WO2010062860A3 - Fiber-based interferometer system for monitoring an imaging interferometer - Google Patents
Fiber-based interferometer system for monitoring an imaging interferometer Download PDFInfo
- Publication number
- WO2010062860A3 WO2010062860A3 PCT/US2009/065572 US2009065572W WO2010062860A3 WO 2010062860 A3 WO2010062860 A3 WO 2010062860A3 US 2009065572 W US2009065572 W US 2009065572W WO 2010062860 A3 WO2010062860 A3 WO 2010062860A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sensor
- light
- objective
- light source
- stage
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
- G01B9/02068—Auto-alignment of optical elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02076—Caused by motion
- G01B9/02077—Caused by motion of the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
Abstract
Apparatus include a microscope including an objective and a stage for positioning a test object relative to the objective, the stage being moveable with respect to the objective, and a sensor system including a sensor light source, an interferometric sensor configured to receive light from the sensor light source, to introduce an optical path difference (OPD) between first and second portions of the light, the OPD being related to a distance between the objective lens and the stage, and to combine the light portions to provide output light, a detector for detecting the output light from the interferometric sensor, a fiber waveguide for directing light between the sensor light source, the interferometric sensor and the detector, a tunable optical cavity between the sensor light source and the interferometric sensor, and an electronic controller configured to determine information related to the OPD based on the detected output light.
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11815108P | 2008-11-26 | 2008-11-26 | |
US61/118,151 | 2008-11-26 | ||
US12/509,098 US8004688B2 (en) | 2008-11-26 | 2009-07-24 | Scan error correction in low coherence scanning interferometry |
US12/509,098 | 2009-07-24 | ||
US12/541,325 US7978338B2 (en) | 2008-11-26 | 2009-08-14 | Compound reference interferometer |
US12/541,325 | 2009-08-14 | ||
US12/551,308 | 2009-08-31 | ||
US12/551,308 US8379218B2 (en) | 2008-11-26 | 2009-08-31 | Fiber-based interferometer system for monitoring an imaging interferometer |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2010062860A2 WO2010062860A2 (en) | 2010-06-03 |
WO2010062860A3 true WO2010062860A3 (en) | 2010-08-26 |
Family
ID=42195958
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/065572 WO2010062860A2 (en) | 2008-11-26 | 2009-11-23 | Fiber-based interferometer system for monitoring an imaging interferometer |
PCT/US2009/065529 WO2010062853A2 (en) | 2008-11-26 | 2009-11-23 | Scan error correction in low coherence scanning interferometry |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/065529 WO2010062853A2 (en) | 2008-11-26 | 2009-11-23 | Scan error correction in low coherence scanning interferometry |
Country Status (7)
Country | Link |
---|---|
US (5) | US8004688B2 (en) |
EP (1) | EP2238430B9 (en) |
JP (1) | JP5536667B2 (en) |
KR (2) | KR101191842B1 (en) |
CN (1) | CN102057269B (en) |
TW (1) | TWI425184B (en) |
WO (2) | WO2010062860A2 (en) |
Families Citing this family (180)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006033229B4 (en) * | 2006-07-18 | 2013-05-08 | Ezono Ag | Ultrasonic probe and method for the optical detection of ultrasonic waves |
