical element having an optical axis which is neither parallel nor perpendicular to the planar surface, the element cooperating with the at least one optical signal receiving element and being operative to direct light to the at least one optical signal receiving element.
- There is further provided, in accordance with another preferred embodiment of the present invention, a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate, mounting at least one optical signal providing element onto the integrated circuit substrate, mounting at least one optical signal receiving element onto the integrated circuit substrate and providing optical alignment, between the at least one optical signal providing element and the at least one optical signal receiving element, subsequent to mounting thereof, by suitable positioning along an optical path extending therebetween, an intermediate optical element and fixing the intermediate optical element to the integrated circuit substrate.
- In accordance with a further preferred embodiment of the present invention, the intermediate optical element, when fixed to the substrate, has an optical axis which is neither parallel nor perpendicular to a planar surface of the integrated circuit substrate.
- There is also provided, in accordance with yet another preferred embodiment of the present invention, a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate, mounting at least one optical signal providing element on the integrated circuit substrate and mounting at least one discrete reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal providing element and to direct light from the at least one optical signal providing element.
- There is further provided, in accordance with still another preferred embodiment of the present invention, a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate, mounting at least one optical signal receiving element on the integrated circuit substrate and mounting at least one discrete reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal receiving element and to direct light to the at least one optical signal receiving element.
- There is also provided, in accordance with another preferred embodiment of the present invention, a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate defining a planar surface, mounting at least one optical signal providing element on the integrated circuit substrate and mounting at least one reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal providing element and to direct light from the at least one optical signal providing element, wherein an optical axis of the at least one reflecting optical element is neither parallel nor perpendicular to the planar surface.
- There is further provided, in accordance with yet another preferred embodiment of the present invention, a method for producing an electro-optic integrated circuit including providing an integrated circuit substrate defining a planar surface, mounting at least one optical signal receiving element on the integrated circuit substrate and mounting at least one reflecting optical element onto the integrated circuit substrate to cooperate with the at least one optical signal receiving element and to direct light to the at least one optical signal receiving element, wherein an optical axis of the at least one reflecting optical element is neither parallel nor perpendicular to the planar surface.
- In accordance with a preferred embodiment of the present invention, the at least one optical element includes a flat reflective surface. Additionally, the at least one optical element includes a concave mirror. Alternatively, the at least one optical element includes a partially flat and partially concave mirror. Additionally, the partially concave mirror includes a mirror with multiple concave reflective surfaces.
- In accordance with another preferred embodiment, the at least one optical element includes a reflective grating. Additionally, the at least one optical element includes reflective elements formed on opposite surfaces of an optical substrate. Preferably, at least one of the reflective elements includes a flat reflective surface. Alternatively, at least one of the reflective elements includes a concave mirror. Alternatively or additionally, at least one of the reflective elements includes a partially flat and partially concave mirror. Additionally, the mirror includes a mirror with multiple concave reflective surfaces. Alternatively, at least one of the reflective elements includes a reflective grating.
- Preferably, the at least one optical element is operative to focus light received from the optical signal providing element. Alternatively, the at least one optical element is operative to collimate light received from the optical signal providing element. In accordance with another preferred embodiment, the at least one optical element is operative to focus at least one of multiple colors of light received from the optical signal providing element. Additionally or alternatively, the at least one optical element is operative to collimate at least one of multiple colors of light received from the optical signal providing element. In accordance with another preferred embodiment, the at least one optical element is operative to enhance the optical properties of light received from the optical signal providing element.
- In accordance with a preferred embodiment, the optical signal providing element includes an optical fiber. Alternatively, the optical signal providing element includes a laser diode. Additionally or alternatively, the optical signal providing element includes a waveguide. In accordance with another preferred embodiment, the optical signal providing element includes an array waveguide grating. Alternatively, the optical signal providing element includes a semiconductor optical amplifier.
- Preferably, the optical signal providing element is operative to convert an electrical signal to an optical signal. Alternatively, the optical signal providing element is operative to transmit an optical signal. Additionally, the optical signal providing element also includes an optical signal receiving element. In accordance with another preferred embodiment, the optical signal providing element is operative to generate an optical signal.
- In accordance with a preferred embodiment of the present invention, the integrated circuit substrate includes gallium arsenide. Alternatively, the integrated circuit substrate includes indium phosphide.
- In accordance with another preferred embodiment of the present invention, the integrated circuit includes at least one optical signal providing element and at least one optical element receiving element, the at least one discrete reflecting optical element cooperating with the at least one optical signal providing element and the at least one optical signal receiving element and being operative to direct light from the at least one signal providing element to the at least one optical signal receiving element.
- Preferably, the at least one optical signal receiving element includes an optical fiber. Alternatively, the at least one optical signal receiving element includes a laser diode. Additionally or alternatively, the at least one optical signal receiving element includes a diode detector.
- In accordance with a preferred embodiment of the present invention, the at least one optical signal receiving element is operative to convert an optical signal to an electrical signal. Additionally, the at least one optical signal receiving element is operative to transmit an optical signal. Alternatively, the at least one optical signal receiving element also includes an optical signal providing element.
- Preferably, the at least one reflecting optical element is operative to focus light received by the optical signal receiving element. Alternatively, the at least one reflecting optical element is operative to collimate light received by the optical signal receiving element. In accordance with another preferred embodiment, the at least one reflecting optical element is operative to focus at least one of multiple colors of light received by the optical signal receiving element. Additionally or alternatively, the at least one reflecting optical element is operative to collimate at least one of multiple colors of light received by the optical signal receiving element. In accordance with another preferred embodiment, the at least one reflecting optical element is operative to enhance the optical properties of light received by the optical signal receiving element.
- There is also provided, in accordance with another preferred embodiment of the present invention, an integrated circuit including a first integrated circuit substrate having first and second planar surfaces, the first planar surface having first electrical circuitry formed thereon and the second planar surface having formed therein at least one recess and at least one second integrated circuit substrate having second electrical circuitry formed thereon, the at least one second integrated circuit substrate being located at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- There is further provided, in accordance with yet another preferred embodiment of the present invention, an integrated circuit including a first integrated circuit substrate having first electrical circuitry formed thereon and having formed therein at least one recess and at least one second integrated circuit substrate having second electrical circuitry formed thereon, the at least one second integrated circuit substrate being located at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- There is also provided, in accordance with still another preferred embodiment of the present invention, a method for producing an integrated circuit including providing a first integrated circuit substrate, with first and second planar surfaces, forming first electrical circuitry on the first planar surface, forming at least one recess in the second planar surface, providing at least one second integrated circuit substrate, forming second electrical circuitry on the at least one second integrated circuit substrate and locating the at least one second integrated circuit substrate at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- There is further provided, in accordance with another preferred embodiment of the present invention, a method for producing an integrated circuit including providing a first integrated circuit substrate, forming first electrical circuitry on the first substrate, forming at least one recess in the first substrate, providing at least one second integrated circuit substrate, forming second electrical circuitry on the at least one second integrated circuit substrate and locating the at least one second integrated circuit substrate at least partially in the at least one recess, the second electrical circuitry communicating with the first electrical circuitry.
- Preferably, the first electrical circuitry includes electro-optic components. Additionally, the second electrical circuitry includes electro-optic components. In accordance with a preferred embodiment, the second electrical circuitry communicating with the first electrical circuitry includes communicating via an optical communication path. Additionally, the optical communication path includes optical coupling through free space.
- There is also provided, in accordance with still another preferred embodiment of the present invention, an integrated circuit including a first integrated circuit substrate having first and second planar surfaces, the first planar surface having first electrical circuitry formed thereon and the second planar surface having formed therein at least one recess and at least one second substrate, the at least one second substrate being located at least partially in the at least one recess, the second substrate containing at least one element communicating with the first electrical circuitry.
- There is further provided, in accordance with another preferred embodiment, an integrated circuit including a first integrated circuit substrate, having electrical circuitry formed thereon and having formed therein at least one recess and at least one second substrate, the at least one second substrate being located at least partially in the at least one recess, the second substrate containing at least one element communicating with the electrical circuitry.
- There is also provided, in accordance with yet another preferred embodiment, a method for producing an integrated circuit including providing a first integrated circuit substrate, with first and second planar surfaces, forming first electrical circuitry on the first planar surface, forming at least one recess in the second planar surface, providing at least one second substrate and locating the at least one second substrate at least partially in the at least one recess, the second substrate containing at least one element communicating with the first electrical circuitry.
- There is further provided, in accordance with still another preferred embodiment, a method for producing an integrated circuit including providing a first integrated circuit substrate, forming electrical circuitry on the first substrate, forming at least one recess in the first substrate, providing at least one second substrate and locating the at least one second substrate at least partially in the at least one recess, the second substrate containing at least one element communicating with the electrical circuitry.
- In accordance with a preferred embodiment, the first electrical circuitry includes electro-optic components. Additionally, the at least one element includes electro-optic components. Preferably, the at least one element communicating with the first electrical circuitry includes communicating via an optical communication path. Additionally, the optical communication path includes optical coupling through free space.
- There is yet further provided, in accordance with another preferred embodiment of the present invention, an integrated circuit including a silicon integrated circuit substrate having electrical signal processing circuitry formed thereon and at least one discrete optical element mounted thereon, the electrical signal processing circuitry including an electrical signal input and an electrical signal output and the at least one discrete optical element including an optical input and an optical output.
- There is also provided, in accordance with yet another preferred embodiment of the present invention, a method for producing an integrated circuit including providing a silicon integrated circuit substrate, forming electrical signal processing circuitry on the substrate and mounting at least one discrete optical element on the substrate, the electrical signal processing circuitry including an electrical signal input and an electrical signal output and the at least one discrete optical element including an optical input and an optical output.
- Preferably, the optical element is operative to convert the electrical signal output into the optical input. Alternatively, the electrical signal processing circuitry is operative to convert the optical output into the electrical signal input. In accordance with another preferred embodiment, the electrical signal processing circuitry and the discrete optical element are located on a single planar surface of the substrate. Alternatively, the electrical signal processing circuitry and the discrete optical element are located on different planar surfaces of the substrate.
- There is also provided in accordance with still another preferred embodiment of the present invention, an optical connector including a plurality of optical elements defining at least one optical input path and at least one optical output path, the at least one optical input path and the at least one optical output path being non-coaxial.
- There is further provided in accordance with another preferred embodiment of the present invention, a method for producing an optical connector including providing a plurality of optical elements, defining at least one optical input path through at least one of the plurality of optical elements and defining at least one optical output path through at least one of the plurality of optical elements, the at least one optical input path and the at least one optical output path being non-coaxial.
- Preferably, at least one of the plurality of optical elements includes a flat reflective surface. Additionally, at least one of the plurality of optical elements includes a concave mirror. Additionally or alternatively, at least one of the plurality of optical elements includes a partially flat and partially concave mirror. Alternatively, at least one of the plurality of optical elements includes a mirror with multiple concave reflective surfaces. Additionally or alternatively, at least one of the plurality of optical elements includes a reflective grating. Additionally, at least one of the plurality of optical elements includes reflective elements formed on opposite surfaces of an optical substrate.
- In accordance with a preferred embodiment, at least one of the plurality of optical elements is operative to focus light. Alternatively, at least one of the plurality of optical elements is operative to collimate light. Additionally, at least one of the plurality of optical elements is operative to focus at least one of multiple colors of light. Additionally or alternatively, at least one of the plurality of optical elements is operative to collimate at least one of multiple colors of light. Alternatively, at least one of the plurality of optical elements is operative to enhance the optical properties of light.
- Preferably, at least one of the plurality of optical elements includes an optical fiber. Additionally, at least one of the plurality of optical elements includes a laser diode. Alternatively, at least one of the plurality of optical elements includes a diode detector.
- There is further provided in accordance with still another preferred embodiment of the present invention an optical reflector including an optical substrate, at least one microlens formed on a surface of the optical substrate and a first reflective surface formed over the at least one microlens.
- There is still further provided in accordance with yet another preferred embodiment of the present invention a method for producing an optical reflector including providing an optical substrate, forming at least one microlens on a surface of the optical substrate, coating the at least one microlens with a reflective material and dicing the substrate.
- Preferably, the first reflective surface is also formed over at least a portion of the surface of the optical substrate. Alternatively, at least a portion of the first reflective surface includes a grating. Preferably, the first reflective surface includes aluminum.
- In accordance with another preferred embodiment, the optical reflector also includes at least one second reflective surface formed on at least a portion of an opposite surface of the substrate. Additionally, at least a portion of the second reflective surface includes a grating. Preferably, the second reflective surface includes aluminum.
