US20100109673A1 - Heat-resistant lens kit - Google Patents
Heat-resistant lens kit Download PDFInfo
- Publication number
- US20100109673A1 US20100109673A1 US12/652,325 US65232510A US2010109673A1 US 20100109673 A1 US20100109673 A1 US 20100109673A1 US 65232510 A US65232510 A US 65232510A US 2010109673 A1 US2010109673 A1 US 2010109673A1
- Authority
- US
- United States
- Prior art keywords
- heat
- main body
- light
- lens kit
- resistant lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
Definitions
- the present invention is related to a wafer tester for a photo sensor, and particularly to a wafer tester that includes a hear-resistant lens kit to form an enclosed room for isolating the surface of a device under test.
- CMOS sensor It is necessary for a CMOS sensor to be tested under low-temperature environment for sure of practical work in the low-temperature environment.
- FIG. 1 is a schematic diagram of a wafer tester 10 having a test base 11 as an upper portion and a chuck 13 for loading a device under test as a bottom portion.
- the test base 11 includes a pogo tower 13 , a probe card 14 and a test head 16 .
- the test head 16 is associated with a test probe 18 for touching a device under test, a room for light transmission and a probe card holder 17 for connecting the pogo tower 12 and the probe card 14 into a piece.
- the device under test in order to maintain a device in a low-temperature state, the device under test is necessarily attached to the chuck 13 through low-temperature treatment for sure of low temperature. Meanwhile, the probe card 14 of the wafer tester 10 is close to the device under test in low-temperature state. However, the device under test is in low-temperature state on one hand. On the other hand, the probe card 14 is in room-temperature or higher-temperature state. Thus, there is vapor, also called as saturated vapor, formed on the interface of the low-temperature surface and the high-temperature surface. When light is incident continuously, light though vapor may be reflected, refracted or scattered. Thus, light incident on the device under test may be disordered and further cause incorrect measurement and short to damage the apparatus. Thus, in order to correctly and rapidly test the device under test, the vapor generation should be overcome.
- one object of the present invention is to provide a heat-resistant lens kit to prevent from vapor generation.
- Another one object of the present invention provides a heat-resistant lens kit having a main body with a through hole and two parallel lenses to enclose a room.
- the main body is associated with a suction hole and an indicator to make the room vacuum.
- the other object of the present invention provides a wafer tester of photo sensor.
- the wafer tester includes a heat-resistant lens kit to form a vacuum room for isolating the surface of a device under test from the incident surface of light and preventing from vapor formation.
- Another object of the present invention provides a wafer tester of photo sensor which includes a pair of lenses directly attached to the two ends of an opening on a pogo tower to form an enclosed room.
- a vacuum pump maintains the enclosed room in vacuum state.
- the low-temperature surface and the room-temperature surface are isolated from each other to prevent vapor formation.
- FIG. 1 is a schematic diagram illustrating a testing apparatus according to a prior art.
- FIG. 2A is a schematic diagram illustrating a heat-resistant lens kit according to the present invention.
- FIG. 2B is a schematic diagram illustrating a heat-resistant lens kit according to the present invention.
- FIG. 3 is a schematic diagram illustrating an exemplary testing apparatus according to the present invention.
- FIG. 4 is a schematic diagram illustrating an exemplary testing apparatus according to the present invention.
- the present invention provides a wafer tester. Following illustrations describe detailed components and steps for understanding the present invention. Obviously, the present invention is not limited to the embodiments of wafer tester, however, the preferable embodiments of the present invention are illustrated as followings. Besides, the present invention may be applied to other embodiments, not limited to ones mentioned.
- the device under test would be maintained in a low-temperature state when attached to a low-temperature chuck 13 .
- the room-temperature probe card 14 causes vapor formation on the interface.
- the vapor film results in the reflection and fraction of lights and further in test error and apparatus damage.
- One best resolution to such a problem is to isolate the interface of objects in different temperature with a room in a vacuum state.
- one exemplary embodiment of the present invention provides a heat-resistant lens kit 20 shown as FIG. 2A including a main body 22 and two lenses 24 .
- a through hole is set in the main body 22 and the two lenses 24 are parallel configured on the two ends of the through hole of the main body 22 .
- the main body 22 and the two lenses 24 enclose a vacuum room.
- the two lenses 24 are fixed on the main body 22 with built-in screws or adhesive, and so on.
- the main body 22 may be made of low thermo-conductivity and heat resistant materials to form a heat resistant element in good quality.
