WO1997013183A1 - Holographic medium and process - Google Patents
Holographic medium and process Download PDFInfo
- Publication number
- WO1997013183A1 WO1997013183A1 PCT/US1996/015600 US9615600W WO9713183A1 WO 1997013183 A1 WO1997013183 A1 WO 1997013183A1 US 9615600 W US9615600 W US 9615600W WO 9713183 A1 WO9713183 A1 WO 9713183A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid
- medium
- monomer
- exposure
- acid generator
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 36
- 239000002253 acid Substances 0.000 claims abstract description 55
- 239000000178 monomer Substances 0.000 claims abstract description 55
- 230000005855 radiation Effects 0.000 claims abstract description 38
- 239000011230 binding agent Substances 0.000 claims abstract description 28
- 238000010526 radical polymerization reaction Methods 0.000 claims abstract description 21
- 238000010538 cationic polymerization reaction Methods 0.000 claims abstract description 18
- 238000006116 polymerization reaction Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 6
- 230000001427 coherent effect Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 239000002841 Lewis acid Substances 0.000 claims description 3
- 150000007517 lewis acids Chemical class 0.000 claims description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000005520 diaryliodonium group Chemical group 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 150000002118 epoxides Chemical class 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 3
- 239000001301 oxygen Substances 0.000 abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 2
- -1 polysiloxanes Polymers 0.000 description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 10
- 150000003254 radicals Chemical class 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 8
- 239000000523 sample Substances 0.000 description 8
- 125000002091 cationic group Chemical group 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 5
- 239000003999 initiator Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 3
- 238000013500 data storage Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- ZWBOIOUXXAJRAU-UHFFFAOYSA-N 1a,2,3,7b-tetrahydronaphtho[1,2-b]oxirene Chemical compound C1CC2=CC=CC=C2C2C1O2 ZWBOIOUXXAJRAU-UHFFFAOYSA-N 0.000 description 2
- 239000007848 Bronsted acid Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 2
- 239000008240 homogeneous mixture Substances 0.000 description 2
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical class [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000011833 salt mixture Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- AXJXIUVYMGWYGE-UHFFFAOYSA-N 5,6,7,8-tetrahydro-1ah-naphtho[1,8a-b]oxirene Chemical compound C1=CC=C2CCCCC32OC31 AXJXIUVYMGWYGE-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000003899 bactericide agent Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- BOXSCYUXSBYGRD-UHFFFAOYSA-N cyclopenta-1,3-diene;iron(3+) Chemical class [Fe+3].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 BOXSCYUXSBYGRD-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical class C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- PQPVPZTVJLXQAS-UHFFFAOYSA-N hydroxy-methyl-phenylsilicon Chemical compound C[Si](O)C1=CC=CC=C1 PQPVPZTVJLXQAS-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920003216 poly(methylphenylsiloxane) Polymers 0.000 description 1
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000003930 superacid Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
- C08G59/306—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing silicon
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Holo Graphy (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51433897A JP3604700B2 (en) | 1995-10-06 | 1996-09-30 | Holographic media and processes |
DE69616813T DE69616813T2 (en) | 1995-10-06 | 1996-09-30 | HALOGRAPHIC RECORDING MATERIAL AND METHOD |
EP96933179A EP0853774B1 (en) | 1995-10-06 | 1996-09-30 | Holographic medium and process |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US54012595A | 1995-10-06 | 1995-10-06 | |
US08/540,125 | 1995-10-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1997013183A1 true WO1997013183A1 (en) | 1997-04-10 |
Family
ID=24154115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1996/015600 WO1997013183A1 (en) | 1995-10-06 | 1996-09-30 | Holographic medium and process |
Country Status (5)
Country | Link |
---|---|
US (1) | US5759721A (en) |
EP (1) | EP0853774B1 (en) |
JP (1) | JP3604700B2 (en) |
DE (1) | DE69616813T2 (en) |
WO (1) | WO1997013183A1 (en) |
Cited By (20)
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WO1997044714A1 (en) * | 1996-05-17 | 1997-11-27 | Polaroid Corporation | Holographic medium and process |
WO1999026112A1 (en) * | 1997-11-13 | 1999-05-27 | Polaroid Corporation | Holographic medium and process |
WO1999033642A1 (en) * | 1997-12-29 | 1999-07-08 | Novartis Ag | Holographic ophthalmic lens |
