WO2004094693A3 - Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition - Google Patents

Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition Download PDF

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Publication number
WO2004094693A3
WO2004094693A3 PCT/US2004/011477 US2004011477W WO2004094693A3 WO 2004094693 A3 WO2004094693 A3 WO 2004094693A3 US 2004011477 W US2004011477 W US 2004011477W WO 2004094693 A3 WO2004094693 A3 WO 2004094693A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas distribution
distribution plate
vapor deposition
chemical vapor
large area
Prior art date
Application number
PCT/US2004/011477
Other languages
French (fr)
Other versions
WO2004094693A2 (en
Inventor
Soo Young Choi
Quanyuan Shang
Robert I Greene
Li Hou
Original Assignee
Applied Materials Inc
Soo Young Choi
Quanyuan Shang
Robert I Greene
Li Hou
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc, Soo Young Choi, Quanyuan Shang, Robert I Greene, Li Hou filed Critical Applied Materials Inc
Priority to JP2005518601A priority Critical patent/JP2006515039A/en
Priority to CN2004800052710A priority patent/CN1754008B/en
Publication of WO2004094693A2 publication Critical patent/WO2004094693A2/en
Publication of WO2004094693A3 publication Critical patent/WO2004094693A3/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Abstract

Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having a plurality of gas passages passing between an upstream side and a downstream side of the diffuser plate. At least one of the gas passages includes a first hole and a second hole coupled by an orifice hole. The first hole extends from the upstream side of the diffuser plate while the second hole extends from the downstream side. The orifice hole has a diameter less than the respective diameters of the first and second holes.
PCT/US2004/011477 2003-04-16 2004-04-14 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition WO2004094693A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005518601A JP2006515039A (en) 2003-04-16 2004-04-14 Gas distribution plate assembly for large area plasma chemical vapor deposition
CN2004800052710A CN1754008B (en) 2003-04-16 2004-04-14 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/417,592 2003-04-16
US10/417,592 US6942753B2 (en) 2003-04-16 2003-04-16 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition

Publications (2)

Publication Number Publication Date
WO2004094693A2 WO2004094693A2 (en) 2004-11-04
WO2004094693A3 true WO2004094693A3 (en) 2005-02-10

Family

ID=33158943

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/011477 WO2004094693A2 (en) 2003-04-16 2004-04-14 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition

Country Status (6)

Country Link
US (1) US6942753B2 (en)
JP (2) JP2006515039A (en)
KR (1) KR100696021B1 (en)
CN (2) CN1754008B (en)
TW (1) TWI276701B (en)
WO (1) WO2004094693A2 (en)

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