WO2005089465A3 - Electromechanical three-trace junction devices - Google Patents

Electromechanical three-trace junction devices Download PDF

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Publication number
WO2005089465A3
WO2005089465A3 PCT/US2005/009026 US2005009026W WO2005089465A3 WO 2005089465 A3 WO2005089465 A3 WO 2005089465A3 US 2005009026 W US2005009026 W US 2005009026W WO 2005089465 A3 WO2005089465 A3 WO 2005089465A3
Authority
WO
WIPO (PCT)
Prior art keywords
conductive elements
electromechanical
nanotube ribbon
electrically conductive
elements
Prior art date
Application number
PCT/US2005/009026
Other languages
French (fr)
Other versions
WO2005089465A2 (en
Inventor
Thomas Ruckes
Brent M Segal
Darren K Brock
Original Assignee
Nantero Inc
Thomas Ruckes
Brent M Segal
Darren K Brock
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nantero Inc, Thomas Ruckes, Brent M Segal, Darren K Brock filed Critical Nantero Inc
Publication of WO2005089465A2 publication Critical patent/WO2005089465A2/en
Publication of WO2005089465A3 publication Critical patent/WO2005089465A3/en

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/02Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
    • G11C13/025Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change using fullerenes, e.g. C60, or nanotubes, e.g. carbon or silicon nanotubes
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C23/00Digital stores characterised by movement of mechanical parts to effect storage, e.g. using balls; Storage elements therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0094Switches making use of nanoelectromechanical systems [NEMS]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/77Array wherein the memory element being directly connected to the bit lines and word lines without any access device being used
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/734Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc.
    • Y10S977/742Carbon nanotubes, CNTs
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/936Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/943Information storage or retrieval using nanostructure

Abstract

Three trace electromechanical circuits and methods of using same. A circuit includes first and second electrically conductive elements with a nanotube ribbon (or other electromechanical elements) disposed therebetween. An insulative layer is disposed on one of the first and second conductive elements. The nanotube ribbon is movable toward at least one of the first and second electrically conductive elements in response to electrical stimulus applied to at least one of the first and second electrically conductive elements and the nanotube ribbon. Such circuit may be formed into arrays of cells. One of the conductive elements may be used to create an attractive force to cause the nanotube ribbon to contact a conductive element, and the other of the conductive elements may be used to create an attractive force to pull the nanotube ribbon from contact with the contacted conductive element. The electrically conductive traces may be aligned or unaligned with one another.
PCT/US2005/009026 2004-03-17 2005-03-17 Electromechanical three-trace junction devices WO2005089465A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/802,900 2004-03-17
US10/802,900 US7176505B2 (en) 2001-12-28 2004-03-17 Electromechanical three-trace junction devices

Publications (2)

Publication Number Publication Date
WO2005089465A2 WO2005089465A2 (en) 2005-09-29
WO2005089465A3 true WO2005089465A3 (en) 2006-01-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/009026 WO2005089465A2 (en) 2004-03-17 2005-03-17 Electromechanical three-trace junction devices

Country Status (2)

Country Link
US (2) US7176505B2 (en)
WO (1) WO2005089465A2 (en)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7563711B1 (en) * 2001-07-25 2009-07-21 Nantero, Inc. Method of forming a carbon nanotube-based contact to semiconductor
US7259410B2 (en) * 2001-07-25 2007-08-21 Nantero, Inc. Devices having horizontally-disposed nanofabric articles and methods of making the same
US6924538B2 (en) * 2001-07-25 2005-08-02 Nantero, Inc. Devices having vertically-disposed nanofabric articles and methods of making the same
US6706402B2 (en) 2001-07-25 2004-03-16 Nantero, Inc. Nanotube films and articles
US6835591B2 (en) * 2001-07-25 2004-12-28 Nantero, Inc. Methods of nanotube films and articles
US7176505B2 (en) * 2001-12-28 2007-02-13 Nantero, Inc. Electromechanical three-trace junction devices
