USRE24253E - Method of producing a composite liquid - Google Patents
Method of producing a composite liquid Download PDFInfo
- Publication number
- USRE24253E USRE24253E US24253DE USRE24253E US RE24253 E USRE24253 E US RE24253E US 24253D E US24253D E US 24253DE US RE24253 E USRE24253 E US RE24253E
- Authority
- US
- United States
- Prior art keywords
- bath
- copper
- electrolyte
- chloride
- electrolysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title description 7
- 239000007788 liquid Substances 0.000 title description 2
- 239000002131 composite material Substances 0.000 title 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 17
- 229910052802 copper Inorganic materials 0.000 description 17
- 239000010949 copper Substances 0.000 description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 16
- 239000003792 electrolyte Substances 0.000 description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 10
- 238000005868 electrolysis reaction Methods 0.000 description 10
- IPCRBOOJBPETMF-UHFFFAOYSA-N N-acetylthiourea Chemical compound CC(=O)NC(N)=S IPCRBOOJBPETMF-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- -1 chloride anions Chemical class 0.000 description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 4
- MIDXCONKKJTLDX-UHFFFAOYSA-N 3,5-dimethylcyclopentane-1,2-dione Chemical compound CC1CC(C)C(=O)C1=O MIDXCONKKJTLDX-UHFFFAOYSA-N 0.000 description 3
- 229920001353 Dextrin Polymers 0.000 description 3
- 239000004375 Dextrin Substances 0.000 description 3
- 235000013736 caramel Nutrition 0.000 description 3
- BQJTUDIVKSVBDU-UHFFFAOYSA-L copper;sulfuric acid;sulfate Chemical compound [Cu+2].OS(O)(=O)=O.[O-]S([O-])(=O)=O BQJTUDIVKSVBDU-UHFFFAOYSA-L 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 235000019425 dextrin Nutrition 0.000 description 3
- 235000013379 molasses Nutrition 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 2
- 241000054822 Lycaena cupreus Species 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N aminothiocarboxamide Natural products NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 2
- 229940067741 sodium octyl sulfate Drugs 0.000 description 2
- WFRKJMRGXGWHBM-UHFFFAOYSA-M sodium;octyl sulfate Chemical compound [Na+].CCCCCCCCOS([O-])(=O)=O WFRKJMRGXGWHBM-UHFFFAOYSA-M 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Definitions
- This invention deals with bright copper plating, and in particular with bright copper plating by electrolysis from an acid bath.
- the essence of the invention thus consists in providing an electrolyte for acid copper plating in which the chloride anion content ranges from 0.001 to 0.015 gram per liter.
- the predominant ingredients of the bath preferred for the electrolysis are copper sulphate and sulfuric acid.
- sodium lauryl sulfate and sodium octyl sulfate are preferred therefor.
- the invention thus consists in an electrolytic bath which contains:
- the articles to be plated are advantageously subjected to a preliminary treatment prior to the coating proper. For this purpose they are cleaned with an alkalinecleaner, dipped into acid in order to remove any rush-neutralized and then rinsed in water. It is also preferable to first apply a thin copper coating from a cyanide bath.
- Such abath may contain from 3 to v5 ounces of copper metal per gallon, 1 to 3 ounces of free sodium cyanide and from 2 to 8 ounces of sodium carbonate. Plating with this bath for from 3 to 4 minutes is sufficient. After this flash plating the article is washed to remove the cyanide.
- the temperature of the bath is preferably maintained at between and 100 F.
- the electric current should have a voltage of from 2.5 to 6 volts and a density of from 40 to 200 amps. per square foot.
- EXAMPLE I An electrolyte was used having the following composition: 250 gr./l. CuSO4..5I-I2O 60 gr./l. sulfuric acid 0.005 gr./l. chloride anion 0.10 gr./1. dextrin 0.015 gr./l. acetyl thiourea 0.02 gr./ 1. sodium octyl sulfate
- the bath had a temperature of F. Agitation was carried out by blowing air through the bath. The electric current had a density of amps. per square foot and a voltage of 4.5 volts.
- the coating obtained in this instance was extremely smooth and uniform and had a high luster.
- the bath did not show any turbidity even after a use of several weeks.