WO2011160064A1 (en) * | 2010-06-17 | 2011-12-22 | Purdue Research Foundation | Digital holographic method of measuring cellular activity and of using results to screen compounds |
US10426348B2 (en) | 2008-03-05 | 2019-10-01 | Purdue Research Foundation | Using differential time-frequency tissue-response spectroscopy to evaluate living body response to a drug |
US7839496B2 (en) * | 2008-04-24 | 2010-11-23 | Araca Incorporated | Confocal microscopy pad sample holder and method of hand using the same |
US8004688B2 (en) * | 2008-11-26 | 2011-08-23 | Zygo Corporation | Scan error correction in low coherence scanning interferometry |
DE102008060621B3 (en) * | 2008-12-05 | 2010-08-12 | Carl Zeiss Ag | Optical arrangement for the contactless measurement or testing of a body surface |
US8107084B2 (en) * | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
JP5426901B2 (en) * | 2009-02-26 | 2014-02-26 | 株式会社日立製作所 | Spectral optical system in DUV-UV band and spectroscopic measurement apparatus using the same |
US7869027B2 (en) * | 2009-04-20 | 2011-01-11 | Araca, Inc. | Confocal microscopy pad sample holder that measures displacement and method of using the same |
CN114563027A (en) * | 2009-05-27 | 2022-05-31 | 希里克萨有限公司 | Optical sensing method and device |
FI20095619A0 (en) * | 2009-06-04 | 2009-06-04 | Gasera Ltd | A system and method for measuring relative motion |
US9025156B2 (en) * | 2009-12-14 | 2015-05-05 | Konica Minolta Holdings, Inc. | Interferometer and fourier spectrometer using same |
US8508746B2 (en) * | 2010-03-30 | 2013-08-13 | Duke University | Interferometric systems having reflective chambers and related methods |
WO2011135698A1 (en) * | 2010-04-28 | 2011-11-03 | キヤノン株式会社 | Method of measuring deformation |
US8705041B2 (en) * | 2010-05-27 | 2014-04-22 | Promet International, Inc. | Coaxial interferometer and inspection probe |
US10401793B2 (en) | 2010-06-17 | 2019-09-03 | Purdue Research Foundation | Digital holographic method of measuring cellular activity and measuring apparatus with improved stability |
TWI500963B (en) * | 2010-06-29 | 2015-09-21 | Chroma Ate Inc | An image capturing device and method |
JP4912504B1 (en) * | 2010-09-16 | 2012-04-11 | キヤノン株式会社 | Refractive index measurement method and measurement apparatus |
CN102554709A (en) * | 2010-12-10 | 2012-07-11 | 通用电气公司 | Distance measuring system and distance measuring method |
JP5794664B2 (en) * | 2011-01-20 | 2015-10-14 | キヤノン株式会社 | Tomographic image generating apparatus and tomographic image generating method |
DE102011003807A1 (en) * | 2011-02-08 | 2012-08-09 | Leica Microsystems Cms Gmbh | Microscope with autofocus device and autofocusing method for microscopes |
NL2008110A (en) | 2011-02-18 | 2012-08-21 | Asml Netherlands Bv | Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method. |
US10359361B2 (en) * | 2011-02-18 | 2019-07-23 | The General Hospital Corporation | Laser speckle micro-rheology in characterization of biomechanical properties of tissues |
KR101186464B1 (en) * | 2011-04-13 | 2012-09-27 | 에스엔유 프리시젼 주식회사 | Interferometric system for measuring tsv and method using the same |
US8817269B2 (en) * | 2011-04-26 | 2014-08-26 | Carl Zeiss Meditec, Inc. | Fizeau reference arm using a chirped fiber bragg grating |
TWI472822B (en) * | 2011-05-20 | 2015-02-11 | Univ Feng Chia | Parallelism inspection apparatus and method thereof |
US9784568B2 (en) * | 2011-05-20 | 2017-10-10 | Universitat Politècnica De Catalunya | Method and device for non-contact three dimensional object surface imaging |
US20120300040A1 (en) * | 2011-05-25 | 2012-11-29 | Microsoft Corporation | Imaging system |