- In accordance with yet another preferred embodiment, the optical reflector also includes a notch formed in the opposite surface of the substrate.
- Preferably, the at least one microlens includes photoresist. Alternatively, the at least one microlens is formed by photolithography and thermal reflex forming. Additionally, the at least one microlens is formed by photolithography using a grey scale mask forming. Alternatively, the at least one microlens is formed by jet printing formation.
- In accordance with still another preferred embodiment, the at least one microlens has an index of refraction which is identical to that of the optical substrate. Alternatively, the at least one microlens has an index of refraction which closely approximates that of the optical substrate.
- There is also provided in accordance with another preferred embodiment of the present invention a packaged electro-optic circuit having integrally formed therein an optical connector and electrical connections.
- There is further provided in accordance with yet another preferred embodiment of the present invention a method for wafer scale production of an electro-optic circuit having integrally formed therein an optical connector and electrical connections including wafer scale formation of a multiplicity of electro-optic circuits onto a substrate, wafer scale provision of at least one optical waveguide on the substrate, wafer scale mounting of at least one integrated circuit component onto the substrate, wafer scale formation of at least one optical pathway providing an optical connection between the at least one integrated circuit component and the at least one optical waveguide, wafer scale formation of at least one mechanical connector guide on the substrate, wafer scale formation of at least one packaging layer over at least one surface of the substrate, and thereafter, dicing the substrate to define a multiplicity of electro-optic circuits, each having integrally formed therein an optical connector.
- Preferably, the at least one optical fiber defines a connector interface.
- There is still further provided in accordance with still another embodiment of the present invention a method of mounting an integrated circuit onto an electrical circuit including forming an integrated circuit with a multiplicity of electrical connection pads which generally lie along a surface of the integrated circuit, forming an electrical circuit with a multiplicity of electrical connection contacts which generally protrude from a surface of the electrical circuit and employing at least a conductive adhesive to electrically and mechanically join the multiplicity of electrical connection pads to the multiplicity of electrical connection contacts.
- Preferably, the method also includes providing an underfill layer.
- The present invention will be appreciated more fully from the following detailed description, taken in conjunction with the drawings in which:
-
FIGS. 1A , 1B, 1C, 1D and 1E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with a preferred embodiment of the present invention; -
FIGS. 2A , 2B, 2C, and 2D are simplified sectional illustrations of further stages in the production of the electro-optic integrated circuit referenced inFIGS. 1A-1E ; -
FIG. 3 is an enlarged simplified optical illustration of a portion ofFIG. 2D ; -
FIGS. 4A , 4B, 4C, 4D and 4E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with another preferred embodiment of the present invention; -
FIGS. 5A , 5B, 5C and 5D are simplified sectional illustrations of further stages in the production of the electro-optic integrated circuit referenced inFIGS. 4A-4E ; -
FIGS. 6A , 6B and 6C are enlarged simplified optical illustrations of a portion ofFIG. 5D in accordance with preferred embodiments of the present invention; -
FIG. 7 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention; -
FIGS. 8A , 8B and 8C are enlarged simplified optical illustrations of a portion ofFIG. 7 in accordance with other embodiments of the present invention; -
FIGS. 9A , 9B, 9C, 9D and 9E are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention; -
FIGS. 10A , 10B, 10C and 10D are simplified sectional illustrations of further stages in the production of the electro-optic integrated circuit referenced inFIGS. 9A-9E ; -
FIGS. 11A , 11B and 11C are enlarged simplified optical illustrations of a portion ofFIG. 10D in accordance with preferred embodiments of the present invention; -
FIG. 12 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention; -
FIGS. 13A , 13B and 13C are enlarged simplified optical illustrations of a portion ofFIG. 12 in accordance with further preferred embodiments of the present invention; -
FIGS. 14A , 14B, 14C and 14D are simplified sectional illustrations of stages in the production an electro-optic integrated circuit in accordance with another embodiment of the present invention; -
FIGS. 15A , 15B and 15C are simplified optical illustrations ofFIG. 14D in accordance with preferred embodiments of the present invention; -
FIG. 16 is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention; -
FIGS. 17A , 17B and 17C are enlarged simplified optical illustrations of a portion ofFIG. 16 in accordance with further embodiments of the present invention; -
FIGS. 18A , 18B, 18C and 18D are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 4A-6C in accordance with one embodiment of the present invention; -
FIGS. 19A , 19B, 19C, 19D and 19E are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-6C in accordance with another embodiment of the present invention; -
FIGS. 20A , 20B, 20C, 20D, 20E and 20F are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 9A-17C in accordance with yet another embodiment of the present invention; -
FIGS. 21A , 21B, 21C, 21D, 21E and 21F are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-17C in accordance with still another embodiment of the present invention; -
FIGS. 22A , 22B, 22C, 22D, 22E, 22F and 22G are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-8C in accordance with a further embodiment of the present invention; -
FIGS. 23A , 23B, 23C, 23D, 23E, 23F and 23G are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 9A-17C in accordance with yet a further embodiment of the present invention; -
FIGS. 24A , 24B, 24C, 24D, 24E, 24F and 24G are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-17C in accordance with a still further embodiment of the present invention; -
FIGS. 25A , 25B, 25C and 25D are simplified illustrations of multiple stages in the production of a multi-chip module in accordance with a preferred embodiment of the present invention; -
FIG. 26 is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including a laser light source; -
FIG. 27 is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including an optical detector; -
FIG. 28 is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including an electrical element; -
FIG. 29 is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including multiple elements located in multiple recesses formed within a substrate; -
FIG. 30 is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including multiple stacked elements located in recesses formed within substrates; -
FIGS. 31A , 31B, 31C and 31D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention; -
FIG. 32 is an enlarged simplified optical illustration of a portion ofFIG. 31D ; -
FIGS. 33A , 33B, 33C and 33D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention; -
FIG. 34 is an enlarged simplified optical illustration of a portion ofFIG. 33D ; -
FIGS. 35A , 35B, 35C and 35D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention; -
FIG. 36 is an enlarged simplified optical illustration of a portion ofFIG. 35D ; -
FIGS. 37A , 37B, 37C and 37D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention; -
FIG. 38 is an enlarged simplified optical illustration of a portion ofFIG. 37D ; -
FIGS. 39A , 39B, 39C and 39D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with yet another preferred embodiment of the present invention; -
FIG. 40 is a simplified optical illustration ofFIG. 39D ; -
FIGS. 41A , 41B, 41C and 41D are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with still another preferred embodiment of the present invention; -
FIG. 42 is a simplified optical illustration ofFIG. 41D ; -
FIG. 43 is a simplified optical illustration of optical communication between connectors of the types shown inFIGS. 40 and 42 ; -
FIG. 44 is a simplified optical illustration of optical communication between two connectors of the type shown inFIG. 40 ; -
FIG. 45 is a simplified optical illustration of optical communication between two connectors of the type shown inFIG. 42 ; -
FIGS. 46A , 46B, 46C and 46D are simplified illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention; -
FIG. 47 is an enlarged simplified optical illustration of a portion ofFIG. 46D ; -
FIG. 48 is a simplified optical illustration of optical communication between an electro-optic integrated circuit and an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention; -
FIG. 49 is a simplified optical illustration of optical communication between an optic integrated circuit and an electro-optic integrated circuit in accordance with a preferred embodiment of the present invention; -
FIGS. 50A , 50B, 50C, 50D and 50E are simplified pictorial illustrations of stages in the production of an electro-optic integrated circuit constructed and operative in accordance with still another preferred embodiment of the present invention; -
FIG. 51 is a simplified functional illustration of a preferred embodiment of the structure ofFIG. 50E ; -
FIGS. 52A and 52B are simplified pictorial illustrations of a packaged electro-optic circuit having integrally formed therein an optical connector and electrical connections, alone and in conjunction with a conventional optical connector; -
FIGS. 53A-53F are simplified pictorial and sectional illustrations of a first plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B ; -
FIGS. 54A-54J are simplified pictorial and sectional illustrations of a second plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B ; -
FIGS. 55A-55D are simplified pictorial and sectional illustrations of a third plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B ; -
FIGS. 56A , 56B and 56C are enlarged simplified optical illustrations of a portion ofFIG. 55D in accordance with various preferred embodiments of the present invention; -
FIG. 57 is a simplified sectional illustration of an electro-optic circuit constructed and operative in accordance with another preferred embodiment of the present invention; -
FIGS. 58A , 58B and 58C are enlarged simplified optical illustrations of a portion ofFIG. 57 in accordance with various other preferred embodiments of the present invention; -
FIG. 59 is a simplified pictorial illustration corresponding to sectional illustration 55D; -
FIGS. 60A-60F are simplified pictorial and sectional illustrations of a fourth plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B ; and -
FIG. 61 is a simplified illustration of incorporation of packaged electro-optic circuits of the type shown inFIGS. 52A-52B as parts of a larger electrical circuit. - Reference is now made to
FIGS. 1A , 1B, 1C, 1D and 1E, which are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with a preferred embodiment of the present invention. As seen inFIG. 1A , one or moreelectrical circuits 100 are preferably formed onto afirst surface 102 of asubstrate 104, preferably a silicon substrate or a substrate that is generally transparent to light within at least part of the wavelength range of 600-1650 nm, typically of thickness between 200-800 microns. Theelectrical circuits 100 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits, and included within aplanarized layer 105 formed ontosubstrate 104. The substrate preferably is then turned over, as indicated by anarrow 106, and one or moreelectrical circuits 108 are formed on anopposite surface 110 ofsubstrate 104, as shown inFIG. 1B . - Referring now to
FIG. 1C , preferably, following formation ofelectrical circuits respective surfaces substrate 104, an array of parallel, spaced, elongate opticalfiber positioning elements 112 is preferably formed, such as by conventional photolithographic techniques, over aplanarized layer 114 including electrical circuits 108 (FIG. 1B ). As seen inFIG. 1D , an array ofoptical fibers 116 is disposed overlayer 114, each fiber being positioned betweenadjacent positioning elements 112. The fibers are fixed in place relative topositioning elements 112 and to layer 114 ofsubstrate 104 by means of asuitable adhesive 118, preferably epoxy, as seen inFIG. 1E . - Reference is now made to
FIGS. 2A , 2B, 2C, and 2D, which are simplified sectional illustrations, taken along the lines II-II inFIG. 1E , of further stages in the production of an electro-optic integrated circuit. As seen inFIG. 2A , electro-optic components 120, such as diode lasers, are mounted onto electrical circuit 100 (not shown), included withinplanarized layer 105. It is appreciated that electro-optic components 120 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. - As shown in
FIG. 2B , atransverse notch 124 is preferably formed, at least partially overlapping the locations of the electro-optic components 120 and extending through the adhesive 118 and partially through eachoptical fiber 116. Specifically, in this embodiment, thenotch 124 extends through part of thecladding 126 of eachfiber 116 and entirely through thecore 128 of each fiber. It is appreciated that the surfaces defined by thenotch 124 are relatively rough, as shown. - Turning now to
FIG. 2C , it is seen that amirror 130 is preferably mounted parallel to one of the roughinclined surfaces 132 defined bynotch 124.Mirror 130 preferably comprises aglass substrate 134, with asurface 135 facingsurface 132 defined bynotch 124, having formed on anopposite surface 136 thereof, a metallic layer or adichroic filter layer 138. As seen inFIG. 2D , preferably, themirror 130 is securely held in place partially by anysuitable adhesive 139, such as epoxy, and partially by anoptical adhesive 140, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index, preferably, is precisely matched to that of thecores 128 of theoptical fibers 116. It is appreciated thatoptical adhesive 140 may be employed throughout instead of adhesive 139. The adhesive 140 preferably fills the interstices between the roughenedsurface 132 defined bynotch 124 andsurface 135 ofmirror 130. - Reference is now made to
FIG. 3 , which is an enlarged simplified optical illustration of a portion ofFIG. 2D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 150 of acore 128, throughadhesive 140 andsubstrate 134 to areflective surface 152 oflayer 138 ofmirror 130 and thence throughsubstrate 134, adhesive 140 andcladding 126, throughlayer 114 andsubstrate 104, which are substantially transparent to this light. It is noted that the index of refraction of adhesive 140 is close to but not identical to that ofcladding 126 andsubstrate 134. It is noted thatmirror 130 typically reflects light onto electro-optic component 120 (FIG. 2D ), without focusing or collimating the light. - Reference is now made to
