WO2004086470A1 - 露光装置及びデバイス製造方法 - Google Patents
露光装置及びデバイス製造方法 Download PDFInfo
- Publication number
- WO2004086470A1 WO2004086470A1 PCT/JP2004/003928 JP2004003928W WO2004086470A1 WO 2004086470 A1 WO2004086470 A1 WO 2004086470A1 JP 2004003928 W JP2004003928 W JP 2004003928W WO 2004086470 A1 WO2004086470 A1 WO 2004086470A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- liquid
- substrate
- exposure apparatus
- optical system
- projection optical
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
Abstract
Description
Claims
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020117015987A KR101181688B1 (ko) | 2003-03-25 | 2004-03-23 | 노광 장치 및 디바이스 제조 방법 |
KR1020127009949A KR101345474B1 (ko) | 2003-03-25 | 2004-03-23 | 노광 장치 및 디바이스 제조 방법 |
EP04722659.2A EP1610361B1 (en) | 2003-03-25 | 2004-03-23 | Exposure system and device production method |
JP2005504056A JP4353179B2 (ja) | 2003-03-25 | 2004-03-23 | 露光装置、露光方法、及びデバイス製造方法 |
US11/230,572 US7471371B2 (en) | 2003-03-25 | 2005-09-21 | Exposure apparatus and device fabrication method |
US11/498,183 US7916272B2 (en) | 2003-03-25 | 2006-08-03 | Exposure apparatus and device fabrication method |
US11/648,694 US8558987B2 (en) | 2003-03-25 | 2007-01-03 | Exposure apparatus and device fabrication method |
US11/808,406 US8018570B2 (en) | 2003-03-25 | 2007-06-08 | Exposure apparatus and device fabrication method |
US14/041,174 US8804095B2 (en) | 2003-03-25 | 2013-09-30 | Exposure apparatus and device fabrication method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003083329 | 2003-03-25 | ||
JP2003-83329 | 2003-03-25 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/230,572 Continuation US7471371B2 (en) | 2003-03-25 | 2005-09-21 | Exposure apparatus and device fabrication method |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004086470A1 true WO2004086470A1 (ja) | 2004-10-07 |
Family
ID=33094951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/003928 WO2004086470A1 (ja) | 2003-03-25 | 2004-03-23 | 露光装置及びデバイス製造方法 |
Country Status (5)
Country | Link |
---|---|
US (5) | US7471371B2 (ja) |
EP (1) | EP1610361B1 (ja) |
JP (5) | JP4353179B2 (ja) |
KR (3) | KR101181688B1 (ja) |
WO (1) | WO2004086470A1 (ja) |
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WO2006093340A1 (en) * | 2005-03-02 | 2006-09-08 | Canon Kabushiki Kaisha | Exposure apparatus |
JP2006332100A (ja) * | 2005-05-23 | 2006-12-07 | Canon Inc | 液浸露光装置 |
WO2006133800A1 (en) * | 2005-06-14 | 2006-12-21 | Carl Zeiss Smt Ag | Lithography projection objective, and a method for correcting image defects of the same |
JP2007005714A (ja) * | 2005-06-27 | 2007-01-11 | Toshiba Corp | 液浸露光方法及び液浸露光装置 |
WO2007046523A1 (en) * | 2005-10-18 | 2007-04-26 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
JP2007173718A (ja) * | 2005-12-26 | 2007-07-05 | Nikon Corp | 露光装置及びデバイス製造方法 |
JP2007519238A (ja) * | 2004-01-20 | 2007-07-12 | カール・ツアイス・エスエムテイ・アーゲー | マイクロリソグラフィ投影露光装置および投影レンズのための測定装置 |
JP2007180271A (ja) * | 2005-12-28 | 2007-07-12 | Nikon Corp | 結像光学系、結像光学系の製造方法、結像光学系の調整方法、露光装置及びデバイスの製造方法 |
WO2007083686A1 (ja) * | 2006-01-18 | 2007-07-26 | Canon Kabushiki Kaisha | 露光装置 |
JP2007194613A (ja) * | 2005-12-28 | 2007-08-02 | Asml Netherlands Bv | リソグラフィ装置、デバイス製造方法および制御システム |
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US8804095B2 (en) | 2014-08-12 |
US20080030697A1 (en) | 2008-02-07 |
KR101181688B1 (ko) | 2012-09-19 |
US8558987B2 (en) | 2013-10-15 |
EP1610361A4 (en) | 2007-10-03 |
KR20110097945A (ko) | 2011-08-31 |
EP1610361A1 (en) | 2005-12-28 |
KR20050110033A (ko) | 2005-11-22 |
US20060268249A1 (en) | 2006-11-30 |
JP2012080148A (ja) | 2012-04-19 |
US7471371B2 (en) | 2008-12-30 |
JP2014030061A (ja) | 2014-02-13 |
EP1610361B1 (en) | 2014-05-21 |
JP5626230B2 (ja) | 2014-11-19 |
KR101345474B1 (ko) | 2013-12-27 |
US8018570B2 (en) | 2011-09-13 |
JP5725133B2 (ja) | 2015-05-27 |
JPWO2004086470A1 (ja) | 2006-06-29 |
US20140028987A1 (en) | 2014-01-30 |
JP4858569B2 (ja) | 2012-01-18 |
JP5333416B2 (ja) | 2013-11-06 |
US20070109516A1 (en) | 2007-05-17 |
KR20120049407A (ko) | 2012-05-16 |
US20060012765A1 (en) | 2006-01-19 |
US7916272B2 (en) | 2011-03-29 |
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