US4725345A - Method for forming a hard carbon thin film on article and applications thereof - Google Patents
Method for forming a hard carbon thin film on article and applications thereof Download PDFInfo
- Publication number
- US4725345A US4725345A US06/853,182 US85318286A US4725345A US 4725345 A US4725345 A US 4725345A US 85318286 A US85318286 A US 85318286A US 4725345 A US4725345 A US 4725345A
- Authority
- US
- United States
- Prior art keywords
- carbon
- article
- bond
- gas
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
- H04R31/003—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor for diaphragms or their outer suspension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the present invention relates to a method for forming a hard carbon thin film or layer at a low pressure and at relatively low temperatures and applications thereof.
- a chemical vapor deposition process (plasma CVD) and an ionization deposition process are known as methods of manufacturing a thin diamond film or layer, which has attracted an attention as a new material in recent years, at a low pressure and at relatively low temperatures. It has been confirmed that diamond was formed by these processes. Further, the process using microwave discharge as a plasma generating method has also recently been proposed (Japanese patent unexamined publication No. 110494/1983).
- hydrocarbon and hydrogen gas are used as a mixture gas, this mixture gas is discharged onto the surface of the heated substrate, and thereby educing diamond from the vapor through decomposition of hydrocarbon.
- the acoustic diaphragm consisting of a diamond like carbon layer has been proposed as the applied technology.
- the acoustic diaphragm in which the solid carbon source was formed due to an ion beam deposition process Japanese patent examined publication No. 33237/1980
- Japanese patent unexamined publication No. 162194/1983 Japanese patent unexamined publication No.
- diamond produced by those methods has the drawback such that the deposition rate is low. It is considered that this is because since it is a fundamental idea to decompose the hydrocarbon gas such as methane or the like, a vacuum degree decreases and the mean free path is reduced.
- the sonic velocity, Young's modulus, and rigidity of the acoustic diaphragm proposed hitherto can be certainly improved, there is the drawback such that the peak of high frequency resonance occurs in the case of assembling such acoustic diaphragms to a speaker unit. It is considered that this is because since only diamond is formed, in spite of the improvement of the physical characteristic, a moderate internal loss of the diaphragm itself is not obtained.
- Another object of the invention is to provide a method for forming a hard carbon layer which is suitable to cover the surface of an acoustic diaphragm.
- Still another object of the invention is to provide an acoustic diaphragm having a good high frequency characteristic.
- a method according to the present invention belongs to what is called an ion plating process and relates to a method whereby carbon is heated and evaporated in the vacuum by an electron beam or the like and thereby depositing a hard carbon thin layer on the substrate.
- this method by use of graphite as a solid carbon source, the carbon vapor is ionized in the relatively high vacuum in the order of 10 -4 Torr by an ionizing electrode (probe) and a filament or by an ionizing electrode (probe). Further, catalystic gas such as the mixture gas of hydrogen and argon is added.
- the deposited carbon layer is predominantly amorphous carbon of inclusion of hybridized orbital SP 2 bond and hybridized orbital SP 3 bond and crystalline carbon particles of hybridized orbital SP 3 bond dispersed in said amorphous carbon, or an amorphous carbon of inclusion of hybridized orbital SP 2 bond and hybridized orbital SP 3 bond.
- the deposition rate is smaller than 0.02 ⁇ m/min, the effect of improvement of the high frequency characteristic cannot be obtained.
- the deposition rate exceeds 0.1 ⁇ m/min, adhesive property with the diaphragm substrate deteriorates. Therefore, it is desirable to set the deposition rate to a value within a range of 0.02 to 0.1 ⁇ m/min.
- the produced layer was analyzed and their crystalline properties were compared through the electron diffraction.
- the crystal in the layer formed due to the ion plating process according to the invention coincides with the spacing of diamond.
- the layer in which amorphous carbon mixedly exists was obtained.
- the existence of diamond was confirmed by the respective measuring methods such as infrared spectrum, photo-electron spectrum, hardness measurement, and the like.
- the hard carbon layer can be formed on the substrate at a low pressure and at ordinary temperatures and the thin metal layer made of aluminum or titanium of tens of microns is used as the substrate of the diaphragm, no thermal deformation occurs (at temperatures below 500° C.) and no stress is applied to the whole diaphragm.
- the adhesive property of the hard carbon layer with the substrate is good and stable, the produced layer of the diaphragm is hardly peeled off and variations in Young's modulus, density, internal loss, and the like are small.
- the diaphragm forming region in this case is 6.5 times as wide as that by the ion beam process.
- the material and shape of the substrate, and the like are not limited, so that the following wide applications can be considered.
- Electronic field--Improvement of the abrasion resistance of the magnetic heads (to record and reproduce the audio signal, video signal, or data signal on and from the recording medium such as magnetic disk, optical disk, magnetic tape, or floppy disk).
- this hard carbon layer is suitable as a coating layer onto the surface of the diaphragm of the speaker.
- the quality of the sound which is reproduced by the speaker largely depends on the performance (physical properties) of this diaphragm. It is necessary to satisfy the following conditions as the diaphragm of the speaker. Namely, the light, strong and weak resonance diaphragm is desirable. In terms of the physical properties, it is preferable to use the material having the characteristics of low density, high elasticity, and large internal loss.
- Diamond has the highest hardness and ridigity on earth and has the excellent physical properties with regard to the Young's modulus, sonic velocity, and the like as compared with the other materials. Therefore, diamond is a favorable diaphragm material.
- the diaphragm of the speaker even if layer-like diamond could be formed due to the process at ordinary temperatures and at a low pressure, the single diamond body itself would have been broken due to the impact from the outside or the internal stress. Thus, it is difficult to manufacture the speaker diaphragms made of diamond. In terms of the sound quality and performance, there are also problems such that the resonance of the diaphragm occurs because of its high rigidity, and the like.
- the hard carbon layer formed due to the ion plating process according to the present invention has the feature such that the diamond particles having the SP 3 bond were dispersed in the carbon layer mainly having the hybridized orbital SP 2 bond. Therefore, the specific note at the resonance frequency is suppressed and the generation of unnecessary noise is little and also the rigidity is high. Further, this hard carbon layer can eliminate what is called a "brittleness" such that the layer is broken due to the impact from the outside or the internal stress. Consequently, the diaphragm having the acoustically ideal performance could be formed.
- the following table shows the comparison of the mechanical characteristics between titanium and the hard carbon layer formed by the invention.
- FIG. 1 is a diagram showing an apparatus to embody a method for forming a hard carbon layer according to the present invention
- FIGS. 2 to 6 are diagrams showing dome-shaped diaphragms each of which was coated with a hard carbon layer on the surface;
- FIGS. 7 to 9 are diagrams showing cone-shaped diaphragms each of which was coated with a hard carbon layer on the surface;
- FIG. 10 is a diagram showing a structure of a speaker including a composite diaphragm shown in each of FIGS. 7 to 9;
- FIG. 11 is a diagram showing dome-shaped diaphragms each of which was formed with an intermediate layer between a base material of a diaphragm and a hard carbon layer.
- a method for forming a hard carbon layer according to the present invention is accomplished by an apparatus shown in FIG. 1.
- An article 2 as substrate which is formed with a hard carbon layer on the surface is disposed in a vacuum chamber 1 and the air is exhausted from this chamber to the vacuum pressure of the order of 10 -6 Torr. Thereafter, the argon gas or the mixture gas of hydrogen and argon is introduced into the vacuum chamber 1 so that the gas pressure in the vacuum chamber becomes the order of 10 -4 Torr Graphite 5 in a crucible 4 is evaporated by applying an electron beam 3 onto the graphite 5. At the same time, a DC voltage of 50 V is applied to an ionizing electrode 6 arranged over the crucible 4. In addition, a current of a predetermined amount is also supplied to an electron emitting filament 7 disposed between the crucible 4 and the ionizing electrode 6. The evaporated carbon is ionized in the electric field produced by electrode 6 and becomes a plasma state with the mixture gas.
- a DC voltage in a range of -100 to -1 kV is applied to the article 2 and a shutter 8 is opened to form a layer onto the article 2 serving as a base material. It is desirable to set the deposition rate to a value within a range of 0.02 to 0.1 ⁇ m/min.
- the layer on the article 2 formed in this manner was evaluated. The hardness of Hv 3000 to 4000 was obtained and it has been confirmed through electron diffraction and ESCA spectrum that the SP 3 diamond bond was formed. On the other hand, no hydrogen was detected in the layer.
- the preparation like cleaning on the surface of the article 2 is conducted before the evaporating step of the graphite.
- Argon gas or mixture gas of Argon and hydrogen of the order of 10 -2 Torr is introduced into the chamber 1.
- DC voltage of several hundred voltages is applied onto the article 2 to bombard the surface of the article 2 with ionized argon.
- This preparation is useful for better deposition characteristics of carbon on the surface of the article 2.
- the argon gas is drained from the chamber 1.
- the hard carbon layer consisting of amorphous carbon of inclusion of hybridized orbital SP 2 bond and hybridized orbital SP 3 bond and crystal grains or particles of the hybridized orbital SP 3 bond dispersed in the amorphous carbon, or the hard carbon layer of amorphous carbon of the SP 2 bond and SP 3 bond.
