WO2004013693A3 - Scatterometry alignment for imprint lithography - Google Patents
Scatterometry alignment for imprint lithography Download PDFInfo
- Publication number
- WO2004013693A3 WO2004013693A3 PCT/US2003/023948 US0323948W WO2004013693A3 WO 2004013693 A3 WO2004013693 A3 WO 2004013693A3 US 0323948 W US0323948 W US 0323948W WO 2004013693 A3 WO2004013693 A3 WO 2004013693A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- imprint lithography
- scatterometry
- alignment
- liquid
- template
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03767009A EP1573395A4 (en) | 2002-08-01 | 2003-07-31 | Scatterometry alignment for imprint lithography |
JP2004526254A JP2006516065A (en) | 2002-08-01 | 2003-07-31 | Scatter measurement alignment for imprint lithography |
AU2003261317A AU2003261317A1 (en) | 2002-08-01 | 2003-07-31 | Scatterometry alignment for imprint lithography |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/210,785 | 2002-08-01 | ||
US10/210,780 | 2002-08-01 | ||
US10/210,780 US6916584B2 (en) | 2002-08-01 | 2002-08-01 | Alignment methods for imprint lithography |
US10/210,894 US7070405B2 (en) | 2002-08-01 | 2002-08-01 | Alignment systems for imprint lithography |
US10/210,894 | 2002-08-01 | ||
US10/210,785 US7027156B2 (en) | 2002-08-01 | 2002-08-01 | Scatterometry alignment for imprint lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004013693A2 WO2004013693A2 (en) | 2004-02-12 |
WO2004013693A3 true WO2004013693A3 (en) | 2006-01-19 |
Family
ID=31499238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/023948 WO2004013693A2 (en) | 2002-08-01 | 2003-07-31 | Scatterometry alignment for imprint lithography |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1573395A4 (en) |
JP (2) | JP2006516065A (en) |
KR (1) | KR20050026088A (en) |
AU (1) | AU2003261317A1 (en) |
TW (1) | TWI266970B (en) |
WO (1) | WO2004013693A2 (en) |
Families Citing this family (85)
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US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US7442336B2 (en) * | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
DE10311855B4 (en) | 2003-03-17 | 2005-04-28 | Infineon Technologies Ag | Arrangement for transferring information / structures to wafers using a stamp |
US7090716B2 (en) * | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7261830B2 (en) | 2003-10-16 | 2007-08-28 | Molecular Imprints, Inc. | Applying imprinting material to substrates employing electromagnetic fields |
KR100585951B1 (en) * | 2004-02-18 | 2006-06-01 | 한국기계연구원 | A construction/separation type individually actuating imprinting apparatus |
JP2006013400A (en) * | 2004-06-29 | 2006-01-12 | Canon Inc | Method and apparatus for detecting relative positional deviation between two objects |
US20060062922A1 (en) | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
US7630067B2 (en) * | 2004-11-30 | 2009-12-08 | Molecular Imprints, Inc. | Interferometric analysis method for the manufacture of nano-scale devices |
US7292326B2 (en) * | 2004-11-30 | 2007-11-06 | Molecular Imprints, Inc. | Interferometric analysis for the manufacture of nano-scale devices |
WO2006060758A2 (en) * | 2004-12-01 | 2006-06-08 | Molecular Imprints, Inc. | Methods of exposure for the purpose of thermal management for imprint lithography processes |
JP4500183B2 (en) * | 2005-02-25 | 2010-07-14 | 東芝機械株式会社 | Transfer device |
KR100729427B1 (en) | 2005-03-07 | 2007-06-15 | 주식회사 디엠에스 | Apparatus for making etching area on substrate |
JP4641835B2 (en) * | 2005-03-16 | 2011-03-02 | リコー光学株式会社 | Method of manufacturing phase shifter optical element and element obtained |
CN101479661B (en) * | 2005-03-23 | 2012-06-06 | 艾格瑞系统有限公司 | A method for manufacturing a device using imprint lithography and direct write technology |
US7708924B2 (en) | 2005-07-21 | 2010-05-04 | Asml Netherlands B.V. | Imprint lithography |
US7692771B2 (en) | 2005-05-27 | 2010-04-06 | Asml Netherlands B.V. | Imprint lithography |
US20060267231A1 (en) | 2005-05-27 | 2006-11-30 | Asml Netherlands B.V. | Imprint lithography |
KR20060127811A (en) * | 2005-06-07 | 2006-12-13 | 오브듀캇 아베 | Separation apparatus and method |
TWI432904B (en) * | 2006-01-25 | 2014-04-01 | Dow Corning | Epoxy formulations for use in lithography techniques |