- EXAMPLE II 200 gr./l. copper sulfate 50 gr./l. sulfuric acid 0.005 gr./l. chloride anion 0.10 gr./l. caramel and/ or molasses .03 gr./l. acetyl thiourea 0.10 gr./l. sodium lauryl sulfate
- the process with this electrolyte was carried out under the same conditions as were used in connection with Example I with the exception that agitation of the electrolyte was eifecte'd by moving the cathode instead of introducing air. The same favorable results were obtained.
Description
United States Patent METHOD OF PRODUCING A COMPOSI'IE'LIQUID BITUMINOUS BINDER John F. Beaver, Piqua, Ohio No Drawing. Original No. 2,602,774, dated July 8, 1952, Serial No. 26,475, May 11, 1948. Application for reissue July 12, 1955, Serial No. 521,655
3 Claims. (Cl. con- 52 This application is a continuation-in-part of my copending application, Serial No. 571,543, filed January 5, 1945, now abandoned.
This invention deals with bright copper plating, and in particular with bright copper plating by electrolysis from an acid bath.
It is an object of this invention to provide a bright copper deposit by electrolysis froman acid bath which yields smooth and very uniform deposits.
It is an object of this invention to provide a bright copper deposit by electrolysis from an acid bath which yields a coating of an exceedingly high luster so that butting is not necessary.
It is another object of this invention to provide a a bright copper deposit by electrolysis of an acid bath with which operationcan be satisfactorilycontinued over a long period of time without noticeable deterioration of the bath or impairment of the coating.
It is still another object of this invention to provide a bright copper deposit by electrolysis. of anacid bath with which an electric current of high density maybe used.
It is still another object of this invention to provide a bright copper deposit by electrolysis of an acid bath which does not require frequent renewal of the electrode and discarding of the bath used.
It is still another object of this invention to provide a bright copper deposit by electrolysis using an acid bath which does not become turbid after some time so that a filtering step does not have to be inserted from time to time.
It is still another object of this invention to provide a bright copper deposit by electrolysis using an acid bath which has a highly increased tolerance for impurities.
It has been found by the applicant during comprehensive research work that, while electrolytes based on a mixture of copper, sulphate and sulfuric acid operate satisfactorily in the beginning, the deposits become less and less uniform as the operation continues. This phenomenon was even noticed although the proportions of the ingredients of the bath were constantly kept at the same level. As a consequence of the disadvantage just described the electrolyte had to be discarded at frequent intervals and replaced by a new one.
After a great many experiments it was discovered that the change of the content of chloride anion is responsible for such unsatisfactory operation.
After this discovery it was then found out that the electrolytes when first used in the beginning had a very low content of chloride anions which were present in the form of a contamination, but that this chloride content became gradually depleted. This was when the operation started to become unsatisfactory.
Further studies of the problem revealed that if the chloride anion content of the electrolyte is controlled so as to bring it within a range of from 0.001 to 0.015 gram "ice per liter of electrolyte all these disadvantages are overcome. A bath thus composed yields deposits of the desired properties for a very considerable period of time.
The essence of the invention thus consists in providing an electrolyte for acid copper plating in which the chloride anion content ranges from 0.001 to 0.015 gram per liter.
As has been mentioned above the predominant ingredients of the bath preferred for the electrolysis are copper sulphate and sulfuric acid.
It is advantageous to add a brightening agent to the electrolyte; derivatives of thiourea have been found especially suitable for this purpose, and in particular acetyl thiourea has yielded excellent results.
It is also advantageous, though optional, to add an agent which permits the use of an electric current of high density. Dextrin, molasses and caramel are excellent for this purpose.
Sometimes it is also desirable to add a wetting agent; sodium lauryl sulfate and sodium octyl sulfate are preferred therefor.
The invention thus consists in an electrolytic bath which contains:
to 275 gr./l. copper sulfate 20 to 100 gr./l. sulfuric acid 0.001 to 0.015 g'r./l. chloride anion 0 to 1.0 gr./l. caramel dextrin and/or molasses 0.005 to 0.05 gr./l. of acetyl thiourea The articles to be plated are advantageously subjected to a preliminary treatment prior to the coating proper. For this purpose they are cleaned with an alkalinecleaner, dipped into acid in order to remove any rush-neutralized and then rinsed in water. It is also preferable to first apply a thin copper coating from a cyanide bath. Such abath may contain from 3 to v5 ounces of copper metal per gallon, 1 to 3 ounces of free sodium cyanide and from 2 to 8 ounces of sodium carbonate. Plating with this bath for from 3 to 4 minutes is sufficient. After this flash plating the article is washed to remove the cyanide.