FIGS. 4A , 4B, 4C, 4D and 4E, which are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with a preferred embodiment of the present invention. As seen inFIG. 4A , one or moreelectrical circuits 200 are preferably formed onto afirst surface 202 of asubstrate 204, preferably a substrate that is generally transparent to light within at least part of the wavelength range of 400-1650 nm, typically of thickness between 200-1000 microns. Theelectrical circuits 200 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits, and included within aplanarized layer 205 formed ontosubstrate 404. The substrate preferably is then turned over, as indicated by anarrow 206, and as shown inFIG. 4B . - Referring now to
FIG. 4C , preferably, following formation ofelectrical circuits 200 onsurface 202 ofsubstrate 204, an array of parallel, spaced, elongate opticalfiber positioning elements 212 is preferably formed, such as by conventional photolithographic techniques, over anopposite surface 210 ofsubstrate 204. As seen inFIG. 4D , an array ofoptical fibers 216 is disposed oversurface 210 ofsubstrate 204, each fiber being positioned betweenadjacent positioning elements 212. Thefibers 216 are fixed in place relative topositioning elements 212 and to surface 210 ofsubstrate 204 by means of asuitable adhesive 218, preferably epoxy, as seen inFIG. 4E . - Reference is now made to
FIGS. 5A , 5B, 5C, and 5D, which are simplified sectional illustrations, taken along the lines V-V inFIG. 4E , of further stages in the production of an electro-optic integrated circuit. As seen inFIG. 5A , electro-optic components 220, such as diode lasers, are mounted onto electrical circuit 200 (not shown), included withinplanarized layer 205. It is appreciated that electro-optic components 220 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. - As shown in
FIG. 5B , atransverse notch 224 is preferably formed, at least partially overlapping the locations of the electro-optic components 220 and extending through the adhesive 218, entirely through eachoptical fiber 216 and partially intosubstrate 204. Specifically, in this embodiment, thenotch 224 extends through all ofcladding 226 of eachfiber 216 and entirely through thecore 228 of each fiber. It is appreciated that the surfaces defined by thenotch 224 are relatively rough, as shown. - Turning now to
FIG. 5C , it is seen that a partially flat and partiallyconcave mirror 230 is preferably mounted parallel to one of the roughinclined surfaces 232 defined bynotch 224.Mirror 230 preferably comprises aglass substrate 234 having formed thereon acurved portion 236 over which is formed a curved metallic layer or adichroic filter layer 238. As seen inFIG. 5D , preferably, themirror 230 is securely held in place partially by anysuitable adhesive 239, such as epoxy, and partially by anoptical adhesive 240, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 228 of theoptical fibers 216. It is appreciated thatoptical adhesive 240 may be employed throughout instead of adhesive 239. Optical adhesive 240 preferably tills the interstices between the roughenedsurface 232 defined bynotch 224 and asurface 242 ofmirror 230. - Reference is now made to
FIG. 6A , which is an enlarged simplified optical illustration of a portion ofFIG. 5D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from anend 250 of acore 228, throughadhesive 240,substrate 234 andcurved portion 236 to areflective surface 252 oflayer 238 and thence throughcurved portion 236, adhesive 240,substrate 204 andlayer 205 which are substantially transparent to this light. It is noted that the index of refraction of adhesive 240 is close to but not identical to that ofcurved portion 236 andsubstrates FIG. 6A , the operation ofcurved layer 238 is to focus light exiting fromend 250 ofcore 228 onto the electro-optic component 220. - Reference is now made to
FIG. 6B , which is an enlarged simplified optical illustration of a portion ofFIG. 5D in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 238 produces collimation rather than focusing of the light exiting fromend 250 ofcore 228 onto the electro-optic component 220. - Reference is now made to
FIG. 6C , which is an enlarged simplified optical illustration of a portion ofFIG. 5D in accordance with yet another embodiment of the present invention wherein agrating 260 is added tocurved layer 238. The additional provision of grating 260 causes separation of light impinging thereon according to its wavelength, such that multispectral light exiting fromend 250 ofcore 228 is focused at multiple locations on electro-optic component 220 in accordance with the wavelengths of components thereof. - Reference is now made to
FIG. 7 , which is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention. The embodiment ofFIG. 7 corresponds generally to that described hereinabove with respect toFIG. 5D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface. As seen inFIG. 7 , it is seen that light fromoptical fiber 316 is directed onto an electro-optic component 320 by a partially flat and partiallyconcave mirror assembly 330, preferably mounted parallel to one of the roughinclined surfaces 332 defined bynotch 324.Mirror assembly 330 preferably comprises aglass substrate 334 having formed thereon a plurality ofcurved portions 336 over which are formed a curved metallic layer or adichroic filter layer 338.Mirror assembly 330 also defines areflective surface 340, which is disposed on aplanar surface 342 generally oppositelayer 338. Preferably, themirror assembly 330 is securely held in place partially by anysuitable adhesive 343, such as epoxy, and partially by anoptical adhesive 344, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 328 of theoptical fibers 316. It is appreciated thatoptical adhesive 344 may be employed throughout instead of adhesive 343. Theoptical adhesive 344 preferably fills the interstices between the roughenedsurface 332 defined bynotch 324 andsurface 342 ofmirror assembly 330. - Reference is now made to
FIG. 8A , which is an enlarged simplified optical illustration of a portion ofFIG. 7 . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from anend 350 of acore 328, throughadhesive 344,substrate 334 and firstcurved portion 336, to a curvedreflective surface 352 oflayer 338 and thence through firstcurved portion 336 andsubstrate 334 toreflective surface 340, fromreflective surface 340 throughsubstrate 334 and secondcurved portion 336 to another curvedreflective surface 354 oflayer 338 and thence through secondcurved portion 336,substrate 334, adhesive 344,substrate 304 andlayer 305, which are substantially transparent to this light. It is noted that the index of refraction of adhesive 344 is close to but not identical to that ofsubstrates FIG. 8A , the operation ofcurved layer 338 andreflective surface 340 is to focus light exiting fromend 350 ofcore 328 onto the electro-optic component 320. - Reference is now made to
FIG. 8B , which is an enlarged simplified optical illustration of a portion ofFIG. 7 in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 338 produces collimation rather than focusing of the light exiting fromend 350 ofcore 328 onto the electro-optic component 320. - Reference is now made to
FIG. 8C , which is an enlarged simplified optical illustration of a portion ofFIG. 7 in accordance with yet another embodiment of the present invention wherein areflective grating 360 replacesreflective surface 340. The additional provision of grating 360 causes separation of light impinging thereon according to its wavelength, such that multispectral light existing fromend 350 ofcore 328 is focused at multiple locations on electro-optic component 320 in accordance with the wavelengths of components thereof. - Reference is now made to
FIGS. 9A , 9B, 9C, 9D and 9E, which are simplified pictorial illustrations of initial stages in the production of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention. As seen inFIG. 9A , one or moreelectrical circuits 400 are preferably formed onto a portion of asurface 402 of asubstrate 404, preferably a glass, silicon or ceramic substrate, typically of thickness between 300-1000 microns. Theelectrical circuits 400 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits, and included within aplanarized layer 406 formed ontosubstrate 404. - Turning now to
FIG. 9B , it is seen that another portion of thesurface 402 is formed with an array of parallel, spaced, elongate opticalfiber positioning elements 412 by any suitable technique, such as etching or notching. As seen inFIG. 9C , an array ofoptical fibers 416 is engaged withsubstrate 404, each fiber being positioned betweenadjacent positioning elements 412. The fibers are fixed in place relative topositioning elements 412 and tosubstrate 404 by means of asuitable adhesive 418, preferably epoxy, as seen inFIG. 9D . As seen inFIG. 9E , a plurality of electro-optic components 420, such as diode lasers, are mounted in operative engagement withelectrical circuits 400, each electro-optic component 420 preferably being aligned with acorresponding fiber 416. It is appreciated that electro-optic component 420 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. - Reference is now made to
FIGS. 10A , 10B, 10C, and 10D, which are simplified sectional illustrations, taken along the lines X-X inFIG. 9E , of further stages in the production of an electro-optic integrated circuit. As seen inFIG. 10A , which corresponds toFIG. 9E , electro-optic components 420 are each mounted onto an electrical circuit (not shown), included withinplanarized layer 406 formed ontosubstrate 404. As shown inFIG. 10B , atransverse notch 424 is preferably formed to extend through the adhesive 418 entirely through eachoptical fiber 416 and partially intosubstrate 404. Specifically, in this embodiment, thenotch 424 extends through all ofcladding 426 of eachfiber 416 and entirely through thecore 428 of each fiber. It is appreciated that the surfaces defined by thenotch 424 are relatively rough, as shown. - Turning now to
FIG. 10C , it is seen that a partially flat and partiallyconcave mirror assembly 430 is preferably mounted parallel to one of the roughinclined surfaces 432 defined bynotch 424.Mirror assembly 430 preferably comprises aglass substrate 434 having formed thereon acurved portion 436 over which is formed a curved metallic layer or adichroic filter layer 438.Mirror assembly 430 also defines aplanar surface 440, generally oppositelayer 438, having formed thereon a metallic layer or adichroic filter layer 442 underlying part of thecurved portion 436. - As seen in
FIG. 10D , preferably, themirror assembly 430 is securely held in place partially by anysuitable adhesive 444, such as epoxy, and partially by anoptical adhesive 446, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 428 of theoptical fibers 416. It is appreciated thatoptical adhesive 446 may be employed throughout instead of adhesive 444. - Reference is now made to
FIG. 11A , which is an enlarged simplified optical illustration of a portion ofFIG. 10D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 420 throughglass substrate 434 andcurved portion 436 ofmirror assembly 430 into reflective engagement withlayer 438 and thence throughcurved portion 436 andsubstrate 434 tolayer 442 and reflected fromlayer 442 throughsubstrate 434 and adhesive 446 to focus at anend 450 of acore 428. In the embodiment ofFIG. 11A , the operation ofcurved layer 438 is to focus light exiting from electro-optic component 420 ontoend 450 ofcore 428. - Reference is now made to
FIG. 11B , which is an enlarged simplified optical illustration of a portion ofFIG. 10D in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 438 produces collimation rather than focusing of the light exiting from electro-optic component 420 ontoend 450 ofcore 428. - Reference is now made to
FIG. 11C , which is an enlarged simplified optical illustration of a portion ofFIG. 10D in accordance with yet another embodiment of the present invention wherein agrating 460 is added tocurved layer 438. The additional provision of grating 460 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 420 is focused onend 450 ofcore 428. - Reference is now made to
FIG. 12 , which is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention. The embodiment ofFIG. 12 corresponds generally to that described hereinabove with respect toFIG. 10D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface. As seen inFIG. 12 , it is seen that light from an electro-optic component 520, such as a laser diode, is directed onto a partially flat and partiallyconcave mirror assembly 530, preferably mounted parallel to one of the roughinclined surfaces 532 defined bynotch 524. It is appreciated that electro-optic component 520 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.Mirror assembly 530 preferably comprises aglass substrate 534 having formed thereon a plurality ofcurved portions 536 over which are formed a curved metallic layer or adichroic filter layer 538.Mirror assembly 530 also defines areflective surface 540, which is disposed on aplanar surface 542 generally oppositelayer 538. - Preferably, the
mirror assembly 530 is securely held in place partially by anysuitable adhesive 544, such as epoxy, and partially by anoptical adhesive 546, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 528 of theoptical fibers 516. It is appreciated thatoptical adhesive 546 may be employed throughout instead of adhesive 544. - Reference is now made to
FIG. 13A , which is an enlarged simplified optical illustration of a portion ofFIG. 12 . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 520 throughsubstrate 534 and a firstcurved portion 536 ofmirror assembly 530 into reflective engagement with a part oflayer 538 overlying firstcurved portion 536 and thence through firstcurved portion 536 andsubstrate 534 toreflective surface 540, where it is reflected back throughsubstrate 534 and a secondcurved portion 536 to another part oflayer 538 overlying secondcurved portion 536 and is reflected back through secondcurved portion 536 andsubstrate 534 toreflective surface 540 and thence throughsubstrate 534 and adhesive 546 to focus at anend 550 of acore 528. In the embodiment ofFIG. 13A , the operation ofcurved layer 538 overlying first and secondcurved portions 536 is to focus light exiting from electro-optic component 520 ontoend 550 ofcore 528, with enhanced optical properties. - Reference is now made to
FIG. 13B , which is an enlarged simplified optical illustration of a portion ofFIG. 12 in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 538 produces collimation rather than focusing of the light exiting from electro-optic component 520 ontoend 550 ofcore 528. - Reference is now made to
FIG. 13C , which is an enlarged simplified optical illustration of a portion ofFIG. 12 in accordance with yet another embodiment of the present invention wherein areflective grating 560 replaces part ofreflective surface 540. The additional provision of grating 560 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 520 is focused onend 550 ofcore 528. - Reference is now made to