- a base material 21 of a dome-shaped acoustic diaphragm made of titanium having the thickness of 20 ⁇ m as shown in FIG. 2 is disposed in the vaccum chamber and the inside pressure is reduced to 10 -6 Torr. Thereafter, as preparation step, ions are irradiated by applying a DC voltage of hundreds of volts in the mixture gas atmosphere of Ar+H 2 at the pressure of 10 -2 Torr. And the aforementioned ion plating process is conducted.
- a hard carbon layer 22 obtained by this ion plating method was analyzed by the electron diffraction or ESCA method.
- the fine crystalline grains (crystalline particles of the diamond structure) of the SP 3 bond were dispersed in the amorphous layer of the hybridized orbital SP 2 bond and hybridized orbital SP 3 bond, or that an amorphous carbon of the SP 2 bond and SP 3 bond was formed.
- the sonic velocity of the whole diaphragm formed with the hard carbon layer of 0.3 ⁇ m was within a range of 9,000 to 12,000 m/sec.
- hard carbon layers 32 each having the thickness of 0.3 ⁇ m are formed onto both surfaces of an acoustic diaphragm base material 31 made of titanium of the thickness of 20 ⁇ m which is constituted by integrally forming a voice coil bobbin portion and a dome portion.
- a voice coil is wound around the voice coil bobbin portion of the integrated type diaphragm.
- a hard carbon layer 42 is formed by way of the ion plating process onto a base material 41 of a dome-shaped ⁇ type SiC ceramic diaphragm obtained due to the CVD process.
- the ⁇ type SiC diaphragm base material 41 is disposed in the vacuum chamber and the inside pressure is reduced to 10 -6 Torr.
- ions are irradiated in the mixture gas atmosphere of Ar+H 2 at the vacuum pressure of 10 -2 Torr by applying the DC voltage of hundreds of volts.
- the hard carbon layer obtained by the ion plating process was analyzed by the electron diffraction or ESCA method.
- the fine crystalline grains of the SP 3 bond (crystalline particles of the diamond structure) were included in the amorphous carbon layer of the hybridized orbital SP 2 bond and hybridized orbital SP 3 bond.
- This layer is extremely hard and can be used as a surface layer of the diaphragm.
- the ion deposition rate was 200 ⁇ /min and extremely high, so that an excellent mass productivity is obtained.
- the ceramic diaphragm base material TiC, B 4 C, and the like are useful.
- hard carbon layers 52 are formed onto both surfaces of a diaphragm base material 51.
- the characteristics of this layer were measured. Thus, it has been found that the young's modulus and sonic velocity were further improved.
- the diaphragm obtained in the application 4 or 5 was assembled to a tweeter unit and its frequency characteristics were measured. Thus, it has been found that the reproducible high frequency range was extended, the flat frequency response was obtained, and the harmonic distortion was reduced.
- hard carbon layers 62 are formed onto both surfaces of a ⁇ type SiC ceramic diaphragm base material 61 in which a voice coil bobbin portion and a dome portion are integrally formed.
- a voice coil is wound around the voice coil bobbin portion of this integrated type diaphragm and a tweeter unit is constituted. The characteristics of this tweeter unit were measured. Thus, it has been found that the reproducible limit frequency in the high frequency range was further extended and the reproduced sound with less distortion until a super high frequency was derived.
- an FRP (fiber reinforced plastic) diaphragm is used as a base material which is formed with a hard carbon layer.
- the FRP diaphragm base material is obtained by using PEEK (polyether ether ketone) as a matrix resin and an SiC inorganic fiber as a heat-resisting reinforced fiber.
- PEEK polyether ether ketone
- SiC inorganic fiber as a heat-resisting reinforced fiber.
- Such an FRP diaphragm base material 71 can be easily produced due to a molding process such as heating press, injection, compression, or the like.
- the heat-resisting temperature of the diaphragm base material 71 was about 350° C.
- a hard carbon layer 72 of 0.3 ⁇ m is formed onto the FRP diaphragm base material 71 due to the ion plating process.
- the FRP diaphragm base material 71 is disposed in the vacuum chamber and the inside pressure is reduced to 10 -6 Torr Thereafter, ions are irradiated in the mixture gas atmosphere of Ar+H 2 at the pressure of 10 -2 Torr by applying the DC voltage of hundreds of volts.
- the evaporation rate of graphite was 0.25 g/min and the deposition rate of the hard carbon layer was 0.02 ⁇ m/min.
- the temperature in the vacuum chamber was within a range of room temperature to about 250° C.; therefore, the FRP diaphragm base material serving as the material to be coated could sufficiently endure this temperature.
- the hard carbon layer obtained by this ion plating process was analyzed due to the electron diffraction or ESCA method.
- the fine crystal grains of the SP 3 bond (crystal particles of the diamond structure) were included in the amorphous carbon layer in which the hybridized orbital SP 2 bond and hybridized orbital SP 3 bond mixedly existed.
- the sonic velocity of the whole diaphragm was within a range of 5,000 to 6,000 m/sec and was further improved as compared with the sonic velocity of 3,500 m/sec of the diaphragm formed of only FRP.
- a polyimide resin or the like may be used as the heat-resisting resin.
- An Al 2 O 3 (alumina) fiber or the like may be used as the heat-resisting fiber.
- a hard carbon layer is formed onto an FRM (fiber reinforced metal) diaphragm base material due to a hot press process using aluminium or aluminium alloy as the matrix and SiC as the heat-resisting reinforced fiber.
- the propagation velocity of this FRM diaphragm base material itself was within a range of 6,000 to 6,500 m/sec.
- a hard carbon layer 82 is formed onto the surface of such an FRM diaphragm base material 83 in a manner similar to the application 6.
- the propagation velocity of the whole diaphragm was within a range of 8,000 to 9,000 m/sec and the propagation velocity was remarkably improved.
- an FRM multi-layer diaphragm base material using a metal aluminium or aluminium alloy honeycomb 94 as a core material and having Al/SiC layers 95 on both front and back surfaces is obtained.
- a hard carbon layer 92 is formed on the surface of this base material in a manner similar to the application 6. In this case as well, the Young's modulus and sonic velocity of the whole diaphragm were also remarkably improved.
- FIG. 10 is a cross sectional view showing the state in which a diaphragm 106 obtained by application 6 was assembled in a speaker unit.
- reference numerals 107 denotes a cap; 108 is a frame; 109 a damping spider; 110 a magnetic circuit; and 111 a voice coil.
- the characteristics of the speaker unit constituted as described above were measured. Thus, it has been found that the reproducible high frequency range was extended, the flat frequency response was obtained, and the harmonic distortion was reduced.
- the diaphragm base material consisting of the heat-resisting resin and heat-resisting reinforced fiber or consisting of the metal and heat-resisting reinforced fiber is obtained, or the composite diaphragm base material of such a diaphragm base material is obtained; then the hard carbon layer consisting of the amorphous layer in which the hybridized orbital SP 2 bond and hybridized orbital SP 3 bond mixedly exist and the crystal particles of the hybridized orbital SP 3 bond, or the amorphous hard carbon layer in which the above SP 2 bond and SP 3 bond mixedly exist is formed onto at least one of both front and back surfaces of the foregoing diaphragm base material or composite diaphragm base material due to the ion plating process.
- the acoustic characteristics of the whole diaphragm particularly, the sonic velocity, Young's modulus, rigidity, etc. are improved.
- the reproducible high frequency range is extended and flattened.
- the harmonic distortion can be reduced.
- the hard carbon layer is formed due to the ion plating process, so that the ion deposition rate is high and the method of this invention is very economical and has an extremely high industrial advantage as compared with the other process.
- An acoustic diaphragm of FIG. 11 is obtained in the following manner. Namely, a middle or intermediate thin layer consisting of a single body of titanium compound such as titanium carbide, titanium nitride, or the like, or a mixture body thereof, or silicon carbide, or silicon nitride is formed onto at least one of front and back surfaces of the titanium diaphragm base material by the ion plating process. Further, the hard carbon thin layer is formed on the middle thin layer due to the ion plating process.
- a middle thin layer 113 made of titanium carbide is formed on the surface of a titanium diaphragm base material 112 by the ion plating process.
- the base material 112 of the thickness of 20 ⁇ m is cleaned and the pressure in the vacuum chamber is reduced to 10 -6 Torr.
- argon ions are irradiated in the argon gas atmosphere (at the pressure of 10 -2 Torr) by applying the DC voltage in a range of hundreds volts to one kilovolt.
- intermediate layer material gas of the CH 4 gas is introduced into the vacuum chamber at the vacuum degree of 10 -4 Torr and titanium Ti serving as an intermediate layer material solid source is ionized by an electron beam as plasma.
- vaporized Ti in the plasma reacts to C produced by decomposing CH 4 to produce TiC and this TiC is deposited onto the titanium diaphragm base material 112, so that the intermediate thin layer 113 is formed.
- the hard carbon thin layer was formed onto the middle thin layer in the following manner.
- the carbon source (graphite) in the crucible is evaporated using an electron beam.