JP2007258669A (en) * | 2006-02-23 | 2007-10-04 | Matsushita Electric Works Ltd | Imprint lithography method and imprint lithography apparatus |
US8850980B2 (en) * | 2006-04-03 | 2014-10-07 | Canon Nanotechnologies, Inc. | Tessellated patterns in imprint lithography |
JP4536148B2 (en) * | 2006-04-03 | 2010-09-01 | モレキュラー・インプリンツ・インコーポレーテッド | Lithography imprint system |
JP4795300B2 (en) * | 2006-04-18 | 2011-10-19 | キヤノン株式会社 | Alignment method, imprint method, alignment apparatus, imprint apparatus, and position measurement method |
JP4958614B2 (en) * | 2006-04-18 | 2012-06-20 | キヤノン株式会社 | Pattern transfer apparatus, imprint apparatus, pattern transfer method, and alignment apparatus |
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US7832416B2 (en) | 2006-10-10 | 2010-11-16 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and methods |
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US8142702B2 (en) * | 2007-06-18 | 2012-03-27 | Molecular Imprints, Inc. | Solvent-assisted layer formation for imprint lithography |
US7837907B2 (en) * | 2007-07-20 | 2010-11-23 | Molecular Imprints, Inc. | Alignment system and method for a substrate in a nano-imprint process |
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JP5446434B2 (en) * | 2009-04-30 | 2014-03-19 | Jsr株式会社 | Curable composition for nanoimprint lithography and nanoimprint method |
EP2461350B1 (en) * | 2009-07-29 | 2018-02-28 | Nissan Chemical Industries, Ltd. | Use of a composition for forming resist underlayer film for nanoimprint lithography |
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US8691124B2 (en) | 2009-11-24 | 2014-04-08 | Asml Netherlands B.V. | Alignment and imprint lithography |
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KR102213854B1 (en) * | 2019-07-24 | 2021-02-10 | 한국기계연구원 | Imprinting head and imprinting apparatus comprising the same |
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Citations (4)
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US5148036A (en) * | 1989-07-18 | 1992-09-15 | Canon Kabushiki Kaisha | Multi-axis wafer position detecting system using a mark having optical power |
US5151754A (en) * | 1989-10-06 | 1992-09-29 | Kabushiki Kaisha Toshiba | Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects |
US6383888B1 (en) * | 2001-04-18 | 2002-05-07 | Advanced Micro Devices, Inc. | Method and apparatus for selecting wafer alignment marks based on film thickness variation |
US6636311B1 (en) * | 1998-12-01 | 2003-10-21 | Canon Kabushiki Kaisha | Alignment method and exposure apparatus using the same |
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2003
- 2003-07-31 KR KR1020057001792A patent/KR20050026088A/en not_active Application Discontinuation
- 2003-07-31 TW TW092120993A patent/TWI266970B/en not_active IP Right Cessation
- 2003-07-31 AU AU2003261317A patent/AU2003261317A1/en not_active Abandoned
- 2003-07-31 JP JP2004526254A patent/JP2006516065A/en active Pending
- 2003-07-31 EP EP03767009A patent/EP1573395A4/en not_active Withdrawn
- 2003-07-31 WO PCT/US2003/023948 patent/WO2004013693A2/en active Search and Examination
-
2010
- 2010-11-05 JP JP2010248314A patent/JP5421221B2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5148036A (en) * | 1989-07-18 | 1992-09-15 | Canon Kabushiki Kaisha | Multi-axis wafer position detecting system using a mark having optical power |
US5151754A (en) * | 1989-10-06 | 1992-09-29 | Kabushiki Kaisha Toshiba | Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects |
US6636311B1 (en) * | 1998-12-01 | 2003-10-21 | Canon Kabushiki Kaisha | Alignment method and exposure apparatus using the same |
US6383888B1 (en) * | 2001-04-18 | 2002-05-07 | Advanced Micro Devices, Inc. | Method and apparatus for selecting wafer alignment marks based on film thickness variation |
Non-Patent Citations (1)
Title |
---|
See also references of EP1573395A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP1573395A2 (en) | 2005-09-14 |
WO2004013693A2 (en) | 2004-02-12 |
AU2003261317A8 (en) | 2004-02-23 |
KR20050026088A (en) | 2005-03-14 |
EP1573395A4 (en) | 2010-09-29 |
TW200406651A (en) | 2004-05-01 |
TWI266970B (en) | 2006-11-21 |
AU2003261317A1 (en) | 2004-02-23 |
JP2006516065A (en) | 2006-06-15 |
JP5421221B2 (en) | 2014-02-19 |
JP2011101016A (en) | 2011-05-19 |
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