FIGS. 14A , 14B, 14C and 14D, which are simplified pictorial illustrations of further stages in the production of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention. As seen inFIG. 14A , similarly to that shown inFIG. 5A , electro-optic components 600, such as edge emitting diode lasers, are mounted onto an electrical circuit (not shown), included within aplanarized layer 602 formed onto asurface 603 of asubstrate 604, at theopposite surface 606 of which are mountedoptical fibers 616 by means of adhesive 618. It is appreciated that electro-optic components 600 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. - As shown in
FIG. 14B , atransverse notch 624 is preferably formed, extending completely throughsubstrate 604 and entirely through eachoptical fiber 616 and partially intoadhesive 618. Specifically, in this embodiment, thenotch 624 extends through all ofcladding 626 of eachfiber 616 and entirely through thecore 628 of each fiber. It is appreciated that the surfaces defined by thenotch 624 are relatively rough, as shown. - Turning now to
FIG. 14C , it is seen that a partially flat and partiallyconcave mirror assembly 630 is preferably mounted parallel to one of the roughinclined surfaces 632 defined bynotch 624.Mirror assembly 630 preferably comprises aglass substrate 634 having formed thereon acurved portion 636. A partially planar and partially curved metallic layer or adichroic filter layer 638 is formed over asurface 640 ofsubstrate 634 andcurved portion 636 formed thereon. Areflective layer 642 is formed on anopposite surface 643 ofsubstrate 634opposite layer 638. - As seen in
FIG. 14D , preferably, themirror assembly 630 is securely held in place partially by anysuitable adhesive 644, such as epoxy, and partially by anoptical adhesive 646, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 628 of theoptical fibers 616. It is appreciated thatoptical adhesive 646 may be employed throughout instead of adhesive 644. - Reference is now made to
FIG. 15A , which is a simplified optical illustration ofFIG. 14D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 600 throughglass substrate 634 andcurved portion 636 ofmirror assembly 630 into reflective engagement with acurved portion 660 oflayer 638 and thence throughcurved portion 636 andsubstrate 634 into reflective engagement withlayer 642 and thence through multiple reflections throughsubstrate 634 betweenlayer 638 andlayer 642, and then throughsubstrate 634 and adhesive 646 to focus at anend 650 of acore 628. In the embodiment ofFIG. 15A , the operation of the curved portion oflayer 638 is to focus light exiting from electro-optic component 600 ontoend 650 ofcore 628. - Reference is now made to
FIG. 15B , which is a simplified optical illustration ofFIG. 14D in accordance with a further embodiment of the present invention. In this embodiment, the curvature of thecurved portion 660 oflayer 638 produces collimation rather than focusing of the light exiting from electro-optic component 600 ontoend 650 ofcore 628. - Reference is now made to
FIG. 15C , which is a simplified optical illustration ofFIG. 14D in accordance with yet another embodiment of the present invention wherein agrating 662 is added to thecurved portion 660 oflayer 638. The additional provision of grating 662 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 600 is focused onend 650 ofcore 628. - Reference is now made to
FIG. 16 , which is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with still another preferred embodiment of the present invention. The embodiment ofFIG. 16 corresponds generally to that described hereinabove with respect toFIG. 14D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface. As seen inFIG. 16 , it is seen that light from an electro-optic component 720, such as a diode laser, is directed onto a partially flat and partiallyconcave mirror assembly 730, preferably mounted parallel to one of the roughinclined surfaces 732 defined bynotch 724. It is appreciated that electro-optic component 720 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier.Mirror assembly 730 preferably comprises aglass substrate 734 having formed thereon a plurality ofcurved portions 736 over which are formed a curved metallic layer or adichroic filter layer 738.Mirror assembly 730 also defines areflective surface 740, which is disposed on aplanar surface 742 generally oppositelayer 738. - Preferably, the
mirror assembly 730 is securely held in place partially by anysuitable adhesive 744, such as epoxy, and partially by anoptical adhesive 746, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. USA, whose refractive index preferably is precisely matched to that of thecores 728 of theoptical fibers 716. It is appreciated thatoptical adhesive 746 may be employed throughout instead of adhesive 744. - Reference is now made to
FIG. 17A , which is an enlarged simplified optical illustration of a portion ofFIG. 16 . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 720 throughglass substrate 734 ofmirror assembly 730 into reflective engagement with a part oflayer 738 overlying the flat portion thereof, and thence throughsubstrate 734 toreflective surface 740, where it is reflected back throughsubstrate 734 and a firstcurved portion 736 into reflective engagement with a part oflayer 738 overlying firstcurved portion 736, and thence through firstcurved portion 736 andsubstrate 734 toreflective surface 740, where it is reflected back throughsubstrate 734 and a secondcurved portion 736 to another part oflayer 738 overlying secondcurved portion 736 and is reflected back through secondcurved surface 736 andsubstrate 734 toreflective surface 740 and thence throughsubstrate 734 and adhesive 746 to focus at anend 750 of acore 728. In the embodiment ofFIG. 17A , the operation ofcurved layer 738 overlying first and secondcurved portions 736 is to focus light exiting from electro-optic component 720 ontoend 750 ofcore 728, with enhanced optical properties. - Reference is now made to
FIG. 17B , which is an enlarged simplified optical illustration of a portion ofFIG. 16 in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 738 produces collimation rather than focusing of the light exiting from electro-optic component 720 ontoend 750 ofcore 728. - Reference is now made to
FIG. 17C , which is an enlarged simplified optical illustration of a portion ofFIG. 16 in accordance with yet another embodiment of the present invention wherein areflective grating 760 replaces a middle portion ofreflective surface 740. The additional provision of grating 760 causes separation of light impinging thereon according to its wavelength, such that only one component of multispectral light exiting electro-optic component 720 is focused onend 750 ofcore 728. - Reference is now made to
FIGS. 18A , 18B, 18C and 18D, which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 4A-6C in accordance with one embodiment of the present invention. Aglass substrate 800, typically of thickness 200-400 microns, seen inFIG. 18A , has formed thereon an array ofmicrolenses 802, typically formed of photoresist, as seen inFIG. 18B . Themicrolenses 802 preferably have an index of refraction which is identical or very close to that ofsubstrate 800. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 804, typically aluminum, is formed over thesubstrate 800 andmicrolenses 802 as seen inFIG. 18C , typically by evaporation or sputtering. Thesubstrate 800 and themetal layer 804 formed thereon are then diced by conventional techniques, as shown inFIG. 18D , thereby defining individualoptical elements 806, each including a curved portion defined by amicrolens 802. - Reference is now made to
FIGS. 19A , 19B, 19C, 19D and 19E, which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-6C in accordance with another embodiment of the present invention. Aglass substrate 810, typically of thickness 200-400 microns, seen inFIG. 19A , has formed thereon an array ofmicrolenses 812, typically formed of photoresist, as seen inFIG. 19B . Themicrolenses 812 preferably have an index of refraction which is identical or very close to that ofsubstrate 810. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 814, typically aluminum, is formed over thesubstrate 810 andmicrolenses 812 as seen inFIG. 19C , typically by evaporation or sputtering. Thesubstrate 810 is then notched from underneath by conventional techniques. As seen inFIG. 19D ,notches 815 are preferably formed at locations partiallyunderlying microlenses 812. - Following notching, the
substrate 810, themicrolenses 812 and themetal layer 814 formed thereon are diced by conventional techniques, as shown inFIG. 19E , thereby defining individualoptical elements 816, each including a curved portion defined by part of amicrolens 812. - Reference is now made to
FIGS. 20A , 20B, 20C, 20D, 20E and 20F, which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 9A-17C in accordance with yet another embodiment of the present invention. Aglass substrate 820, typically of thickness 200-400 microns, seen inFIG. 20A , has formed thereon an array ofmicrolenses 822, typically formed of photoresist, as seen inFIG. 20B . Themicrolenses 822 preferably have an index of retraction which is identical or very close to that ofsubstrate 820. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 824, typically aluminum, is formed over thesubstrate 820 andmicrolenses 822 as seen inFIG. 20C , typically by evaporation or sputtering. Anadditional metal layer 825, typically aluminum, is similarly formed on an opposite surface ofsubstrate 820. Metal layers 824 and 825 are patterned typically by conventional photolithographic techniques to define respectivereflective surfaces FIG. 20D . - The
substrate 820 is notched from underneath by conventional techniques. As seen inFIG. 20E ,notches 828 need not be at locations partiallyunderlying microlenses 822. Following notching, thesubstrate 820 is diced by conventional techniques, as shown inFIG. 20F , thereby defining individualoptical elements 829, each including a curved reflective portion defined by a pair ofmicrolenses 822 as well as a flatreflective surface 829. - Reference is now made to
FIGS. 21A , 21B, 21C, 21D, 21E and 21F which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-17C in accordance with still another embodiment of the present invention. Aglass substrate 830, typically of thickness 200-400 microns, seen inFIG. 21A , has formed thereon an array of pairs of microlenses 832, typically formed of photoresist, as seen inFIG. 21B . The microlenses 832 preferably have an index of retraction which is identical or very close to that ofsubstrate 830. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 834, typically aluminum, is formed over thesubstrate 830 and pairs of microlenses 832 as seen inFIG. 21C , typically by evaporation or sputtering. Anadditional metal layer 835, typically aluminum, is similarly formed on an opposite surface ofsubstrate 830. Metal layers 834 and 835 are patterned, typically by conventional photolithographic techniques, to define respectivereflective surfaces FIG. 21D . - The
substrate 830 is notched from underneath by conventional techniques, definingnotches 838, as seen inFIG. 21E . Following notching, thesubstrate 830 is diced by conventional techniques, as shown inFIG. 21F , thereby defining individualoptical elements 839, each including a curved reflective portion defined by a pair of microlenses 823 as well as a flatreflective surface 837. - Reference is now made to
FIGS. 22A , 22B, 22C, 22D, 22E, 22F and 22G, which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-8C in accordance with a further embodiment of the present invention. Aglass substrate 840, typically of thickness 200-400 microns, seen inFIG. 22A , has formed in an underside surface thereof an array ofreflective diffraction gratings 841, as seen inFIG. 22B , typically by etching. Alternatively, thegratings 841 may be formed on the surface of thesubstrate 840, typically by lithography or transfer. An array of pairs ofmicrolenses 842, typically formed of photoresist, is formed on an opposite surface ofsubstrate 840, as seen inFIG. 22C . Themicrolenses 842 preferably have an index of refraction which is identical or very close to that ofsubstrate 840. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 844, typically aluminum, is formed over thesubstrate 840 and pairs ofmicrolenses 842 as seen inFIG. 22D , typically by evaporation or sputtering.Metal layer 844 is preferably patterned, typically by conventional photolithographic techniques, to define areflective surface 846, as seen inFIG. 22E . - The
substrate 840 is notched from underneath by conventional techniques, definingnotches 848, as seen inFIG. 22F . Following notching, thesubstrate 840 is diced by conventional techniques, as shown inFIG. 22G , thereby defining individualoptical elements 849, each including a curved reflective portion defined by a pair ofmicrolenses 842 as well as a flatreflective grating 841. - Reference is now made to
FIGS. 23A , 23B, 23C, 23D, 23E, 23F and 23G, which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 9A-17C in accordance with yet a further embodiment of the present invention. Aglass substrate 850, typically of thickness 200-400 microns, seen inFIG. 23A , has formed in an underside surface thereof an array ofreflective diffraction gratings 851, as seen inFIG. 23B , typically by etching. Alternatively, thegratings 851 may be formed on the surface of thesubstrate 850, typically by lithography or transfer. An array of pairs ofmicrolenses 852, typically formed of photoresist, is formed on an opposite surface ofsubstrate 850, as seen inFIG. 23C . Themicrolenses 852 preferably have an index of refraction which is identical or very close to that ofsubstrate 850. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 854, typically aluminum, is formed over thesubstrate 850 and pairs ofmicrolenses 852 as seen inFIG. 23D , typically by evaporation or sputtering. Anadditional metal layer 855 is similarly formed on an opposite surface of thesubstrate 850. Metal layers 854 and 855 are preferably patterned, typically by conventional photolithographic techniques, to define respectivereflective surfaces FIG. 23E . - The
substrate 850 is notched from underneath by conventional techniques, definingnotches 858, as seen inFIG. 23F . Following notching, thesubstrate 850 is diced by conventional techniques, as shown inFIG. 23G , thereby defining individualoptical elements 859, each including a curved reflective portion defined by a pair ofmicrolenses 852 as well as a flatreflective grating 851 and flatreflective surfaces 857. - Reference is now made to
FIGS. 24A , 24B, 24C, 24D, 24E, 24F and 24G, which are simplified illustrations of a method for fabricating optical elements employed in the embodiments ofFIGS. 1A-17C in accordance with a still further embodiment of the present invention. Aglass substrate 860, typically of thickness 200-400 microns, seen inFIG. 24A , has formed therein an array ofreflective diffraction gratings 861, as seen inFIG. 24B , typically by etching. Alternatively, thegratings 861 may be formed on the surface of thesubstrate 860, typically by lithography or transfer. An array ofmicrolenses 862, typically formed of photoresist, is formed on the same surface ofsubstrate 860, as seen inFIG. 24C . Themicrolenses 862 preferably have an index of refraction which is identical or very close to that ofsubstrate 860. This may be achieved by one or more conventional techniques, such as photolithography and thermal reflow, photolithography using of a grey scale mask, and jet printing. - A
