| Veröffentlichungsnummer | USD606195 S1 |
| Publikationstyp | Erteilung |
| Anmeldenummer | 29/309,566 |
| Veröffentlichungsdatum | 15. Dez. 2009 |
| Eingetragen | 4. Sept. 2008 |
| Prioritätsdatum | 4. Sept. 2008 |
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Interspinous implant
US D606195 S1
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The ornamental design for an interspinous implant, as shown and described.
FIG. 1 is a front perspective view of an interspinous implant showing our new design;
FIG. 2 is a right side elevation thereof;
FIG. 3 is a left side elevation thereof;
FIG. 4 is a rear elevation thereof;
FIG. 5 is a front elevation thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is a front perspective view of a modified embodiment of the design shown in FIGS. 1 through 7.
The broken lines in the drawings represent environmental structure and form no part of the claimed design.
| Zitiert von Patent | Eingetragen | Veröffentlichungsdatum | Antragsteller | Titel |
|---|
| US20120065683 | 13. Sept. 2010 | 15. März 2012 | Kuo Fan-Ching | Interspinous process distraction device |