- the enclosed room between the main body 22 and two lenses 24 is kept vacuum to be configured for blocking heat conduction.
- the main body 22 and the two lenses 24 may enclose a non-vacuum room. Gas in the non-vacuum room may be exhaust out to meet vacuum requirement for blocking heat conduction.
- the heat-resistant lens kit 20 includes a suction hole 26 and an indicator 28 to exhaust gas out of the heat-resistant lens kit 20 by an air extractor (not shown).
- the indicator 28 may be sucked into the heat-resistant lens kit 20 .
- the indicator 28 may float up to remind a user of extracting gas within the heat-resistant lens kit 20 when the vacuum degree is below a threshold in the heat-resistant lens kit 20 .
- the indicator 28 may be made of spring, elastic sheet, sponge or any suitable elastic element.
- FIG. 3 shown in FIG. 3 is a schematic diagram illustrating the combination of the heat-resistant lens kit 20 and a wafer tester 10 in accordance with the present invention.
- the upper portion is a test plate 11 and the lower portion is the wafer tester 10 for loading a device under test.
- the test plate 11 includes a POGO Tower 12 , a probe card 14 , a chamber 15 and a test head 16 .
- the fixing of the heat-resistant lens kit 20 and POGO Tower 12 may be implemented with a screw 21 , shown in FIG.
- the heat-resistant lens kit 20 may be fixed on the POGO Tower 12 with at least one O-ring 23 on the main body 22 of the heat-resistant lens kit 20 to fix the POGO Tower 12 of the heat-resistant lens kit 20 , show in FIG. 2B .
- the light source emits light through the chamber 15 of the wafer tester 10
- the light is incident into the opening of the POGO Tower 12 and through the two lenses 24 of the heat-resistant lens kit 20 and the enclosed room, the probe card 14 and the aperture on the test head 16 in sequence, and then on the device under test.
- the low temperature conducted by the device under test may be isolated and prevent the probe card 14 from vapor.
- the two lenses 25 are directly fixed on the through hole of the chuck 13 , shown as FIG. 4 .
- the fixation of the two lenses 25 and the two ends of the POGO Tower 12 is not limited, such as screw fixation, O-ring fixation or direct attachment as long as the fixed two lenses 25 are parallel and in vacuum state.
- the vacuum formation is implemented by the vacuum pump 40 on the wafer tester 10 that may associate with the usage condition to maintain vacuum between the two lenses 25 and the POGO Tower 12 .
- the low temperature conducted by the device under test may be isolated and prevent the probe card 14 from vapor.
Abstract
A heat-resistant lens kit configured within the pogo tower of the wafer tester is disclosed. The heat-resistant lens kit has two parallel lenses and a main body with a through hole. The main body and two parallel lenses enclose a vacuum room within the through hole.
Description
- This application is a continuation application of, and claims a priority to the U.S. patent application Ser. No. 11/819,083 filed on Jun. 25, 2007, which claims a priority to the foreign patent application in Taiwan with a serial number TW96107169, filed on Mar. 2, 2007.
- 1. Field of the Invention
- The present invention is related to a wafer tester for a photo sensor, and particularly to a wafer tester that includes a hear-resistant lens kit to form an enclosed room for isolating the surface of a device under test.
- 2. Description of the Related Art
- It is necessary for a CMOS sensor to be tested under low-temperature environment for sure of practical work in the low-temperature environment.
-
FIG. 1 is a schematic diagram of awafer tester 10 having atest base 11 as an upper portion and achuck 13 for loading a device under test as a bottom portion. Thetest base 11 includes apogo tower 13, aprobe card 14 and atest head 16. Thetest head 16 is associated with atest probe 18 for touching a device under test, a room for light transmission and aprobe card holder 17 for connecting thepogo tower 12 and theprobe card 14 into a piece. Obviously, there is a hole individually in thepogo tower 12,probe card 14 and atest head 16 for passing light onto the device under test. Shown inFIG. 1 , in order to maintain a device in a low-temperature state, the device under test is necessarily attached to thechuck 13 through low-temperature treatment for sure of low temperature. Meanwhile, theprobe card 14 of thewafer tester 10 is close to the device under test in low-temperature state. However, the device under test is in low-temperature state on one hand. On the other hand, theprobe card 14 is in room-temperature or higher-temperature state. Thus, there is vapor, also called as saturated vapor, formed on the interface of the low-temperature surface and the high-temperature surface. When light is incident continuously, light though vapor may be reflected, refracted or scattered. Thus, light incident on the device under test may be disordered and further cause incorrect measurement and short to damage the apparatus. Thus, in order to correctly and rapidly test the device under test, the vapor generation should be overcome. - In order to test a photo sensor in low-temperature state, one object of the present invention is to provide a heat-resistant lens kit to prevent from vapor generation.