thin metal layer 864, typically aluminum, is formed over thesubstrate 860 andmicrolenses 862 as seen inFIG. 24D , typically by evaporation or sputtering. Anadditional metal layer 865 is similarly formed on an opposite surface of thesubstrate 860. Metal layers 864 and 865 are preferably patterned, typically by conventional photolithographic techniques, to define respectivereflective surfaces FIG. 24E . - The
substrate 860 is notched from underneath by conventional techniques, definingnotches 868, as seen inFIG. 24F . Following notching, thesubstrate 860 is diced by conventional techniques, as shown inFIG. 24G , thereby defining individualoptical elements 869, each including a curvedreflective surface 866 defined by amicrolens 862 as well as a flatreflective grating 861 and a flatreflective surface 867. - Reference is now made to
FIGS. 25A , 25B, 25C and 25D, which are simplified illustrations of multiple stages in the production of a multi-chip module in accordance with a preferred embodiment of the present invention. As seen inFIG. 25A , asubstrate 900, typically formed of silicon and having a thickness of 300-800 microns, has formed thereon at least onedielectric passivation layer 902, at least onemetal layer 904 and at least one overlyingdielectric layer 906. The dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.Vias 908, connected to at least onemetal layer 904, extend throughlayer 902 to thesubstrate 900. - As seen in
FIG. 25B , an array ofopenings 910 is formed by removing portions ofsubstrate 900 at alocation underlying vias 908. Preferably, the entire thickness of thesubstrate 900 is removed. The removal ofsubstrate 900 may be achieved by using conventional etching techniques and, preferably, provides a volume of dimensions of at least 600 microns in width. - As seen in
FIG. 25C ,metallic bumps 912, preferably solder bumps, are preferably formed onto the thus exposed surfaces ofvias 908. As seen inFIG. 25D , integratedcircuit chips 914 are preferably located inopenings 910 and operatively engaged withvias 908 by being soldered tobumps 912, thus creating a multi-chip module, wherein integratedcircuit chips 914 reside within the substrate of the module. - Reference is now made
FIG. 26 , which is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including alaser light source 920 formed on anintegrated circuit chip 922, located in anopening 924 formed in amodule substrate 926. - Reference is now made to
FIG. 27 , which is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including anoptical detector 930 formed on anintegrated circuit chip 932, located in anopening 934 formed in amodule substrate 936. - Reference is now made to
FIG. 28 , which is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including anelectrical element 940 formed on anintegrated circuit chip 942 located in anopening 944 formed in amodule substrate 946. - Reference is now made to
FIG. 29 , which is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , includingmultiple elements 950 located inmultiple recesses 952 formed within asubstrate 954. These elements may by any suitable electrical or electro-optic element. - Reference is now made to
FIG. 30 , which is a simplified illustration of a multi-chip module of the type referenced inFIGS. 25A-25D , including multiple stacked elements located in recesses formed within substrates. As seen inFIG. 30 , asubstrate 1000, typically formed of silicon and having a thickness of 500-1000 microns, has formed thereon at least onedielectric passivation layer 1002, at least onemetal layer 1004 and at least oneoverlying dielectric layer 1006. The dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.Vias 1008, connected to at least onemetal layer 1004 extend throughlayer 1002 to thesubstrate 1000. At least oneopening 1010 is formed by removing a portion ofsubstrate 1000 at alocation underlying vias 1008. Preferably, the entire thickness ofsubstrate 1000 is removed. The removal ofsubstrate 1000 may be achieved by using conventional etching techniques and provides a volume of dimensions of at least 1000 microns in width.Metallic bumps 1012, preferably solder bumps, are preferably formed onto the thus exposed surfaces ofvias 1008. - Disposed within
opening 1010 is asubstrate 1020, typically formed of silicon and having a thickness of 300-800 microns, having formed thereon at least onedielectric passivation layer 1022, at least onemetal layer 1024 and at least oneoverlying dielectric layer 1026. The dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands.Vias 1028, connected to at least onemetal layer 1024, extend throughlayer 1022 to thesubstrate 1020. At least oneopening 1030 is formed by removing portions ofsubstrate 1020 at alocation underlying vias 1028. Preferably, the entire thickness ofsubstrate 1020 is removed. The removal ofsubstrate 1020 may be achieved by using conventional etching techniques and provides a volume of dimensions of at least 600 microns in width.Metallic bumps 1032, preferably solder bumps, are preferably formed onto the thus exposed surfaces ofvias 1028. Additionalmetallic bumps 1034, preferably solder bumps, are preferably formed onto ends of vias 1036 which are preferably connected to at least onemetal layer 1024, which need not necessarily be connected tobumps 1032.Bumps substrate 1020 withinsubstrate 1000. - An
integrated circuit chip 1040 is preferably located in opening 1030 and operatively engaged withvias 1028 by being soldered tobumps 1032, thus creating a multi-chip module, wherein at least oneintegrated circuit chip 1040 resides withinsubstrate 1020, which in turn resides withinsubstrate 1000. - It is appreciated that any suitable number of substrates, such as
substrates FIG. 30 , and that each such substrate may have multiple openings formed therein. - Reference is now made to
FIGS. 31A , 31B, 31C and 31D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention. In the embodiment ofFIG. 31A , similarly toFIG. 2A described hereinabove, electro-optic components 1120, such as diode lasers, are mounted onto an electrical circuit (not shown), included within aplanarized layer 1122 formed onto asubstrate 1123. It is appreciated that electro-optic components 1120 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. - As shown in
FIG. 31B , atransverse notch 1124 is preferably formed, at least partially overlapping the locations of the electro-optic components 1120 and extending through an adhesive 1125 and partially through each of a plurality ofoptical fibers 1126. Specifically, in this embodiment, thenotch 1124 extends entirely through thecladding 1127 of eachfiber 1126 and entirely through thecore 1128 of each fiber. It is appreciated that the surfaces defined by thenotch 1124 are relatively rough, as shown. - Turning now to
FIG. 31C , it is seen that amirror 1130, typically of the type illustrated inFIGS. 2C and 3 , is preferably mounted parallel to one of the roughinclined surfaces 1132 defined bynotch 1124.Mirror 1130 preferably comprises aglass substrate 1134 having formed on asurface 1136 thereof, a metallic layer or adichroic filter layer 1138. A partially flat and partiallyconcave mirror 1139, typically similar to the type illustrated inFIGS. 5C and 6A , is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1140.Mirror 1139 preferably comprises aglass substrate 1142 having formed thereon acurved portion 1144 over which is formed a curved metallic layer or adichroic filter layer 1146. - As seen in
FIG. 31D , themirrors cores 1128 of theoptical fibers 1126. The adhesive 1150 preferably fills the interstices between the roughenedsurfaces notch 1124 andrespective mirrors substrates - Reference is now made to
FIG. 32 , which is an enlarged simplified optical illustration of a portion ofFIG. 31D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1151 of acore 1128, through adhesive 1150 andglass substrate 1134 to areflective surface 1152 ofmirror 1130 and thence throughglass substrate 1134, adhesive 1150,substrate 1123 andlayer 1122, which are substantially transparent to this light. Similarly, a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1161 ofcore 1128, through adhesive 1150,glass substrate 1142 andcurved portion 1144 to areflective surface 1162 ofmirror 1139 and thence throughcurved portion 1144,glass substrate 1142, adhesive 1150,substrate 1123 andlayer 1122, which are substantially transparent to this light. - It is noted that
mirror 1130 typically reflects light onto an electro-optic component 1120, here designated 1170, without focusing or collimating the light, whilemirror 1139 focuses light reflected thereby onto another electro-optic component 1120, here designated 1172. It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed. - Reference is now made to
FIGS. 33A , 33B, 33C and 33D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention. In the embodiment ofFIG. 33A , similarly toFIG. 31A described hereinabove, electro-optic components 1220, such as diode lasers, are mounted onto an electrical circuit (not shown), included within aplanarized layer 1222 formed onto asubstrate 1223. It is appreciated that electro-optic components 1220 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. In contrast to the embodiment ofFIG. 31A , here the electro-optic components 1220 are located in openings or recesses formed within thesubstrate 1223, similarly to the structure shown inFIG. 29 . - As shown in
FIG. 33B , atransverse notch 1224 is preferably formed, at least partially overlapping the locations of at least one of the electro-optic components 1220 and extending through an adhesive 1225 and partially through each of a plurality ofoptical fibers 1226. Specifically, in this embodiment, thenotch 1224 extends through part of thecladding 1227 of eachfiber 1226 and entirely through thecore 1228 of each fiber. It is appreciated that the surfaces defined by thenotch 1224 are relatively rough, as shown. - Turning now to
FIG. 33C , it is seen that amirror 1230, typically, similar to the type illustrated inFIGS. 2C and 3 , is preferably mounted parallel to one of the rough inclined surfaces, here designated 1232, defined bynotch 1224.Mirror 1230 preferably comprises aglass substrate 1234 having formed on asurface 1236 thereof, a metallic layer or adichroic filter layer 1238. A partially flat and partiallyconcave mirror 1239, typically similar to the type illustrated inFIGS. 5C and 6A , is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1240.Mirror 1239 preferably comprises aglass substrate 1242 having formed thereon acurved portion 1244 over which is formed a curved metallic layer or adichroic filter layer 1246. - As seen in
FIG. 33D , themirrors cores 1228 of theoptical fibers 1226. The adhesive 1250 preferably fills the interstices between the roughenedsurfaces notch 1224 andrespective mirrors cladding 1227,substrate 1242 andcurved portion 1244. - Reference is now made to
FIG. 34 , which is an enlarged simplified optical illustration of a portion ofFIG. 33D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1251 of acore 1228, through adhesive 1250 to areflective surface 1252 ofmirror 1230 and thence through adhesive 1250 andcladding 1227, and then throughlayer 1222, which is substantially transparent to this light. Similarly, a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1261 ofcore 1228, through adhesive 1250,substrate 1242 andcurved portion 1244, to areflective surface 1262 ofmirror 1239 and thence throughcurved portion 1244, adhesive 1250 andcladding 1227, and then throughlayer 1222, which is substantially transparent to this light. - It is noted that
mirror 1230 typically reflects light onto an electro-optic component 1220, here designated 1270, without focusing or collimating the light, whilemirror 1239 focuses light reflected thereby onto another electro-optic component 1220, here designated 1272. It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed. - Reference is now made to
FIGS. 35A , 35B, 35C and 35D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with a preferred embodiment of the present invention. In the embodiment ofFIG. 35A , similarly toFIG. 31A described hereinabove, electro-optic components 1320, such as diode lasers, are mounted onto an electrical circuit (not shown), included within aplanarized layer 1322 formed onto asubstrate 1323. It is appreciated that electro-optic components 1320 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. As distinct from the embodiment ofFIGS. 31A-32 , here at least first and secondseparate fibers substrate 1323, preferably by an adhesive 1327. Thefibers - As shown in
FIG. 35B , atransverse notch 1328 is preferably formed, at least partially overlapping the locations of the electro-optic components 1320 and extending through adhesive 1327 and partially through at least each ofoptical fibers notch 1328 extends entirely through of thecladding cores fibers notch 1328 are relatively rough, as shown. - Turning now to
FIG. 35C , it is seen that amirror 1334, typically of the type illustrated inFIGS. 2C and 3 , is preferably mounted parallel to one of the roughinclined surfaces 1335 defined bynotch 1328.Mirror 1334 preferably comprises aglass substrate 1336 having formed on asurface 1337 thereof, a metallic layer or adichroic filter layer 1338. A partially flat and partiallyconcave mirror 1339, typically similar to the type illustrated inFIGS. 5C and 6A , is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1340.Mirror 1339 preferably comprises aglass substrate 1342 having formed thereon acurved portion 1344 over which is formed a curved metallic layer or adichroic filter layer 1346. - As seen in
FIG. 35D , themirrors cores optical fibers surfaces notch 1328 andrespective mirrors substrates - Reference is now made to
FIG. 36 , which is an enlarged simplified optical illustration of a portion ofFIG. 35D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1352 of acore 1332 of afiber 1325, through adhesive 1350 andsubstrate 1336 to areflective surface 1354 ofmirror 1334 and thence throughsubstrate 1336, adhesive 1350,substrate 1323 andlayer 1322, which are substantially transparent to this light. Similarly, a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1362 ofcore 1333 offiber 1326, through adhesive 1350,substrate 1342 andcurved portion 1344 to areflective surface 1364 ofmirror 1339 and thence throughcurved portion 1344,substrate 1342, adhesive 1350,substrate 1323 andlayer 1322, which are substantially transparent to this light. - It is noted that
mirror 1334 typically reflects light onto an electro-optic component 1320, here designated 1370, without focusing or collimating the light, whilemirror 1339 focuses light reflected thereby onto another electro-optic component 1320, here designated 1372. It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed. - Reference is now made to