US7858185B2 (en) 2003-09-08 2010-12-28 Nantero, Inc. High purity nanotube fabrics and films
US7075141B2 (en) * 2003-03-28 2006-07-11 Nantero, Inc. Four terminal non-volatile transistor device
US6944054B2 (en) * 2003-03-28 2005-09-13 Nantero, Inc. NRAM bit selectable two-device nanotube array
US7294877B2 (en) * 2003-03-28 2007-11-13 Nantero, Inc. Nanotube-on-gate FET structures and applications
US7113426B2 (en) * 2003-03-28 2006-09-26 Nantero, Inc. Non-volatile RAM cell and array using nanotube switch position for information state
US6995046B2 (en) 2003-04-22 2006-02-07 Nantero, Inc. Process for making byte erasable devices having elements made with nanotubes
US7045421B2 (en) * 2003-04-22 2006-05-16 Nantero, Inc. Process for making bit selectable devices having elements made with nanotubes
WO2005019793A2 (en) 2003-05-14 2005-03-03 Nantero, Inc. Sensor platform using a horizontally oriented nanotube element
US7280394B2 (en) * 2003-06-09 2007-10-09 Nantero, Inc. Field effect devices having a drain controlled via a nanotube switching element
US7274064B2 (en) * 2003-06-09 2007-09-25 Nanatero, Inc. Non-volatile electromechanical field effect devices and circuits using same and methods of forming same
JP3731589B2 (en) * 2003-07-18 2006-01-05 ソニー株式会社 Imaging device and synchronization signal generator
WO2005017967A2 (en) * 2003-08-13 2005-02-24 Nantero, Inc. Nanotube device structure and methods of fabrication
EP1665278A4 (en) * 2003-08-13 2007-11-07 Nantero Inc Nanotube-based switching elements with multiple controls and circuits made from same
WO2005084164A2 (en) * 2003-08-13 2005-09-15 Nantero, Inc. Nanotube-based switching elements and logic circuits
US7115960B2 (en) * 2003-08-13 2006-10-03 Nantero, Inc. Nanotube-based switching elements
US7289357B2 (en) * 2003-08-13 2007-10-30 Nantero, Inc. Isolation structure for deflectable nanotube elements
US7375369B2 (en) * 2003-09-08 2008-05-20 Nantero, Inc. Spin-coatable liquid for formation of high purity nanotube films
US7504051B2 (en) * 2003-09-08 2009-03-17 Nantero, Inc. Applicator liquid for use in electronic manufacturing processes
US7416993B2 (en) * 2003-09-08 2008-08-26 Nantero, Inc. Patterned nanowire articles on a substrate and methods of making the same
US7528437B2 (en) * 2004-02-11 2009-05-05 Nantero, Inc. EEPROMS using carbon nanotubes for cell storage
US7658869B2 (en) * 2004-06-03 2010-02-09 Nantero, Inc. Applicator liquid containing ethyl lactate for preparation of nanotube films
US7556746B2 (en) * 2004-06-03 2009-07-07 Nantero, Inc. Method of making an applicator liquid for electronics fabrication process
US7652342B2 (en) * 2004-06-18 2010-01-26 Nantero, Inc. Nanotube-based transfer devices and related circuits
US7288970B2 (en) * 2004-06-18 2007-10-30 Nantero, Inc. Integrated nanotube and field effect switching device
US7161403B2 (en) * 2004-06-18 2007-01-09 Nantero, Inc. Storage elements using nanotube switching elements
US7164744B2 (en) 2004-06-18 2007-01-16 Nantero, Inc. Nanotube-based logic driver circuits
WO2006121461A2 (en) 2004-09-16 2006-11-16 Nantero, Inc. Light emitters using nanotubes and methods of making same
US20100147657A1 (en) * 2004-11-02 2010-06-17 Nantero, Inc. Nanotube esd protective devices and corresponding nonvolatile and volatile nanotube switches
US7567414B2 (en) * 2004-11-02 2009-07-28 Nantero, Inc. Nanotube ESD protective devices and corresponding nonvolatile and volatile nanotube switches
WO2006065937A2 (en) 2004-12-16 2006-06-22 Nantero, Inc. Aqueous carbon nanotube applicator liquids and methods for producing applicator liquids thereof
US7394687B2 (en) 2005-05-09 2008-07-01 Nantero, Inc. Non-volatile-shadow latch using a nanotube switch
TWI324773B (en) 2005-05-09 2010-05-11 Nantero Inc Non-volatile shadow latch using a nanotube switch
US7479654B2 (en) 2005-05-09 2009-01-20 Nantero, Inc. Memory arrays using nanotube articles with reprogrammable resistance
US7781862B2 (en) 2005-05-09 2010-08-24 Nantero, Inc. Two-terminal nanotube devices and systems and methods of making same
US7598127B2 (en) * 2005-05-12 2009-10-06 Nantero, Inc. Nanotube fuse structure
US7575693B2 (en) * 2005-05-23 2009-08-18 Nantero, Inc. Method of aligning nanotubes and wires with an etched feature
US7402770B2 (en) 2005-06-10 2008-07-22 Lsi Logic Corporation Nano structure electrode design
US7538040B2 (en) 2005-06-30 2009-05-26 Nantero, Inc. Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafers
CA2621103C (en) * 2005-09-06 2015-11-03 Nantero, Inc. Nanotube fabric-based sensor systems and methods of making same
