USRE16767E - Charles prancis jenkins - Google Patents
Charles prancis jenkins Download PDFInfo
- Publication number
- USRE16767E USRE16767E US16767DE USRE16767E US RE16767 E USRE16767 E US RE16767E US 16767D E US16767D E US 16767DE US RE16767 E USRE16767 E US RE16767E
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- US
- United States
- Prior art keywords
- light
- source
- screen
- area
- charles
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Links
- 239000000203 mixture Substances 0.000 description 4
- 239000012141 concentrate Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 101700065062 andA Proteins 0.000 description 1
- 230000001721 combination Effects 0.000 description 1
- 230000003247 decreasing Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001264 neutralization Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004544 spot-on Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/66—Transforming electric information into light information
Definitions
- This invention relates to apparatus for receiving pictures-by-radio, and has for its principal object means for ⁇ varying, with a fluctuating current, the intensity of the light falling on a given area.
- A is a light source;
- B a lens for gathering the diverging rays of the light source and direct-ing them onto mirror C, from which the light is .reflected to an apertured disc D, with a transparenter transl ⁇ he glass mlrror C, which may b e a strip, a disc, or
- the beam of light directed on the mirror, and from there reected to the mask D has its boundary shown by solid lines in the drawing. This is the boundary when the diaphragm is in inactive or neutral position.
- the fluctuating current in the leads F follows the light values of in a receiving station, of which this device is a art.'
- the changing intensity of the spot on tEe mask D is imaged on a photographic ⁇ pictures being sent vfrom a broadcasting statlon and picked up 1927.
- a light source In apparatus of tlie class described, a light source, a flexible mirror located to rellect light from said source, an electro-magnet and its armature, attached to the mirror, with the axis of the reflected light, and an apertured' mask between the lens and light source, the area of the a erture being but a. fraction of .thearea of t e adjacent surface of Said lens.
- a source of light a light receiving surface
- a lens arrangedv in alignment with the axis of the reiiected light and located between the apertured mask and the light receiving surface and being of ma- B0 terially a greater area than the aperturedy mask, andmeans to alternately concentrate' and disperse said beam to thereby vary the amount of light transmitted through said means
- said screen being provided with an aperprocess of transmitting pic- 5i the 'armature being I a lens in alignment 66.
- a light screen located in 90 the axis of face, meanebassociated arranged in alignment with '.t-he axi's'of the ,retlected light vand located between the light towards the light 'receiving light variations ofa picture being trans- 'of constant intensity, face, means including ⁇ a f ing a ⁇ wards said light receiving ture normally smaller light, a lensv arranged the reflected 'light andlocated between the light screen and the lightreceiving surface and having an area .ma- Aterially greater. than" the aperture of the than the beam of screen, and means to vary the concentration or" said beamin accordance with light variations oi successive picture areas. 5.
- a source of light of constant intensity y a light receiving surwith said source for eam'of light along a fixed vaxisv surface,v a light screen located inthe path of the beam, said directing a screen being'provided'with van aperture normally smaller than the beam of light, a lens screen and the light receiving surface and having an area materially greater than'the aperture of ⁇ the screen, a source of current varying in amplitude in accordancewith mitted, Aand means controlled by said source of current for varying 'the concentration of said beam n accordance with amplitude va- Y a Lsources-of lightl a light receiving s'ur-.
- a light receivin'grsurface meansasscciated with said source for directing a beam lof iight along a; fixed axis'.
Description
c. F. JENHKINS will@ nunon original Filed oct. 31.. 1922v [Mmes FRAmsJeNKmg Jlis .lucent light Aaperture therein.
Reissued l1, 1927.
UNITED STATES PATENT OFFICE.
CHARLES FRANCIS JENXINS, 0F WASHINGTON, DISTRICT 0F COLUMBIA, ASSIGNOB T0 y JENKINS LABORATORIES, .A CORPORATION.
FLE'XING MIRROR.
original No. 1,525,550, dated Fem-naw 10, 1925, seria11w.5es,145, ined october 31, 1922. Application i'nr reissue' led January 10,
This invention relates to apparatus for receiving pictures-by-radio, and has for its principal object means for`varying, with a fluctuating current, the intensity of the light falling on a given area.-
In the ligure, A is a light source; B a lens for gathering the diverging rays of the light source and direct-ing them onto mirror C, from which the light is .reflected to an apertured disc D, with a transparenter transl`he glass mlrror C, which may b e a strip, a disc, or
shape most suitable for the purpose,l is
jacent to the pole piece of an electric magnet having leads F.