FIGS. 37A , 37B, 37C and 37D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated assembly in accordance with another preferred embodiment of the present invention. The embodiment ofFIGS. 37A-37D is similar to the embodiments ofFIGS. 33A-33D and 35A-35D, described hereinabove. As shown inFIG. 37A , electro-optic components 1400, such as diode lasers, are mounted onto an electrical circuit (not shown), included within aplanarized layer 1402 formed onto asubstrate 1404. It is appreciated that electro-optic components 1400 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating and a semiconductor optical amplifier. In contrast to the embodiment ofFIG. 35A , here the electro-optic components 1400 are located in openings or recesses formed within thesubstrate 1404, similarly to the structure shown inFIG. 33A . As distinct from the embodiment ofFIG. 33A , here at least first and secondseparate fibers substrate 1404, preferably by an adhesive 1410, similarly to the structure shown inFIG. 35A . Thefibers - As shown in
FIG. 37B , atransverse notch 1412 is preferably formed, at least partially overlapping the locations of at least one of the electro-optic components 1400 and extending through an adhesive 1410 and partially through each of a plurality ofoptical fibers notch 1412 extends through part of thecladdings cores fibers notch 1412 are relatively rough, as shown. - Turning now to
FIG. 37C , it is seen that amirror 1430, typically, similar to the type illustrated inFIGS. 2C and 3 , is preferably mounted parallel to one of the rough inclined surfaces, here designated 1432, defined bynotch 1412.Mirror 1430 preferably comprises aglass substrate 1434 having formed on asurface 1436 thereof, a metallic layer or adichroic filter layer 1438. A partially flat and partiallyconcave mirror 1439, typically similar to the type illustrated inFIGS. 5C and 6A , is preferably mounted parallel to an opposite one of the rough inclined surfaces, here designated 1440.Mirror 1439 preferably comprises aglass substrate 1442 having formed thereon acurved portion 1444 over which is formed a curved metallic layer or adichroic filter layer 1446. - As seen in
FIG. 37D , themirrors cores optical fibers surfaces notch 1412 andrespective mirrors curved portion 1444,substrate 1442 and claddings 1414 and 1416 of theoptical fibers - Reference is now made to
FIG. 38 , which is an enlarged simplified optical illustration of a portion ofFIG. 37D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1451 of acore 1418, through adhesive 1450 to areflective surface 1452 ofmirror 1430 and thence through adhesive 1450 andcladding 1414, throughlayer 1402, which is substantially transparent to this light. Similarly, a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 600-1650 nm, from anend 1462 ofcore 1420, through adhesive 1450,substrate 1442 andcurved portion 1444 to areflective surface 1464 ofmirror 1439 and thence throughcurved portion 1444, adhesive 1450 andcladding 1416, throughlayer 1402, which is substantially transparent to this light. - It is noted that
mirror 1430 typically reflects light onto an electro-optic component 1400, here designated 1470, without focusing or collimating the light, whilemirror 1439 focuses light reflected thereby onto another electro-optic component 1400, here designated 1472. It is appreciated that any suitable combination of mirrors having any suitable optical properties, such as collimating and focusing, may alternatively be employed. - Reference is now made to
FIGS. 39A , 39B, 39C, and 39D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention. As seen inFIG. 39A , electro-optic components 1520, such as a diode laser, are each mounted onto an electrical circuit (not shown), included within aplanarized layer 1522 formed ontosubstrate 1524. It is appreciated that electro-optic components 1520 may be any suitable electro-optic component, such as a laser diode, diode detector, waveguide, array waveguide grating or a semiconductor optical amplifier. - As shown in
FIG. 39B , atransverse cut 1526 is preferably formed to extend partially through thesubstrate 1524. It is appreciated that asurface 1528 defined by thecut 1526 is relatively rough, as shown. - Turning now to
FIG. 39C , it is seen that a partially flat and partiallyconcave mirror assembly 1530 is preferably mounted parallel to the roughinclined surface 1528 defined by thecut 1526.Mirror assembly 1530 preferably comprises aglass substrate 1534 having formed thereon acurved portion 1536 over which is formed a curved metallic layer or adichroic filter layer 1538.Mirror assembly 1530 also defines aflat surface 1540, having formed thereon a metallic layer or adichroic filter layer 1542 partially underlying thecurved portion 1536. As seen inFIG. 39D , preferably, themirror assembly 1530 is securely held in place by any suitable adhesive 1544, such as epoxy. - Reference is now made to
FIG. 40 , which is a simplified optical illustration corresponding toFIG. 39D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from each electro-optic component 1520 throughglass substrate 1534 andcurved portion 1536 ofmirror assembly 1530 into reflective engagement withlayer 1538 and thence throughcurved portion 1536 andsubstrate 1534 tolayer 1542 and reflected fromlayer 1542 throughsubstrate 1534 as a parallel beam. - It is appreciated that the electro-optic integrated circuit described in reference to
FIGS. 39A-40 may be configured to operate as either a light transmitter or a light receiver, as described hereinbelow with reference toFIGS. 43-45 . - Reference is now made to
FIGS. 41A , 41B, 41C, and 41D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention. As seen inFIG. 41A , anoptical fiber 1620 is mounted onto asubstrate 1622, preferably by means of adhesive 1623. As shown inFIG. 41B , atransverse cut 1624 is preferably formed to extend through the adhesive 1623, theoptical fiber 1620 and thesubstrate 1622. Specifically, in this embodiment, thecut 1624 extends through thecladding 1626 offiber 1620 and entirely through thecore 1628 of the fiber. It is appreciated that asurface 1629 defined by thecut 1624 is relatively rough, as shown. - Turning now to
FIG. 41C , it is seen that a partially flat and partiallyconcave mirror assembly 1630 is preferably mounted parallel to the roughinclined surface 1629 defined by thecut 1624.Mirror assembly 1630 preferably comprises aglass substrate 1634 having formed thereon acurved portion 1636 over which is formed a curved metallic layer or adichroic filter layer 1638.Mirror assembly 1630 also defines aflat surface 1640 having formed thereon a metallic layer or adichroic filter layer 1642, partially underlying thecurved portion 1636. As seen inFIG. 41D , preferably, themirror assembly 1630 is securely held in place by an optical adhesive 1644, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 1628 of theoptical fibers 1620. - Reference is now made to
FIG. 42 , which is a simplified optical illustration corresponding toFIG. 41D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from anend 1646 ofcore 1628 offiber 1620 through adhesive 1644 andsubstrate 1634 andcurved portion 1636 ofmirror assembly 1630 into reflective engagement withlayer 1638 and thence throughcurved portion 1636 andsubstrate 1634 tolayer 1642 and reflected fromlayer 1642 throughsubstrate 1634 as a parallel beam. - It is appreciated that the electro-optic integrated circuit described in reference to
FIGS. 41A-42 may be configured to operate as either a light transmitter or a light receiver, as described hereinbelow with reference toFIGS. 43-45 . - Reference is now made to
FIG. 43 , which illustrates optical coupling through free space between the electro-optic integrated circuit ofFIG. 40 , here designated byreference numeral 1700 and the electro-optic integrated circuit ofFIG. 42 , here designated byreference numeral 1702. It is appreciated that either of electro-opticintegrated circuits - Reference is now made to
FIG. 44 , which illustrates optical coupling through free space between an electro-optic integrated circuit ofFIG. 40 , here designated byreference numeral 1704 and another electro-optic integrated circuit ofFIG. 40 , here designated byreference numeral 1706. It is appreciated that either of electro-opticintegrated circuits - Reference is now made to
FIG. 45 , which illustrates optical coupling through free space between an electro-optic integrated circuit ofFIG. 42 , here designated byreference numeral 1708 and another electro-optic integrated circuit ofFIG. 42 , here designated byreference numeral 1710. It is appreciated that either of electro-opticintegrated circuits - Reference is now made to
FIGS. 46A , 46B, 46C, and 46D, which are simplified sectional illustrations of stages in the production of an electro-optic integrated circuit in accordance with another preferred embodiment of the present invention. As seen inFIG. 46A , anoptical fiber 1800 is fixed in place onsubstrate 1802 by means of asuitable adhesive 1804, preferably epoxy. As shown inFIG. 46B , atransverse notch 1824 is preferably formed, extending through the adhesive 1804 entirely through theoptical fiber 1800 and partially intosubstrate 1802. Specifically, in this embodiment, thenotch 1824 extends through all ofcladding 1826 of thefiber 1800 and entirely through thecore 1828 of the fiber. It is appreciated that the surfaces defined by thenotch 1824 are relatively rough, as shown. - Turning now to
FIG. 46C , it is seen that a partially flat and partiallyconcave mirror 1830 is preferably mounted parallel to one of the roughinclined surfaces 1832 defined bynotch 1824.Mirror 1830 preferably comprises aglass substrate 1834 having formed thereon acurved portion 1836 over which is formed a curved metallic layer or adichroic filter layer 1838. As seen inFIG. 46D , preferably, themirror 1830 is securely held in place partially by any suitable adhesive 1844, such as epoxy, and partially by an optical adhesive 1846, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 1828 of theoptical fibers 1800. It is appreciated that optical adhesive 1846 may be employed throughout instead of adhesive 1844. The optical adhesive 1846 preferably fills the interstices between the roughenedsurface 1832 defined bynotch 1824 and asurface 1848 ofmirror 1830. - Reference is now made to
FIG. 47 , which is an enlarged simplified optical illustration of a portion ofFIG. 46D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from anend 1850 of acore 1828, through adhesive 1846,substrate 1834 andcurved portion 1836, to areflective surface 1852 oflayer 1838 and thence throughcurved portion 1836, adhesive 1846 andsubstrate 1802, which are substantially transparent to this light. It is noted that the index of refraction of adhesive 1846 is close to but not identical to that ofcurved portion 1836 andsubstrates FIG. 47 , the operation ofcurved layer 1838 is to collimate light exiting fromend 1850 ofcore 1828 throughsubstrate 1802 as a parallel beam. - Reference is now made to
FIG. 48 , which illustrates optical coupling through free space between an electro-optic integrated circuit ofFIG. 46D , here designated byreference numeral 1900, and another electro-optic integrated circuit ofFIG. 46D , here designated byreference numeral 1902. It is appreciated that either of electro-opticintegrated circuits - Reference is now made to
FIG. 49 , which illustrates optical coupling through free space between an electro-optic integrated circuit ofFIG. 46D , here designated byreference numeral 1904, and anoptical device 1906.Optical device 1906 may be any optical device that receives or transmits light along a parallel beam. It is appreciated that either of electro-opticintegrated circuit 1904 andoptical device 1906 may transmit light to the other, which receives the light, along a parallel beam. - Reference is now made to
FIGS. 50A , 50B, 50C, 50D and 50E, which are simplified pictorial illustrations of stages in the production of an electro-optic integrated circuit constructed and operative in accordance with still another preferred embodiment of the present invention. As seen inFIG. 50A , asubstrate 2000, typically formed of silicon and having a thickness of 300-800 microns, has formed thereon at least onedielectric passivation layer 2002, at least onemetal layer 2004 and at least oneoverlying dielectric layer 2006. The dielectric layers are preferably transparent to light preferably in both the visible and the infrared bands. Vias, (not shown) connected to at least onemetal layer 2004, extend throughlayer 2002 to thesubstrate 2000. One or more semiconductorfunctional blocks 2008 are preferably formed onsubstrate 2000. - As seen in
FIG. 50B , one ormore openings 2010 are formed by removing portions of thesubstrate 2000 from the underside thereof, as shown for example inFIG. 25B . The removal of portions ofsubstrate 2000 may be achieved by using conventional etching techniques and, preferably, provides a volume of dimensions of at least 600 microns in width. - As seen in
FIG. 50C , integratedcircuit chips 2014 are preferably located inopenings 2010. These chips may be operatively engaged with vias (not shown) by being soldered to bumps (not shown) as illustrated for example inFIG. 25D , thus creating an optoelectronic integrated circuit, wherein integratedcircuit chips 2014 reside within the substrate of the integrated circuit. - As seen in
FIG. 50D , one ormore fibers 2016 are fixed tosubstrate 2000, preferably by an adhesive (not shown), similarly to that shown inFIG. 37A .Multiple fibers 2016 may be identical, similar or different and need not be arranged in a mutually aligned spatial relationship. - As shown in
FIG. 50E , it is seen that amirror 2030, typically of the type illustrated in any ofFIGS. 18A-24G , is preferably mounted in operative engagement with eachfiber 2016. - Reference is now made to
FIG. 51 , which is a simplified functional illustration of a preferred embodiment of the structure ofFIG. 50E . As seen inFIG. 51 , a high frequencyoptical signal 2100, typically offrequency 10 GHz, passes through afiber 2102 and is reflected by amirror 2104 onto adiode 2106, which may be located in arecess 2107. An outputelectrical signal 2108 fromdiode 2106 is supplied to anamplifier 2110, which may be located in arecess 2111 and need not be formed of silicon, but could be formed, for example, of gallium arsenide or indium phosphide. The amplifiedoutput 2112 ofamplifier 2110 may be provided to a serializer/deserializer 2114, which may be located in arecess 2115 and need not be formed of silicon, but could be formed, for example, of gallium arsenide or indium phosphide. - An
output signal 2116 from serializer/deserializer 2114 is preferably fed to one or more semiconductorfunctional blocks 2118 for further processing. Alaser 2120, which may be located in arecess 2122, may employ an electrical output from afunctional block 2118 to produce a modulatedlight beam 2124, which is reflected by amirror 2126 so as to pass through afiber 2128. It is appreciated that electro-opticintegrated circuit devices - It is appreciated that in addition to the substrate materials described hereinabove the substrates may comprise glass, silicon, sapphire, alumina, aluminum nitride, boron nitride or any other suitable material.