TWI447352B (en) * | 2011-07-08 | 2014-08-01 | 私立中原大學 | Optical tomography system |
JP5787255B2 (en) * | 2011-07-12 | 2015-09-30 | 国立大学法人 筑波大学 | Program for correcting measurement data of PS-OCT and PS-OCT system equipped with the program |
US20130017762A1 (en) * | 2011-07-15 | 2013-01-17 | Infineon Technologies Ag | Method and Apparatus for Determining a Measure of a Thickness of a Polishing Pad of a Polishing Machine |
JP2013036848A (en) * | 2011-08-08 | 2013-02-21 | Nikon Corp | Height measuring device and method |
TWI466112B (en) * | 2011-10-07 | 2014-12-21 | Ind Tech Res Inst | Optical equipment and registration method |
DE102011115027A1 (en) * | 2011-10-07 | 2013-04-11 | Polytec Gmbh | Coherence grid interferometer and method for spatially resolved optical measurement of the surface geometry of an object |
CN103033129B (en) * | 2011-10-07 | 2015-10-21 | 财团法人工业技术研究院 | Optical apparatus and optical addressing method |
JP5714780B2 (en) * | 2011-11-09 | 2015-05-07 | ザイゴ コーポレーションZygo Corporation | Double-pass interferometric encoder system |
WO2013070848A1 (en) * | 2011-11-09 | 2013-05-16 | Zygo Corporation | Low coherence interferometry using encoder systems |
EP2776790B1 (en) | 2011-11-09 | 2016-09-14 | Zygo Corporation | Compact encoder head for interferometric encoder system |
JP5527625B2 (en) * | 2011-11-22 | 2014-06-18 | 横河電機株式会社 | Microscope equipment |
US20130153552A1 (en) * | 2011-12-14 | 2013-06-20 | Gwangju Institute Of Science And Technology | Scribing apparatus and method for having analysis function of material distribution |
US9360302B2 (en) * | 2011-12-15 | 2016-06-07 | Kla-Tencor Corporation | Film thickness monitor |
WO2014112086A1 (en) | 2013-01-17 | 2014-07-24 | 浜松ホトニクス株式会社 | Image acquisition device and focus method for image acquisition device |
CN102589463B (en) * | 2012-01-10 | 2014-01-15 | 合肥工业大学 | Two-dimensional and three-dimensional integrated imaging measurement system |
JP5984406B2 (en) * | 2012-02-01 | 2016-09-06 | キヤノン株式会社 | measuring device |
TWI502549B (en) * | 2012-02-20 | 2015-10-01 | Univ Nat Kaohsiung Applied Sci | Recognition method and system for component images |
JP2013200182A (en) * | 2012-03-23 | 2013-10-03 | Toshiba Corp | Defect inspection device and defect inspection method |
US20150085291A1 (en) * | 2012-03-29 | 2015-03-26 | Asml Holding N.V. | Compact Self-Contained Holographic and Interferometric Apparatus |
TWI516746B (en) | 2012-04-20 | 2016-01-11 | 賽格股份有限公司 | Method, apparatus, and computer-program product for performing non-harmonic cyclic error compensation in interferometric encoder systems and lithography systems |
EP2662661A1 (en) | 2012-05-07 | 2013-11-13 | Leica Geosystems AG | Measuring device with an interferometer and an absorption medium defining a thick line spectrum |
US9113782B2 (en) * | 2012-06-01 | 2015-08-25 | Joshua Noel Hogan | Multiple reference OCT system |
JP6353831B2 (en) * | 2012-06-26 | 2018-07-04 | ケーエルエー−テンカー コーポレイション | Algorithmic removal from scanning and diffraction optical measurements in angle-resolved reflectometry |
JP5975785B2 (en) * | 2012-08-14 | 2016-08-23 | 株式会社アドテックエンジニアリング | Drawing apparatus, exposure drawing apparatus, program, and drawing method |
JP6006053B2 (en) * | 2012-09-06 | 2016-10-12 | アストロデザイン株式会社 | Laser scanning fluorescence microscope |
FR2995677B1 (en) * | 2012-09-14 | 2014-08-29 | Thales Sa | OPTICAL INSTRUMENT WITH WAVE FRONT ANALYZER |
EP2904347B1 (en) * | 2012-10-04 | 2018-07-18 | Zygo Corporation | Position monitoring system with reduced noise |