US7446044B2 (en) * 2005-09-19 2008-11-04 California Institute Of Technology Carbon nanotube switches for memory, RF communications and sensing applications, and methods of making the same
US7385839B2 (en) * 2005-12-01 2008-06-10 International Business Machines Corporation Memory devices using carbon nanotube (CNT) technologies
DE102006004218B3 (en) * 2006-01-30 2007-08-16 Infineon Technologies Ag Electromechanical storage device and method for manufacturing an electromechanical storage device
WO2009037596A2 (en) * 2007-09-17 2009-03-26 Barrick Gold Corporation Method to improve recovery of gold from double refractory gold ores
AU2008300273B2 (en) * 2007-09-18 2012-03-22 Barrick Gold Corporation Process for recovering gold and silver from refractory ores
US8262770B2 (en) 2007-09-18 2012-09-11 Barrick Gold Corporation Process for controlling acid in sulfide pressure oxidation processes
US8009461B2 (en) * 2008-01-07 2011-08-30 International Business Machines Corporation SRAM device, and SRAM device design structure, with adaptable access transistors
JP4836092B2 (en) 2008-03-19 2011-12-14 国立大学法人東北大学 Method for forming semiconductor device
US8022490B2 (en) 2008-03-24 2011-09-20 Conexant Systems, Inc. Micro electro-mechanical sensor (MEMS) fabricated with ribbon wire bonds
US8222127B2 (en) 2008-07-18 2012-07-17 Micron Technology, Inc. Methods of forming structures having nanotubes extending between opposing electrodes and structures including same
EP2345052A2 (en) * 2008-10-01 2011-07-20 Joseph F. Pinkerton Nanoelectromechanical tunneling current switch
US7897954B2 (en) 2008-10-10 2011-03-01 Macronix International Co., Ltd. Dielectric-sandwiched pillar memory device
US8013324B2 (en) * 2009-04-03 2011-09-06 International Business Machines Corporation Structurally stabilized semiconductor nanowire
US7943530B2 (en) * 2009-04-03 2011-05-17 International Business Machines Corporation Semiconductor nanowires having mobility-optimized orientations
US7902541B2 (en) * 2009-04-03 2011-03-08 International Business Machines Corporation Semiconductor nanowire with built-in stress
US8237150B2 (en) * 2009-04-03 2012-08-07 International Business Machines Corporation Nanowire devices for enhancing mobility through stress engineering
US8368125B2 (en) 2009-07-20 2013-02-05 International Business Machines Corporation Multiple orientation nanowires with gate stack stressors
US20110056812A1 (en) * 2009-09-08 2011-03-10 Kaul Anupama B Nano-electro-mechanical switches using three-dimensional sidewall-conductive carbon nanofibers and method for making the same
US8729412B2 (en) 2009-11-11 2014-05-20 University Of Utah Research Foundation Nanoelectromechanical logic devices
US8435798B2 (en) * 2010-01-13 2013-05-07 California Institute Of Technology Applications and methods of operating a three-dimensional nano-electro-mechanical resonator and related devices
US10281430B2 (en) * 2016-07-15 2019-05-07 The United States of America as represented by the Administratior of NASA Identification and characterization of remote objects by electric charge tunneling, injection, and induction, and an erasable organic molecular memory

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6548841B2 (en) * 2000-11-09 2003-04-15 Texas Instruments Incorporated Nanomechanical switches and circuits
US6803840B2 (en) * 2001-03-30 2004-10-12 California Institute Of Technology Pattern-aligned carbon nanotube growth and tunable resonator apparatus
US6809465B2 (en) * 2002-08-23 2004-10-26 Samsung Electronics Co., Ltd. Article comprising MEMS-based two-dimensional e-beam sources and method for making the same

Family Cites Families (168)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3448302A (en) * 1966-06-16 1969-06-03 Itt Operating circuit for phase change memory devices
FR2115034B1 (en) * 1970-11-24 1973-11-23 Sescosem
US3892890A (en) 1972-05-12 1975-07-01 Hitachi Ltd Process for forming carbon coatings
US3970887A (en) 1974-06-19 1976-07-20 Micro-Bit Corporation Micro-structure field emission electron source
US5032538A (en) 1979-08-10 1991-07-16 Massachusetts Institute Of Technology Semiconductor embedded layer technology utilizing selective epitaxial growth methods
US4378629A (en) * 1979-08-10 1983-04-05 Massachusetts Institute Of Technology Semiconductor embedded layer technology including permeable base transistor, fabrication method
US4324814A (en) * 1981-03-19 1982-04-13 Rca Corporation Method for forming a narrow thin film line