- Another one object of the present invention provides a heat-resistant lens kit having a main body with a through hole and two parallel lenses to enclose a room. The main body is associated with a suction hole and an indicator to make the room vacuum.
- The other object of the present invention provides a wafer tester of photo sensor. The wafer tester includes a heat-resistant lens kit to form a vacuum room for isolating the surface of a device under test from the incident surface of light and preventing from vapor formation.
- Another object of the present invention provides a wafer tester of photo sensor which includes a pair of lenses directly attached to the two ends of an opening on a pogo tower to form an enclosed room. A vacuum pump maintains the enclosed room in vacuum state. The low-temperature surface and the room-temperature surface are isolated from each other to prevent vapor formation.
-
FIG. 1 is a schematic diagram illustrating a testing apparatus according to a prior art. -
FIG. 2A is a schematic diagram illustrating a heat-resistant lens kit according to the present invention. -
FIG. 2B is a schematic diagram illustrating a heat-resistant lens kit according to the present invention. -
FIG. 3 is a schematic diagram illustrating an exemplary testing apparatus according to the present invention. -
FIG. 4 is a schematic diagram illustrating an exemplary testing apparatus according to the present invention. - The present invention provides a wafer tester. Following illustrations describe detailed components and steps for understanding the present invention. Obviously, the present invention is not limited to the embodiments of wafer tester, however, the preferable embodiments of the present invention are illustrated as followings. Besides, the present invention may be applied to other embodiments, not limited to ones mentioned.
- In a known technology, the device under test would be maintained in a low-temperature state when attached to a low-
temperature chuck 13. However, the room-temperature probe card 14 causes vapor formation on the interface. The vapor film results in the reflection and fraction of lights and further in test error and apparatus damage. One best resolution to such a problem is to isolate the interface of objects in different temperature with a room in a vacuum state. - Accordingly, one exemplary embodiment of the present invention provides a heat-
resistant lens kit 20 shown asFIG. 2A including amain body 22 and twolenses 24. A through hole is set in themain body 22 and the twolenses 24 are parallel configured on the two ends of the through hole of themain body 22. Themain body 22 and the twolenses 24 enclose a vacuum room. The twolenses 24 are fixed on themain body 22 with built-in screws or adhesive, and so on. Furthermore, themain body 22 may be made of low thermo-conductivity and heat resistant materials to form a heat resistant element in good quality. - In a preferred embodiment, the enclosed room between the
main body 22 and twolenses 24 is kept vacuum to be configured for blocking heat conduction. However, in another embodiment, themain body 22 and the twolenses 24 may enclose a non-vacuum room. Gas in the non-vacuum room may be exhaust out to meet vacuum requirement for blocking heat conduction. - The method for making vacuum is not limited to in the present invention. For example, in
FIG. 2A , the heat-resistant lens kit 20 includes asuction hole 26 and anindicator 28 to exhaust gas out of the heat-resistant lens kit 20 by an air extractor (not shown). When a vacuum degree is read out within the heat-resistant lens kit 20, theindicator 28 may be sucked into the heat-resistant lens kit 20. Reversely, theindicator 28 may float up to remind a user of extracting gas within the heat-resistant lens kit 20 when the vacuum degree is below a threshold in the heat-resistant lens kit 20. Accordingly, theindicator 28 may be made of spring, elastic sheet, sponge or any suitable elastic element. When a low-temperature environment, for example, room temperature down to −100° C., is configured by achuck 13, vapor due to temperature difference does not result because the enclosed vacuum room by the heat-resistant lens kit 20 may isolate the contact surface of a device under test from incident surface of aprobe card 14. Moreover, in order to maintain identical phase of light when light reaches to the element in a test, it is necessary to make the twolenses 24 parallel for fear of interference on light source in the test. - Next, shown in