WO2014064701A1 (en) * | 2012-10-26 | 2014-05-01 | Applied Spectral Imaging Ltd. | Method and system for spectral imaging |
KR101643113B1 (en) * | 2012-11-30 | 2016-08-10 | 퀘드 테크놀러지즈 인터내셔날, 인크. | Integrated wavefront sensor and profilometer |
US20150157199A1 (en) * | 2012-12-06 | 2015-06-11 | Noam Sapiens | Method and apparatus for scatterometric measurement of human tissue |
US9291505B2 (en) * | 2012-12-07 | 2016-03-22 | Baker Hughes Incorporated | Polarization scrambling in interferometer systems |
TWI623776B (en) * | 2012-12-17 | 2018-05-11 | Lg伊諾特股份有限公司 | Method of designing and optical substrate |
EP2947490A4 (en) | 2013-01-17 | 2016-08-31 | Hamamatsu Photonics Kk | Image acquisition device and focus method for image acquisition device |
CN104919351B (en) | 2013-01-17 | 2017-05-24 | 浜松光子学株式会社 | Image acquisition device and focus method for image acquisition device |
HUE054657T2 (en) * | 2013-01-17 | 2021-09-28 | Hamamatsu Photonics Kk | Image capturing appartus and focusing method thereof |
CN103105236B (en) * | 2013-01-18 | 2014-08-20 | 电子科技大学 | Method used for liquid crystal optical phase modulator phase detection |
KR102048793B1 (en) * | 2013-02-12 | 2019-11-26 | 지고 코포레이션 | Surface topography interferometer with surface color |
US9305753B2 (en) * | 2013-03-06 | 2016-04-05 | Kla-Tencor Corporation | Thickness change monitor wafer for in situ film thickness monitoring |
US9052190B2 (en) * | 2013-03-12 | 2015-06-09 | Kla-Tencor Corporation | Bright-field differential interference contrast system with scanning beams of round and elliptical cross-sections |
KR101462848B1 (en) * | 2013-03-18 | 2014-11-18 | 에스엔유 프리시젼 주식회사 | Three dimensional shape measurment apparatus for recogniting color |
US9313418B2 (en) * | 2013-05-30 | 2016-04-12 | Toshiba America Electronic Components, Inc. | Method and apparatus for detection of biological conditions |
US20150002852A1 (en) * | 2013-06-26 | 2015-01-01 | Zygo Corporation | Coherence scanning interferometry using phase shifted interferometrty signals |
CN104375383B (en) * | 2013-08-13 | 2017-08-29 | 上海微电子装备有限公司 | Focusing-levelling detection device and method for lithographic equipment |
US9116038B2 (en) | 2013-08-19 | 2015-08-25 | International Business Machines Corporation | Integrated optical illumination reference source |
JP6250329B2 (en) * | 2013-08-19 | 2017-12-20 | 株式会社ディスコ | Processing equipment |
US9857160B1 (en) | 2013-09-24 | 2018-01-02 | TVS Holdings, LLC | Multi-mode frequency sweeping interferometer and method of using same |
JP6257072B2 (en) * | 2013-10-16 | 2018-01-10 | 国立大学法人 筑波大学 | Surface shape measurement method using a white interferometer |
JP2015085398A (en) * | 2013-10-28 | 2015-05-07 | 株式会社ディスコ | Cutting device |
JP6305013B2 (en) * | 2013-10-28 | 2018-04-04 | 株式会社ディスコ | Processing equipment |
US9874628B2 (en) * | 2013-11-12 | 2018-01-23 | The Boeing Company | Dual hidden point bars |
CN104730279B (en) * | 2013-12-20 | 2018-04-10 | 中国工程物理研究院激光聚变研究中心 | A kind of chirped pulse velocity interferometer |
US9798130B2 (en) | 2014-01-09 | 2017-10-24 | Zygo Corporation | Measuring topography of aspheric and other non-flat surfaces |
US10317189B2 (en) * | 2014-01-23 | 2019-06-11 | Kabushiki Kaisha Topcon | Detection of missampled interferograms in frequency domain OCT with a k-clock |
US10185299B2 (en) | 2014-03-11 | 2019-01-22 | Ametek Precitech, Inc. | Edge treatment process |
US9719777B1 (en) * | 2014-05-30 | 2017-08-01 | Zygo Corporation | Interferometer with real-time fringe-free imaging |