- the electron emitting filament is arranged over the crucible and the ionizing electrode is disposed over this filament.
- the DC voltage of 50 V is applied to the ionizing electrode and a predetermined voltage is also applied to the electron emitting filament, thereby ionizing evaporated carbon.
- the carbon layer is formed onto the composite layer consisting of a titanium diaphragm base material 122 and a middle thin layer 113, thereby obtaining a hard carbon thin layer 114 as shown in FIG. 11.
- the hard carbon thin layer 114 obtained in this manner was evaluated. Thus, it has been found due to the electron diffraction and ESCA spectrum that the hardness was within a range of HV 3,000 to 4,000 and the diamond particles having the hybridized orbital SP 3 bond were dispersed in the carbon layer mainly having the hybridized orbital SP 2 bond.
- the sonic velocity of a diaphragm 111 obtained as described above was within a range of 12,000 to 13,000 m/sec and the producible high frequency range was extended and the hardness of the surface was increased.
- the internal loss tan ⁇ was 0.01 or more.
- the middle thin layer is formed on the surface of the titanium diaphragm base material and the hard carbon thin layer in which the diamond particles having the hybridized orbital SP 3 bond were dispersed in the carbon layer mainly having the hybridized orbital SP 2 bond is formed on the surface of the middle thin layer.
- the internal loss can be increased as compared with the acoustic diaphragm previously proposed by the same applicant (Japanese patent unexamined publication No. 84529/1985). Either one of the above-mentioned diaphragms can be selectively used in accordance with the application.
- TiC titanium carbide
- TiN titanium nitride
- the middle thin layer 113 consisting of the mixture material of titanium carbide and titanium nitride can be simultaneously formed. In this case, the physical properties of the resultant mixture material are good.
- silicon carbide has the diamond type covalent bond structure, it has a high hardness and is suitable as the middle thin layer.
- Boron nitride (BN) and cubic boron nitride (CBN) also have the good physical properties.
- cubic boron nitride has the Knoop hardness of 4700 kg/mm 2 and is proper as a material having the excellent hardness.
- the process of forming the hard thin multi-layers namely, the middle thin layer and the hard carbon thin layer formed thereof due to the ion plating process
- a desired diaphragm can be obtained in one batch, so that the excellent mass productivity can be obtained.
- this ion plating process has the features such that the ionizing efficiency is high and the deposition rate is also high, so that it is extremely economical and the reliability is also high since the hard thin layer having the good adhesive property can be obtained.
Abstract
Description
______________________________________ PLANE-SPACING A hard carbon layer formed Diamond (ASTM-675) by the invention Plane-spacing Plane-spacing Difference of hkl (Å) (Å) plane-spacing (%) ______________________________________ 111 2.06 2.06 0 220 1.261 1.21 4.04 311 1.0754 -- -- 400 0.8916 -- -- 331 0.8182 0.807 1.37 ______________________________________
______________________________________ Propaga- Specific Young's tion modules of Internal modulus velocity elasticity loss dyne/cm.sup.2 m/sec cm.sup.2 /sec.sup.2 tan δ ______________________________________ Titanium 1.1 × 10.sup.12 4,948 25 × 10.sup.10 0.014 Hard 3.1 × 10.sup.12 8,350 70 × 10.sup.10 0.026 carbon layer formed by the invention ______________________________________
Claims (15)
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60-84531 | 1985-04-22 | ||
JP8453085A JPS61244195A (en) | 1985-04-22 | 1985-04-22 | Acoustic diaphragm |
JP60-84530 | 1985-04-22 | ||
JP8453185A JPS61244196A (en) | 1985-04-22 | 1985-04-22 | Composite acoustic diaphragm |
JP60-84529 | 1985-04-22 | ||
JP8452985A JPS61244194A (en) | 1985-04-22 | 1985-04-22 | Acoustic diaphragm |
JP60-127690 | 1985-06-12 | ||
JP12769085A JPS61285896A (en) | 1985-06-12 | 1985-06-12 | Production of acoustic diaphragm |
JP60-197760 | 1985-09-09 | ||
JP19776085A JPS6259499A (en) | 1985-09-09 | 1985-09-09 | Acoustic diaphragm |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/116,539 Division US4772513A (en) | 1985-04-22 | 1987-11-04 | Method for forming a hard carbon thin film on article and applications thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
US4725345A true US4725345A (en) | 1988-02-16 |
Family
ID=27525098
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US06/853,182 Expired - Fee Related US4725345A (en) | 1985-04-22 | 1986-04-17 | Method for forming a hard carbon thin film on article and applications thereof |
US07/116,539 Expired - Fee Related US4772513A (en) | 1985-04-22 | 1987-11-04 | Method for forming a hard carbon thin film on article and applications thereof |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/116,539 Expired - Fee Related US4772513A (en) | 1985-04-22 | 1987-11-04 | Method for forming a hard carbon thin film on article and applications thereof |
Country Status (1)
Country | Link |
---|---|
US (2) | US4725345A (en) |
Cited By (116)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0280315A2 (en) * | 1987-02-26 | 1988-08-31 | Nissin Electric Company, Limited | Method of forming a diamond film |
US4802967A (en) * | 1987-04-08 | 1989-02-07 | Andus Corporation | Surface treatment of polymers |
US4842945A (en) * | 1986-05-29 | 1989-06-27 | Nippon Steel Corporation | Stainless steel coated with thin film of carbon containing specified amount in a state of diamond and having an adjustable black transparent color tone |
US4865711A (en) * | 1987-04-08 | 1989-09-12 | Andus Corporation | Surface treatment of polymers |
US4876984A (en) * | 1987-06-12 | 1989-10-31 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US4899347A (en) * | 1989-05-11 | 1990-02-06 | General Electric Company | Solid state laser gain medium with diamond coating |
FR2636197A1 (en) * | 1988-08-24 | 1990-03-09 | Mitsubishi Pencil Co | PROCESS FOR PRODUCING CARBON ACOUSTIC MEMBRANE |
US4913762A (en) * | 1987-04-08 | 1990-04-03 | Andus Corporation | Surface treatment of polymers for bonding by applying a carbon layer with sputtering |
US4925701A (en) * | 1988-05-27 | 1990-05-15 | Xerox Corporation | Processes for the preparation of polycrystalline diamond films |
US4961958A (en) * | 1989-06-30 | 1990-10-09 | The Regents Of The Univ. Of Calif. | Process for making diamond, and doped diamond films at low temperature |
EP0398257A2 (en) * | 1989-05-18 | 1990-11-22 | Yamaha Corporation | A speaker diaphragm |
US4981568A (en) * | 1988-09-20 | 1991-01-01 | International Business Machines Corp. | Apparatus and method for producing high purity diamond films at low temperatures |
US4987002A (en) * | 1988-05-09 | 1991-01-22 | Kabushiki Kaisha Kenwood | Process for forming a crystalline diamond film |
US4992298A (en) * | 1988-10-11 | 1991-02-12 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
US5013580A (en) * | 1987-10-27 | 1991-05-07 | Thomson-Csf | Video recording/play-back head, method for making it and apparatus applying said method |
US5015494A (en) * | 1987-02-24 | 1991-05-14 | Semiconductor Energy Laboratory Co., Ltd. | Microwave enhanced CVD method for depositing diamond |
EP0440326A1 (en) * | 1990-01-29 | 1991-08-07 | BAUSCH & LOMB INCORPORATED | Method of depositing diamond-like film onto a substrate having a low melting temperature |
US5055318A (en) * | 1988-10-11 | 1991-10-08 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
US5075094A (en) * | 1990-04-30 | 1991-12-24 | The United States Of America As Represented By The Secretary Of The Navy | Method of growing diamond film on substrates |
US5076147A (en) * | 1989-04-13 | 1991-12-31 | Endress U. Hauser Gmbh U. Co. | Pressure sensor including a diaphragm having a protective layer thereon |
US5087478A (en) * | 1989-08-01 | 1992-02-11 | Hughes Aircraft Company | Deposition method and apparatus using plasma discharge |
US5126206A (en) * | 1990-03-20 | 1992-06-30 | Diamonex, Incorporated | Diamond-on-a-substrate for electronic applications |
US5147687A (en) * | 1991-05-22 | 1992-09-15 | Diamonex, Inc. | Hot filament CVD of thick, adherent and coherent polycrystalline diamond films |
US5182093A (en) * | 1990-01-08 | 1993-01-26 | Celestech, Inc. | Diamond deposition cell |