The beam of light directed on the mirror, and from there reected to the mask D has its boundary shown by solid lines in the drawing. This is the boundary when the diaphragm is in inactive or neutral position.
- When the iron diaphragm is pulled down by current in the leads F, the boundary of the vbeam of light between the mirror E and the mask D will be more concentrated, as shown by the dotted lines, because the mirror is concave. However, When the diaphragm is repelled over the pole of the magnet by current of opposite sign in the leads F, the mirror will be made convex, andthe beam reflected therefrom will be wider, as shown bounded -b the dash lines. The effect then of a pu sating or alternating current in the 'leads F is to cause the cross sec tion of the beam of light, where it falls on the mask, to have greater or lesser area.' As the area is lessened the intensity over unit area is obviously increased, and if the area considered is that in the middle of the mask D, it is just as obvious that this area will fluctuate in strength of illumination in y accord with the amplitude of vibration of the mirror.
This then is the object sought, namely, means for increasing or decreasing the intensity'of t-he illumination of a given area to corrspond vto the fluctuation in the cur` rent strength of the leads F.
The fluctuating current in the leads F follows the light values of in a receiving station, of which this device is a art.' The changing intensity of the spot on tEe mask D is imaged on a photographic` pictures being sent vfrom a broadcasting statlon and picked up 1927. Serial N o. `1130,318.
plate P in this tures-by-radio, andA is distributedover-the plate in proper order to reproduce the original picture by any suitable and Well known device.
vWhat I claim 'isz l. In apparatus of tlie class described, a light source, a flexible mirror located to rellect light from said source, an electro-magnet and its armature, attached to the mirror, with the axis of the reflected light, and an apertured' mask between the lens and light source, the area of the a erture being but a. fraction of .thearea of t e adjacent surface of Said lens.
2. In combination, a source of light, a light receiving surface, means for directlng` a beam of light from said source towards ,said surface,' an apertured mask located beltween said source and said surface to'nor- 75 mally permit only a portion of said beam to reach the surface, a lens arrangedv in alignment with the axis of the reiiected light and located between the apertured mask and the light receiving surface and being of ma- B0 terially a greater area than the aperturedy mask, andmeans to alternately concentrate' and disperse said beam to thereby vary the amount of light transmitted through said means,
3'. In combinatioma source of light, a
light receiving surface, means associated andlocated between the light screen and the 96 light receiving surface and having an area materially'greater than the aperture in the light screen, .and means to` alternately concentrate and dispersesaidbeam to therebyV vary the amount of light transmitted 100 through said aperture.
4. The combi-nation of a source 4of light of constant intensity, a light receiving'surface, means associated with said source for directing a beam of light along a iixed axis *105 towards said light receiving surface,a light screen located in the path of said beam,
said screen being provided with an aperprocess of transmitting pic- 5i the 'armature being I a lens in alignment 66.
a light screen located in 90 the axis of face, meanebassociated arranged in alignment with '.t-he axi's'of the ,retlected light vand located between the light towards the light 'receiving light variations ofa picture being trans- 'of constant intensity, face, means including `a f ing a `wards said light receiving ture normally smaller light, a lensv arranged the reflected 'light andlocated between the light screen and the lightreceiving surface and having an area .ma- Aterially greater. than" the aperture of the than the beam of screen, and means to vary the concentration or" said beamin accordance with light variations oi successive picture areas. 5. The combination of a source of light of constant intensity,y a light receiving surwith said source for eam'of light along a fixed vaxisv surface,v a light screen located inthe path of the beam, said directing a screen being'provided'with van aperture normally smaller than the beam of light, a lens screen and the light receiving surface and having an area materially greater than'the aperture of `the screen, a source of current varying in amplitude in accordancewith mitted, Aand means controlled by said source of current for varying 'the concentration of said beam n accordance with amplitude va- Y a Lsources-of lightl a light receiving s'ur-.
riationsy of said current.