US4524431A (en) * 1982-02-01 1985-06-18 Texas Instruments Incorporated High-speed nonvolatile memory array
US4495511A (en) * 1982-08-23 1985-01-22 The United States Of America As Represented By The Secretary Of The Navy Permeable base transistor structure
US4510016A (en) * 1982-12-09 1985-04-09 Gte Laboratories Method of fabricating submicron silicon structures such as permeable base transistors
US4707197A (en) 1984-08-02 1987-11-17 American Telephone And Telegraph Company, At&T Bell Laboratories Method of producing a silicide/Si heteroepitaxial structure, and articles produced by the method
JPS6177199A (en) 1984-09-21 1986-04-19 Toshiba Corp Semiconductor memory
JPS6194042A (en) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd Molecular construction and its manufacture
JPS61121369A (en) * 1984-11-19 1986-06-09 Fujitsu Ltd Semiconductor device
US4901121A (en) * 1985-03-29 1990-02-13 American Telephone & Telegraph Co., At&T Bell Labs. Semiconductor device comprising a perforated metal silicide layer
US4701842A (en) 1985-10-04 1987-10-20 International Business Machines Corporation Method and apparatus for avoiding excessive delay in a pipelined processor during the execution of a microbranch instruction
US4758534A (en) 1985-11-13 1988-07-19 Bell Communications Research, Inc. Process for producing porous refractory metal layers embedded in semiconductor devices
US4819212A (en) * 1986-05-31 1989-04-04 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device with readout test circuitry
US4939556A (en) 1986-07-10 1990-07-03 Canon Kabushiki Kaisha Conductor device
US4845533A (en) 1986-08-22 1989-07-04 Energy Conversion Devices, Inc. Thin film electrical devices with amorphous carbon electrodes and method of making same
CH670914A5 (en) 1986-09-10 1989-07-14 Landis & Gyr Ag
US4876667A (en) 1987-06-22 1989-10-24 Energy Conversion Devices, Inc. Data storage device having a phase change memory medium reversible by direct overwrite
US4853893A (en) 1987-07-02 1989-08-01 Ramtron Corporation Data storage device and method of using a ferroelectric capacitance divider
US4947226A (en) 1987-12-08 1990-08-07 Hoenywell, Inc. Bilateral switching device
US5155561A (en) 1988-01-05 1992-10-13 Massachusetts Institute Of Technology Permeable base transistor having an electrode configuration for heat dissipation
US5184320A (en) * 1988-02-12 1993-02-02 Texas Instruments Incorporated Cached random access memory device and system
US4888630A (en) 1988-03-21 1989-12-19 Texas Instruments Incorporated Floating-gate transistor with a non-linear intergate dielectric
GB8807225D0 (en) 1988-03-25 1988-04-27 Hughes Microelectronics Ltd Nonvolatile ram cell
US5198994A (en) * 1988-08-31 1993-03-30 Kabushiki Kaisha Toshiba Ferroelectric memory device
US5010037A (en) * 1988-10-14 1991-04-23 California Institute Of Technology Pinhole-free growth of epitaxial CoSi2 film on Si(111)
US5592642A (en) * 1988-12-22 1997-01-07 Framdrive Ferroelectric storage device emulating a rotating disk drive unit in a computer system and having an optical and parallel data interface
US5592643A (en) * 1988-12-22 1997-01-07 Framdrive Ferroelectric storage device emulating a rotating disk drive unit in acomputer system and having a parallel data interface
US5592644A (en) * 1988-12-22 1997-01-07 Framdrive Ferroelectric storage device emulating a rotating disk drive unit in a computer system and having an optical data interface
US5089545A (en) * 1989-02-12 1992-02-18 Biotech International, Inc. Switching and memory elements from polyamino acids and the method of their assembly
GB8907045D0 (en) 1989-03-29 1989-05-10 Hughes Microelectronics Ltd Sense amplifier
JPH02296372A (en) 1989-05-10 1990-12-06 Mitsubishi Electric Corp Transmissive base transistor
US6346413B1 (en) * 1989-06-07 2002-02-12 Affymetrix, Inc. Polymer arrays
US4985871A (en) * 1989-11-13 1991-01-15 Chips And Technologies, Inc. Memory controller for using reserved dram addresses for expanded memory space
DE4025269A1 (en) 1990-02-07 1991-08-08 Forschungszentrum Juelich Gmbh ELECTRONIC COMPONENT AND METHOD FOR THE PRODUCTION THEREOF
US5412785A (en) * 1990-04-09 1995-05-02 Motorola, Inc. Microprogrammed data processor which includes a microsequencer in which a next microaddress output of a microROM is connected to the or-plane of an entry PLA
FR2663466A1 (en) 1990-06-15 1991-12-20 Thomson Csf SEMICONDUCTOR COMPONENT WITH SCHOTTKY JUNCTION FOR HYPERFREQUENCY AMPLIFICATION AND FAST LOGIC CIRCUITS, AND METHOD FOR MAKING SAME.
