US5691541A - Maskless, reticle-free, lithography - Google Patents
Maskless, reticle-free, lithography Download PDFInfo
- Publication number
- US5691541A US5691541A US08/645,531 US64553196A US5691541A US 5691541 A US5691541 A US 5691541A US 64553196 A US64553196 A US 64553196A US 5691541 A US5691541 A US 5691541A
- Authority
- US
- United States
- Prior art keywords
- array
- programmable array
- substrate
- lithography system
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (20)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/645,531 US5691541A (en) | 1996-05-14 | 1996-05-14 | Maskless, reticle-free, lithography |
PCT/US1997/008178 WO1997043770A1 (en) | 1996-05-14 | 1997-05-14 | Maskless, reticle-free lithography |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/645,531 US5691541A (en) | 1996-05-14 | 1996-05-14 | Maskless, reticle-free, lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
US5691541A true US5691541A (en) | 1997-11-25 |
Family
ID=24589381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/645,531 Expired - Lifetime US5691541A (en) | 1996-05-14 | 1996-05-14 | Maskless, reticle-free, lithography |
Country Status (2)
Country | Link |
---|---|
US (1) | US5691541A (en) |
WO (1) | WO1997043770A1 (en) |
Cited By (181)
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US5870176A (en) * | 1996-06-19 | 1999-02-09 | Sandia Corporation | Maskless lithography |
US5909658A (en) * | 1996-06-18 | 1999-06-01 | International Business Machines Corporation | High speed electron beam lithography pattern processing system |
US5985498A (en) * | 1999-03-01 | 1999-11-16 | Advanced Micro Devices, Inc. | Method of characterizing linewidth errors in a scanning lithography system |
WO2000003307A1 (en) | 1998-07-10 | 2000-01-20 | Ball Semiconductor, Inc. | Maskless photolithography system |
US6042973A (en) * | 1998-01-08 | 2000-03-28 | Micron Technology, Inc. | Subresolution grating for attenuated phase shifting mask fabrication |
WO2000042618A1 (en) * | 1999-01-11 | 2000-07-20 | Johnson Kenneth C | Maskless, microlens euv lithography system |
US6096457A (en) * | 1998-02-27 | 2000-08-01 | Micron Technology, Inc. | Method for optimizing printing of a phase shift mask having a phase shift error |
US6106979A (en) * | 1997-12-30 | 2000-08-22 | Micron Technology, Inc. | Use of attenuating phase-shifting mask for improved printability of clear-field patterns |
US6133986A (en) * | 1996-02-28 | 2000-10-17 | Johnson; Kenneth C. | Microlens scanner for microlithography and wide-field confocal microscopy |
US6159643A (en) * | 1999-03-01 | 2000-12-12 | Advanced Micro Devices, Inc. | Extreme ultraviolet lithography reflective mask |
US6200646B1 (en) | 1999-08-25 | 2001-03-13 | Spectra Group Limited, Inc. | Method for forming polymeric patterns, relief images and colored polymeric bodies using digital light processing technology |
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US6215578B1 (en) * | 1998-09-17 | 2001-04-10 | Vanguard International Semiconductor Corporation | Electronically switchable off-axis illumination blade for stepper illumination system |
US6238852B1 (en) * | 1999-01-04 | 2001-05-29 | Anvik Corporation | Maskless lithography system and method with doubled throughput |
EP1107064A2 (en) * | 1999-12-06 | 2001-06-13 | Olympus Optical Co., Ltd. | Exposure apparatus |
US6248509B1 (en) | 1999-07-27 | 2001-06-19 | James E. Sanford | Maskless photoresist exposure system using mems devices |
US6291110B1 (en) | 1997-06-27 | 2001-09-18 | Pixelligent Technologies Llc | Methods for transferring a two-dimensional programmable exposure pattern for photolithography |
WO2002013226A2 (en) * | 2000-08-08 | 2002-02-14 | Applied Materials, Inc. | Spatial light modulator driven photocathode source electron beam pattern generator |
JP2002506236A (en) * | 1998-03-02 | 2002-02-26 | マイクロニック レーザー システムズ アクチボラゲット | Pattern generator with improved modulator design |