6. The combination of beam of lightjalong a xedaxis to? surface, a light screen located in the `'path of said beamfsaid 1n alignmenti with `reiected light and mirror for "direct-i screen being provided with an' apertureinor'- 35 mally smaller than the beamof light, a lens arranged in alignment with the axis of located between the light screen and the light receivingsurface and having an area materially greater than the aperture of thescieen, -a source of current varying in amplitude fin accordance with light variations cf a'picture being trans- 1nitted,;andmeans Lcontrolled by saidsource 45 the concentration of said beam in accordl ance 'with amplitude variations of said cur-v of current. for lexing said mirror to vary rent.
7. The of constant intensity,
a light receivin'grsurface, meansasscciated with said source for directing a beam lof iight along a; fixed axis'.
receiving surface," a light towards said light screen' located inthe path of the beam, said vscreen being provided-with an aperture normally lsmaller thauthe beam of light, `a'lens `arranged in alignment with the axis 'of the vreflected light and located between the light` screen and thev light receiving surface' `and v a source ,otcurrent- -.varying in amplitude, and .means controlled .source of .current for varying the .cQncentration-c `saidbeamwith amplitudevariation's of said current. 05
havingan area `materially greaterthan-the aperture othe screen,
by saidin accordance CHARLES 'runners Jnruinas,
thel v vcombination of a source of light-A.`
ereofI axmy signature.A
Publications (1)
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USRE16767E true USRE16767E (en) | 1927-10-11 |
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US16767D Expired USRE16767E (en) | Charles prancis jenkins |
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Cited By (43)
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---|---|---|---|---|
US5808797A (en) * | 1992-04-28 | 1998-09-15 | Silicon Light Machines | Method and apparatus for modulating a light beam |
US5841579A (en) * | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US6088102A (en) | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
US6101036A (en) | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
US6130770A (en) | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6268948B1 (en) * | 1999-06-11 | 2001-07-31 | Creo Products Inc. | Micromachined reflective light valve |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US20030138986A1 (en) * | 2001-09-13 | 2003-07-24 | Mike Bruner | Microelectronic mechanical system and methods |
US20030223675A1 (en) * | 2002-05-29 | 2003-12-04 | Silicon Light Machines | Optical switch |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
US6747781B2 (en) | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
US6782205B2 (en) | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US6785001B2 (en) | 2001-08-21 | 2004-08-31 | Silicon Light Machines, Inc. | Method and apparatus for measuring wavelength jitter of light signal |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US6813059B2 (en) | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
US6829092B2 (en) | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
US6872984B1 (en) | 1998-07-29 | 2005-03-29 | Silicon Light Machines Corporation | Method of sealing a hermetic lid to a semiconductor die at an angle |
US6908201B2 (en) | 2002-06-28 | 2005-06-21 | Silicon Light Machines Corporation | Micro-support structures |
US6922273B1 (en) | 2003-02-28 | 2005-07-26 | Silicon Light Machines Corporation | PDL mitigation structure for diffractive MEMS and gratings |
US6922272B1 (en) | 2003-02-14 | 2005-07-26 | Silicon Light Machines Corporation | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices |
US6927891B1 (en) | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
US6928207B1 (en) | 2002-12-12 | 2005-08-09 | Silicon Light Machines Corporation | Apparatus for selectively blocking WDM channels |
US6934070B1 (en) | 2002-12-18 | 2005-08-23 | Silicon Light Machines Corporation | Chirped optical MEM device |
US6947613B1 (en) | 2003-02-11 | 2005-09-20 | Silicon Light Machines Corporation | Wavelength selective switch and equalizer |
US6956995B1 (en) | 2001-11-09 | 2005-10-18 | Silicon Light Machines Corporation | Optical communication arrangement |
US6987600B1 (en) | 2002-12-17 | 2006-01-17 | Silicon Light Machines Corporation | Arbitrary phase profile for better equalization in dynamic gain equalizer |
US7027202B1 (en) | 2003-02-28 | 2006-04-11 | Silicon Light Machines Corp | Silicon substrate as a light modulator sacrificial layer |
US7042611B1 (en) | 2003-03-03 | 2006-05-09 | Silicon Light Machines Corporation | Pre-deflected bias ribbons |
US7046420B1 (en) | 2003-02-28 | 2006-05-16 | Silicon Light Machines Corporation | MEM micro-structures and methods of making the same |