US5216631A (en) * 1990-11-02 1993-06-01 Sliwa Jr John W Microvibratory memory device
CA2062200A1 (en) * 1991-03-15 1992-09-16 Stephen C. Purcell Decompression processor for video applications
US5316989A (en) * 1991-05-08 1994-05-31 Gilbert James Method for making a smooth-surface ceramic
US5196396A (en) * 1991-07-16 1993-03-23 The President And Fellows Of Harvard College Method of making a superconducting fullerene composition by reacting a fullerene with an alloy containing alkali metal
US5444651A (en) 1991-10-30 1995-08-22 Sharp Kabushiki Kaisha Non-volatile memory device
US5290715A (en) * 1991-12-31 1994-03-01 U.S. Philips Corporation Method of making dielectrically isolated metal base transistors and permeable base transistors
US5198390A (en) 1992-01-16 1993-03-30 Cornell Research Foundation, Inc. RIE process for fabricating submicron, silicon electromechanical structures
DE69324508T2 (en) 1992-01-22 1999-12-23 Enhanced Memory Systems Inc DRAM with integrated registers
US5850089A (en) 1992-03-13 1998-12-15 American Research Corporation Of Virginia Modulated-structure of PZT/PT ferroelectric thin films for non-volatile random access memories
US5475341A (en) 1992-06-01 1995-12-12 Yale University Sub-nanoscale electronic systems and devices
US5651126A (en) 1992-06-26 1997-07-22 Apple Computer, Inc. Method and apparatus for reducing transitions on computer signal lines
US5252835A (en) 1992-07-17 1993-10-12 President And Trustees Of Harvard College Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale
EP0683921B1 (en) 1993-02-04 2004-06-16 Cornell Research Foundation, Inc. Microstructures and single mask, single-crystal process for fabrication thereof
JP2541091B2 (en) * 1993-02-26 1996-10-09 日本電気株式会社 Carbon material and its manufacturing method
CA2118662C (en) 1993-03-22 1999-07-13 Paul A. Santeler Memory controller having all dram address and control signals provided synchronously from a single device
US5346683A (en) 1993-03-26 1994-09-13 Gas Research Institute Uncapped and thinned carbon nanotubes and process
JPH06302179A (en) 1993-04-13 1994-10-28 Casio Comput Co Ltd Electronic equipment
JPH0799189A (en) 1993-04-28 1995-04-11 Mitsubishi Electric Corp Manufacture of semiconductor device
US5424054A (en) * 1993-05-21 1995-06-13 International Business Machines Corporation Carbon fibers and method for their production
US5426070A (en) * 1993-05-26 1995-06-20 Cornell Research Foundation, Inc. Microstructures and high temperature isolation process for fabrication thereof
US5456986A (en) 1993-06-30 1995-10-10 Carnegie Mellon University Magnetic metal or metal carbide nanoparticles and a process for forming same
US5453970A (en) 1993-07-13 1995-09-26 Rust; Thomas F. Molecular memory medium and molecular memory disk drive for storing information using a tunnelling probe
WO1995002709A2 (en) 1993-07-15 1995-01-26 President And Fellows Of Harvard College EXTENDED NITRIDE MATERIAL COMPRISING β-C3N¿4?
US5547748A (en) 1994-01-14 1996-08-20 Sri International Carbon nanoencapsulates
JP2526408B2 (en) * 1994-01-28 1996-08-21 工業技術院長 Carbon nano tube continuous manufacturing method and apparatus
US5521602A (en) * 1994-02-10 1996-05-28 Racom Systems, Inc. Communications system utilizing FSK/PSK modulation techniques
US5479172A (en) 1994-02-10 1995-12-26 Racom Systems, Inc. Power supply and power enable circuit for an RF/ID transponder
US5533061A (en) 1994-02-10 1996-07-02 Racom Systems, Inc. Method and apparatus for detecting an FSK encoded carrier signal
US5553099A (en) 1994-02-10 1996-09-03 Racom Systems, Inc. FSK detector for determining an increasing time period between adjacent pulses of an FSK modulated square wave pulse train
US5608246A (en) * 1994-02-10 1997-03-04 Ramtron International Corporation Integration of high value capacitor with ferroelectric memory
US5444421A (en) 1994-02-10 1995-08-22 Racom Systems, Inc. Low power consumption oscillator using multiple transconductance amplifiers
US5517194A (en) * 1994-02-10 1996-05-14 Racom Systems, Inc. Passive RF transponder and method
US5563424A (en) 1994-03-24 1996-10-08 Uniax Corporation Polymer grid triodes
US6226722B1 (en) * 1994-05-19 2001-05-01 International Business Machines Corporation Integrated level two cache and controller with multiple ports, L1 bypass and concurrent accessing
US5626670A (en) * 1994-10-03 1997-05-06 American Research Corporation Of Virginia Method for producing low thermal budget ferroelectric thin films for integrated device structures using laser-crystallization of spin-on sol-gel films