US5190824A (en) * | 1988-03-07 | 1993-03-02 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating |
US5242663A (en) * | 1989-09-20 | 1993-09-07 | Sumitomo Electric Industries, Ltd. | Method of and apparatus for synthesizing hard material |
US5246741A (en) * | 1989-12-22 | 1993-09-21 | Hitachi, Ltd. | Method for surface modification and apparatus therefor |
US5255260A (en) * | 1989-07-28 | 1993-10-19 | Matsushita Electric Industrial Co., Ltd. | Optical recording apparatus employing stacked recording media with spiral grooves and floating optical heads |
US5272009A (en) * | 1988-10-21 | 1993-12-21 | Battelle Memorial Institute | Laminate material and its use as heat-sink |
US5310596A (en) * | 1990-08-10 | 1994-05-10 | Norton Company | Multi-layer superhard film structure |
US5320877A (en) * | 1990-11-01 | 1994-06-14 | Matsushita Electric Industrial Co., Ltd. | Method for forming thin film and apparatus therefor |
US5340401A (en) * | 1989-01-06 | 1994-08-23 | Celestech Inc. | Diamond deposition cell |
US5368939A (en) * | 1991-04-08 | 1994-11-29 | Yoshida Kogyo K.K. | Hard multilayer coated product and process for producing same |
US5432004A (en) * | 1992-07-15 | 1995-07-11 | Sumitomo Electric Industries, Ltd. | Vibration plate of a speaker and method for producing same |
WO1995027806A1 (en) * | 1994-04-06 | 1995-10-19 | The Regents Of The University Of California | Process to produce diamond films |
US5462772A (en) * | 1957-06-27 | 1995-10-31 | Lemelson; Jerome H. | Methods for forming artificial diamond |
US5464667A (en) * | 1994-08-16 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus |
US5593719A (en) * | 1994-03-29 | 1997-01-14 | Southwest Research Institute | Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys |
US5601883A (en) * | 1987-02-10 | 1997-02-11 | Semicondoctor Energy Laboratory Co., Inc. | Microwave enhanced CVD method for coating plastic with carbon films |
US5605714A (en) * | 1994-03-29 | 1997-02-25 | Southwest Research Institute | Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys |
US5616372A (en) * | 1995-06-07 | 1997-04-01 | Syndia Corporation | Method of applying a wear-resistant diamond coating to a substrate |
US5662877A (en) * | 1989-08-23 | 1997-09-02 | Tdk Corporation | Process for forming diamond-like thin film |
US5688557A (en) * | 1995-06-07 | 1997-11-18 | Lemelson; Jerome H. | Method of depositing synthetic diamond coatings with intermediates bonding layers |
US5705262A (en) * | 1993-11-12 | 1998-01-06 | Le Carbone Lorraine | Surface treatment of carbonaceous material for making a subsequent deposit of diamond adherent and diamond-covered pieces obtained |
US5714202A (en) * | 1995-06-07 | 1998-02-03 | Lemelson; Jerome H. | Synthetic diamond overlays for gas turbine engine parts having thermal barrier coatings |
US5725573A (en) * | 1994-03-29 | 1998-03-10 | Southwest Research Institute | Medical implants made of metal alloys bearing cohesive diamond like carbon coatings |
US5731045A (en) * | 1996-01-26 | 1998-03-24 | Southwest Research Institute | Application of diamond-like carbon coatings to cobalt-cemented tungsten carbide components |
US5740941A (en) * | 1993-08-16 | 1998-04-21 | Lemelson; Jerome | Sheet material with coating |
US5780119A (en) * | 1996-03-20 | 1998-07-14 | Southwest Research Institute | Treatments to reduce friction and wear on metal alloy components |
US5866195A (en) * | 1988-03-31 | 1999-02-02 | Lemelson; Jerome H. | Methods for forming diamond-coated superconductor wire |
US5871805A (en) * | 1996-04-08 | 1999-02-16 | Lemelson; Jerome | Computer controlled vapor deposition processes |
GB2331998A (en) * | 1997-12-02 | 1999-06-09 | Teer Coatings Ltd | Articles bearing carbon coatings |
US5945153A (en) * | 1994-07-11 | 1999-08-31 | Southwest Research Institute | Non-irritating antimicrobial coating for medical implants and a process for preparing same |
US6083570A (en) * | 1987-03-31 | 2000-07-04 | Lemelson; Jerome H. | Synthetic diamond coatings with intermediate amorphous metal bonding layers and methods of applying such coatings |
US6083361A (en) * | 1997-05-28 | 2000-07-04 | Anelva Corporation | Sputter device |
US6087025A (en) * | 1994-03-29 | 2000-07-11 | Southwest Research Institute | Application of diamond-like carbon coatings to cutting surfaces of metal cutting tools |
US6162412A (en) * | 1990-08-03 | 2000-12-19 | Sumitomo Electric Industries, Ltd. | Chemical vapor deposition method of high quality diamond |
US6203898B1 (en) | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
US6224952B1 (en) | 1988-03-07 | 2001-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US6287711B1 (en) | 1998-07-01 | 2001-09-11 | Front Edge Technology, Inc. | Wear-resistant coating and component |
US20020073544A1 (en) * | 2000-12-18 | 2002-06-20 | Konica Corporation | Manufacturing method of ink-jet haead |
US6416865B1 (en) * | 1998-10-30 | 2002-07-09 | Sumitomo Electric Industries, Ltd. | Hard carbon film and surface acoustic-wave substrate |
US6503379B1 (en) | 2000-05-22 | 2003-01-07 | Basic Research, Inc. | Mobile plating system and method |
US6521104B1 (en) | 2000-05-22 | 2003-02-18 | Basic Resources, Inc. | Configurable vacuum system and method |
US20030150858A1 (en) * | 2000-08-01 | 2003-08-14 | Jean-Tristan Outreman | Plasma coating method |
US20030180450A1 (en) * | 2002-03-22 | 2003-09-25 | Kidd Jerry D. | System and method for preventing breaker failure |
US6660365B1 (en) | 1998-12-21 | 2003-12-09 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US20040118455A1 (en) * | 2002-12-18 | 2004-06-24 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
US20050016835A1 (en) * | 1998-12-21 | 2005-01-27 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US20050126497A1 (en) * | 2003-09-30 | 2005-06-16 | Kidd Jerry D. | Platform assembly and method |
US20050137084A1 (en) * | 2003-12-22 | 2005-06-23 | Krisko Annette J. | Graded photocatalytic coatings |
GB2413234A (en) * | 2004-04-15 | 2005-10-19 | B & W Loudspeakers | Diamond diaphragms for loudspeaker drive units or microphones |
US6974629B1 (en) | 1999-08-06 | 2005-12-13 | Cardinal Cg Company | Low-emissivity, soil-resistant coating for glass surfaces |
WO2006021275A1 (en) * | 2004-08-26 | 2006-03-02 | Schaeffler Kg | Wear-resistant coating and method for producing the same |
US20060057401A1 (en) * | 2004-07-12 | 2006-03-16 | Krisko Annette J | Low-maintenance coatings |
US20060102373A1 (en) * | 2002-07-17 | 2006-05-18 | Sumitomo Electric Industries, Ltd. | Member for semiconductor device |
US20060118408A1 (en) * | 2004-12-03 | 2006-06-08 | Kari Myli | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
US20060121315A1 (en) * | 2004-12-03 | 2006-06-08 | Kari Myli | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US20060216589A1 (en) * | 2005-03-25 | 2006-09-28 | Front Edge Technology, Inc. | Thin film battery with protective packaging |
US20070026205A1 (en) * | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
US20070127309A1 (en) * | 1998-11-10 | 2007-06-07 | Sipec Corporation | Chemical supply system |
US7250196B1 (en) * | 1999-10-26 | 2007-07-31 | Basic Resources, Inc. | System and method for plasma plating |
US20070248756A1 (en) * | 2006-04-19 | 2007-10-25 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20070278444A1 (en) * | 2002-12-18 | 2007-12-06 | Vapor Technologies, Inc. | Valve component for faucet |
US20080124566A1 (en) * | 2004-11-26 | 2008-05-29 | Clint Guy Smallman | Composite Material Comprising Ultra-Hard Particles Embedded in a Metal or Metal Alloy Matrix and Diaphragm Made Thereof |
US20080213664A1 (en) * | 2007-03-02 | 2008-09-04 | Front Edge Technology, Inc. | Thin film battery and manufacturing method |
US20080315146A1 (en) * | 2002-12-18 | 2008-12-25 | Masco Corporation Of Indiana | Faucet |
US20090057136A1 (en) * | 2007-09-04 | 2009-03-05 | Front Edge Technology, Inc. | Manufacturing method for thin film battery |
US20090136839A1 (en) * | 2007-11-28 | 2009-05-28 | Front Edge Technology, Inc. | Thin film battery comprising stacked battery cells and method |
US20090208671A1 (en) * | 2008-02-18 | 2009-08-20 | Front Edge Technology, Inc. | Thin film battery fabrication using laser shaping |
US20100089773A1 (en) * | 2002-06-10 | 2010-04-15 | Trustees Of Tufts College | Total organic compound (toc) analyzer |
US20100186834A1 (en) * | 2002-12-18 | 2010-07-29 | Masco Corporation Of Indiana | Faucet component with improved coating |
