|
| US4190019 | 14. Sept. 1977 | 26. Febr. 1980 | | Vacuum metallizing interior of hollow article with masking shield |
| US4191128 | 7. Nov. 1978 | 4. März 1980 | | Vacuum metallizing of hollow articles |
| US4646681 | 25. Apr. 1985 | 3. März 1987 | Canon Kabushiki Kaisha | Gaseous phase method accumulated film manufacturing apparatus |
| US5846328 | 22. Febr. 1996 | 8. Dez. 1998 | Anelva Corporation | In-line film deposition system |
| US6027618 | 24. Okt. 1997 | 22. Febr. 2000 | Anelva Corporation | Compact in-line film deposition system |
| US6251232 | 22. Febr. 2000 | 26. Juni 2001 | Anelva Corporation | Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatus |
| US6300225 | 15. März 1999 | 9. Okt. 2001 | Canon Kabushiki Kaisha | Plasma processing method |
| US6649020 | 5. Juli 2001 | 18. Nov. 2003 | Canon Kabushiki Kaisha | Plasma processing apparatus |
| US7517712 | 8. Nov. 2005 | 14. Apr. 2009 | Electronics Packaging Solutions, Inc. | Wafer-level hermetic micro-device packages |
| US7832177 | 4. Mai 2006 | 16. Nov. 2010 | Electronics Packaging Solutions, Inc. | Insulated glazing units |
| US7989040 | 12. Sept. 2008 | 2. Aug. 2011 | Electronics Packaging Solutions, Inc. | Insulating glass unit having multi-height internal standoffs and visible decoration |
