WO2008138609A3 - Reflektiv beschichtetes halbleiterbauelement, verfahren zu dessen herstellung sowie dessen verwendung - Google Patents
Reflektiv beschichtetes halbleiterbauelement, verfahren zu dessen herstellung sowie dessen verwendung Download PDFInfo
- Publication number
- WO2008138609A3 WO2008138609A3 PCT/EP2008/003877 EP2008003877W WO2008138609A3 WO 2008138609 A3 WO2008138609 A3 WO 2008138609A3 EP 2008003877 W EP2008003877 W EP 2008003877W WO 2008138609 A3 WO2008138609 A3 WO 2008138609A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor component
- production
- reflectively coated
- coated semiconductor
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010410 layer Substances 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000002346 layers by function Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
- H01L31/02165—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors using interference filters, e.g. multilayer dielectric filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/056—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means the light-reflecting means being of the back surface reflector [BSR] type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
Abstract
Die Erfindung betrifft ein reflektiv beschichtetes Halbleiterbauelement, das eine Halbleiterschicht, eine funktionale, im Wesentlichen aus Silicium und Kohlenstoff bestehende Schicht (2), und mindestens eine weitere, im Wesentlichen aus Silicium und Kohlenstoff bestehende Schicht (5), aufweist. Diese weitere Schicht fungiert als Reflektor für auf das Halbleiterbauelement fallendes Licht. Ebenso betrifft die Erfindung ein Verfahren zur Herstellung derartiger Halbleiterbauelemente. Verwendung finden die Halbleiterbauelemente insbesondere als Solarzellen bzw. als Bestandteil von Sensoren oder optischen Filtern.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/598,351 US20100206371A1 (en) | 2007-05-14 | 2008-05-14 | Reflectively coated semiconductor component, method for production and use thereof |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07009628.4 | 2007-05-14 | ||
EP07009628A EP1993142A1 (de) | 2007-05-14 | 2007-05-14 | Reflektiv beschichtetes Halbleiterbauelement, Verfahren zu dessen Herstellung sowie dessen Verwendung |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008138609A2 WO2008138609A2 (de) | 2008-11-20 |
WO2008138609A3 true WO2008138609A3 (de) | 2009-01-22 |
Family
ID=38557802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2008/003877 WO2008138609A2 (de) | 2007-05-14 | 2008-05-14 | Reflektiv beschichtetes halbleiterbauelement, verfahren zu dessen herstellung sowie dessen verwendung |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100206371A1 (de) |
EP (1) | EP1993142A1 (de) |
WO (1) | WO2008138609A2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7858427B2 (en) * | 2009-03-03 | 2010-12-28 | Applied Materials, Inc. | Crystalline silicon solar cells on low purity substrate |
DE102010006315B4 (de) | 2010-01-29 | 2012-08-30 | Albert-Ludwigs-Universität Freiburg | Verfahren zur lokalen Hochdotierung und Kontaktierung einer Halbleiterstruktur, welche eine Solarzelle oder eine Vorstufe einer Solarzelle ist |
DE102010060339A1 (de) * | 2010-11-04 | 2012-05-10 | Q-Cells Se | Solarzelle und Solarzellenherstellungsverfahren |
US9330917B2 (en) * | 2012-02-24 | 2016-05-03 | Varian Semiconductor Equipment Associates, Inc. | Passivation layer for workpieces formed from a polymer |
Citations (6)
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GB2116364A (en) * | 1982-03-03 | 1983-09-21 | Energy Conversion Devices Inc | Photovoltaic device having incident radiation directing means |
EP0341017A2 (de) * | 1988-05-04 | 1989-11-08 | Astrosystems, Inc. | Sonnenzelle mit niedergeschlagener Siliziumschicht |
GB2219689A (en) * | 1988-06-01 | 1989-12-13 | Mitsubishi Electric Corp | Photoelectric element |
US5230746A (en) * | 1992-03-03 | 1993-07-27 | Amoco Corporation | Photovoltaic device having enhanced rear reflecting contact |
WO1997038145A1 (de) * | 1996-04-03 | 1997-10-16 | Alusuisse Technology & Management Ag | Beschichtungssubstrat |
EP1722419A1 (de) * | 2005-05-12 | 2006-11-15 | General Electric Company | Oberflächenpassiviertes photovoltaisches Bauelement |
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US4418533A (en) * | 1980-07-14 | 1983-12-06 | Mechanical Technology Incorporated | Free-piston stirling engine inertial cancellation system |
JPH0462716A (ja) * | 1990-06-29 | 1992-02-27 | Matsushita Electric Ind Co Ltd | 結晶性炭素系薄膜およびその堆積方法 |
US5266125A (en) * | 1992-05-12 | 1993-11-30 | Astropower, Inc. | Interconnected silicon film solar cell array |
US5641362A (en) * | 1995-11-22 | 1997-06-24 | Ebara Solar, Inc. | Structure and fabrication process for an aluminum alloy junction self-aligned back contact silicon solar cell |
DE19650111B4 (de) * | 1996-12-03 | 2004-07-01 | Siemens Solar Gmbh | Solarzelle mit geringer Abschattung und Verfahren zur Herstellung |
DE10021440A1 (de) * | 2000-05-03 | 2001-11-15 | Univ Konstanz | Verfahren zur Herstellung einer Solarzelle und nach diesem Verfahren hergestellte Solarzelle |
DE10042733A1 (de) * | 2000-08-31 | 2002-03-28 | Inst Physikalische Hochtech Ev | Multikristalline laserkristallisierte Silicium-Dünnschicht-Solarzelle auf transparentem Substrat |
JP2002343993A (ja) * | 2001-03-15 | 2002-11-29 | Canon Inc | 薄膜多結晶太陽電池及びその形成方法 |
EP1378947A1 (de) * | 2002-07-01 | 2004-01-07 | Interuniversitair Microelektronica Centrum Vzw | Ätzpaste für Halbleiter und Verwendung einer Ätzpaste zum lokalisierten Ätzen von Halbleitersubstraten |
US7122733B2 (en) * | 2002-09-06 | 2006-10-17 | The Boeing Company | Multi-junction photovoltaic cell having buffer layers for the growth of single crystal boron compounds |
US20050056312A1 (en) * | 2003-03-14 | 2005-03-17 | Young David L. | Bifacial structure for tandem solar cells |
US7189917B2 (en) * | 2003-03-26 | 2007-03-13 | Canon Kabushiki Kaisha | Stacked photovoltaic device |
US7170001B2 (en) * | 2003-06-26 | 2007-01-30 | Advent Solar, Inc. | Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias |
US7649141B2 (en) * | 2003-06-30 | 2010-01-19 | Advent Solar, Inc. | Emitter wrap-through back contact solar cells on thin silicon wafers |
US20060060238A1 (en) * | 2004-02-05 | 2006-03-23 | Advent Solar, Inc. | Process and fabrication methods for emitter wrap through back contact solar cells |
US20050172996A1 (en) * | 2004-02-05 | 2005-08-11 | Advent Solar, Inc. | Contact fabrication of emitter wrap-through back contact silicon solar cells |
US7144751B2 (en) * | 2004-02-05 | 2006-12-05 | Advent Solar, Inc. | Back-contact solar cells and methods for fabrication |
US10374120B2 (en) * | 2005-02-18 | 2019-08-06 | Koninklijke Philips N.V. | High efficiency solar cells utilizing wafer bonding and layer transfer to integrate non-lattice matched materials |
DE102005013640A1 (de) * | 2005-03-24 | 2006-10-05 | Atmel Germany Gmbh | Halbleiter-Photodetektor und Verfahren zum Herstellen desselben |
US20100059107A1 (en) * | 2005-09-16 | 2010-03-11 | Blue Square Energy Incorporated | Photovoltaic solar cell and method of making the same |
EP2009703A1 (de) * | 2006-04-14 | 2008-12-31 | Sharp Kabushiki Kaisha | Solarzelle, die solarzelle verwendendes solarzellenmodul und verfahren zur herstellung des solarzellenmoduls |
DE102006027737A1 (de) * | 2006-06-10 | 2007-12-20 | Hahn-Meitner-Institut Berlin Gmbh | Einseitig kontaktierte Solarzelle mit Durchkontaktierungen und Verfahren zur Herstellung |
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US8895842B2 (en) * | 2008-08-29 | 2014-11-25 | Applied Materials, Inc. | High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells |
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EP2190033A1 (de) * | 2008-11-24 | 2010-05-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Tandemsolarzelle aus kristallinem Silizium und kristallinem Siliziumcarbid sowie Verfahren zu dessen Herstellung |
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-
2007
- 2007-05-14 EP EP07009628A patent/EP1993142A1/de not_active Ceased
-
2008
- 2008-05-14 US US12/598,351 patent/US20100206371A1/en not_active Abandoned
- 2008-05-14 WO PCT/EP2008/003877 patent/WO2008138609A2/de active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2116364A (en) * | 1982-03-03 | 1983-09-21 | Energy Conversion Devices Inc | Photovoltaic device having incident radiation directing means |
EP0341017A2 (de) * | 1988-05-04 | 1989-11-08 | Astrosystems, Inc. | Sonnenzelle mit niedergeschlagener Siliziumschicht |
GB2219689A (en) * | 1988-06-01 | 1989-12-13 | Mitsubishi Electric Corp | Photoelectric element |
US5230746A (en) * | 1992-03-03 | 1993-07-27 | Amoco Corporation | Photovoltaic device having enhanced rear reflecting contact |
WO1997038145A1 (de) * | 1996-04-03 | 1997-10-16 | Alusuisse Technology & Management Ag | Beschichtungssubstrat |
EP1722419A1 (de) * | 2005-05-12 | 2006-11-15 | General Electric Company | Oberflächenpassiviertes photovoltaisches Bauelement |
Non-Patent Citations (1)
Title |
---|
XU ET AL: "All amorphous SiC based luminescent microcavity", DIAMOND AND RELATED MATERIALS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 14, no. 11-12, November 2005 (2005-11-01), pages 1999 - 2002, XP005486446, ISSN: 0925-9635 * |
Also Published As
Publication number | Publication date |
---|---|
EP1993142A1 (de) | 2008-11-19 |
US20100206371A1 (en) | 2010-08-19 |
WO2008138609A2 (de) | 2008-11-20 |
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