US20100326817A1 (en) * | 2007-09-14 | 2010-12-30 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
US7862627B2 (en) | 2007-04-27 | 2011-01-04 | Front Edge Technology, Inc. | Thin film battery substrate cutting and fabrication process |
US20110050159A1 (en) * | 2009-08-28 | 2011-03-03 | Front Edge Technology, Inc. | Battery charging apparatus and method |
US20110076550A1 (en) * | 2005-03-25 | 2011-03-31 | Front Edge Technology, Inc. | Battery with protective packaging |
US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
WO2013048733A1 (en) * | 2011-09-27 | 2013-04-04 | Regents Of The University Of California | Anti-charging surface passivation for charged particle optics |
US20130224393A1 (en) * | 2012-02-23 | 2013-08-29 | Sulzer Metco Ag | Plasma Spray Method |
CN103731793A (en) * | 2013-12-27 | 2014-04-16 | 瑞声声学科技(深圳)有限公司 | Method for manufacturing compound vibrating diaphragm |
US8753724B2 (en) | 2012-09-26 | 2014-06-17 | Front Edge Technology Inc. | Plasma deposition on a partially formed battery through a mesh screen |
US8864954B2 (en) | 2011-12-23 | 2014-10-21 | Front Edge Technology Inc. | Sputtering lithium-containing material with multiple targets |
US8865340B2 (en) | 2011-10-20 | 2014-10-21 | Front Edge Technology Inc. | Thin film battery packaging formed by localized heating |
US9077000B2 (en) | 2012-03-29 | 2015-07-07 | Front Edge Technology, Inc. | Thin film battery and localized heat treatment |
US9257695B2 (en) | 2012-03-29 | 2016-02-09 | Front Edge Technology, Inc. | Localized heat treatment of battery component films |
US9279291B2 (en) | 2011-12-30 | 2016-03-08 | Smith International, Inc. | Diamond enhanced drilling insert with high impact resistance |
US9356320B2 (en) | 2012-10-15 | 2016-05-31 | Front Edge Technology Inc. | Lithium battery having low leakage anode |
US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
US9887429B2 (en) | 2011-12-21 | 2018-02-06 | Front Edge Technology Inc. | Laminated lithium battery |
US9905895B2 (en) | 2012-09-25 | 2018-02-27 | Front Edge Technology, Inc. | Pulsed mode apparatus with mismatched battery |
US10008739B2 (en) | 2015-02-23 | 2018-06-26 | Front Edge Technology, Inc. | Solid-state lithium battery with electrolyte |
CN108632721A (en) * | 2017-03-15 | 2018-10-09 | 奥音科技(北京)有限公司 | Top dome made of ceramic material |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
CN112626450A (en) * | 2020-12-15 | 2021-04-09 | 国光电器股份有限公司 | Ceramic vibrating diaphragm and preparation method thereof |
US10984830B2 (en) * | 2017-02-24 | 2021-04-20 | The National University Of Singapore | Two dimensional amorphous carbon as overcoat for heat assisted magnetic recording media |
US11114674B2 (en) | 2017-02-24 | 2021-09-07 | National University Of Singapore | Proton conductive two-dimensional amorphous carbon film for gas membrane and fuel cell applications |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63283299A (en) * | 1987-05-15 | 1988-11-21 | Mitsubishi Pencil Co Ltd | Diaphragm for acoustic apparatus |
US4960640A (en) * | 1988-02-19 | 1990-10-02 | Refractory Composites, Inc. | Composite refractory material |
US4863798A (en) * | 1988-07-21 | 1989-09-05 | Refractory Composites, Inc. | Refractory composite material and method of making such material |
JPH03145900A (en) * | 1989-11-01 | 1991-06-21 | Yamaha Corp | Diaphragm for speaker |
US5045165A (en) * | 1990-02-01 | 1991-09-03 | Komag, Inc. | Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk |
JPH046265A (en) * | 1990-04-24 | 1992-01-10 | Toyota Central Res & Dev Lab Inc | Formation of solid lubricating film to ferrous alloy base body and sliding member having solid lubricating film |
EP0632675B1 (en) * | 1993-06-28 | 2001-08-16 | Matsushita Electric Industrial Co., Ltd. | Diaphragm-edge integral moldings for speakers, acoustic transducers comprising same and method for fabricating same |
US5701359A (en) * | 1995-04-06 | 1997-12-23 | Precision Power | Flat-panel speaker |
US6097829A (en) * | 1995-04-06 | 2000-08-01 | Precision Power, Inc. | Fiber-honeycomb-fiber sandwich speaker diaphragm and method |
JPH11355895A (en) * | 1998-06-12 | 1999-12-24 | Matsushita Electric Ind Co Ltd | Manufacture of diaphragm for loudspeaker |
US6404897B1 (en) * | 1999-01-05 | 2002-06-11 | Harman International Industries, Inc. | Ceramic metal matrix diaphragm for loudspeakers |
JP4418571B2 (en) * | 2000-04-11 | 2010-02-17 | シーケーディ株式会社 | High temperature gas control valve |
US20060133639A1 (en) * | 2004-12-17 | 2006-06-22 | Meiloon Industrial Co., Ltd. | Diaphragm for loudspeaker - magnesium alloy base and multi-layers ceramic structure |
GB0500788D0 (en) * | 2005-01-14 | 2005-02-23 | Element Six Ltd | Rigid three-dimensional components |
CN1863413A (en) * | 2005-05-12 | 2006-11-15 | 光宝科技股份有限公司 | Loudspeaker structure |
TWI452912B (en) * | 2010-02-26 | 2014-09-11 | Usher Audio Thecnology Co Ltd | Acoustic horn diaphragm device |
CN202269005U (en) * | 2011-11-03 | 2012-06-06 | 易力声科技(深圳)有限公司 | Loudspeaker diaphragm and loudspeaker using same |
TWI539836B (en) * | 2012-08-23 | 2016-06-21 | 逢甲大學 | Diaphragm structure for speaker and method of manufacturing method of the diaphragm structure |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4173522A (en) * | 1976-09-09 | 1979-11-06 | Balzers Patent- Und Beteiligungs-Aktiengesellschaft | Method and apparatus for producing carbon coatings by sputtering |
US4460060A (en) * | 1980-03-07 | 1984-07-17 | Toray Industries, Inc. | Vibratory diaphragm for loudspeaker |
US4470479A (en) * | 1977-03-24 | 1984-09-11 | Matsushita Electric Industrial Co., Ltd. | Method of making metal coated foil speaker diaphragm |
US4486286A (en) * | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
US4490229A (en) * | 1984-07-09 | 1984-12-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Deposition of diamondlike carbon films |
US4525417A (en) * | 1982-02-27 | 1985-06-25 | U.S. Philips Corporation | Carbon-containing sliding layer |
US4551216A (en) * | 1983-09-30 | 1985-11-05 | Siemens Aktiengesellschaft | Layer containing carbon and a method and apparatus for producing such a layer |
US4552243A (en) * | 1984-05-03 | 1985-11-12 | Pioneer Industrial Components, Inc. | Diaphragm material for acoustical transducer |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3969131A (en) * | 1972-07-24 | 1976-07-13 | Westinghouse Electric Corporation | Coated graphite members and process for producing the same |
US3980105A (en) * | 1974-07-10 | 1976-09-14 | Hitco | Laminated article comprising pyrolytic graphite and a composite substrate therefor |
US4442165A (en) * | 1981-03-26 | 1984-04-10 | General Electric Co. | Low-density thermally insulating carbon-carbon syntactic foam composite |
US4698256A (en) * | 1984-04-02 | 1987-10-06 | American Cyanamid Company | Articles coated with adherent diamondlike carbon films |
-
1986
- 1986-04-17 US US06/853,182 patent/US4725345A/en not_active Expired - Fee Related
-
1987
- 1987-11-04 US US07/116,539 patent/US4772513A/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4173522A (en) * | 1976-09-09 | 1979-11-06 | Balzers Patent- Und Beteiligungs-Aktiengesellschaft | Method and apparatus for producing carbon coatings by sputtering |
US4470479A (en) * | 1977-03-24 | 1984-09-11 | Matsushita Electric Industrial Co., Ltd. | Method of making metal coated foil speaker diaphragm |
US4460060A (en) * | 1980-03-07 | 1984-07-17 | Toray Industries, Inc. | Vibratory diaphragm for loudspeaker |
US4525417A (en) * | 1982-02-27 | 1985-06-25 | U.S. Philips Corporation | Carbon-containing sliding layer |
US4486286A (en) * | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
US4551216A (en) * | 1983-09-30 | 1985-11-05 | Siemens Aktiengesellschaft | Layer containing carbon and a method and apparatus for producing such a layer |
US4552243A (en) * | 1984-05-03 | 1985-11-12 | Pioneer Industrial Components, Inc. | Diaphragm material for acoustical transducer |
US4490229A (en) * | 1984-07-09 | 1984-12-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Deposition of diamondlike carbon films |
Non-Patent Citations (2)
Title |
---|
Banks et al., Jvac Sci. Technol. 21(3), 1982, pp. 807 814. * |
Banks et al., Jvac Sci. Technol. 21(3), 1982, pp. 807-814. |
Cited By (196)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5462772A (en) * | 1957-06-27 | 1995-10-31 | Lemelson; Jerome H. | Methods for forming artificial diamond |
