WO2001096841A2 - X-ray reflectivity apparatus and method - Google Patents
X-ray reflectivity apparatus and method Download PDFInfo
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- WO2001096841A2 WO2001096841A2 PCT/GB2001/002441 GB0102441W WO0196841A2 WO 2001096841 A2 WO2001096841 A2 WO 2001096841A2 GB 0102441 W GB0102441 W GB 0102441W WO 0196841 A2 WO0196841 A2 WO 0196841A2
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- rays
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- target surface
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
Definitions
- the present invention relates to a method and apparatus for determining a physical parameter of a sample in the vicinity of a target surface of the sample.
- the invention relates to a method and apparatus for making such a determination by measuring the intensity of X-rays reflected from said target surface.
- X-ray reflectivity is one of a range of X-ray scattering techniques often used to probe the structure of matter.
- the technique consists of monitoring the intensity of X-rays reflected from a target surface, relative to the intensity of the incident beam, as a function of the scattering transfer vector.
- the technique can be used to study a variety of physical characteristics and parameters of . a sample such as surface roughness, thin film thickness, interfacial roughness and density.
- Specular reflection of X-rays occurs when the angle of reflection of the beam from the sample surface is the same as the angle of incidence. Since the index of refraction of solid and liquid materials at X-ray wavelengths is generally slightly less than unity, there exists a critical angle of incidence below which X-rays will be totally reflected from a sample surface. The critical angle varies depending on characteristics of the sample in the vicinity of the surface such as the mass density and electron density, and in particular on the atomic number density and composition, and is typically a few tenths of a degree. This means that specular X-ray reflectivity can be used, for example, to determine the density of a material in the vicinity of the sample surface. Specular X-ray reflectivity is described at length in Chason and Mayer, Critical Reviews in Solid State and Materials Sciences, 22 ( 1 ) : l - 67 (1997 ) .
- Conventional X-ray reflectivity systems generally use a well collimated X-ray beam, a well defined X-ray wavelength and one or more precise goniometers to separately vary the angles of the incident beam and of the detection equipment with respect to the target surface of the sample.
- a combined monochromator and collimator in the incident beam may be used to satisfy the first two requirements.
- the X-rays may be generated using a pure metal anode X-ray tube, which provides strong K ⁇ and K ⁇ emission lines.
- the Kc. line is further split into the K l and K 2 lines, of which K ⁇ l is the strongest .
- the K ⁇ l line with a wavelength of 1.5406xl0 "10 m, is commonly used for X-ray reflection measurements.
- a knife-edge is positioned in close proximity to the target surface, and this effectively provides beam collimation as well as ensuring the positioning of the target surface in the beam.
- accurate alignment of the system components and accurate positioning of the sample are of the utmost importance.
- Small errors in the assumed angular zero- point which relates to the position of the goniometer in which the surface of the sample is exactly parallel to the incident beam, can result in significant errors in the subsequent data analysis, for example in the determination of sample density in the vicinity of the target surface. Such errors can easily result when samples are small or have slightly curved surfaces.
- much of the analysis software commercially available at present assumes no zero- point error, when, in reality, errors in alignment are strongly related to errors in parameters determined using the technique.
- a method of determining one or more physical parameters of a sample in the vicinity of a target surface of the sample comprising the steps of irradiating the target surface with X-rays of at least first and second wavelengths, at two or more angles of incidence; taking measurements of the intensity of the X-rays following specular reflection from the target surface at each of the at least first and second wavelengths, and for each of the two or more angles of incidence; and combining said measurements of intensity of the reflected X-rays in order to determine said one or more physical parameters.
- the one or more physical parameters may be determined independently of errors in the assumed angular zero-point.
- the intensity may be measured indirectly through a number of different physical observables such as the total X-ray power, or a photon count, and using a wide variety of means familiar to the person skilled in the art.
- the invention provides for more rapid sample alignment than methods and apparatus of the prior art, because the need for absolute angular precision is reduced. Confidence in fitted parameters such as density, film thickness and interfacial thickness is increased, as the invention allows false minima in computer fitting programs to be more easily avoided. Target surfaces that are not perfectly flat may be analysed with increased accuracy using the present invention, because determination of the zero-point angle, in which the incident X-ray beam is parallel to the sample surface, is not as critical as in the prior art .
- the step of combining the measurements includes the step of fitting the measurements to a physical or mathematical theory or model relating the reflectivity of the target surface at a given wavelength and a given angle of incidence to the one or more physical parameters.
- a physical or mathematical theory or model relating the reflectivity of the target surface at a given wavelength and a given angle of incidence to the one or more physical parameters.
- the one or more physical parameters may include refractive index, electron density and mass density.
- refractive index e.g., refractive index
- electron density e.g., electron density
- mass density e.g., electron density
- Other physical parameters, such as surface roughness, thin film thickness and interfacial roughness may similarly be determined.
- the measurements are taken when the angles of incidence and reflection are substantially equal, in other words when specular reflection occurs.
- the scattering transfer vector is substantially perpendicular to the target surface, and relatively simple models or expressions may be used to determine certain physical parameters such as refractive index or physical density.
- the target surface is simultaneously irradiated with X-rays of the at least first and second wavelengths.
- the target surface is simultaneously irradiated with X-rays of the at least first and second wavelengths.
- adjustments to the apparatus which might otherwise be required between sets of measurements at each X-ray wavelength, may be avoided. This eliminates a potential source of error and also eliminates the need to either carefully realign the apparatus for a change of X-ray wavelength or to use a special monochromator set up .
- the measurements of the intensity of the reflected X-rays at the at least first and second wavelengths are taken simultaneously for any given angle of incidence. Any adjustments that might otherwise be required to adapt the apparatus used in order to change the detected wavelength would introduce a further source of error, as ' well as complicating the construction of the apparatus used and the carrying out of the method.
- the X-rays for irradiating the target surface may be generated using a pure metal anode X-ray source, in which case the first and second wavelengths may be the K ⁇ and K ⁇ lines of the pure metal anode.
- the X-rays are generated using a metal alloy anode X-ray source comprising at least first and second component metals, X-rays of the first wavelength being emitted by the first component metal and the X-rays of the second wavelength being emitted by the second component metal .
- the K ⁇ and K ⁇ emission lines of most conventional pure metal anodes are rather close together in wavelength, and it may be difficult to obtain a very good split between their respective signals in the means used to detect the X- rays .
- a larger separation of the two or more X-ray wavelengths used will result in an improved determination of, for example, the angular zero-point of the apparatus with respect to the target surface, or of the one or more physical parameters which the method and apparatus seek to determine.
- the metal alloy anode used is a nickel-chromium alloy anode.
- a variety of other elemental compositions will be suitable, as will be apparent to the person skilled in the art, including alloys of three or more metals.
- any X-ray source capable of generating two or more wavelengths with sufficient wavelength separation may be used, such as a synchrotron or other source in combination with suitable monochromator means.
- the a'ngles of incidence and reflection of the detected X-rays are in the range from zero to ten degrees.
- the critical angle for total external reflection of X-rays is in the range from 0.1 to 0.9 degrees.
- interference fringes may extend several degrees beyond the critical angle and can be used to determine the thicknesses of sub-surface layers.
- an apparatus for use in determining one or more physical parameters of a sample in the vicinity of a target surface of the sample comprising an X-ray source adapted to generate X-rays of at least first and second wavelengths and arranged to irradiate the target surface with said X-rays ; X-ray detection means adapted to take measurements of the intensity of X-rays following specular reflection from the target surface at each of the at least first and second wavelengths; and angle adjustment means arranged to allow the angle of incidence of the X-rays onto the target surface to be varied.
- the apparatus may be arranged so that the angles of incidence, reflection and the orientation of the target surface may all be adjusted independently. It will be apparent to the person skilled in the art that useful X-ray reflectivity measurements may be taken by adjusting only one, or both of the angles of incidence and reflection.
- the X-ray detection means may comprise two or more X-ray detectors. Reflected beam monochromator means may then be used to simultaneously or sequentially direct reflected X-rays of each of the at least first and second wavelengths to respective ones of each of said two or more X-ray detectors.
- the apparatus comprises an energy or wavelength-dispersive detector, so that the intensity of the X-rays at one or more of the at least first and second wavelengths can be measured simultaneously.
- a semiconductor junction solid-state detector may be used.
- the apparatus may comprise an adjustable monochromator arranged so that X-rays of only one of said at least first and second wavelengths impinge on the X-ray detection means at any one time.
- the apparatus further comprises data processing means adapted to combine said measurements of the intensity of the reflected X-rays in order to determine said one or more physical parameters.
- the data processing means is adapted to fit the measurements to a physical or mathematical theory or model relating the reflectivity of the sample surface at a given X-ray wavelength and angle of incidence to the one or more physical parameters.
- Figure 1 shows, schematically, apparatus for making multiple wavelength X-ray reflectivity measurements, employing a monochromator in the incident beam, and according to a first embodiment of the invention
- Figure 2 shows, schematically, apparatus for making multiple wavelength X-ray reflectivity measurements, employing a knife-edge collimator and a reflected beam monochromator, and according to a second aspect of the present invention
- Figure 3 shows, schematically, apparatus for making multiple wavelength X-ray reflectivity measurements, employing an incident beam collimating slit, only a single goniometer and a solid-state detector, and according to a third embodiment of the present invention.
- X-rays are generated by a metal alloy anode X-ray source 1, for example a nickel/chromium anode source, although many other elemental combinations would be suitable.
- the nickel K ⁇ emission line is at 1.659xl0" 10 m and the chromium K ⁇ line is at 2.291xl0 ⁇ 10 m, both these values being weighted averages of the K ⁇ l and K ⁇ 2 lines.
- the X-rays may be generated by a conventional single metal anode X-ray source.
- the X-rays are passed through an adjustable monochromator 2 which also operates as a collimator.
- the monochromator is adjustable to select X-rays of a chosen one of two or more wavelengths, for example the nickel and chromium K ⁇ lines generated by the metal alloy anode source, or alternatively, K ⁇ l and K ⁇ lines generated by a single metal anode.
- the X-ray beam emerging from the monochromator 2 is incident on the target surface 3 of the sample 4, defining an angle of incidence.
- the sample 4 is mounted on a first goniometer so that the target surface 3 is perpendicular to the plane of the goniometer, is precisely aligned with the rotational axis of the goniometer, and so that the angle of incidence of the collimated X-ray beam on the target surface may be adjusted with good precision.
- a slit 6 and X-ray detector 7 are mounted on a second goniometer 8 that is concentric with the first goniometer, in such a way that X-rays reflected from the target surface 3 may pass through the slit and onto the detector 7.
- the angle of reflection of the X-rays passing through the slit 6 may be adjusted by rotating the second goniometer 8 relative to the first goniometer 5.
- the apparatus shown in Figure 1 may be used to carry out a method according to the invention in the following way.
- the first and second goniometers 5 and 8 are adjusted to define an angular zero-point at which an X-ray beam emerging from the monochromator 2 grazes the target surface 3 at a zero angle of incidence and enters the slit 6 with a zero angle of reflection.
- the monochromator 2 is then adjusted to select X-rays of only a first wavelength, for example the nickel K ⁇ line if the X-ray source is a nickel/chromium metal alloy anode source, or the K ⁇ l line at 1.5406xl0" 10 m wavelength if the X-ray source 1 is a conventional copper anode source.
- Measurements of X-ray intensity incident on the detector 7 following specular reflection at the target surface are then made for a number of angles of incidence, by adjusting the first and second goniometers 5 and 8 between each measurement .
- the monochromator 2 is then adjusted to select X- rays of only a second wavelength, for example the chromium K ⁇ line if the X-ray source is a nickel/chromium metal alloy anode source, or the K ⁇ line at 1.3922xl0 "10 m wavelength if the X-ray source 1 is a conventional copper anode source.
- the angular zero-point may be re-determined at this point, before proceeding to measure again the intensity of X-rays incident on the detector at a number of angles of incidence and corresponding angles of reflection.
- An appropriately programmed computer is then used to simultaneously fit the data sets taken at the first and second X-ray wavelengths to a single physical model to yield a determination of one or . more physical parameters, such as electron density or mass density.
- more physical parameters such as electron density or mass density.