US5997140A (en) * | 1997-12-29 | 1999-12-07 | Novartis Ag | Actively controllable multifocal lens |
US6139147A (en) * | 1998-11-20 | 2000-10-31 | Novartis Ag | Actively controllable multifocal lens |
US6139146A (en) * | 1997-12-29 | 2000-10-31 | Novartis Ag | Programmable corrective lenses |
US6310850B1 (en) | 1999-07-29 | 2001-10-30 | Siros Technologies, Inc. | Method and apparatus for optical data storage and/or retrieval by selective alteration of a holographic storage medium |
US6322933B1 (en) | 1999-01-12 | 2001-11-27 | Siros Technologies, Inc. | Volumetric track definition for data storage media used to record data by selective alteration of a format hologram |
US6322931B1 (en) | 1999-07-29 | 2001-11-27 | Siros Technologies, Inc. | Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings |
WO2002019040A2 (en) * | 2000-08-28 | 2002-03-07 | Aprilis, Inc. | Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
WO2002039185A1 (en) * | 2000-11-10 | 2002-05-16 | Durand Technology Limited | Optical recording materials |
WO2002086623A1 (en) * | 2001-04-20 | 2002-10-31 | Durand Technology Limited | Optical recording materials |
US6512606B1 (en) | 1999-07-29 | 2003-01-28 | Siros Technologies, Inc. | Optical storage media and method for optical data storage via local changes in reflectivity of a format grating |
WO2003046661A1 (en) * | 2001-11-27 | 2003-06-05 | Durand Technology Limited | Printed uv cured optical films |
WO2004011522A1 (en) * | 2002-07-30 | 2004-02-05 | Toagosei Co., Ltd. | Composition for holography, method of curing the same, and cured article |
EP1679561A2 (en) | 2005-01-11 | 2006-07-12 | Fuji Photo Film Co., Ltd. | Hologram recording method, hologram recording apparatus, and hologram recording medium |
EP1724762A2 (en) | 2005-04-19 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Optical information recording media, method for manufacturing the same and method for recording/reproducing optical information |
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WO2007047840A2 (en) * | 2005-10-18 | 2007-04-26 | Dce Aprilis, Inc. | Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
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US6020985A (en) * | 1998-01-30 | 2000-02-01 | Siros Technologies, Inc. | Multilayer reflection microhologram storage in tape media |
US6212148B1 (en) | 1998-01-30 | 2001-04-03 | Siros Technologies, Inc. | Optical data storage by selective localized alteration of a format hologram |
US6147782A (en) | 1998-05-01 | 2000-11-14 | Siros Technologies, Inc. | Positive unit magnification reflective optics for holographic storage |
US6124076A (en) * | 1998-07-01 | 2000-09-26 | Lucent Technologies Inc. | Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom |
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US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
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JP4786858B2 (en) * | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | Multiphoton curing to provide encapsulated optics |
US6723491B2 (en) | 2000-07-05 | 2004-04-20 | Kba (Advanced Imaging Technology) (Israel) Limited | Utilizing UV to form and decompose a printing member |
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US6569600B2 (en) | 2001-03-30 | 2003-05-27 | Eastman Kodak Company | Optical recording material |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US7001708B1 (en) * | 2001-11-28 | 2006-02-21 | University Of Central Florida Research Foundation, Inc. | Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout |
JP4344177B2 (en) * | 2002-07-12 | 2009-10-14 | 大日本印刷株式会社 | Photosensitive composition for volume hologram recording, photosensitive medium for volume hologram recording, and volume hologram |
US6969578B2 (en) * | 2002-08-19 | 2005-11-29 | Eastman Kodak Company | Optical recording material |
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JP2005049608A (en) * | 2003-07-29 | 2005-02-24 | Fuji Photo Film Co Ltd | Photosensitive composition for volume hologram recording and volume hologram recording medium using the same |
US20050036179A1 (en) * | 2003-08-13 | 2005-02-17 | General Electric Company | Holographic storage medium comprising metal-containing high refractive index region, and storage article containing same |
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US7022392B2 (en) | 2003-11-04 | 2006-04-04 | Eastman Kodak Company | In-situ polymerized matrix for isomerized optical recording article |
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Also Published As
Publication number | Publication date |
---|---|
JPH11512847A (en) | 1999-11-02 |
DE69616813T2 (en) | 2002-07-18 |
EP0853774B1 (en) | 2001-11-07 |
US5759721A (en) | 1998-06-02 |
DE69616813D1 (en) | 2001-12-13 |
EP0853774A1 (en) | 1998-07-22 |
JP3604700B2 (en) | 2004-12-22 |
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