US4842945A (en) * | 1986-05-29 | 1989-06-27 | Nippon Steel Corporation | Stainless steel coated with thin film of carbon containing specified amount in a state of diamond and having an adjustable black transparent color tone |
US5601883A (en) * | 1987-02-10 | 1997-02-11 | Semicondoctor Energy Laboratory Co., Inc. | Microwave enhanced CVD method for coating plastic with carbon films |
US5015494A (en) * | 1987-02-24 | 1991-05-14 | Semiconductor Energy Laboratory Co., Ltd. | Microwave enhanced CVD method for depositing diamond |
EP0280315A3 (en) * | 1987-02-26 | 1989-07-19 | Nissin Electric Company, Limited | Method of forming a diamond film |
EP0280315A2 (en) * | 1987-02-26 | 1988-08-31 | Nissin Electric Company, Limited | Method of forming a diamond film |
US4915977A (en) * | 1987-02-26 | 1990-04-10 | Nissin Electric Co., Ltd. | Method of forming a diamond film |
US6083570A (en) * | 1987-03-31 | 2000-07-04 | Lemelson; Jerome H. | Synthetic diamond coatings with intermediate amorphous metal bonding layers and methods of applying such coatings |
US4802967A (en) * | 1987-04-08 | 1989-02-07 | Andus Corporation | Surface treatment of polymers |
US4865711A (en) * | 1987-04-08 | 1989-09-12 | Andus Corporation | Surface treatment of polymers |
US4913762A (en) * | 1987-04-08 | 1990-04-03 | Andus Corporation | Surface treatment of polymers for bonding by applying a carbon layer with sputtering |
US4876984A (en) * | 1987-06-12 | 1989-10-31 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US5013580A (en) * | 1987-10-27 | 1991-05-07 | Thomson-Csf | Video recording/play-back head, method for making it and apparatus applying said method |
US6207281B1 (en) * | 1988-03-07 | 2001-03-27 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US7144629B2 (en) | 1988-03-07 | 2006-12-05 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US6224952B1 (en) | 1988-03-07 | 2001-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US5190824A (en) * | 1988-03-07 | 1993-03-02 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating |
US6583481B2 (en) | 1988-03-07 | 2003-06-24 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US5871847A (en) * | 1988-03-07 | 1999-02-16 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US20010018097A1 (en) * | 1988-03-07 | 2001-08-30 | Kenji Itoh | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US6265070B1 (en) | 1988-03-07 | 2001-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
US5866195A (en) * | 1988-03-31 | 1999-02-02 | Lemelson; Jerome H. | Methods for forming diamond-coated superconductor wire |
US4987002A (en) * | 1988-05-09 | 1991-01-22 | Kabushiki Kaisha Kenwood | Process for forming a crystalline diamond film |
US4925701A (en) * | 1988-05-27 | 1990-05-15 | Xerox Corporation | Processes for the preparation of polycrystalline diamond films |
FR2636197A1 (en) * | 1988-08-24 | 1990-03-09 | Mitsubishi Pencil Co | PROCESS FOR PRODUCING CARBON ACOUSTIC MEMBRANE |
US4981568A (en) * | 1988-09-20 | 1991-01-01 | International Business Machines Corp. | Apparatus and method for producing high purity diamond films at low temperatures |
US5055318A (en) * | 1988-10-11 | 1991-10-08 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
US4992298A (en) * | 1988-10-11 | 1991-02-12 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
US5272009A (en) * | 1988-10-21 | 1993-12-21 | Battelle Memorial Institute | Laminate material and its use as heat-sink |
US5340401A (en) * | 1989-01-06 | 1994-08-23 | Celestech Inc. | Diamond deposition cell |
US5076147A (en) * | 1989-04-13 | 1991-12-31 | Endress U. Hauser Gmbh U. Co. | Pressure sensor including a diaphragm having a protective layer thereon |
EP0397298A2 (en) * | 1989-05-11 | 1990-11-14 | General Electric Company | Solid state laser gain medium |
EP0397298A3 (en) * | 1989-05-11 | 1991-07-10 | General Electric Company | Solid state laser gain medium |
US4899347A (en) * | 1989-05-11 | 1990-02-06 | General Electric Company | Solid state laser gain medium with diamond coating |
EP0398257A2 (en) * | 1989-05-18 | 1990-11-22 | Yamaha Corporation | A speaker diaphragm |
EP0398257A3 (en) * | 1989-05-18 | 1993-02-24 | Yamaha Corporation | A speaker diaphragm |
WO1991000377A1 (en) * | 1989-06-30 | 1991-01-10 | The Regents Of The University Of California | Process for making diamond, doped diamond, diamond-cubic boron nitride composite films at low temperature |
US4961958A (en) * | 1989-06-30 | 1990-10-09 | The Regents Of The Univ. Of Calif. | Process for making diamond, and doped diamond films at low temperature |
US5255260A (en) * | 1989-07-28 | 1993-10-19 | Matsushita Electric Industrial Co., Ltd. | Optical recording apparatus employing stacked recording media with spiral grooves and floating optical heads |
US5087478A (en) * | 1989-08-01 | 1992-02-11 | Hughes Aircraft Company | Deposition method and apparatus using plasma discharge |
US5662877A (en) * | 1989-08-23 | 1997-09-02 | Tdk Corporation | Process for forming diamond-like thin film |
US5242663A (en) * | 1989-09-20 | 1993-09-07 | Sumitomo Electric Industries, Ltd. | Method of and apparatus for synthesizing hard material |
US5246741A (en) * | 1989-12-22 | 1993-09-21 | Hitachi, Ltd. | Method for surface modification and apparatus therefor |
US5182093A (en) * | 1990-01-08 | 1993-01-26 | Celestech, Inc. | Diamond deposition cell |
EP0440326A1 (en) * | 1990-01-29 | 1991-08-07 | BAUSCH & LOMB INCORPORATED | Method of depositing diamond-like film onto a substrate having a low melting temperature |
US5126206A (en) * | 1990-03-20 | 1992-06-30 | Diamonex, Incorporated | Diamond-on-a-substrate for electronic applications |
US5075094A (en) * | 1990-04-30 | 1991-12-24 | The United States Of America As Represented By The Secretary Of The Navy | Method of growing diamond film on substrates |
US6162412A (en) * | 1990-08-03 | 2000-12-19 | Sumitomo Electric Industries, Ltd. | Chemical vapor deposition method of high quality diamond |
US5310596A (en) * | 1990-08-10 | 1994-05-10 | Norton Company | Multi-layer superhard film structure |
US5320877A (en) * | 1990-11-01 | 1994-06-14 | Matsushita Electric Industrial Co., Ltd. | Method for forming thin film and apparatus therefor |
US5368939A (en) * | 1991-04-08 | 1994-11-29 | Yoshida Kogyo K.K. | Hard multilayer coated product and process for producing same |
US5147687A (en) * | 1991-05-22 | 1992-09-15 | Diamonex, Inc. | Hot filament CVD of thick, adherent and coherent polycrystalline diamond films |
US5432004A (en) * | 1992-07-15 | 1995-07-11 | Sumitomo Electric Industries, Ltd. | Vibration plate of a speaker and method for producing same |
US5556464A (en) * | 1992-07-15 | 1996-09-17 | Sumitomo Electric Industries, Ltd. | Vibration plate of a speaker and method for producing same |
US5740941A (en) * | 1993-08-16 | 1998-04-21 | Lemelson; Jerome | Sheet material with coating |
US5794801A (en) * | 1993-08-16 | 1998-08-18 | Lemelson; Jerome | Material compositions |
US5705262A (en) * | 1993-11-12 | 1998-01-06 | Le Carbone Lorraine | Surface treatment of carbonaceous material for making a subsequent deposit of diamond adherent and diamond-covered pieces obtained |
US5605714A (en) * | 1994-03-29 | 1997-02-25 | Southwest Research Institute | Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys |
US5725573A (en) * | 1994-03-29 | 1998-03-10 | Southwest Research Institute | Medical implants made of metal alloys bearing cohesive diamond like carbon coatings |
US6087025A (en) * | 1994-03-29 | 2000-07-11 | Southwest Research Institute | Application of diamond-like carbon coatings to cutting surfaces of metal cutting tools |
US5593719A (en) * | 1994-03-29 | 1997-01-14 | Southwest Research Institute | Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys |
WO1995027806A1 (en) * | 1994-04-06 | 1995-10-19 | The Regents Of The University Of California | Process to produce diamond films |
US6361567B1 (en) | 1994-07-11 | 2002-03-26 | Southwest Research Institute | Non-irritating antimicrobial coating for medical implants and a process for preparing same |
US5945153A (en) * | 1994-07-11 | 1999-08-31 | Southwest Research Institute | Non-irritating antimicrobial coating for medical implants and a process for preparing same |
US5984905A (en) * | 1994-07-11 | 1999-11-16 | Southwest Research Institute | Non-irritating antimicrobial coating for medical implants and a process for preparing same |
US5464667A (en) * | 1994-08-16 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus |
US5714202A (en) * | 1995-06-07 | 1998-02-03 | Lemelson; Jerome H. | Synthetic diamond overlays for gas turbine engine parts having thermal barrier coatings |
US5688557A (en) * | 1995-06-07 | 1997-11-18 | Lemelson; Jerome H. | Method of depositing synthetic diamond coatings with intermediates bonding layers |
US5616372A (en) * | 1995-06-07 | 1997-04-01 | Syndia Corporation | Method of applying a wear-resistant diamond coating to a substrate |
US5731045A (en) * | 1996-01-26 | 1998-03-24 | Southwest Research Institute | Application of diamond-like carbon coatings to cobalt-cemented tungsten carbide components |
US5780119A (en) * | 1996-03-20 | 1998-07-14 | Southwest Research Institute | Treatments to reduce friction and wear on metal alloy components |
US5871805A (en) * | 1996-04-08 | 1999-02-16 | Lemelson; Jerome | Computer controlled vapor deposition processes |
US6083361A (en) * | 1997-05-28 | 2000-07-04 | Anelva Corporation | Sputter device |
US6203898B1 (en) | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
US6348237B2 (en) | 1997-08-29 | 2002-02-19 | 3M Innovative Properties Company | Jet plasma process for deposition of coatings |
US20050003098A1 (en) * | 1997-08-29 | 2005-01-06 | 3M Innovative Properties Company | Flash evaporation-plasma coating deposition method |
US20020102361A1 (en) * | 1997-08-29 | 2002-08-01 | 3M Innovative Properties Company | Jet plasma process and apparatus for deposition of coatings and the coatings thereof |
US7189436B2 (en) | 1997-08-29 | 2007-03-13 | 3M Innovative Properties Company | Flash evaporation-plasma coating deposition method |
GB2331998A (en) * | 1997-12-02 | 1999-06-09 | Teer Coatings Ltd | Articles bearing carbon coatings |
US6726993B2 (en) | 1997-12-02 | 2004-04-27 | Teer Coatings Limited | Carbon coatings, method and apparatus for applying them, and articles bearing such coatings |
GB2331998B (en) * | 1997-12-02 | 2003-01-15 | Teer Coatings Ltd | Carbon coatings, method and apparatus for applying them, and articles bearing such coatings |
US6287711B1 (en) | 1998-07-01 | 2001-09-11 | Front Edge Technology, Inc. | Wear-resistant coating and component |
US6416865B1 (en) * | 1998-10-30 | 2002-07-09 | Sumitomo Electric Industries, Ltd. | Hard carbon film and surface acoustic-wave substrate |
US20070127309A1 (en) * | 1998-11-10 | 2007-06-07 | Sipec Corporation | Chemical supply system |
US6939446B2 (en) | 1998-12-21 | 2005-09-06 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US6660365B1 (en) | 1998-12-21 | 2003-12-09 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US20030228431A1 (en) * | 1998-12-21 | 2003-12-11 | Annette Krisko | Soil-resistant coating for glass surfaces |
US20060000706A1 (en) * | 1998-12-21 | 2006-01-05 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US7294403B2 (en) | 1998-12-21 | 2007-11-13 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US6964731B1 (en) | 1998-12-21 | 2005-11-15 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US7491301B2 (en) | 1998-12-21 | 2009-02-17 | Cardinal Cg Company | Methods and apparatuses for depositing film on both sides of a pane |
US20050016835A1 (en) * | 1998-12-21 | 2005-01-27 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US20050025982A1 (en) * | 1998-12-21 | 2005-02-03 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US20060115655A1 (en) * | 1998-12-21 | 2006-06-01 | Krisko Annette J | Low-emissivity, soil-resistant coating for glass surfaces |
US6974629B1 (en) | 1999-08-06 | 2005-12-13 | Cardinal Cg Company | Low-emissivity, soil-resistant coating for glass surfaces |
US7250196B1 (en) * | 1999-10-26 | 2007-07-31 | Basic Resources, Inc. | System and method for plasma plating |
US6503379B1 (en) | 2000-05-22 | 2003-01-07 | Basic Research, Inc. | Mobile plating system and method |
US6905582B2 (en) | 2000-05-22 | 2005-06-14 | Basic Resources, Inc. | Configurable vacuum system and method |
US6858119B2 (en) | 2000-05-22 | 2005-02-22 | Basic Resources, Inc. | Mobile plating system and method |
US7189437B2 (en) | 2000-05-22 | 2007-03-13 | Basic Resources, Inc. | Mobile plating system and method |
US20030159926A1 (en) * | 2000-05-22 | 2003-08-28 | Kidd Jerry D. | Configurable vacuum system and method |
US20030136670A1 (en) * | 2000-05-22 | 2003-07-24 | Kidd Jerry D. | Mobile plating system and method |
US6521104B1 (en) | 2000-05-22 | 2003-02-18 | Basic Resources, Inc. | Configurable vacuum system and method |
US20030150858A1 (en) * | 2000-08-01 | 2003-08-14 | Jean-Tristan Outreman | Plasma coating method |
US20050212864A1 (en) * | 2000-12-18 | 2005-09-29 | Konica Minolta Holdings, Inc. | Manufacturing method of ink-jet head |
US7370415B2 (en) | 2000-12-18 | 2008-05-13 | Konica Minolta Holdings, Inc. | Manufacturing method of ink-jet head |
US20020073544A1 (en) * | 2000-12-18 | 2002-06-20 | Konica Corporation | Manufacturing method of ink-jet haead |
US20030180450A1 (en) * | 2002-03-22 | 2003-09-25 | Kidd Jerry D. | System and method for preventing breaker failure |
US20100089773A1 (en) * | 2002-06-10 | 2010-04-15 | Trustees Of Tufts College | Total organic compound (toc) analyzer |
US8216447B2 (en) | 2002-06-10 | 2012-07-10 | O.I. Corporation | Total organic compound (TOC) analyzer |
US20060102373A1 (en) * | 2002-07-17 | 2006-05-18 | Sumitomo Electric Industries, Ltd. | Member for semiconductor device |
US6935618B2 (en) | 2002-12-18 | 2005-08-30 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
US20070278444A1 (en) * | 2002-12-18 | 2007-12-06 | Vapor Technologies, Inc. | Valve component for faucet |
US8118055B2 (en) | 2002-12-18 | 2012-02-21 | Vapor Technologies Inc. | Valve component for faucet |
US20040118455A1 (en) * | 2002-12-18 | 2004-06-24 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
US7216661B2 (en) | 2002-12-18 | 2007-05-15 | Masco Corporation Of Indiana | Method of forming a wear resistant component |
US20100252130A1 (en) * | 2002-12-18 | 2010-10-07 | Vapor Technologies, Inc. | Valve component for faucet |
US20060038156A1 (en) * | 2002-12-18 | 2006-02-23 | Masco Corporation Of Indiana | Method of forming a wear resistant component |
US20080315146A1 (en) * | 2002-12-18 | 2008-12-25 | Masco Corporation Of Indiana | Faucet |
US7445026B2 (en) | 2002-12-18 | 2008-11-04 | Masco Corporation Of Indiana | Valve component with improved wear resistance |
US20100186834A1 (en) * | 2002-12-18 | 2010-07-29 | Masco Corporation Of Indiana | Faucet component with improved coating |
US9909677B2 (en) | 2002-12-18 | 2018-03-06 | Delta Faucet Company | Faucet component with coating |
US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
US9388910B2 (en) | 2002-12-18 | 2016-07-12 | Delta Faucet Company | Faucet component with coating |
US20040129314A1 (en) * | 2002-12-18 | 2004-07-08 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
US20050126497A1 (en) * | 2003-09-30 | 2005-06-16 | Kidd Jerry D. | Platform assembly and method |
US20050137084A1 (en) * | 2003-12-22 | 2005-06-23 | Krisko Annette J. | Graded photocatalytic coatings |
US7294404B2 (en) | 2003-12-22 | 2007-11-13 | Cardinal Cg Company | Graded photocatalytic coatings |
GB2413234A (en) * | 2004-04-15 | 2005-10-19 | B & W Loudspeakers | Diamond diaphragms for loudspeaker drive units or microphones |
GB2413234B (en) * | 2004-04-15 | 2007-09-12 | B & W Loudspeakers | Diaphragms for loudspeaker drive units or microphones |
US20070195986A1 (en) * | 2004-04-15 | 2007-08-23 | B & W Loudspeakers Limited | Diaphragms for Loudspeaker Drive Units For Microphones |
USRE44155E1 (en) | 2004-07-12 | 2013-04-16 | Cardinal Cg Company | Low-maintenance coatings |
US20060057298A1 (en) * | 2004-07-12 | 2006-03-16 | Krisko Annette J | Low-maintenance coatings |
US20060057401A1 (en) * | 2004-07-12 | 2006-03-16 | Krisko Annette J | Low-maintenance coatings |
US7604865B2 (en) | 2004-07-12 | 2009-10-20 | Cardinal Cg Company | Low-maintenance coatings |
US7713632B2 (en) | 2004-07-12 | 2010-05-11 | Cardinal Cg Company | Low-maintenance coatings |
USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
WO2006021275A1 (en) * | 2004-08-26 | 2006-03-02 | Schaeffler Kg | Wear-resistant coating and method for producing the same |
US20070224349A1 (en) * | 2004-08-26 | 2007-09-27 | Schaeffler Kg | Wear-Resistant Coating and Method for Producing Same |
US20080124566A1 (en) * | 2004-11-26 | 2008-05-29 | Clint Guy Smallman | Composite Material Comprising Ultra-Hard Particles Embedded in a Metal or Metal Alloy Matrix and Diaphragm Made Thereof |