- the resetting of the monochromator 2 will change the exact path of the incident beam, and the system will need careful re- alignment for measurements at the second X-ray wavelength. Separate assumed errors in the zero- points determined for the two sets of measurements would need to be used during data analysis.
- the sample may be held in a fixed position while the source 1 and adjustable monochromator 2 are mounted on the first goniometer 5. Additional slits may be used, for beam collimation, and the monochromator may alternatively be positioned between the target surface 3 and the detector 1 , in which case a single zero point error could be assumed for both sets of measurements.
- Figure 2 there is shown an apparatus according to a second preferred embodiment of the invention. X-rays are again generated by a nickel/chromium metal alloy anode X-ray source 11. These X-rays, however, are neither well collimated or passed through a monochromator before being incident on the target surface 13 of sample 14.
- the sample 14 is mounted on a first goniometer 15 so that the target surface 13 is perpendicular to the plane of the goniometer, is precisely aligned with the rotational axis of the goniometer, and so that the angle of incidence of the X-ray beam onto the target surface may be precisely adjusted.
- Collimation of the beam is provided by a knife-edge collimator 12, which comprises a fine edge positioned very close to the sample surface 13, and close to the rotational axis of the first goniometer 15.
- a slit 16, reflected beam monochromator 19 and X-ray detector 17 are mounted on a second goniometer 18, concentric with the first goniometer 15, in such a way that X-rays reflected from the target surface 13 may pass through the slit, and be directed onto X-ray detector 17 by the monochromator 19.
- the reflected beam monochromator 19 selects X-rays of a particular but adjustable wavelength, and directs the selected X-rays onto X-ray detector 17.
- the angle of reflection of the X-rays from the target surface that pass through the slit 16 may be adjusted by rotating the second goniometer 18.
- the apparatus shown in Figure 2 may be used to perform the method of the invention in a similar way to that described above in relation to the apparatus shown in Figure 1.
- a single zero-point error may be assumed when the two or more data sets at different X-ray wavelengths are analysed by simultaneous fitting to a physical or mathematical theory or model.
- a single assumed zero-point error there remains a likelihood of small variations in the actual zero-point error between scans, for example due to temperature variation or mechanical interference with the system.
- the X-ray source may be mounted on the first goniometer 15 instead of the sample 14 and knife-edge collimator 12. Additional slits may be mounted in the incident beam to reduce the amount of scattered radiation.
- the arrangement shown in Figure 2 may be adapted by providing a reflected beam monochromator that simultaneously selects X-rays of each of two or more wavelengths and directs the X-rays of each selected wavelength to a separate X-ray detector. If such an arrangement is used then the intensity of each selected wavelength can be simultaneously measured, so that only a single scan over the desired range of angles of incidence and reflection is required. The same result could be achieved by using a motorised monochromator to select each wavelength in turn for each angle of incidence and reflection. Because only a single scan is performed only a single assumed zero- point error is required during analysis of the intensity measurements .
- the arrangement shown in Figure 2 may also be adapted by replacing the reflected beam monochromator 19 and conventional X-ray detector 17 with a wavelength-dispersive detector such as a semiconductor junction solid-state detector. Electronics connected to the detector may then be used to record scans over a range of angles of incidence and reflection, simultaneously at the two or more desired X-ray wavelengths .
- a wavelength-dispersive detector such as a semiconductor junction solid-state detector. Electronics connected to the detector may then be used to record scans over a range of angles of incidence and reflection, simultaneously at the two or more desired X-ray wavelengths .
- FIG. 3 there is shown an apparatus according to a third preferred embodiment of the invention.
- the X-rays generated by the nickel/chromium metal alloy anode X-ray source 21 are collimated by a slit 22 before being incident on the target surface 23 of sample 24.
- the X-ray source 21 and slit 22 are mounted on a single goniometer 25 in such a way that the X-ray beam emerging from the slit is directed towards the rotational axis of the goniometer 25.
- the sample is fixed in position, rather than being mounted on the goniometer, in such a way so that the target surface 23 is perpendicular to the plane of the goniometer, and is precisely aligned to pass through the axis of rotation of the goniometer.
- the angle of incidence of the X-rays onto the target surface 23 is adjusted by moving the source 21 and slit 22 using the goniometer 25.