FIG. 3 is a schematic diagram illustrating the combination of the heat-resistant lens kit 20 and awafer tester 10 in accordance with the present invention. The upper portion is atest plate 11 and the lower portion is thewafer tester 10 for loading a device under test. Thetest plate 11 includes aPOGO Tower 12, aprobe card 14, achamber 15 and atest head 16. There are a plurality oftest probes 18 for contacting the device under test and aprobe card holder 17 for combining thePOGO Tower 12 and theprobe card 14. There is an opening within thePOGO Tower 12 to load the heat-resistant lens kit 20. The fixing of the heat-resistant lens kit 20 andPOGO Tower 12 may be implemented with ascrew 21, shown inFIG. 2A . Moreover, the heat-resistant lens kit 20 may be fixed on thePOGO Tower 12 with at least one O-ring 23 on themain body 22 of the heat-resistant lens kit 20 to fix thePOGO Tower 12 of the heat-resistant lens kit 20, show inFIG. 2B . Thus, when the light source emits light through thechamber 15 of thewafer tester 10, the light is incident into the opening of thePOGO Tower 12 and through the twolenses 24 of the heat-resistant lens kit 20 and the enclosed room, theprobe card 14 and the aperture on thetest head 16 in sequence, and then on the device under test. The low temperature conducted by the device under test may be isolated and prevent theprobe card 14 from vapor. - In another embodiment of the present invention, the two
lenses 25 are directly fixed on the through hole of thechuck 13, shown asFIG. 4 . The fixation of the twolenses 25 and the two ends of thePOGO Tower 12 is not limited, such as screw fixation, O-ring fixation or direct attachment as long as the fixed twolenses 25 are parallel and in vacuum state. In the embodiment, the vacuum formation is implemented by thevacuum pump 40 on thewafer tester 10 that may associate with the usage condition to maintain vacuum between the twolenses 25 and thePOGO Tower 12. Thus, the low temperature conducted by the device under test may be isolated and prevent theprobe card 14 from vapor. - Obviously, according to the illustration of embodiments aforementioned, there may be modification and differences in the present invention. Thus it is necessary to understand the addition of claims. In addition of detailed illustration aforementioned, the present invention may be broadly applied to other embodiments. Although the present invention has been explained in relation to its preferred embodiment, it is to be understood that other modifications and variation can be made without departing the spirit and scope of the invention as hereafter claimed.
Claims (10)
1. A testing apparatus of light-sensing element, comprising:
a probe card associated with a probe head thereon, wherein there are a plurality of testing probes on the probe head;
a pogo tower connected with the probe card and having an opening;
a holder of probe card arranged between the pogo tower and the probe card and configured for connecting the pogo tower and the probe card into a piece;
a heat-resistant lens kit configured in an opening of the pogo tower, wherein the heat-resistant lens kit comprises a main body with a through hole and two parallel lenses, and a suction hole and an indicator associated on the main body and the two parallel lenses, and an enclosed room is formed between the main body and the two parallel lenses; and
a chuck for loading a device under test.
2. The testing apparatus of light-sensing element according to claim 1 , wherein the heat-resistant lens kit is fixed in the opening of the pogo tower with a fixing component.
3. The testing apparatus of light-sensing element according to claim 1 , wherein the heat-resistant lens kit is connected with the pogo tower with an O-ring.
4. The testing apparatus of light-sensing element according to claim 1 , wherein the enclosed room is in vacuum.
5. The testing apparatus of light-sensing element according to claim 1 , wherein the indicator is made of spring, elastic sheet, sponge or elastic element.
6. The testing apparatus of light-sensing element according to claim 1 , wherein the chuck provides an environment below the room temperature.
7. The testing apparatus of light-sensing element according to claim 1 , wherein the chuck provides an environment below negative 40 degree Celsius.
8. The testing apparatus of light-sensing element according to claim 1 , wherein the main body is made of heat-resistant material.
9. A heat-resistant lens kit, comprising a main body with a through hole and two lenses configured on two corresponding ends of the through hole to form an enclosed room, the characteristic in: a suction hole and an indicator associated on the main body and the two lenses parallel.
