WO2004095544A3 - Substrate with multiple conductive layers and methods for making and using same - Google Patents

Substrate with multiple conductive layers and methods for making and using same Download PDF

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Publication number
WO2004095544A3
WO2004095544A3 PCT/US2004/012297 US2004012297W WO2004095544A3 WO 2004095544 A3 WO2004095544 A3 WO 2004095544A3 US 2004012297 W US2004012297 W US 2004012297W WO 2004095544 A3 WO2004095544 A3 WO 2004095544A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
making
methods
same
conductive layers
Prior art date
Application number
PCT/US2004/012297
Other languages
French (fr)
Other versions
WO2004095544A2 (en
Inventor
David W Caldwell
Michael Jon Taylor
Original Assignee
Touchsensor Tech Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Touchsensor Tech Llc filed Critical Touchsensor Tech Llc
Priority to EP04760080A priority Critical patent/EP1620786A2/en
Priority to NZ543242A priority patent/NZ543242A/en
Priority to AU2004231587A priority patent/AU2004231587A1/en
Priority to BRPI0409702-5A priority patent/BRPI0409702A/en
Priority to CA002522849A priority patent/CA2522849A1/en
Priority to MXPA05011327A priority patent/MXPA05011327A/en
Priority to JP2006513188A priority patent/JP2006524750A/en
Publication of WO2004095544A2 publication Critical patent/WO2004095544A2/en
Publication of WO2004095544A3 publication Critical patent/WO2004095544A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04113Peripheral electrode pattern in resistive digitisers, i.e. electrodes at the periphery of the resistive sheet are shaped in patterns enhancing linearity of induced field
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0232Optical elements or arrangements associated with the device
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0104Properties and characteristics in general
    • H05K2201/0108Transparent
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/032Materials
    • H05K2201/0326Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0361Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15Position of the PCB during processing
    • H05K2203/1545Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49156Manufacturing circuit on or in base with selective destruction of conductive paths
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49165Manufacturing circuit on or in base by forming conductive walled aperture in base

Abstract

A layer of transparent conductive a material is disposed on a surface of a substrate. Further layers of conductive material are deposited on the layer of transparent conductive material or on an opposite surface of the substrate. The layers are selectively etched to yield a layout of pads for mounting electrical components and conductive traces forming an electrical circuit.
PCT/US2004/012297 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same WO2004095544A2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
EP04760080A EP1620786A2 (en) 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same
NZ543242A NZ543242A (en) 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same
AU2004231587A AU2004231587A1 (en) 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same
BRPI0409702-5A BRPI0409702A (en) 2003-04-22 2004-04-21 conductive multilayer substrate and methods for its manufacture and use
CA002522849A CA2522849A1 (en) 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same
MXPA05011327A MXPA05011327A (en) 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same.
JP2006513188A JP2006524750A (en) 2003-04-22 2004-04-21 Substrate having a plurality of conductive layers and method for producing and using the same

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US46443803P 2003-04-22 2003-04-22
US60/464,438 2003-04-22
US54388304P 2004-02-12 2004-02-12
US60/543,883 2004-02-12
US10/828,997 US8307549B2 (en) 2001-11-20 2004-04-20 Method of making an electrical circuit
US10/828,997 2004-04-20

Publications (2)

Publication Number Publication Date
WO2004095544A2 WO2004095544A2 (en) 2004-11-04
WO2004095544A3 true WO2004095544A3 (en) 2005-06-30

Family

ID=33314257

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/012297 WO2004095544A2 (en) 2003-04-22 2004-04-21 Substrate with multiple conductive layers and methods for making and using same

Country Status (10)

Country Link
US (2) US8307549B2 (en)
EP (1) EP1620786A2 (en)
JP (1) JP2006524750A (en)
KR (1) KR20060009859A (en)
AU (1) AU2004231587A1 (en)
BR (1) BRPI0409702A (en)
CA (1) CA2522849A1 (en)
MX (1) MXPA05011327A (en)
NZ (1) NZ543242A (en)
WO (1) WO2004095544A2 (en)

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US20080088601A1 (en) * 2004-05-19 2008-04-17 Tpk Touch Solutions Inc. Circuit layout on a touch panel
DE202005020315U1 (en) * 2005-12-15 2006-02-16 Döppner Bauelemente GmbH & Co. KG Electrical socket connection
US8124490B2 (en) 2006-12-21 2012-02-28 Stats Chippac, Ltd. Semiconductor device and method of forming passive devices
TWI428663B (en) * 2009-06-12 2014-03-01 Au Optronics Corp Touch-control liquid crystal display touch panel and liquid crystal display
KR101006291B1 (en) * 2009-12-31 2011-01-06 박종호 Pad for touch panel, manufacturing system of pad for touch panel and method thereof
EP2402481A1 (en) * 2010-06-29 2012-01-04 Applied Materials, Inc. Method and system for manufacturing a transparent body for use in a touch panel
US8623689B2 (en) * 2010-07-07 2014-01-07 Ineffable Cellular Limited Liability Company Package process of backside illumination image sensor
JP6096195B2 (en) * 2011-09-07 2017-03-15 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Method and system for producing a transparent body used in a touch panel
JP5885993B2 (en) * 2011-10-17 2016-03-16 関東化學株式会社 Etching solution composition and etching method
JP5920972B2 (en) * 2011-12-26 2016-05-24 メック株式会社 Wiring forming method and etching solution
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JP5894820B2 (en) * 2012-03-13 2016-03-30 日東電工株式会社 Method for producing conductive film roll
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3864180A (en) * 1971-07-23 1975-02-04 Litton Systems Inc Process for forming thin-film circuit devices
US4586988A (en) * 1983-08-19 1986-05-06 Energy Conversion Devices, Inc. Method of forming an electrically conductive member
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US20030025679A1 (en) * 1999-06-22 2003-02-06 Cirque Corporation System for disposing a proximity sensitive touchpad behind a mobile phone keypad

Also Published As

Publication number Publication date
US8307549B2 (en) 2012-11-13
WO2004095544A2 (en) 2004-11-04
CA2522849A1 (en) 2004-11-04
KR20060009859A (en) 2006-02-01
JP2006524750A (en) 2006-11-02
US20100218978A1 (en) 2010-09-02
US20050020062A1 (en) 2005-01-27
BRPI0409702A (en) 2006-05-02
AU2004231587A1 (en) 2004-11-04
NZ543242A (en) 2009-01-31
MXPA05011327A (en) 2006-03-08
EP1620786A2 (en) 2006-02-01

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