- a solid state energy or wavelength dispersive detector 27 is provided in a fixed position relative to the sample 24, with the active surface of the detector located so that X-rays reflected from the . sample with an angle of reflection of between zero and the required upper limit are incident on the active surface.
- the distance of the active surface from the target surface 23 may be changed to ensure that the solid-state detector is large enough to always intercept the X-ray beam for desired angles of reflection.
- a knife-edge 26 is provided to prevent the X-ray beam from impinging directly on the detector 27 without first reflecting from the sample surface, when the angle of incidence is very small.
- Two or more single channel analysers are connected to the detector 27 to discriminate between the two or more X- ray wavelengths the intensities which are to be measured, although a motorised monochromator together with a more standard detector could be used.
- the apparatus of Figure 3 may be used to perform the method of the invention by making measurements of the intensities of the reflected X-ray beam at two or more wavelengths over a range of angles of incidence and reflection, by adjusting the goniometer 25. No precise determination of the zero-point is required, as the zero-point angle can be determined during the data processing stage, although approximate alignment is clearly desirable.
- the use of a single goniometer also simplifies operation of the apparatus considerably.
- a metal alloy anode X-ray source means that two or more emission lines may be used with a better separation than could be achieved with a single metal anode source.
- the nickel and chromium K ⁇ lines discussed above are easy to differentiate in electronics used to process the signals from the solid-state detector.
- a metal alloy anode X-ray source may advantageously be used in place of the other described sources in any of the X-ray reflection apparatus described, or indeed any apparatus embodying the invention.
- a variation of the apparatus shown in Figure 3 that may often be more convenient to arrange is to mount only the sample 23,24, or the sample and the detector 27, on the goniometer, keeping the X-ray source 21 fixed.
- the operation of the goniometers may be automated and controlled by a computer, as may be the operation of the X-ray source and the determination of the angular zero-points.
- the signals from the X-ray detector or detectors used will typically require some electronic post processing, which may be rather complex for solid state energy or wavelength dispersive detectors. Data from the detectors, and also from the goniometers, X-ray source, monochromators and so on will be typically fed to a computer for storage and further processing.
- the data analysis may be performed by computer apparatus directly connected to or apart from the system, using standard software or software written or adapted for the purpose .
- the data may be analysed by performing a least-square type fit using the multiple wavelength data, in order to reduce or eliminate alignment errors, to identify or eliminate false minima or- maxima in parameter space, and to increase confidence in the results.
- reflectivity models such as those given in Crabb et al, Computer Physics Communications 77 (1993) 441-449 may be used, with suitable modifications to allow fitting of the zero point angle using data sets obtained at two or more wavelengths .
- the recursion formula of Parratt may be used in the reflectivity model to allow for a number of homogenous layers with plane-parallel interfaces.
- ⁇ is the angle of incidence and reflection of the X-rays
- ⁇ is essentially a function of the electron density of the sample and ⁇ describes absorption in the material of the sample.
- Coefficients ⁇ and ⁇ are components of the index of refraction n of matter at X-ray wavelengths, which may be expressed as :
- n 1 - ⁇ - i ⁇
- ⁇ is the X-ray wavelength
- m and e are the mass and charge of an electron
- c is the speed of light
- Ni is the atomic number density of atoms of species i
- Z L is the corresponding atomic number
- f and f " are the real and imaginary components of the anomalous dispersion correction to the atomic scattering factor.
- coefficients ⁇ and ⁇ essentially become functions of the X-ray wavelength ⁇ and the sample density p.
- the X-ray reflection coefficient R may then be written as a function of incident angle, X-ray wavelength and sample density, R( ⁇ , ⁇ ,p) . If the incident angle includes a measured component ⁇ and an unknown zero point error angle ⁇ , and measurements of R are made at two or more wavelengths, then the expression for R( ⁇ + ⁇ , ⁇ ,p) can be fitted to the data to yield values for ⁇ and p.
- ⁇ c is measured, with an unknown zero point error angle of ⁇ , then the measured value of ⁇ c can be expressed as a function of the X-ray wavelength ⁇ , the electron or mass density p based on
- measurements of ⁇ c at two or more wavelengths ⁇ may also be fitted to the data to yield values for density and zero point error angle.