US6356340B1 (en) | 1998-11-20 | 2002-03-12 | Advanced Micro Devices, Inc. | Piezo programmable reticle for EUV lithography |
WO2002023845A2 (en) * | 2000-09-15 | 2002-03-21 | Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers |
US6379847B2 (en) | 1998-02-27 | 2002-04-30 | Micron Technology, Inc. | Electrically programmable photolithography mask |
US6379867B1 (en) | 2000-01-10 | 2002-04-30 | Ball Semiconductor, Inc. | Moving exposure system and method for maskless lithography system |
WO2002048797A2 (en) * | 2000-12-14 | 2002-06-20 | Qinetiq Limited | Exposure apparatus and method using active tiling |
US6425669B1 (en) | 2000-05-24 | 2002-07-30 | Ball Semiconductor, Inc. | Maskless exposure system |
US6433917B1 (en) | 2000-11-22 | 2002-08-13 | Ball Semiconductor, Inc. | Light modulation device and system |
US6445667B1 (en) | 2000-07-11 | 2002-09-03 | Iomega Corporation | Optical servo writing |
US6461797B1 (en) | 1999-11-19 | 2002-10-08 | International Business Machines Corporation | Method and apparatus for selectively programming a semiconductor device |
US6473237B2 (en) | 2000-11-14 | 2002-10-29 | Ball Semiconductor, Inc. | Point array maskless lithography |
US6489984B1 (en) | 1998-12-29 | 2002-12-03 | Kenneth C. Johnson | Pixel cross talk suppression in digital microprinters |
US20030003383A1 (en) * | 2001-06-20 | 2003-01-02 | Asml Netherlands B.V. | Device manufacturing method, device manufactured thereby and a mask for use in the method |
US6507729B1 (en) | 2000-06-16 | 2003-01-14 | Lucent Trans Electronic Company, Ltd. | Luminescent external dialer for mobile phone |
US6509955B2 (en) * | 2000-05-25 | 2003-01-21 | Ball Semiconductor, Inc. | Lens system for maskless photolithography |
US6512625B2 (en) | 2000-11-22 | 2003-01-28 | Ball Semiconductor, Inc. | Light modulation device and system |
US20030025979A1 (en) * | 2001-07-31 | 2003-02-06 | Ball Semiconductor, Inc. | Surface distortion compensated photolithography |
US20030026501A1 (en) * | 2001-08-03 | 2003-02-06 | Ball Semiconductor, Inc. | Real time data conversion for a digital display |
US20030030781A1 (en) * | 2001-07-24 | 2003-02-13 | Asml Netherlands B.V. | Imaging apparatus |
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US6537738B1 (en) | 2000-08-08 | 2003-03-25 | Ball Semiconductor, Inc. | System and method for making smooth diagonal components with a digital photolithography system |
US20030058515A1 (en) * | 1999-07-27 | 2003-03-27 | Sanford James E. | MEMS-based valve device |
US6552779B2 (en) | 2000-05-25 | 2003-04-22 | Ball Semiconductor, Inc. | Flying image of a maskless exposure system |
US6555828B1 (en) * | 1998-11-17 | 2003-04-29 | The Regents Of The University Of California | Method and apparatus for inspecting reflection masks for defects |
US6576384B1 (en) * | 1998-10-19 | 2003-06-10 | Vanguard International Semiconductor Corporation | Mask image scanning exposure method |
US20030123040A1 (en) * | 2001-11-07 | 2003-07-03 | Gilad Almogy | Optical spot grid array printer |
US6624880B2 (en) | 2001-01-18 | 2003-09-23 | Micronic Laser Systems Ab | Method and apparatus for microlithography |
US20030186140A1 (en) * | 2001-06-27 | 2003-10-02 | Fries David P. | Maskless photolithography for using photoreactive agents |
US20030190535A1 (en) * | 2001-06-27 | 2003-10-09 | Fries David P. | Maskless photolithography using plasma displays |
US20030190536A1 (en) * | 2001-06-27 | 2003-10-09 | Fries David P. | Maskless photolithography for etching and deposition |
US20030206281A1 (en) * | 2002-05-01 | 2003-11-06 | Kanti Jain | Maskless lithography with sub-pixel resolution |
US20030210717A1 (en) * | 2002-05-08 | 2003-11-13 | Harry Rieger | Method and system for providing a pulse laser |
US6658315B2 (en) * | 2001-10-31 | 2003-12-02 | Ball Semiconductor, Inc. | Non-synchronous control of pulsed light |
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