WO2001096841A3 - X-ray reflectivity apparatus and method - Google Patents

X-ray reflectivity apparatus and method Download PDF

Info

Publication number
WO2001096841A3
WO2001096841A3 PCT/GB2001/002441 GB0102441W WO0196841A3 WO 2001096841 A3 WO2001096841 A3 WO 2001096841A3 GB 0102441 W GB0102441 W GB 0102441W WO 0196841 A3 WO0196841 A3 WO 0196841A3
Authority
WO
WIPO (PCT)
Prior art keywords
rays
target surface
different wavelengths
ray reflectivity
incidence
Prior art date
Application number
PCT/GB2001/002441
Other languages
French (fr)
Other versions
WO2001096841A2 (en
Inventor
Peter Neil Gibson
Original Assignee
European Community
Peter Neil Gibson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by European Community, Peter Neil Gibson filed Critical European Community
Priority to CA002412634A priority Critical patent/CA2412634A1/en
Priority to JP2002510921A priority patent/JP2004503771A/en
Priority to EP01934187A priority patent/EP1311835A2/en
Publication of WO2001096841A2 publication Critical patent/WO2001096841A2/en
Publication of WO2001096841A3 publication Critical patent/WO2001096841A3/en
Priority to NO20025951A priority patent/NO20025951L/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials

Abstract

A method and corresponding apparatus for determining one or more physical parameters, such as electron density, of a target surface of a sample are disclosed. The target surface is irradiated with X-rays of at least two different wavelengths over a range of angles of incidence, and the physical parameter is determined by combining measurements of the intensity of these X-rays following specular reflection. The X-rays at two different wavelengths may be simultaneously generated using a metal alloy anode.
PCT/GB2001/002441 2000-06-14 2001-06-01 X-ray reflectivity apparatus and method WO2001096841A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CA002412634A CA2412634A1 (en) 2000-06-14 2001-06-01 X-ray reflectivity apparatus and method
JP2002510921A JP2004503771A (en) 2000-06-14 2001-06-01 X-ray reflectivity apparatus and method
EP01934187A EP1311835A2 (en) 2000-06-14 2001-06-01 X-ray reflectivity apparatus and method
NO20025951A NO20025951L (en) 2000-06-14 2002-12-11 X-ray reflectivity apparatus and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0014587A GB0014587D0 (en) 2000-06-14 2000-06-14 X-ray reflectivity apparatus and method
GB0014587.0 2000-06-14

Publications (2)

Publication Number Publication Date
WO2001096841A2 WO2001096841A2 (en) 2001-12-20
WO2001096841A3 true WO2001096841A3 (en) 2002-05-10

Family

ID=9893678

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2001/002441 WO2001096841A2 (en) 2000-06-14 2001-06-01 X-ray reflectivity apparatus and method

Country Status (6)

Country Link
EP (1) EP1311835A2 (en)
JP (1) JP2004503771A (en)
CA (1) CA2412634A1 (en)
GB (1) GB0014587D0 (en)
NO (1) NO20025951L (en)
WO (1) WO2001096841A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6718008B1 (en) * 2002-04-22 2004-04-06 Bruker Axs, Inc. X-ray diffraction screening system with retractable x-ray shield
JP3731207B2 (en) * 2003-09-17 2006-01-05 株式会社リガク X-ray analyzer
FR2866709A1 (en) * 2004-02-19 2005-08-26 Production Et De Rech S Appliq Specimen characteristics e.g. roughness, measuring device, has interception unit to intercept X-rays of beam height greater than selected value, in order to limit extension of measuring zone along direction of propagation of incident X-rays
US10151713B2 (en) 2015-05-21 2018-12-11 Industrial Technology Research Institute X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4352017A (en) * 1980-09-22 1982-09-28 Rca Corporation Apparatus for determining the quality of a semiconductor surface
US4821301A (en) * 1986-02-28 1989-04-11 Duke University X-ray reflection method and apparatus for chemical analysis of thin surface layers
JPH0394104A (en) * 1989-09-06 1991-04-18 Toshiba Corp Film thickness measuring method and film thickness measuring device and film forming device using it
DE4137673A1 (en) * 1991-11-15 1993-05-19 Siemens Ag Grazing X=ray reflectometer for rapid diffraction investigations - enabling surface property and thin film thickness determination
US5619548A (en) * 1995-08-11 1997-04-08 Oryx Instruments And Materials Corp. X-ray thickness gauge
WO1998048263A1 (en) * 1997-04-24 1998-10-29 Alexandr Mikhailovich Baranov Method for monitoring the parameters of film coatings and surfaces during their modification process and device for realising the same
WO1999056116A1 (en) * 1998-04-29 1999-11-04 Alexandr Mikhailovich Baranov Method for controlling the parameters of thin-film coatings and surfaces in real time and device for realising the same
WO2001009566A1 (en) * 1999-08-02 2001-02-08 Therma-Wave, Inc. X-ray reflectometry measurements on patterned wafers

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4352017A (en) * 1980-09-22 1982-09-28 Rca Corporation Apparatus for determining the quality of a semiconductor surface
US4821301A (en) * 1986-02-28 1989-04-11 Duke University X-ray reflection method and apparatus for chemical analysis of thin surface layers
JPH0394104A (en) * 1989-09-06 1991-04-18 Toshiba Corp Film thickness measuring method and film thickness measuring device and film forming device using it
DE4137673A1 (en) * 1991-11-15 1993-05-19 Siemens Ag Grazing X=ray reflectometer for rapid diffraction investigations - enabling surface property and thin film thickness determination
US5619548A (en) * 1995-08-11 1997-04-08 Oryx Instruments And Materials Corp. X-ray thickness gauge
WO1998048263A1 (en) * 1997-04-24 1998-10-29 Alexandr Mikhailovich Baranov Method for monitoring the parameters of film coatings and surfaces during their modification process and device for realising the same
WO1999056116A1 (en) * 1998-04-29 1999-11-04 Alexandr Mikhailovich Baranov Method for controlling the parameters of thin-film coatings and surfaces in real time and device for realising the same
WO2001009566A1 (en) * 1999-08-02 2001-02-08 Therma-Wave, Inc. X-ray reflectometry measurements on patterned wafers

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
"NONDESTRUCTIVE CHARACTERIZATION OF ULTRATHIN CARBON FILMS", IBM TECHNICAL DISCLOSURE BULLETIN, IBM CORP. NEW YORK, US, VOL. 32, NR. 11, PAGE(S) 468-471, ISSN: 0018-8689, XP000097775 *
PATENT ABSTRACTS OF JAPAN vol. 015, no. 274 (P - 1226) 11 July 1991 (1991-07-11) *
PLOTZ W M ET AL: "CHARACTERIZATION OF THIN FILMS AND MULTILAYERS BY SPECULAR X-RAY REFLECTIVITY", JOURNAL DE PHYSIQUE III, EDITIONS DE PHYSIQUE, PARIS, FR, VOL. 4, NR. 9, PAGE(S) 1503-1511, ISSN: 1155-4320, XP000468483 *
SAMMAR A ET AL: "Profile determination of a stratified medium from reflectivity measurements: a regularized inverse problem", JOURNAL OF MODERN OPTICS, JAN. 1996, TAYLOR & FRANCIS, UK, VOL. 43, NR. 1, PAGE(S) 67 - 79, ISSN: 0950-0340, XP002191408 *

Also Published As

Publication number Publication date
JP2004503771A (en) 2004-02-05
EP1311835A2 (en) 2003-05-21
WO2001096841A2 (en) 2001-12-20
NO20025951L (en) 2003-01-16
CA2412634A1 (en) 2001-12-20
GB0014587D0 (en) 2000-08-09
NO20025951D0 (en) 2002-12-11

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