10. The heat-resistant lens kit according to claim 9 , wherein the main body is made of heat-resistant material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/652,325 US20100109673A1 (en) | 2007-03-02 | 2010-01-05 | Heat-resistant lens kit |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096107169A TWI334486B (en) | 2007-03-02 | 2007-03-02 | Test apparatus with heat-resistant lens kit |
TW96107169 | 2007-03-02 | ||
US11/819,083 US7701233B2 (en) | 2007-03-02 | 2007-06-25 | Heat-resistant lens kit |
US12/652,325 US20100109673A1 (en) | 2007-03-02 | 2010-01-05 | Heat-resistant lens kit |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/819,083 Continuation US7701233B2 (en) | 2007-03-02 | 2007-06-25 | Heat-resistant lens kit |
Publications (1)
Publication Number | Publication Date |
---|---|
US20100109673A1 true US20100109673A1 (en) | 2010-05-06 |
Family
ID=39732658
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/819,083 Expired - Fee Related US7701233B2 (en) | 2007-03-02 | 2007-06-25 | Heat-resistant lens kit |
US12/652,325 Abandoned US20100109673A1 (en) | 2007-03-02 | 2010-01-05 | Heat-resistant lens kit |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/819,083 Expired - Fee Related US7701233B2 (en) | 2007-03-02 | 2007-06-25 | Heat-resistant lens kit |
Country Status (3)
Country | Link |
---|---|
US (2) | US7701233B2 (en) |
JP (1) | JP4729025B2 (en) |
TW (1) | TWI334486B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI399547B (en) * | 2009-07-22 | 2013-06-21 | King Yuan Electronics Co Ltd | Semiconductor test equipment with concentric circle pogo towers |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4115736A (en) * | 1977-03-09 | 1978-09-19 | The United States Of America As Represented By The Secretary Of The Air Force | Probe station |
US6771086B2 (en) * | 2002-02-19 | 2004-08-03 | Lucas/Signatone Corporation | Semiconductor wafer electrical testing with a mobile chiller plate for rapid and precise test temperature control |
US20050237418A1 (en) * | 2002-07-01 | 2005-10-27 | Rohm Co., Ltd | Image sensor module |
US7102159B2 (en) * | 2004-06-12 | 2006-09-05 | Macronix International Co., Ltd. | Ultra thin image sensor package structure and method for fabrication |
US20060214673A1 (en) * | 2003-11-28 | 2006-09-28 | Shingo Tamai | Intrument for testing solid-state imaging device |
US20060245071A1 (en) * | 2005-04-29 | 2006-11-02 | Agilent Technologies | Lens correction element, system and method |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5929151B2 (en) * | 1981-08-03 | 1984-07-18 | 日本電子材料株式会社 | Semiconductor wafer testing equipment |
JPH07111995B2 (en) * | 1987-09-02 | 1995-11-29 | 東京エレクトロン株式会社 | Probe device |
US5835997A (en) * | 1995-03-28 | 1998-11-10 | University Of South Florida | Wafer shielding chamber for probe station |
WO2004053451A1 (en) * | 2002-12-06 | 2004-06-24 | Inter Action Corporation | Instrument for testing solid-state imaging device |
JP4513059B2 (en) * | 2004-08-25 | 2010-07-28 | 横河電機株式会社 | IC tester |
-
2007
- 2007-03-02 TW TW096107169A patent/TWI334486B/en not_active IP Right Cessation
- 2007-06-25 US US11/819,083 patent/US7701233B2/en not_active Expired - Fee Related
- 2007-08-29 JP JP2007222456A patent/JP4729025B2/en not_active Expired - Fee Related
-
2010
- 2010-01-05 US US12/652,325 patent/US20100109673A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4115736A (en) * | 1977-03-09 | 1978-09-19 | The United States Of America As Represented By The Secretary Of The Air Force | Probe station |
US6771086B2 (en) * | 2002-02-19 | 2004-08-03 | Lucas/Signatone Corporation | Semiconductor wafer electrical testing with a mobile chiller plate for rapid and precise test temperature control |
US20050237418A1 (en) * | 2002-07-01 | 2005-10-27 | Rohm Co., Ltd | Image sensor module |
US20060214673A1 (en) * | 2003-11-28 | 2006-09-28 | Shingo Tamai | Intrument for testing solid-state imaging device |
US7102159B2 (en) * | 2004-06-12 | 2006-09-05 | Macronix International Co., Ltd. | Ultra thin image sensor package structure and method for fabrication |
US20060245071A1 (en) * | 2005-04-29 | 2006-11-02 | Agilent Technologies | Lens correction element, system and method |
Also Published As
Publication number | Publication date |
---|---|
US7701233B2 (en) | 2010-04-20 |
JP4729025B2 (en) | 2011-07-20 |
JP2008216236A (en) | 2008-09-18 |
US20080211527A1 (en) | 2008-09-04 |
TW200837352A (en) | 2008-09-16 |
TWI334486B (en) | 2010-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: KING YUAN ELECTRONICS CO., LTD,TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:TAI, PI-HUI;REEL/FRAME:023734/0899 Effective date: 20091230 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |