WO2002075794A3 - A method for making a micromechanical device by using a sacrificial substrate - Google Patents

A method for making a micromechanical device by using a sacrificial substrate Download PDF

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Publication number
WO2002075794A3
WO2002075794A3 PCT/US2002/007761 US0207761W WO02075794A3 WO 2002075794 A3 WO2002075794 A3 WO 2002075794A3 US 0207761 W US0207761 W US 0207761W WO 02075794 A3 WO02075794 A3 WO 02075794A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
micromechanical
micromechanical structures
caps
forming
Prior art date
Application number
PCT/US2002/007761
Other languages
French (fr)
Other versions
WO2002075794A2 (en
Inventor
Satyadev R Patel
Andrew G Huibers
Original Assignee
Reflectivity Inc
Satyadev R Patel
Andrew G Huibers
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Reflectivity Inc, Satyadev R Patel, Andrew G Huibers filed Critical Reflectivity Inc
Publication of WO2002075794A2 publication Critical patent/WO2002075794A2/en
Publication of WO2002075794A3 publication Critical patent/WO2002075794A3/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00214—Processes for the simultaneaous manufacturing of a network or an array of similar microstructural devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032—Packages or encapsulation
    • B81B7/0077—Other packages not provided for in groups B81B7/0035 - B81B7/0074
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261—Processes for packaging MEMS devices
    • B81C1/00333—Aspects relating to packaging of MEMS devices, not covered by groups B81C1/00269 - B81C1/00325
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00865—Multistep processes for the separation of wafers into individual elements
    • B81C1/00896—Temporary protection during separation into individual elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00865—Multistep processes for the separation of wafers into individual elements
    • B81C1/00904—Multistep processes for the separation of wafers into individual elements not provided for in groups B81C1/00873 - B81C1/00896
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
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    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
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Abstract

A method is disclosed for forming a micromechanical device. The method includes fully or partially forming one or more micromechanical structures multiple times on first substrate (5a). A second substrate is bonded onto the first substrate so a to cover the multiple areas each having one or more micromechanical structures, so as to form a substrate assembly. The substrate assembly is then separated into individual dies, each die having the one or more micromechanical structures held on a portion (21) of the first substrate, with a portion of the second substrate bonded to the first substrate portion. Finally, the second substrate portion is removed from each die (3a-3d) to expose the one or more micromechanical structures on the first substrate portion. The invention is also directed to a method for forming a micromechanical device, including: forming one or more micromechanical structures in one or more areas on a first substrate; bonding caps onto the first substrate so as to cover the one or more areas each having one or more micromechanical structures, so as to form a substrate (10) assembly; after a period of time, removing the caps to expose the one or more micromechanical structures. During the period of time between bonding the caps and later removing the caps, the substrate assembly can be singulated, inspected, irradiated, annealed, die attached, shipped and/or stored.
PCT/US2002/007761 2001-03-15 2002-03-15 A method for making a micromechanical device by using a sacrificial substrate WO2002075794A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US27622201P 2001-03-15 2001-03-15
US60/276,222 2001-03-15
US10/005,308 US6969635B2 (en) 2000-12-07 2001-12-03 Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
US10/005,308 2001-12-03

Publications (2)

Publication Number Publication Date
WO2002075794A2 WO2002075794A2 (en) 2002-09-26
WO2002075794A3 true WO2002075794A3 (en) 2002-11-14

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WO (1) WO2002075794A2 (en)

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US6849471B2 (en) 2003-03-28 2005-02-01 Reflectivity, Inc. Barrier layers for microelectromechanical systems
US6969635B2 (en) * 2000-12-07 2005-11-29 Reflectivity, Inc. Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
US6529310B1 (en) * 1998-09-24 2003-03-04 Reflectivity, Inc. Deflectable spatial light modulator having superimposed hinge and deflectable element
US6942811B2 (en) * 1999-10-26 2005-09-13 Reflectivity, Inc Method for achieving improved selectivity in an etching process
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US6969635B2 (en) 2005-11-29
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US20050214976A1 (en) 2005-09-29
US20050139940A1 (en) 2005-06-30
US20050179982A1 (en) 2005-08-18
US20050180686A1 (en) 2005-08-18
US7573111B2 (en) 2009-08-11
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US20050181532A1 (en) 2005-08-18
US7449358B2 (en) 2008-11-11
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US20030054588A1 (en) 2003-03-20
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US20050173711A1 (en) 2005-08-11
US20050260792A1 (en) 2005-11-24
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US20050170557A1 (en) 2005-08-04
US7286278B2 (en) 2007-10-23
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US20050170547A1 (en) 2005-08-04
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US20050170540A1 (en) 2005-08-04
US20020132389A1 (en) 2002-09-19

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