It is furthermore advantageous to agitate the electrolyte during electrolysis. This may be carried out either by moving the cathode or by stirring the electrolyte, the latter being preferred. In particular it has been found satisfactory to effect stirring by blowing air through the bath. If stirring is carried out this way, however, it is advisable to restrict the quantity of the wetting agent to a minimum or omit it entirely, because otherwise excessive foaming takes place which impairs the operation.
The temperature of the bath is preferably maintained at between and 100 F. The electric current should have a voltage of from 2.5 to 6 volts and a density of from 40 to 200 amps. per square foot.
In the following, two examples are given for the pur pose of illustrating my invention:
EXAMPLE I An electrolyte was used having the following composition: 250 gr./l. CuSO4..5I-I2O 60 gr./l. sulfuric acid 0.005 gr./l. chloride anion 0.10 gr./1. dextrin 0.015 gr./l. acetyl thiourea 0.02 gr./ 1. sodium octyl sulfate The bath had a temperature of F. Agitation was carried out by blowing air through the bath. The electric current had a density of amps. per square foot and a voltage of 4.5 volts.
The coating obtained in this instance was extremely smooth and uniform and had a high luster. The bath did not show any turbidity even after a use of several weeks.
The tolerance for impurities for a bath of this invention is considerably increased in particular for iron, zinc, chromium and nickel. For instance, without the presence of chloride anions, harmful and impairs the operation. With a chloride anion content as set forth in this specification several grams per liter may be present in the electrolyte and the operation will be satisfactory.
EXAMPLE II 200 gr./l. copper sulfate 50 gr./l. sulfuric acid 0.005 gr./l. chloride anion 0.10 gr./l. caramel and/ or molasses .03 gr./l. acetyl thiourea 0.10 gr./l. sodium lauryl sulfate The process with this electrolyte was carried out under the same conditions as were used in connection with Example I with the exception that agitation of the electrolyte was eifecte'd by moving the cathode instead of introducing air. The same favorable results were obtained.
It will be understood that while there have been described herein certain specific embodiments of my invention, it is not intended thereby to have it limited to the details given in view of the fact that this invention is susceptible to various modifications and changes that come within the spirit of the disclosure and the scope of the appended claims.
I claim:
1. In a method of electrolytically depositing copper from a copper sulfate-sulphuric acid bath containing acetyl thiourea in an amount of from about 0.005 to 0.05 gm./1. and chloride anion in an amount of from about 0.001 to 0.015 gm./l., the step of maintaining the chloride anion concentration at a constant value within the range of about 0.001 to 0.015 gm./l. by addition of a chloride[.], and wherein the bath is maintained at a current density of from 40 to 200 amperes per square foot.
an iron content of 0.25 gr./1. is'
2. In a method of electrolytically depositing copper from a copper sulfate-sulfuric acid bath containing a thiourea compound in an amount of from about 0.005 to 0.05 gm./l. and chloride anion in an amount of from about 0.001 to 0.015 gm./l., the step of maintaining the chloride anion concentration at a constant value within the range of "about 0.001 to 0.015 gm./l. by addition of a chloride[.], and wherein the electric current density is from to 200 amperes per square foot, with voltage of 2.5 to 6.0.
3. In a method of electrolytically depositing copper from a copper sulfate-sulphuric acid bath containing a thiourea compound in an amount 09 from about 0.005 to 0.05 gnu/l. and chloride anion in an amount of from about 0.001 to 0.015 gm./ L, the step of maintaining the chloride anion concentration at a constant value within the range of about 0.001 to 0.015 gm./l. by addition of a chloride and wherein the bath is maintained at between about and F. and the electric current density is from 40 to 200 amperes per square foot with a voltage of 2.5 to 6.0.
References Cited in the file of this patent or the original patent UNITED STATES PATENTS Buswell: Chemistry 1929, pp. 74-76.
