US D606195 S1
The ornamental design for an interspinous implant, as shown and described.
FIG. 1 is a front perspective view of an interspinous implant showing our new design;
FIG. 2 is a right side elevation thereof;
FIG. 3 is a left side elevation thereof;
FIG. 4 is a rear elevation thereof;
FIG. 5 is a front elevation thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is a front perspective view of a modified embodiment of the design shown in FIGS. 1 through 7.
The broken lines in the drawings represent environmental structure and form no part of the claimed design.
| Zitiert von Patent||Eingetragen|| Veröffentlichungsdatum|| Antragsteller|| Titel|
|US20120065683||13. Sept. 2010||15. März 2012||Kuo Fan-Ching||Interspinous process distraction device|