- the more limited amount of data resulting from a measurement of the critical angle is likely to provide a less accurate determination of the desired physical parameters and zero point angle error than a method of analysis based on reflectivity data points at a range of angles of incidence greater than the critical angle.
- Reflectivity data may be fitted to the model using, for example, least squares techniques.
Abstract
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002412634A CA2412634A1 (en) | 2000-06-14 | 2001-06-01 | X-ray reflectivity apparatus and method |
EP01934187A EP1311835A2 (en) | 2000-06-14 | 2001-06-01 | X-ray reflectivity apparatus and method |
JP2002510921A JP2004503771A (en) | 2000-06-14 | 2001-06-01 | X-ray reflectivity apparatus and method |
NO20025951A NO20025951L (en) | 2000-06-14 | 2002-12-11 | X-ray reflectivity apparatus and method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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GB0014587A GB0014587D0 (en) | 2000-06-14 | 2000-06-14 | X-ray reflectivity apparatus and method |
GB0014587.0 | 2000-06-14 |
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WO2001096841A2 true WO2001096841A2 (en) | 2001-12-20 |
WO2001096841A3 WO2001096841A3 (en) | 2002-05-10 |
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PCT/GB2001/002441 WO2001096841A2 (en) | 2000-06-14 | 2001-06-01 | X-ray reflectivity apparatus and method |
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EP (1) | EP1311835A2 (en) |
JP (1) | JP2004503771A (en) |
CA (1) | CA2412634A1 (en) |
GB (1) | GB0014587D0 (en) |
NO (1) | NO20025951L (en) |
WO (1) | WO2001096841A2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1357377A2 (en) * | 2002-04-22 | 2003-10-29 | Bruker AXS, Inc. | X-ray difraction screening system with retractable x-ray shield |
FR2866709A1 (en) * | 2004-02-19 | 2005-08-26 | Production Et De Rech S Appliq | Specimen characteristics e.g. roughness, measuring device, has interception unit to intercept X-rays of beam height greater than selected value, in order to limit extension of measuring zone along direction of propagation of incident X-rays |
CN1598554B (en) * | 2003-09-17 | 2011-08-10 | 株式会社理学 | X-ray analysis apparatus |
US10151713B2 (en) | 2015-05-21 | 2018-12-11 | Industrial Technology Research Institute | X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof |
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2000
- 2000-06-14 GB GB0014587A patent/GB0014587D0/en not_active Ceased
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2001
- 2001-06-01 CA CA002412634A patent/CA2412634A1/en not_active Abandoned
- 2001-06-01 EP EP01934187A patent/EP1311835A2/en not_active Withdrawn
- 2001-06-01 JP JP2002510921A patent/JP2004503771A/en active Pending
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Publication number | Priority date | Publication date | Assignee | Title |
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EP1357377A2 (en) * | 2002-04-22 | 2003-10-29 | Bruker AXS, Inc. | X-ray difraction screening system with retractable x-ray shield |
EP1357377A3 (en) * | 2002-04-22 | 2004-01-21 | Bruker AXS, Inc. | X-ray difraction screening system with retractable x-ray shield |
CN1598554B (en) * | 2003-09-17 | 2011-08-10 | 株式会社理学 | X-ray analysis apparatus |
FR2866709A1 (en) * | 2004-02-19 | 2005-08-26 | Production Et De Rech S Appliq | Specimen characteristics e.g. roughness, measuring device, has interception unit to intercept X-rays of beam height greater than selected value, in order to limit extension of measuring zone along direction of propagation of incident X-rays |
US10151713B2 (en) | 2015-05-21 | 2018-12-11 | Industrial Technology Research Institute | X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof |
Also Published As
Publication number | Publication date |
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CA2412634A1 (en) | 2001-12-20 |
NO20025951D0 (en) | 2002-12-11 |
NO20025951L (en) | 2003-01-16 |
JP2004503771A (en) | 2004-02-05 |
GB0014587D0 (en) | 2000-08-09 |
EP1311835A2 (en) | 2003-05-21 |
WO2001096841A3 (en) | 2002-05-10 |
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