US5590078A (en) 1994-10-07 1996-12-31 Mukesh Chatter Method of and apparatus for improved dynamic random access memory (DRAM) providing increased data bandwidth and addressing range for current DRAM devices and/or equivalent bandwidth and addressing range for smaller DRAM devices
US5623638A (en) * 1994-11-22 1997-04-22 Advanced Micro Devices, Inc. Memory control unit with programmable edge generator to minimize delay periods for critical DRAM timing parameters
US6203814B1 (en) * 1994-12-08 2001-03-20 Hyperion Catalysis International, Inc. Method of making functionalized nanotubes
US5716708A (en) * 1995-01-17 1998-02-10 Lagow; Richard J. Acetylenic carbon allotrope
US6231980B1 (en) * 1995-02-14 2001-05-15 The Regents Of The University Of California BX CY NZ nanotubes and nanoparticles
US6063243A (en) * 1995-02-14 2000-05-16 The Regents Of The Univeristy Of California Method for making nanotubes and nanoparticles
US5780101A (en) 1995-02-17 1998-07-14 Arizona Board Of Regents On Behalf Of The University Of Arizona Method for producing encapsulated nanoparticles and carbon nanotubes using catalytic disproportionation of carbon monoxide
US5747180A (en) * 1995-05-19 1998-05-05 University Of Notre Dame Du Lac Electrochemical synthesis of quasi-periodic quantum dot and nanostructure arrays
US6190634B1 (en) * 1995-06-07 2001-02-20 President And Fellows Of Harvard College Carbide nanomaterials
US5751156A (en) * 1995-06-07 1998-05-12 Yale University Mechanically controllable break transducer
US5640133A (en) * 1995-06-23 1997-06-17 Cornell Research Foundation, Inc. Capacitance based tunable micromechanical resonators
EP0758128B1 (en) * 1995-08-09 2001-11-28 Infineon Technologies AG Memory device and fabrication method
US6183714B1 (en) * 1995-09-08 2001-02-06 Rice University Method of making ropes of single-wall carbon nanotubes
US5757038A (en) * 1995-11-06 1998-05-26 International Business Machines Corporation Self-aligned dual gate MOSFET with an ultranarrow channel
US6445006B1 (en) * 1995-12-20 2002-09-03 Advanced Technology Materials, Inc. Microelectronic and microelectromechanical devices comprising carbon nanotube components, and methods of making same
US5799209A (en) 1995-12-29 1998-08-25 Chatter; Mukesh Multi-port internally cached DRAM system utilizing independent serial interfaces and buffers arbitratively connected under a dynamic configuration
US6036774A (en) * 1996-02-26 2000-03-14 President And Fellows Of Harvard College Method of producing metal oxide nanorods
US5897945A (en) * 1996-02-26 1999-04-27 President And Fellows Of Harvard College Metal oxide nanorods
US5875451A (en) * 1996-03-14 1999-02-23 Enhanced Memory Systems, Inc. Computer hybrid memory including DRAM and EDRAM memory components, with secondary cache in EDRAM for DRAM
US5640343A (en) 1996-03-18 1997-06-17 International Business Machines Corporation Magnetic memory array using magnetic tunnel junction devices in the memory cells
US5650958A (en) 1996-03-18 1997-07-22 International Business Machines Corporation Magnetic tunnel junctions with controlled magnetic response
RU98120524A (en) * 1996-05-15 2000-10-10 Хайперион Каталайзис Интернэшнл GRAPHITE NANOFIBERS IN ELECTROCHEMICAL CAPACITORS
US5838165A (en) 1996-08-21 1998-11-17 Chatter; Mukesh High performance self modifying on-the-fly alterable logic FPGA, architecture and method
US5781717A (en) 1996-09-19 1998-07-14 I-Cube, Inc. Dynamic spare column replacement memory system
JPH10106960A (en) 1996-09-25 1998-04-24 Sony Corp Manufacture of quantum thin line
US5802583A (en) 1996-10-30 1998-09-01 Ramtron International Corporation Sysyem and method providing selective write protection for individual blocks of memory in a non-volatile memory device
US6025618A (en) * 1996-11-12 2000-02-15 Chen; Zhi Quan Two-parts ferroelectric RAM
US6038060A (en) * 1997-01-16 2000-03-14 Crowley; Robert Joseph Optical antenna array for harmonic generation, mixing and signal amplification
JP3525934B2 (en) * 1997-02-06 2004-05-10 インターナショナル・ビジネス・マシーンズ・コーポレーション Layered medium and light emitting diode
US6809462B2 (en) * 2000-04-05 2004-10-26 Sri International Electroactive polymer sensors
US5753088A (en) * 1997-02-18 1998-05-19 General Motors Corporation Method for making carbon nanotubes
TW419828B (en) * 1997-02-26 2001-01-21 Toshiba Corp Semiconductor integrated circuit