- Reference is now made to
FIGS. 52A and 52B , which are simplified pictorial illustrations of a packaged electro-optic circuit 3100, having integrally formed therein an optical connector and electrical connections, alone and in conjunction with a conventional optical connector. - As seen in
FIGS. 52A and 52B , a packaged electro-optic circuit 3100 is provided in accordance with a preferred embodiment of the present invention and includes an at least partiallytransparent substrate 3102, typically glass. Electrical circuitry (not shown) is formed, as by conventional photolithographic techniques, over one surface ofsubstrate 3102 and is encapsulated by alayer 3104 of a protective material such as BCB, commercially available from Dow Corning of the U.S.A. Anarray 3106 of electrical connections, preferably in the form of conventional solder bumps, communicates with the electrical circuitry via conductive pathways (not shown) extending through the protective material oflayer 3104. - Formed on a surface of
substrate 3102 opposite to thatadjacent layer 3104 there are defined optical pathways (not shown) which communicate with an array ofoptical fibers 3108, whose ends are aligned along anedge 3110 of thesubstrate 3102. Preferably, physical alignment bores 3112 are aligned with the array ofoptical fibers 3108. Thebores 3112 are preferably defined by cylindrical elements, which, together with theoptical fibers 3108 and the optical pathways, are encapsulated by alayer 3114 of protective material, preferably epoxy. -
FIG. 52B shows a conventional MPO typeoptical connector 3116, such as an MPO connector manufactured by SENKO Advanced Components, Inc. of Marlborough, Mass., USA., arranged for mating contact with the packaged electro-optic circuit 3100, whereinalignment pins 3118 ofconnector 3116 are arranged to seat in alignment bores 3112 of the electro-optic circuit 3100 and optical fiber ends (not shown) ofconnector 3116 are arranged in butting aligned relationship with the ends of thearray 3108 of optical fibers in packaged electro-optic circuit 3100. - Reference is now made to
FIGS. 53A-53F , which are simplified pictorial and sectional illustrations of a first plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B . Turning toFIG. 53A , it is seen thatelectrical circuits 3120 are preferably formed onto afirst surface 3122 ofsubstrate 3102, at least part of which is transparent to light within at least part of the wavelength range of 600-1650 nm.Substrate 3102 is preferably of thickness between 200-800 microns. Theelectrical circuits 3120 are preferably formed by conventional photolithographic techniques employed in the production of integrated circuits. - The substrate shown in
FIG. 53A is turned over, as indicated by anarrow 3124 and, as seen inFIG. 53B , an array of parallel, spaced, elongate opticalfiber positioning elements 3126 is preferably formed, such as by conventional photolithographic techniques, over anopposite surface 3128 ofsubstrate 3102. It is appreciated that the positions of the array ofelements 3126 onsurface 3128 are preferably precisely coordinated with the positions of theelectrical circuits 3120 onfirst surface 3122 of thesubstrate 3102, as shown inFIG. 53C . - Turning to
FIG. 53D , it is seen thatnotches 3130 are preferably formed onsurface 3128, as by means of adicing blade 3132, to precisely position and accommodate alignmentbore defining cylinders 3134, as shown inFIG. 53E .FIG. 53E illustrates that the centers of alignmentbore defining cylinders 3134 preferably lie in the same plane as thecenters 3136 ofoptical fibers 3108 which are precisely positioned betweenelements 3126 onsurface 3128.FIG. 53F illustrates encapsulation of thefibers 3108, thecylinders 3134 and thepositioning elements 3126 bylayer 3114 of protective material, preferably epoxy. - Reference is now made to
FIGS. 54A-54J , which are simplified pictorial and sectional illustrations of a second plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B .FIG. 54A shows the wafer ofFIG. 53F turned over. - As shown in
FIG. 54B , a multiplicity ofstuds 3140, preferably gold studs, are formed ontoelectrical circuits 3120 lying onsurface 3122. Thestuds 3140 are preferably flattened or “coined”, as shown schematically inFIG. 54C , to yield a multiplicity of flattenedelectrical contacts 3142, as shown inFIG. 54D . - As shown in
FIGS. 54E , 54F and 54G, the wafer ofFIG. 54D is turned over, as indicated by anarrow 3144, and theelectrical contacts 3142 are dipped into ashallow bath 3146 of a conductive adhesive 3148, such as H20E silver filled epoxy, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, so as to coat the tip of eachcontact 3142 with adhesive 3148, as shown. The wafer ofFIG. 54G is then turned over, as indicated by anarrow 3150, and a plurality ofintegrated circuits 3152 is mounted onto the multiplicity ofcontacts 3142, as seen inFIG. 54H .Integrated circuits 3152 may be electrical or electro-optic integrated circuits as appropriate. -
FIG. 54I illustrates the application ofunderfill material 3154, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, at the gap betweenintegrated circuits 3152 andelectrical circuits 3120 as well assubstrate 3102. Ifintegrated circuits 3152 include electro-optic devices, theunderfill material 3154 should be transparent as appropriate. - As shown in
FIG. 54J , anencapsulation layer 3156, such as a layer of solder mask, is preferably formed overintegrated circuits 3152,electrical circuits 3120,substrate 3102 andunderfill material 3154. - For the purposes of the discussion which follows, it is assumed that at least some, if not all, of the
integrated circuits 3152 are electro-optic devices. It is appreciated that additional integrated circuits (not shown) which are not electro-optic devices, may be electrically connected to theelectrical circuits 3120 onsubstrate 3102 by other techniques, such as wire bonding. - Reference is now made to
FIGS. 55A-55D , which are simplified pictorial and sectional illustrations of a third plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B . -
FIG. 55A illustrates the wafer ofFIG. 54J , turned over and notched along lines extending perpendicularly to the array ofoptical fibers 3108, producing an inclined cut extending entirely through at least thecore 3160 of eachfiber 3108 and extending at least partially throughcylindrical elements 3134. -
FIG. 55B-55D are simplified sectional illustrations, taken along the lines LVB-LVB inFIG. 55A , of further stages in the production of the electro-optic integrated circuit. - As shown in
FIG. 55B , the notching preferably forms anotch 3224, at least partially overlapping the locations of theintegrated circuits 3152, at least some, if not all, of which are electro-optic devices, and extending through thelayer 3114 of protective material, entirely through eachoptical fiber 3108 and partially intosubstrate 3102. Specifically, in this embodiment, thenotch 3224 extends through all ofcladding 3226 of eachfiber 3108 and entirely through thecore 3160 of each fiber. It is appreciated that the surfaces defined by thenotch 3224 are relatively rough, as shown. - Turning now to
FIG. 55C , it is seen that a partially flat and partiallyconcave mirror assembly 3230 is preferably mounted parallel to one of the roughinclined surfaces 3232 defined bynotch 3224.Mirror assembly 3230 preferably comprises aglass substrate 3234 having formed thereon acurved portion 3236 over which is formed a curved metallic layer or adichroic filter layer 3238. A preferred method of fabrication ofmirror assembly 3230 is described hereinabove with reference toFIGS. 19A-19E . As seen inFIG. 55D , preferably, themirror assembly 3230 is securely held in place partially by any suitable adhesive 3239, such as epoxy, and partially by an optical adhesive 3240, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 3160 of theoptical fibers 3108. It is appreciated that optical adhesive 3240 may be employed throughout instead of adhesive 3239. Optical adhesive 3240 preferably fills the interstices between the roughenedsurface 3232 defined bynotch 3224 and asurface 3242 ofmirror assembly 3230. - Reference is now made to
FIGS. 56A-56C , which are enlarged simplified optical illustrations of a portion ofFIG. 55D in accordance with preferred embodiments of the present invention.FIG. 56A is an enlarged simplified optical illustration of a portion ofFIG. 55D . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from anend 3250 of acore 3160, through adhesive 3240,substrate 3234 andcurved portion 3236 to areflective surface 3252 oflayer 3238 and thence throughcurved portion 3236, adhesive 3240 andsubstrate 3102 andlayer 3104 which are substantially transparent to this light. It is noted that the index of refraction of adhesive 3240 is close to but not identical to that ofcurved portion 3236 andsubstrates FIG. 56A , the operation ofcurved layer 3238 is to focus light exiting fromend 3250 ofcore 3160 onto the electro-optic component 3152. -
FIG. 56B is an enlarged simplified optical illustration of a portion ofFIG. 55D in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 3238 produces collimation rather than focusing of the light exiting fromend 3250 ofcore 3160 onto the electro-optic component 3152. -
FIG. 56C is an enlarged simplified optical illustration of a portion ofFIG. 55D in accordance with yet another embodiment of the present invention wherein agrating 3260 is added tocurved layer 3238. The additional provision of grating 3260 causes separation of light impinging thereon according to its wavelength, such that multispectral light exiting fromend 3250 ofcore 3160 is focused at multiple locations on electro-optic component 3152 in accordance with the wavelengths of components thereof. - Reference is now made to
FIG. 57 , which is a simplified sectional illustration of an electro-optic integrated circuit constructed and operative in accordance with yet another preferred embodiment of the present invention. The embodiment ofFIG. 57 corresponds generally to that described hereinabove with respect toFIG. 55D other than in that a mirror with multiple concave reflective surfaces is provided rather than a mirror with a single such reflective surface. As seen inFIG. 57 , it is seen that light from anoptical fiber 3316 is directed onto an electro-optic component 3320 by a partially flat and partiallyconcave mirror assembly 3330, preferably mounted parallel to one of the roughinclined surfaces 3332 defined bynotch 3324.Mirror assembly 3330 preferably comprises aglass substrate 3334 having formed thereon a plurality ofcurved portions 3336 over which are formed a curved metallic layer or adichroic filter layer 3338.Mirror assembly 3330 also defines areflective surface 3340, which is disposed on aplanar surface 3342 generally oppositelayer 3338. A preferred method of fabrication ofmirror assembly 3330 is described hereinabove with reference toFIGS. 20A-20F . Preferably, themirror assembly 3330 is securely held in place partially by any suitable adhesive 3343, such as epoxy, and partially by an optical adhesive 3344, such as OG 146, manufactured by Epoxy Technology, 14 Fortune Drive, Billerica, Mass. 01821, USA, whose refractive index preferably is precisely matched to that of thecores 3328 of theoptical fibers 3316. It is appreciated that optical adhesive 3344 may be employed throughout instead of adhesive 3343. The optical adhesive 3344 preferably fills the interstices between the roughenedsurface 3332 defined bynotch 3324 andsurface 3342 ofmirror assembly 3330. - Reference is now made to
FIG. 58A , which is an enlarged simplified optical illustration of a portion ofFIG. 57 . Here it is seen that a generally uninterrupted optical path is defined for light, preferably in the wavelength range of 400-1650 nm, from anend 3350 of acore 3328, through adhesive 3344,substrate 3334 and firstcurved portion 3336, to a curvedreflective surface 3352 oflayer 3338 and thence through firstcurved portion 3336 andsubstrate 3334 toreflective surface 3340, fromreflective surface 3340 throughsubstrate 3334 and secondcurved portion 3336 to another curvedreflective surface 3354 oflayer 3338 and thence through secondcurved portion 3336,substrate 3334, adhesive 3344 andsubstrate 3304 andlayer 3305, which are substantially transparent to this light. It is noted that the index of refraction of adhesive 3344 is close to but not identical to that ofsubstrates FIG. 58A , the operation ofcurved layer 3338 andreflective surface 3340 is to focus light exiting fromend 3350 ofcore 3328 onto the electro-optic component 3320. - Reference is now made to