US9282304B1 (en) | 2014-06-02 | 2016-03-08 | Bruker Nano Inc. | Full-color images produced by white-light interferometry |
JP6371865B2 (en) * | 2014-06-10 | 2018-08-08 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus and method for manufacturing a lithographic apparatus |
RU2572412C1 (en) * | 2014-06-27 | 2016-01-10 | Общество с ограниченной ответственностью "Фурье фотоникс" | High-precision interferometer with active suppression of spurious vibrations |
KR102340495B1 (en) * | 2014-07-14 | 2021-12-16 | 지고 코포레이션 | Interferometric encoders using spectral analysis |
TWI599758B (en) | 2014-08-12 | 2017-09-21 | 賽格股份有限公司 | Method of calibrating a scanning interferometry imaging system, scanning interferometry imaging system, non-transitory computer readable medium, and method of calibrating an scanning interferometry imaging system having a broadband light source |
WO2016027874A1 (en) * | 2014-08-21 | 2016-02-25 | 公立大学法人大阪市立大学 | Stress visualization device, and mechanical property value visualization device |
CN104219463B (en) * | 2014-09-17 | 2017-05-31 | 中国科学院苏州生物医学工程技术研究所 | Laser scanning confocal micro- scope imaging data processing method based on integration sampling |
TWI522979B (en) | 2014-09-19 | 2016-02-21 | 群創光電股份有限公司 | Liquid display panel and method for detecting potentials generated from ions of liquid crystal layer and alignment layer comprised therein |
CN104345168A (en) * | 2014-11-07 | 2015-02-11 | 中国工程物理研究院激光聚变研究中心 | Scanning frequency domain interferometer |
US9976947B1 (en) | 2014-11-24 | 2018-05-22 | TVS Holdings, LLC | Position measurement device |
DE102014118151A1 (en) * | 2014-12-08 | 2016-06-09 | Universität Kassel | White-light interference microscope and method for operating a white-light interference microscope |
TWI546841B (en) | 2014-12-10 | 2016-08-21 | 財團法人工業技術研究院 | Electron microscope having carrier |
US9869852B2 (en) * | 2015-01-26 | 2018-01-16 | Thorlabs, Inc. | Microscopy system with auto-focus adjustment by low-coherence interferometry |
TWI550982B (en) * | 2015-03-06 | 2016-09-21 | 智泰科技股份有限公司 | Real-time wavelength correction system for visible light |
DE102015108912A1 (en) * | 2015-06-05 | 2016-12-08 | Carl Zeiss Microscopy Gmbh | Apparatus and method for detecting surface topographies |
US9759555B2 (en) * | 2015-07-09 | 2017-09-12 | Camtek Ltd. | High throughput triangulation system |
DE102015113465B4 (en) * | 2015-08-14 | 2018-05-03 | Medizinisches Laserzentrum Lübeck GmbH | Method and device for scanning at least one cut surface in the interior of a light-scattering object |
US20170067735A1 (en) * | 2015-09-09 | 2017-03-09 | Vishal Khosla | Apparatus for In-Line Test and Surface Analysis on a Mechanical Property Tester |
CN105509638A (en) * | 2015-12-01 | 2016-04-20 | 中国科学院长春光学精密机械与物理研究所 | Phase-shift interference information processing method based on error compensation |
CN105655267A (en) * | 2016-01-04 | 2016-06-08 | 京东方科技集团股份有限公司 | Early-warning system for detecting substrates, and production equipment |
US11598627B2 (en) | 2016-02-03 | 2023-03-07 | Virginia Tech Intellectual Properties, Inc. | Methods, systems and apparatus of interferometry for imaging and sensing |
US11150173B2 (en) | 2016-02-12 | 2021-10-19 | The General Hospital Corporation | Laser speckle micro-rheology in characterization of biomechanical properties of tissues |
DE102016204535A1 (en) * | 2016-03-18 | 2017-09-21 | Carl Zeiss Smt Gmbh | Measuring microscope for measuring masks for lithographic processes and measuring methods and calibration methods therefor |
FR3050023B1 (en) * | 2016-04-11 | 2020-02-14 | Unity Semiconductor | METHOD AND SYSTEM FOR OPTICAL INSPECTION AND MEASUREMENT OF A FACE OF AN OBJECT |
CN105806236B (en) * | 2016-05-11 | 2018-08-28 | 天津大学 | Linnik type interference spectrums measure the nonlinear phase compensation method of film |
CN107578986B (en) * | 2016-07-04 | 2019-11-01 | 中芯国际集成电路制造(上海)有限公司 | The measurement method of semiconductor structure and forming method thereof and photoetching offset |
US10024776B2 (en) * | 2016-07-20 | 2018-07-17 | Rtec-Instruments, Inc. | Apparatus for in-line testing and surface analysis on a mechanical property tester |
DE102016213237A1 (en) * | 2016-07-20 | 2018-01-25 | Carl Zeiss Smt Gmbh | Measuring device for the interferometric determination of a shape of an optical surface |
CN113739694A (en) | 2016-09-15 | 2021-12-03 | 科磊股份有限公司 | System and method for optimizing focus of imaging-based coverage metrics |
US10890428B2 (en) | 2016-11-18 | 2021-01-12 | Zygo Corporation | Interferometric method and apparatus using calibration information relating a focus setting to a test object position |
US10288408B2 (en) | 2016-12-01 | 2019-05-14 | Nanometrics Incorporated | Scanning white-light interferometry system for characterization of patterned semiconductor features |
CN106855521B (en) * | 2017-03-06 | 2023-07-14 | 南京市计量监督检测院 | Rail web surface crack micro-deformation detection device and detection method |
US10753726B2 (en) | 2017-03-26 | 2020-08-25 | Cognex Corporation | System and method for 3D profile determination using model-based peak selection |
EP3396306B1 (en) * | 2017-04-26 | 2019-11-27 | Mitutoyo Corporation | Method and system for calculating a height map of a surface of an object from an image stack in scanning optical 2.5d profiling of the surface by an optical system |
DE102017114023A1 (en) * | 2017-06-23 | 2018-12-27 | SmarAct Holding GmbH | Method and detector for interferometry-correlated imaging |
CN113375797A (en) | 2017-07-06 | 2021-09-10 | 浜松光子学株式会社 | Mirror assembly and optical module |
US10310085B2 (en) * | 2017-07-07 | 2019-06-04 | Mezmeriz Inc. | Photonic integrated distance measuring pixel and method of distance measurement |
DE102017115922C5 (en) * | 2017-07-14 | 2023-03-23 | Precitec Gmbh & Co. Kg | Method and device for measuring and setting a distance between a machining head and a workpiece and associated method for regulation |
CN109381189B (en) * | 2017-08-04 | 2021-07-30 | 适着三维科技股份有限公司 | Calibration device |
US10365089B1 (en) | 2017-08-04 | 2019-07-30 | The United States Of America, As Represented By The Secretary Of The Navy | Atmospheric infrasonic sensing from an array of aircraft |
US10578440B1 (en) | 2017-08-04 | 2020-03-03 | The United States Of America, As Represented By The Secretary Of The Navy | Atmospheric infrasonic sensing from an aircraft |
JP6876576B2 (en) * | 2017-08-17 | 2021-05-26 | 日本電子株式会社 | 3D image construction method |
TWI791046B (en) * | 2017-10-02 | 2023-02-01 | 美商奈米創尼克影像公司 | Apparatus and method to reduce vignetting in microscopic imaging |
US10502944B2 (en) | 2017-10-02 | 2019-12-10 | Nanotronics Imaging, Inc. | Apparatus and method to reduce vignetting in microscopic imaging |
CN108106973B (en) * | 2017-12-18 | 2020-01-10 | 大连理工大学 | Method for simultaneously measuring stress and displacement of saturated particle medium based on transparent photoelastic material |
TWI650526B (en) * | 2017-12-18 | 2019-02-11 | 財團法人工業技術研究院 | Measuring apparatus |
US10352690B2 (en) | 2017-12-18 | 2019-07-16 | Industrial Technology Research Institute | Measuring apparatus |
