WO2002061367A1 - Method and device for detecting position, method and device for exposure, and program and information recording medium - Google Patents

Method and device for detecting position, method and device for exposure, and program and information recording medium Download PDF

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Publication number
WO2002061367A1
WO2002061367A1 PCT/JP2002/000783 JP0200783W WO02061367A1 WO 2002061367 A1 WO2002061367 A1 WO 2002061367A1 JP 0200783 W JP0200783 W JP 0200783W WO 02061367 A1 WO02061367 A1 WO 02061367A1
Authority
WO
WIPO (PCT)
Prior art keywords
equidistant points
providing
exposure
program
recording medium
Prior art date
Application number
PCT/JP2002/000783
Other languages
French (fr)
Japanese (ja)
Inventor
Tarou Sugihara
Kouji Yoshida
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2002561891A priority Critical patent/JPWO2002061367A1/en
Publication of WO2002061367A1 publication Critical patent/WO2002061367A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder

Abstract

A position detecting method, comprising the steps of, based on the imaged results of two linear profiles of a notch, as a cutout formed in an object, non-parallel with each other, providing a first set formed of a plurality of equidistant points positioned at a specified distance from one linear profile and a second set formed of a plurality of equidistant points positioned at a specified distance from the other linear profile (step 121), providing a regression curve on the equidistant points grouped in the first set and a regression curve on the equidistant points grouped in the second set (step 122), and providing the intersection of the lines as position information according to a notch forming position (step 123), whereby the position information according to the notch forming position can be provided rapidly and accurately while reducing the noise by the imaged results and the effects of quantization error in the processing of the imaged results.
PCT/JP2002/000783 2001-01-31 2002-01-31 Method and device for detecting position, method and device for exposure, and program and information recording medium WO2002061367A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002561891A JPWO2002061367A1 (en) 2001-01-31 2002-01-31 Position detecting method and apparatus, exposure method and apparatus, program and information recording medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001022814 2001-01-31
JP2001-22814 2001-01-31

Publications (1)

Publication Number Publication Date
WO2002061367A1 true WO2002061367A1 (en) 2002-08-08

Family

ID=18888168

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/000783 WO2002061367A1 (en) 2001-01-31 2002-01-31 Method and device for detecting position, method and device for exposure, and program and information recording medium

Country Status (2)

Country Link
JP (1) JPWO2002061367A1 (en)
WO (1) WO2002061367A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011117914A (en) * 2009-12-07 2011-06-16 Cognex Corp Object control system, object control method, program, and rotation center position specification device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142853A (en) * 1989-10-28 1991-06-18 Hitachi Ltd Apparatus and method for aligning wafer
JPH06333037A (en) * 1993-05-25 1994-12-02 Roland D G Kk Contour forming method
US5381004A (en) * 1993-08-31 1995-01-10 Applied Materials, Inc. Particle analysis of notched wafers
JPH09186061A (en) * 1995-12-28 1997-07-15 Nikon Corp Positioning method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142853A (en) * 1989-10-28 1991-06-18 Hitachi Ltd Apparatus and method for aligning wafer
JPH06333037A (en) * 1993-05-25 1994-12-02 Roland D G Kk Contour forming method
US5381004A (en) * 1993-08-31 1995-01-10 Applied Materials, Inc. Particle analysis of notched wafers
JPH09186061A (en) * 1995-12-28 1997-07-15 Nikon Corp Positioning method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011117914A (en) * 2009-12-07 2011-06-16 Cognex Corp Object control system, object control method, program, and rotation center position specification device

Also Published As

Publication number Publication date
JPWO2002061367A1 (en) 2004-06-03

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