US7054515B1 (en) | 2002-05-30 | 2006-05-30 | Silicon Light Machines Corporation | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor |
US7057795B2 (en) | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
US7068372B1 (en) | 2003-01-28 | 2006-06-27 | Silicon Light Machines Corporation | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor |
US7177081B2 (en) | 2001-03-08 | 2007-02-13 | Silicon Light Machines Corporation | High contrast grating light valve type device |
US7286764B1 (en) | 2003-02-03 | 2007-10-23 | Silicon Light Machines Corporation | Reconfigurable modulator-based optical add-and-drop multiplexer |
US7391973B1 (en) | 2003-02-28 | 2008-06-24 | Silicon Light Machines Corporation | Two-stage gain equalizer |
-
0
- US US16767D patent/USRE16767E/en not_active Expired
Cited By (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5808797A (en) * | 1992-04-28 | 1998-09-15 | Silicon Light Machines | Method and apparatus for modulating a light beam |
US5841579A (en) * | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US6088102A (en) | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US6101036A (en) | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
US6130770A (en) | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6872984B1 (en) | 1998-07-29 | 2005-03-29 | Silicon Light Machines Corporation | Method of sealing a hermetic lid to a semiconductor die at an angle |
US6268948B1 (en) * | 1999-06-11 | 2001-07-31 | Creo Products Inc. | Micromachined reflective light valve |
US7177081B2 (en) | 2001-03-08 | 2007-02-13 | Silicon Light Machines Corporation | High contrast grating light valve type device |
US6782205B2 (en) | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US6747781B2 (en) | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
US6829092B2 (en) | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
US6785001B2 (en) | 2001-08-21 | 2004-08-31 | Silicon Light Machines, Inc. | Method and apparatus for measuring wavelength jitter of light signal |
US7049164B2 (en) | 2001-09-13 | 2006-05-23 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US20030138986A1 (en) * | 2001-09-13 | 2003-07-24 | Mike Bruner | Microelectronic mechanical system and methods |
US6956995B1 (en) | 2001-11-09 | 2005-10-18 | Silicon Light Machines Corporation | Optical communication arrangement |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
US20030223675A1 (en) * | 2002-05-29 | 2003-12-04 | Silicon Light Machines | Optical switch |
US6839479B2 (en) | 2002-05-29 | 2005-01-04 | Silicon Light Machines Corporation | Optical switch |
US7054515B1 (en) | 2002-05-30 | 2006-05-30 | Silicon Light Machines Corporation | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US6813059B2 (en) | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
US6908201B2 (en) | 2002-06-28 | 2005-06-21 | Silicon Light Machines Corporation | Micro-support structures |
US7057795B2 (en) | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
US6928207B1 (en) | 2002-12-12 | 2005-08-09 | Silicon Light Machines Corporation | Apparatus for selectively blocking WDM channels |
US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
US6987600B1 (en) | 2002-12-17 | 2006-01-17 | Silicon Light Machines Corporation | Arbitrary phase profile for better equalization in dynamic gain equalizer |
US6934070B1 (en) | 2002-12-18 | 2005-08-23 | Silicon Light Machines Corporation | Chirped optical MEM device |
US6927891B1 (en) | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
US7068372B1 (en) | 2003-01-28 | 2006-06-27 | Silicon Light Machines Corporation | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor |
US7286764B1 (en) | 2003-02-03 | 2007-10-23 | Silicon Light Machines Corporation | Reconfigurable modulator-based optical add-and-drop multiplexer |
US6947613B1 (en) | 2003-02-11 | 2005-09-20 | Silicon Light Machines Corporation | Wavelength selective switch and equalizer |
US6922272B1 (en) | 2003-02-14 | 2005-07-26 | Silicon Light Machines Corporation | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices |
US7046420B1 (en) | 2003-02-28 | 2006-05-16 | Silicon Light Machines Corporation | MEM micro-structures and methods of making the same |
US6922273B1 (en) | 2003-02-28 | 2005-07-26 | Silicon Light Machines Corporation | PDL mitigation structure for diffractive MEMS and gratings |
US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
US7027202B1 (en) | 2003-02-28 | 2006-04-11 | Silicon Light Machines Corp | Silicon substrate as a light modulator sacrificial layer |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US7391973B1 (en) | 2003-02-28 | 2008-06-24 | Silicon Light Machines Corporation | Two-stage gain equalizer |
US7042611B1 (en) | 2003-03-03 | 2006-05-09 | Silicon Light Machines Corporation | Pre-deflected bias ribbons |
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