WO2009034953A1 - Thin film transistor - Google Patents

Thin film transistor Download PDF

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Publication number
WO2009034953A1
WO2009034953A1 PCT/JP2008/066198 JP2008066198W WO2009034953A1 WO 2009034953 A1 WO2009034953 A1 WO 2009034953A1 JP 2008066198 W JP2008066198 W JP 2008066198W WO 2009034953 A1 WO2009034953 A1 WO 2009034953A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
film transistor
layer
layers
disclosed
Prior art date
Application number
PCT/JP2008/066198
Other languages
French (fr)
Japanese (ja)
Inventor
Koki Yano
Kazuyoshi Inoue
Shigekazu Tomai
Masashi Kasami
Original Assignee
Idemitsu Kosan Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co., Ltd. filed Critical Idemitsu Kosan Co., Ltd.
Priority to JP2009532177A priority Critical patent/JPWO2009034953A1/en
Publication of WO2009034953A1 publication Critical patent/WO2009034953A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • H01L29/78693Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate the semiconducting oxide being amorphous
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel

Abstract

Disclosed is a thin film transistor comprising an oxide semiconductor film wherein a crystalline layer and an amorphous layer are arranged in layers.
PCT/JP2008/066198 2007-09-10 2008-09-09 Thin film transistor WO2009034953A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009532177A JPWO2009034953A1 (en) 2007-09-10 2008-09-09 Thin film transistor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-233942 2007-09-10
JP2007233942 2007-09-10

Publications (1)

Publication Number Publication Date
WO2009034953A1 true WO2009034953A1 (en) 2009-03-19

Family

ID=40451960

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066198 WO2009034953A1 (en) 2007-09-10 2008-09-09 Thin film transistor

Country Status (3)

Country Link
JP (1) JPWO2009034953A1 (en)
TW (1) TWI453915B (en)
WO (1) WO2009034953A1 (en)

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