US20060118408A1 (en) * | 2004-12-03 | 2006-06-08 | Kari Myli | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
US20060121315A1 (en) * | 2004-12-03 | 2006-06-08 | Kari Myli | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8679674B2 (en) | 2005-03-25 | 2014-03-25 | Front Edge Technology, Inc. | Battery with protective packaging |
US7846579B2 (en) | 2005-03-25 | 2010-12-07 | Victor Krasnov | Thin film battery with protective packaging |
US20110076550A1 (en) * | 2005-03-25 | 2011-03-31 | Front Edge Technology, Inc. | Battery with protective packaging |
US8475955B2 (en) | 2005-03-25 | 2013-07-02 | Front Edge Technology, Inc. | Thin film battery with electrical connector connecting battery cells |
US8168322B2 (en) | 2005-03-25 | 2012-05-01 | Front Edge Technology, Inc. | Thin film battery with protective packaging |
US20100227214A1 (en) * | 2005-03-25 | 2010-09-09 | Front Edge Technology, Inc. | Thin film battery with protective packaging |
US20060216589A1 (en) * | 2005-03-25 | 2006-09-28 | Front Edge Technology, Inc. | Thin film battery with protective packaging |
US20080264903A1 (en) * | 2005-08-01 | 2008-10-30 | Vapor Technologies Inc. | Method of producing an article having patterned decorative coating |
US20070026205A1 (en) * | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
US8123967B2 (en) | 2005-08-01 | 2012-02-28 | Vapor Technologies Inc. | Method of producing an article having patterned decorative coating |
US7989094B2 (en) | 2006-04-19 | 2011-08-02 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20070248756A1 (en) * | 2006-04-19 | 2007-10-25 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
US20080213664A1 (en) * | 2007-03-02 | 2008-09-04 | Front Edge Technology, Inc. | Thin film battery and manufacturing method |
US7862927B2 (en) | 2007-03-02 | 2011-01-04 | Front Edge Technology | Thin film battery and manufacturing method |
US20110094094A1 (en) * | 2007-04-27 | 2011-04-28 | Front Edge Technology, Inc. | Pulsed laser cutting of thin film battery |
US7862627B2 (en) | 2007-04-27 | 2011-01-04 | Front Edge Technology, Inc. | Thin film battery substrate cutting and fabrication process |
US8728176B2 (en) | 2007-04-27 | 2014-05-20 | Front Edge Technology, Inc. | Pulsed laser cutting of thin film battery |
US20090057136A1 (en) * | 2007-09-04 | 2009-03-05 | Front Edge Technology, Inc. | Manufacturing method for thin film battery |
US8628645B2 (en) | 2007-09-04 | 2014-01-14 | Front Edge Technology, Inc. | Manufacturing method for thin film battery |
US20100326817A1 (en) * | 2007-09-14 | 2010-12-30 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
US8506768B2 (en) | 2007-09-14 | 2013-08-13 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
US8696879B2 (en) | 2007-09-14 | 2014-04-15 | Cardinal Cg Company | Low-maintenance coating technology |
US20090136839A1 (en) * | 2007-11-28 | 2009-05-28 | Front Edge Technology, Inc. | Thin film battery comprising stacked battery cells and method |
US20090208671A1 (en) * | 2008-02-18 | 2009-08-20 | Front Edge Technology, Inc. | Thin film battery fabrication using laser shaping |
US8870974B2 (en) | 2008-02-18 | 2014-10-28 | Front Edge Technology, Inc. | Thin film battery fabrication using laser shaping |
US8502494B2 (en) | 2009-08-28 | 2013-08-06 | Front Edge Technology, Inc. | Battery charging apparatus and method |
US20110050159A1 (en) * | 2009-08-28 | 2011-03-03 | Front Edge Technology, Inc. | Battery charging apparatus and method |
WO2013048733A1 (en) * | 2011-09-27 | 2013-04-04 | Regents Of The University Of California | Anti-charging surface passivation for charged particle optics |
US8865340B2 (en) | 2011-10-20 | 2014-10-21 | Front Edge Technology Inc. | Thin film battery packaging formed by localized heating |
US9887429B2 (en) | 2011-12-21 | 2018-02-06 | Front Edge Technology Inc. | Laminated lithium battery |
US8864954B2 (en) | 2011-12-23 | 2014-10-21 | Front Edge Technology Inc. | Sputtering lithium-containing material with multiple targets |
US9279291B2 (en) | 2011-12-30 | 2016-03-08 | Smith International, Inc. | Diamond enhanced drilling insert with high impact resistance |
US20130224393A1 (en) * | 2012-02-23 | 2013-08-29 | Sulzer Metco Ag | Plasma Spray Method |
US9257695B2 (en) | 2012-03-29 | 2016-02-09 | Front Edge Technology, Inc. | Localized heat treatment of battery component films |
US9077000B2 (en) | 2012-03-29 | 2015-07-07 | Front Edge Technology, Inc. | Thin film battery and localized heat treatment |
US9905895B2 (en) | 2012-09-25 | 2018-02-27 | Front Edge Technology, Inc. | Pulsed mode apparatus with mismatched battery |
US8753724B2 (en) | 2012-09-26 | 2014-06-17 | Front Edge Technology Inc. | Plasma deposition on a partially formed battery through a mesh screen |
US9356320B2 (en) | 2012-10-15 | 2016-05-31 | Front Edge Technology Inc. | Lithium battery having low leakage anode |
CN103731793A (en) * | 2013-12-27 | 2014-04-16 | 瑞声声学科技(深圳)有限公司 | Method for manufacturing compound vibrating diaphragm |
US10008739B2 (en) | 2015-02-23 | 2018-06-26 | Front Edge Technology, Inc. | Solid-state lithium battery with electrolyte |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
US11325859B2 (en) | 2016-11-17 | 2022-05-10 | Cardinal Cg Company | Static-dissipative coating technology |
US10984830B2 (en) * | 2017-02-24 | 2021-04-20 | The National University Of Singapore | Two dimensional amorphous carbon as overcoat for heat assisted magnetic recording media |
US11114674B2 (en) | 2017-02-24 | 2021-09-07 | National University Of Singapore | Proton conductive two-dimensional amorphous carbon film for gas membrane and fuel cell applications |
US11192788B2 (en) | 2017-02-24 | 2021-12-07 | National University Of Singapore | Two-dimensional amorphous carbon coating and methods of growing and differentiating stem cells |
CN108632721A (en) * | 2017-03-15 | 2018-10-09 | 奥音科技(北京)有限公司 | Top dome made of ceramic material |
CN112626450A (en) * | 2020-12-15 | 2021-04-09 | 国光电器股份有限公司 | Ceramic vibrating diaphragm and preparation method thereof |
CN112626450B (en) * | 2020-12-15 | 2023-08-29 | 国光电器股份有限公司 | Ceramic vibrating diaphragm and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
US4772513A (en) | 1988-09-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4725345A (en) | Method for forming a hard carbon thin film on article and applications thereof | |
EP0341589B1 (en) | Method of and apparatus for manufacturing a crystalline diamond film for use as an acoustic diaphragm | |
JP3660866B2 (en) | Method and apparatus for forming hard carbon film | |
US5541003A (en) | Articles having diamond-like protective thin film | |
JPS62196371A (en) | Diamond coated member having high adhesiveness | |
US5707717A (en) | Articles having diamond-like protective film | |
CA2184737A1 (en) | Diamond-like carbon coated transducers for magnetic recording media | |
JPH10505879A (en) | Diamond film deposition method on electroless plated nickel layer | |
KR100592100B1 (en) | Diaphragm of micro speaker | |
JPH04341565A (en) | Manufacture of silicon carbide film | |
JPH11158631A (en) | Protective film, its production and article | |
Sattel et al. | Nucleation during deposition of hydrocarbon ions as a function of substrate temperature | |
CN211047202U (en) | Vibrating diaphragm | |
JP3205363B2 (en) | Mold with diamond-like protective film | |
JPH0434873B2 (en) | ||
JP3130094B2 (en) | Mold with diamond-like protective film | |
JP2697751B2 (en) | Method of coating diamond film | |
JP3110491B2 (en) | Surface acoustic wave device using diamond-like film | |
JPS63226197A (en) | Acoustic diaphragm | |
JPS6259499A (en) | Acoustic diaphragm | |
JPS63226198A (en) | Acoustic diaphragm | |
JPH07101957B2 (en) | Diaphragm for speaker | |
JPH04341558A (en) | Article with diamondlike protective film and its production | |
JPH0778871B2 (en) | Magnetic disk | |
JPS60186195A (en) | Manufacture of diaphragm for electroacoustic transducer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: TRIO KABUSHIKI KAISHA, 17-5, SHIBUYA 2-CHOME, SHIB Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:SAKAMOTO, MASAKATSU;OHTA, SHUHEI;IWAKURA, SHIRO;AND OTHERS;REEL/FRAME:004646/0149 Effective date: 19860414 |
|
CC | Certificate of correction | ||
FPAY | Fee payment |
Year of fee payment: 4 |
|
FPAY | Fee payment |
Year of fee payment: 8 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees | ||
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20000216 |
|
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |