WO2006023489A3 - Cyclic error compensation in interferometry systems - Google Patents

Cyclic error compensation in interferometry systems Download PDF

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Publication number
WO2006023489A3
WO2006023489A3 PCT/US2005/029104 US2005029104W WO2006023489A3 WO 2006023489 A3 WO2006023489 A3 WO 2006023489A3 US 2005029104 W US2005029104 W US 2005029104W WO 2006023489 A3 WO2006023489 A3 WO 2006023489A3
Authority
WO
WIPO (PCT)
Prior art keywords
sub
signal
different paths
tilde over
beams
Prior art date
Application number
PCT/US2005/029104
Other languages
French (fr)
Other versions
WO2006023489A2 (en
Inventor
Frank C Demarest
Henry A Hill
Original Assignee
Zygo Corp
Frank C Demarest
Henry A Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp, Frank C Demarest, Henry A Hill filed Critical Zygo Corp
Priority to JP2007527942A priority Critical patent/JP4918487B2/en
Publication of WO2006023489A2 publication Critical patent/WO2006023489A2/en
Publication of WO2006023489A3 publication Critical patent/WO2006023489A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain

Abstract

The invention features a method including: (i) providing an interference signal S(t) from two beams directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time; (ii) providing one or more coefficients representative of one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A.sub.l cos(.omega..sub.Rt+.phi.(t)+.zeta..sub.l), where A.sub. l and.zeta..sub.l are constants,. omega.. sub.R is an angular frequency difference between the two beams before being directed along the different paths, and.phi.(t)=nk{tilde over (L)}(t), with k=2.pi./.lambda. and.lambda, equal to a wavelength for the beams; (iii) calculating a linear combination of values of the signal S(t); and (iv) reducing the effect of the deviation of S(t) from the ideal expression on an estimate of {tilde over (L)}(t) using an error signal generated from the coefficients and one or more error basis functions derived at least in part from the linear combination of values of the signal S(t).
PCT/US2005/029104 2004-08-16 2005-08-15 Cyclic error compensation in interferometry systems WO2006023489A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007527942A JP4918487B2 (en) 2004-08-16 2005-08-15 Periodic error correction in interferometer systems.

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US60224204P 2004-08-16 2004-08-16
US60/602,242 2004-08-16
US11/060,173 US7428685B2 (en) 2002-07-08 2005-02-17 Cyclic error compensation in interferometry systems
US11/060,173 2005-02-17

Publications (2)

Publication Number Publication Date
WO2006023489A2 WO2006023489A2 (en) 2006-03-02
WO2006023489A3 true WO2006023489A3 (en) 2007-11-29

Family

ID=35968106

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/029104 WO2006023489A2 (en) 2004-08-16 2005-08-15 Cyclic error compensation in interferometry systems

Country Status (3)

Country Link
US (1) US7428685B2 (en)
JP (1) JP4918487B2 (en)
WO (1) WO2006023489A2 (en)

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US7616322B2 (en) * 2002-07-08 2009-11-10 Zygo Corporation Cyclic error compensation in interferometry systems
US7365857B2 (en) * 2004-10-22 2008-04-29 Zygo Corporation Precompensation of polarization errors in heterodyne interferometry
US20080109178A1 (en) * 2006-11-03 2008-05-08 Nikon Corporation Method and system for predicting and correcting signal fluctuations of an interferometric measuring apparatus
US7576868B2 (en) * 2007-06-08 2009-08-18 Zygo Corporation Cyclic error compensation in interferometry systems
US8004688B2 (en) * 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
JP5697323B2 (en) * 2009-10-22 2015-04-08 キヤノン株式会社 Heterodyne interferometer
JP5582990B2 (en) 2010-12-08 2014-09-03 キヤノン株式会社 measuring device
WO2012082555A2 (en) * 2010-12-16 2012-06-21 Zygo Corporation Cyclic error compensation in inteferometric encoder systems
JP2013002921A (en) * 2011-06-15 2013-01-07 Canon Inc Measuring device
JP2013217670A (en) * 2012-04-04 2013-10-24 Canon Inc Measuring device and measuring method
TWI516746B (en) * 2012-04-20 2016-01-11 賽格股份有限公司 Method, apparatus, and computer-program product for performing non-harmonic cyclic error compensation in interferometric encoder systems and lithography systems
JP2014109481A (en) * 2012-11-30 2014-06-12 Canon Inc Measurement method and measurement device
DE102016203996A1 (en) * 2016-03-11 2017-09-14 Robert Bosch Gmbh Method for determining angle errors and light emitting device
KR102285916B1 (en) * 2016-06-08 2021-08-03 지고 코포레이션 Precision positioning system using wavelength tunable laser

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Also Published As

Publication number Publication date
US7428685B2 (en) 2008-09-23
JP2008510170A (en) 2008-04-03
JP4918487B2 (en) 2012-04-18
WO2006023489A2 (en) 2006-03-02
US20050166118A1 (en) 2005-07-28

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