FIG. 58B , which is an enlarged simplified optical illustration of a portion ofFIG. 57 in accordance with a further embodiment of the present invention. In this embodiment, the curvature ofcurved layer 3338 produces collimation rather than focusing of the light exiting fromend 3350 ofcore 3328 onto the electro-optic component 3320. - Reference is now made to
FIG. 58C , which is an enlarged simplified optical illustration of a portion ofFIG. 57 in accordance with yet another embodiment of the present invention wherein areflective grating 3360 replacesreflective surface 3340. A preferred method of fabrication ofmirror assembly 3330 with grating 3360 is described hereinbelow with reference toFIGS. 22A-22F . The additional provision of grating 3360 causes separation of light impinging thereon according to its wavelength, such that multispectral light existing fromend 3350 ofcore 3328 is focused at multiple locations on electro-optic component 3320 in accordance with the wavelengths of components thereof. - It is appreciated that, even though the illustrated embodiments of
FIGS. 55C-58C utilize the mirror assemblies whose fabrications are described hereinabove with reference toFIGS. 19A-20F and 22A-22G, any of the mirror assemblies whose fabrications are described hereinabove with reference toFIGS. 18A-24G may alternatively be utilized. - Reference is now made to
FIG. 59 , which is a simplified pictorial illustration corresponding to sectional illustration 55D.FIG. 59 illustrates the wafer ofFIG. 55A , with partially flat and partiallyconcave mirror assembly 3230 mounted thereon, parallel to one of the roughinclined surfaces 3232 defined bynotch 3224, as described hereinabove with reference toFIG. 55D . It is appreciated thatmirror assembly 3230 extends along the entire length ofsubstrate 3102. - Reference is now made to
FIGS. 60A-60F , which are simplified pictorial and sectional illustrations of a fourth plurality of stages in the manufacture of the packaged electro-optic circuit ofFIGS. 52A and 52B .FIG. 60A shows the wafer ofFIG. 59 turned over.FIG. 60B is a sectional illustration of the wafer ofFIG. 60A along lines LXB-LXB.FIG. 60C illustrates the formation ofholes 3402 by conventional techniques, such as the use of lasers or photolithography, which communicate with electrical circuits 3120 (FIG. 53A ) onsubstrate 3102.FIG. 60D shows the formation ofsolder bumps 3404 inholes 3402. - Following the formation of
solder bumps 3404 inholes 3402, the wafer, as shown inFIG. 60E , is preferably diced, providing a plurality of packaged electro-optic circuit chips 3406, as illustrated inFIG. 60F . Following dicing ofsubstrate 3102 into a plurality of packaged electro-optic circuit chips 3406, anoptical edge surface 3407 of each of the plurality of packaged electro-optic circuit chips 3406 is polished to provide an optical quality planar surface. It is appreciated that the planar surface defined by the polishing may be either parallel, or at any suitable angle, to the plane defined by the dicing. - Reference is now made to
FIG. 61 , which shows packaged electro-optic circuit chips 3406 mounted on a conventionalelectrical circuit board 3408 and being interconnected by a conventionaloptical fiber ribbon 3410 and associated conventional optical fiber connectors 3116 (FIG. 52B ). - It will be appreciated by persons skilled in the art that the present invention is not limited by what has been particularly shown and described hereinabove. Rather the scope of the present invention includes both combinations and subcombinations of the various features described hereinabove as well as variations and modifications which would occur to persons skilled in the art upon reading the specification and which are not in the prior art.
Claims (35)
1. An optical device formed from a substrate, the optical device, comprising:
an optical fiber, having a core region, mounted on a surface of the substrate;
an optical element disposed on the substrate and operatively configured for optical coupling with the core region of the optical fiber;
an optical connector, the optical connector comprising alignment bores.
2. The optical device of claim 1 , wherein, the alignment bores are arranged on an edge of the optical device.
3. The optical device of claim 1 , further comprising,
electrical circuitry formed on another surface of the substrate; and
an electro-optic component coupled to the electrical circuitry.
4. The optical device of claim 1 , further comprising, a set of positioning elements within which the optical fiber is disposed.
5. The optical device of claim 1 , wherein the substrate is substantially optically transparent.
6. The optical device of claim 1 , further comprising:
a transverse notch within which the optical element is disposed, the transverse notch extending from the surface of the substrate through at least a portion of the optical fiber;
wherein transverse notch has at least one inclined surface.
7. The optical device of claim 1 ,
further comprising an optical adhesive disposed between the surface and the optical element;
wherein the optical adhesive has an index of refraction at least generally matched to that of the core region of the optical fiber and to that of the optical element.
8. The optical device of claim 1 , wherein the optical element has a flat reflective surface or a curved surface.
9. The optical device of claim 1 , wherein the optical element includes a concave mirror.
10. The optical device of claim 1 , wherein the optical element includes a reflective grating.
11. The optical device of claim 1 , wherein the optical element includes reflective elements formed on opposite surfaces of an optical substrate.
12. The optical device of claim 2 , wherein the optical connector is aligned with an end of the optical fiber along the edge of the optical device.
13. An optical device comprising:
a substrate having first and second surfaces;
an optical fiber, having a core region, mounted on the first surface of the substrate;
an optical element disposed on the substrate and operatively configured for optical coupling with the core region of the optical fiber;
wherein the optical element is operatively configured to collimate light received from the optical fiber.
14. An optical device formed from a substrate, the optical device, comprising:
an optical fiber, having a core region, mounted on a surface of the substrate;
an optical element disposed on the substrate and operatively configured for optical coupling with the core region of the optical fiber;
wherein the optical element is operatively configured to focus at least one of multiple colors of light received from the optical fiber.
15. An optical device formed from a substrate, the optical device, comprising:
an optical fiber, having a core region, mounted on a surface of the substrate;
an optical element disposed on the substrate and operatively configured for optical coupling with the core region of the optical fiber;
wherein the optical element is operatively configured to focus light received from the optical fiber.
16. The optical device of claim 15 , further comprising,
electrical circuitry formed on another surface of the substrate; and
an electro-optic component coupled to the electrical circuitry.
17. The optical device of claim 15 , further comprising, a set of positioning elements within which the optical fiber is disposed.
18. The optical device of claim 15 , wherein the substrate is substantially optically transmissive.
19. The optical device of claim 15 , further comprising:
a transverse notch within which the optical element is disposed, the transverse notch extending from the surface of the substrate through a portion of the optical fiber;
wherein transverse notch has an inclined surface.
20. The optical device of claim 15 , wherein the optical element includes a partially flat and partially concave mirror.
21. The optical device of claim 20 , wherein the partially concave mirror includes a mirror having multiple concave reflective surfaces.
22. The optical device of claim 15 , further comprising, an optical connector.
23. The optical device of claim 22 , wherein the optical connector is aligned with an end of the optical fiber along an edge of the optical device.
24. The optical device of claim 22 , wherein the optical connector comprises alignment bores arranged on the edge of the optical device.
25. An optical device comprising:
a substrate having first and second surfaces;
an optical fiber, having a core region, mounted on the first surface of the substrate;
an optical element disposed partially within the substrate and operatively configured for optical coupling with the core region of the optical fiber.
26. An optical device comprising:
a substrate having first and second surfaces;
an optical fiber, having a core region, mounted on the first surface of the substrate;
an optical element disposed partially within the substrate and operatively configured for optical coupling with the core region of the optical fiber, the optical element having a reflective optical surface.
27. The optical device of claim 26 , further comprising:
a transverse notch within which the optical element is disposed, the transverse notch extending from the first surface of the substrate through at least a portion of the optical fiber;
wherein transverse notch has an inclined surface.
28. The optical device of claim 26 , further comprising,
electrical circuitry formed on the second surface of the substrate; and
an electro-optic component coupled to the electrical circuitry.
29. The optical device of claim 26 ,
further comprising an optical adhesive disposed between the first surface and the optical element;
wherein the optical adhesive has an index of refraction at least generally matched to that of the core region of the optical fiber and to that of the optical element.
30. The optical device of claim 26 , wherein the reflective optical surface is a flat reflective surface or a curved surface.
31. The optical device of claim 26 , wherein the optical element includes a concave mirror.
32. The optical device of claim 26 , wherein the optical element includes a partially flat and partially concave mirror.
33. The optical device of claim 32 , wherein the partially concave mirror includes a mirror having multiple concave reflective surfaces.
34. The optical device of claim 26 , wherein the at least one optical element includes a reflective grating.
35. The optical device of claim 26 , wherein the at least one optical element includes reflective elements formed on opposite surfaces of an optical substrate.
Priority Applications (1)
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US12/357,363 US20090154873A1 (en) | 2002-04-16 | 2009-01-21 | Electro-optic integrated circuits with connectors and methods for the production thereof |
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US37341502P | 2002-04-16 | 2002-04-16 | |
US10/314,088 US20040021214A1 (en) | 2002-04-16 | 2002-12-06 | Electro-optic integrated circuits with connectors and methods for the production thereof |
US11/365,328 US20060145279A1 (en) | 2002-04-16 | 2006-02-28 | Electro-optic integrated circuits with connectors and methods for the production thereof |
US12/357,363 US20090154873A1 (en) | 2002-04-16 | 2009-01-21 | Electro-optic integrated circuits with connectors and methods for the production thereof |
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US11/365,328 Continuation US20060145279A1 (en) | 2002-04-16 | 2006-02-28 | Electro-optic integrated circuits with connectors and methods for the production thereof |
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US11/365,328 Abandoned US20060145279A1 (en) | 2002-04-16 | 2006-02-28 | Electro-optic integrated circuits with connectors and methods for the production thereof |
US12/198,867 Expired - Fee Related US8043877B2 (en) | 2002-04-16 | 2008-08-26 | Electro-optic integrated circuits and methods for the production thereof |
US12/357,363 Abandoned US20090154873A1 (en) | 2002-04-16 | 2009-01-21 | Electro-optic integrated circuits with connectors and methods for the production thereof |
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US11/365,328 Abandoned US20060145279A1 (en) | 2002-04-16 | 2006-02-28 | Electro-optic integrated circuits with connectors and methods for the production thereof |
US12/198,867 Expired - Fee Related US8043877B2 (en) | 2002-04-16 | 2008-08-26 | Electro-optic integrated circuits and methods for the production thereof |
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Also Published As
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US20090246905A1 (en) | 2009-10-01 |
US20060145279A1 (en) | 2006-07-06 |
US20040021214A1 (en) | 2004-02-05 |
US8043877B2 (en) | 2011-10-25 |
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