Operating Manual, Daybrite Acid Copper Process, pp. 2-3.
of Water and Sewage Treatment,
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US26475A US2602774A (en) | 1948-05-11 | 1948-05-11 | Method of plating copper |
Publications (1)
Publication Number | Publication Date |
---|---|
USRE24253E true USRE24253E (en) | 1956-12-11 |
Family
ID=21832033
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US24253D Expired USRE24253E (en) | 1948-05-11 | Method of producing a composite liquid | |
US26475A Expired - Lifetime US2602774A (en) | 1948-05-11 | 1948-05-11 | Method of plating copper |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US26475A Expired - Lifetime US2602774A (en) | 1948-05-11 | 1948-05-11 | Method of plating copper |
Country Status (1)
Country | Link |
---|---|
US (2) | US2602774A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3220897A (en) * | 1961-02-13 | 1965-11-30 | Esther S Conley | Conducting element and method |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL83873C (en) * | 1952-05-26 | |||
NL174178B (en) * | 1952-05-26 | Chevron Res | PROCEDURE FOR THE RECOVERY OF HYDROCARBONS FROM A PERMEABLE HYDROCARBON FORMATION BY INJECTION WITH STEAM. | |
US2762762A (en) * | 1953-02-27 | 1956-09-11 | Rca Corp | Method for electroforming a copper article |
US2738318A (en) * | 1954-12-28 | 1956-03-13 | Udylite Res Corp | Electrodeposition of copper from an acid bath |
DE1097231B (en) * | 1957-09-11 | 1961-01-12 | Westinghouse Electric Corp | Acid galvanic copper bath |
US2931760A (en) * | 1957-09-25 | 1960-04-05 | Leon R Westbrook | Acid copper plating |
US3769179A (en) * | 1972-01-19 | 1973-10-30 | Kewanee Oil Co | Copper plating process for printed circuits |
US4474649A (en) * | 1982-06-21 | 1984-10-02 | Asarco Incorporated | Method of thiourea addition of electrolytic solutions useful for copper refining |
US5181770A (en) * | 1989-04-19 | 1993-01-26 | Olin Corporation | Surface topography optimization through control of chloride concentration in electroformed copper foil |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US964096A (en) * | 1906-03-19 | 1910-07-12 | Thomas A Edison | Process for electroplating. |
US2355070A (en) * | 1937-07-03 | 1944-08-08 | Little Inc A | Electrolytic deposition of metal |
US2391289A (en) * | 1941-09-15 | 1945-12-18 | Jr John F Beaver | Bright copper plating |
US2462870A (en) * | 1942-07-09 | 1949-03-01 | Gen Motors Corp | Electrodeposition of copper |
-
0
- US US24253D patent/USRE24253E/en not_active Expired
-
1948
- 1948-05-11 US US26475A patent/US2602774A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3220897A (en) * | 1961-02-13 | 1965-11-30 | Esther S Conley | Conducting element and method |
Also Published As
Publication number | Publication date |
---|---|
US2602774A (en) | 1952-07-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3917517A (en) | Chromium plating electrolyte and method | |
USRE24253E (en) | Method of producing a composite liquid | |
TWI243864B (en) | Surface treatment of aluminum or aluminum alloys by means of formulations comprising alkanesulfonic acids | |
US2391289A (en) | Bright copper plating | |
US2654701A (en) | Plating aluminum | |
JPS634100A (en) | Electrolyte for electrochemical polishing of metal surface | |
US2701234A (en) | Addition agent for copper plating | |
US2693444A (en) | Electrodeposition of chromium and alloys thereof | |
US1750092A (en) | Electroplating process | |
US1945107A (en) | Method of making ductile electrolytic iron | |
US2542779A (en) | Electropolishing composition and process | |
US3446715A (en) | Metal treating | |
US2462870A (en) | Electrodeposition of copper | |
US2984603A (en) | Platinum plating composition and process | |
US1922853A (en) | Process for the electrolytic deposition of chromium | |
US2607722A (en) | Electrolytic polishing of stainless steel | |
US2594124A (en) | Electrolytic polishing of metals | |
US2469015A (en) | Method and compositions for producing surface conversion coatings on zinc | |
US2537032A (en) | Acid zinc electroplating compositions and method | |
US2561222A (en) | Electrolytic method of stripping nickel, chromium, copper, zinc, cadmium, silver, tin, and lead electrodeposits from ferrous basis metals, and compositions for use therein | |
US2355505A (en) | Electrodeposition of bright zinc | |
US2330170A (en) | Electrolytic polishing of metal | |
US2489523A (en) | Electrodeposition of tin or lead-tin alloys | |
US2488246A (en) | Process of electroplating zinc, and baths and compositions for use therein | |
US4247378A (en) | Electrobrightening of aluminium and aluminium-base alloys |