US5847565A (en) 1997-03-31 1998-12-08 Council Of Scientific And Industrial Research Logic device
US6231744B1 (en) * 1997-04-24 2001-05-15 Massachusetts Institute Of Technology Process for fabricating an array of nanowires
US5878840A (en) * 1997-05-06 1999-03-09 Tessum; Mark Reed Apparatus and method for stabilizing a scaffold assembly
US6233665B1 (en) * 1997-05-27 2001-05-15 Unisys Corporation Mapping shared DRAM address bits by accessing data memory in page mode cache status memory in word mode
US6049856A (en) * 1997-05-27 2000-04-11 Unisys Corporation System for simultaneously accessing two portions of a shared memory
KR100276569B1 (en) * 1997-06-20 2000-12-15 김영환 Ferroelectric memory device
US6069380A (en) * 1997-07-25 2000-05-30 Regents Of The University Of Minnesota Single-electron floating-gate MOS memory
US6212597B1 (en) * 1997-07-28 2001-04-03 Neonet Lllc Apparatus for and method of architecturally enhancing the performance of a multi-port internally cached (AMPIC) DRAM array and like
US6221330B1 (en) * 1997-08-04 2001-04-24 Hyperion Catalysis International Inc. Process for producing single wall nanotubes using unsupported metal catalysts
DE69834673T2 (en) * 1997-09-30 2006-10-26 Noritake Co., Ltd., Nagoya Method for producing an electron-emitting source
US5903010A (en) * 1997-10-29 1999-05-11 Hewlett-Packard Company Quantum wire switch and switching method
US6038637A (en) * 1997-11-25 2000-03-14 Nortel Networks Corporation Universal DRAM address multiplexer
TW392357B (en) * 1998-02-10 2000-06-01 United Microelectronics Corp Manufacturing method for semiconductor device and structure manufactured by the same
US6203864B1 (en) * 1998-06-08 2001-03-20 Nec Corporation Method of forming a heterojunction of a carbon nanotube and a different material, method of working a filament of a nanotube
US6052263A (en) * 1998-08-21 2000-04-18 International Business Machines Corporation Low moment/high coercivity pinned layer for magnetic tunnel junction sensors
US6219212B1 (en) * 1998-09-08 2001-04-17 International Business Machines Corporation Magnetic tunnel junction head structure with insulating antiferromagnetic layer
US6187823B1 (en) * 1998-10-02 2001-02-13 University Of Kentucky Research Foundation Solubilizing single-walled carbon nanotubes by direct reaction with amines and alkylaryl amines
US6348700B1 (en) * 1998-10-27 2002-02-19 The Mitre Corporation Monomolecular rectifying wire and logic based thereupon
US6237130B1 (en) * 1998-10-29 2001-05-22 Nexabit Networks, Inc. Chip layout for implementing arbitrated high speed switching access of pluralities of I/O data ports to internally cached DRAM banks and the like
US6048740A (en) * 1998-11-05 2000-04-11 Sharp Laboratories Of America, Inc. Ferroelectric nonvolatile transistor and method of making same
US6232706B1 (en) * 1998-11-12 2001-05-15 The Board Of Trustees Of The Leland Stanford Junior University Self-oriented bundles of carbon nanotubes and method of making same
US6348295B1 (en) * 1999-03-26 2002-02-19 Massachusetts Institute Of Technology Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging
US6518156B1 (en) * 1999-03-29 2003-02-11 Hewlett-Packard Company Configurable nanoscale crossbar electronic circuits made by electrochemical reaction
US6177703B1 (en) * 1999-05-28 2001-01-23 Vlsi Technology, Inc. Method and apparatus for producing a single polysilicon flash EEPROM having a select transistor and a floating gate transistor
EP1059266A3 (en) * 1999-06-11 2000-12-20 Iljin Nanotech Co., Ltd. Mass synthesis method of high purity carbon nanotubes vertically aligned over large-size substrate using thermal chemical vapor deposition
US6361861B2 (en) * 1999-06-14 2002-03-26 Battelle Memorial Institute Carbon nanotubes on a substrate
DE60044972D1 (en) * 1999-07-02 2010-10-28 Harvard College NANOSCOPIC WIRE CONTAINING ARRANGEMENT, LOGISC
US6062931A (en) * 1999-09-01 2000-05-16 Industrial Technology Research Institute Carbon nanotube emitter with triode structure
US6198655B1 (en) * 1999-12-10 2001-03-06 The Regents Of The University Of California Electrically addressable volatile non-volatile molecular-based switching devices
KR20010063852A (en) * 1999-12-24 2001-07-09 박종섭 A method for forming a self aligned contact of semiconductor device
EP1170799A3 (en) * 2000-07-04 2009-04-01 Infineon Technologies AG Electronic device and method of manufacture of an electronic device
JP2002033174A (en) * 2000-07-17 2002-01-31 Sumitomo Wiring Syst Ltd Automatic connector assembling device
DE10134866B4 (en) * 2000-07-18 2005-08-11 Lg Electronics Inc. Method of horizontally growing carbon nanotubes and field effect transistor using the process grown carbon nanotubes
US6566983B2 (en) * 2000-09-02 2003-05-20 Lg Electronics Inc. Saw filter using a carbon nanotube and method for manufacturing the same
US6354133B1 (en) * 2000-10-25 2002-03-12 Advanced Micro Devices, Inc. Use of carbon nanotubes to calibrate conventional tips used in AFM
US6358756B1 (en) * 2001-02-07 2002-03-19 Micron Technology, Inc. Self-aligned, magnetoresistive random-access memory (MRAM) structure utilizing a spacer containment scheme
US6541309B2 (en) * 2001-03-21 2003-04-01 Hewlett-Packard Development Company Lp Fabricating a molecular electronic device having a protective barrier layer
WO2002095097A1 (en) * 2001-05-21 2002-11-28 Trustees Of Boston College, The Varied morphology carbon nanotubes and methods for their manufacture
US6426687B1 (en) * 2001-05-22 2002-07-30 The Aerospace Corporation RF MEMS switch
US6706402B2 (en) * 2001-07-25 2004-03-16 Nantero, Inc. Nanotube films and articles
US6911682B2 (en) * 2001-12-28 2005-06-28 Nantero, Inc. Electromechanical three-trace junction devices
US6919592B2 (en) * 2001-07-25 2005-07-19 Nantero, Inc. Electromechanical memory array using nanotube ribbons and method for making same
US6924538B2 (en) * 2001-07-25 2005-08-02 Nantero, Inc. Devices having vertically-disposed nanofabric articles and methods of making the same
US7176505B2 (en) * 2001-12-28 2007-02-13 Nantero, Inc. Electromechanical three-trace junction devices
AU2003216070A1 (en) * 2002-01-18 2003-09-02 California Institute Of Technology Array-based architecture for molecular electronics
EP1341184B1 (en) * 2002-02-09 2005-09-14 Samsung Electronics Co., Ltd. Memory device utilizing carbon nanotubes and method of fabricating the memory device
US6759693B2 (en) * 2002-06-19 2004-07-06 Nantero, Inc. Nanotube permeable base transistor
US6919740B2 (en) * 2003-01-31 2005-07-19 Hewlett-Packard Development Company, Lp. Molecular-junction-nanowire-crossbar-based inverter, latch, and flip-flop circuits, and more complex circuits composed, in part, from molecular-junction-nanowire-crossbar-based inverter, latch, and flip-flop circuits
US6918284B2 (en) * 2003-03-24 2005-07-19 The United States Of America As Represented By The Secretary Of The Navy Interconnected networks of single-walled carbon nanotubes
US7294877B2 (en) * 2003-03-28 2007-11-13 Nantero, Inc. Nanotube-on-gate FET structures and applications
WO2005019793A2 (en) * 2003-05-14 2005-03-03 Nantero, Inc. Sensor platform using a horizontally oriented nanotube element
US20040238907A1 (en) * 2003-06-02 2004-12-02 Pinkerton Joseph F. Nanoelectromechanical transistors and switch systems
US7280394B2 (en) * 2003-06-09 2007-10-09 Nantero, Inc. Field effect devices having a drain controlled via a nanotube switching element
US6882256B1 (en) * 2003-06-20 2005-04-19 Northrop Grumman Corporation Anchorless electrostatically activated micro electromechanical system switch
EP1665278A4 (en) * 2003-08-13 2007-11-07 Nantero Inc Nanotube-based switching elements with multiple controls and circuits made from same
US7115960B2 (en) * 2003-08-13 2006-10-03 Nantero, Inc. Nanotube-based switching elements
US7289357B2 (en) * 2003-08-13 2007-10-30 Nantero, Inc. Isolation structure for deflectable nanotube elements
US6969651B1 (en) * 2004-03-26 2005-11-29 Lsi Logic Corporation Layout design and process to form nanotube cell for nanotube memory applications
US7161403B2 (en) * 2004-06-18 2007-01-09 Nantero, Inc. Storage elements using nanotube switching elements
US6955937B1 (en) * 2004-08-12 2005-10-18 Lsi Logic Corporation Carbon nanotube memory cell for integrated circuit structure with removable side spacers to permit access to memory cell and process for forming such memory cell

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6548841B2 (en) * 2000-11-09 2003-04-15 Texas Instruments Incorporated Nanomechanical switches and circuits
US6803840B2 (en) * 2001-03-30 2004-10-12 California Institute Of Technology Pattern-aligned carbon nanotube growth and tunable resonator apparatus
US6809465B2 (en) * 2002-08-23 2004-10-26 Samsung Electronics Co., Ltd. Article comprising MEMS-based two-dimensional e-beam sources and method for making the same

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US7176505B2 (en) 2007-02-13

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