JP6851301B2 (en) * | 2017-12-20 | 2021-03-31 | 浜松ホトニクス株式会社 | Observing object cover, interference observation container, interference observation device and interference observation method |
TWI647427B (en) * | 2018-01-10 | 2019-01-11 | 緯創資通股份有限公司 | Object distance estimation method and electronic device |
TWI672493B (en) * | 2018-03-07 | 2019-09-21 | 由田新技股份有限公司 | An automatic optical inspection system and method to obtain mura defect from the panel |
DE102018105877B3 (en) | 2018-03-14 | 2019-02-28 | Precitec Gmbh & Co. Kg | Device for determining an alignment of an optical device of a coherence tomograph, coherence tomograph and laser processing system |
CN108599849B (en) * | 2018-04-14 | 2021-01-01 | 上海交通大学 | Photon processing system and processing method for intelligent decision |
JP7344881B2 (en) * | 2018-04-18 | 2023-09-14 | カール ツァイス メディテック インコーポレイテッド | Post-processing methods to improve LSO-based tracking in OCT |
DE102018113979A1 (en) * | 2018-06-12 | 2019-12-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device and method for the interferometric measurement of a surface of a moving test object |
KR102019326B1 (en) * | 2018-06-25 | 2019-09-06 | 케이맥(주) | Vibration tolerant white light scanning interferometer and its vibration effect removal method |
US11092425B2 (en) | 2018-07-05 | 2021-08-17 | University Of Rochester | Telecentric and broadband achromatic objective lens systems |
US11262191B1 (en) * | 2018-07-12 | 2022-03-01 | Onto Innovation Inc. | On-axis dynamic interferometer and optical imaging systems employing the same |
CN109223044B (en) * | 2018-07-12 | 2021-08-24 | 郑州轻工业学院 | Doppler flow velocity detection method of optical coherence tomography system |
CN110726702A (en) * | 2018-07-17 | 2020-01-24 | 锐准医光股份有限公司 | Optical layer cutting device adopting advanced optical interference microscopy |
TWI691700B (en) * | 2018-07-18 | 2020-04-21 | 薩摩亞商銳準醫光股份有限公司 | Optical slice device using advanced optical interference microscopy |
DE102018119313B4 (en) * | 2018-08-08 | 2023-03-30 | Rogers Germany Gmbh | Process for processing a metal-ceramic substrate and installation for carrying out the process |
CN109211934B (en) * | 2018-08-29 | 2021-01-26 | 南京理工大学 | Micro-sphere surface defect detection device and method based on interference microscopy |
KR102635628B1 (en) * | 2018-10-12 | 2024-02-08 | 일렉트릭 파워 리서치 인스티튜트, 인크. | Method for measuring surface properties in optically distorting media |
JP7036704B2 (en) * | 2018-11-16 | 2022-03-15 | ヤフー株式会社 | Information processing equipment, information processing methods, and information processing programs |
FR3089286B1 (en) * | 2018-11-30 | 2022-04-01 | Unity Semiconductor | Method and system for measuring a surface of an object comprising different structures by low coherence interferometry |
KR102129382B1 (en) * | 2018-12-17 | 2020-07-02 | 주식회사 토모큐브 | Method and apparatus for retrieving phase information of wave from interference pattern |
CN113196179A (en) | 2018-12-21 | 2021-07-30 | Asml控股股份有限公司 | Noise correction for alignment signals |
TWI682150B (en) | 2018-12-27 | 2020-01-11 | 財團法人工業技術研究院 | Automatic calibration optical interferometer and automatic calibration method of optical interferometer |
CN109780992B (en) * | 2018-12-28 | 2020-01-10 | 西安交通大学 | Interferometric system error calibration method based on optical plane fringe image processing |
US10809048B2 (en) * | 2019-01-08 | 2020-10-20 | Formfactor Beaverton, Inc. | Probe systems and methods for calibrating capacitive height sensing measurements |
US11239097B2 (en) * | 2019-02-08 | 2022-02-01 | Hitachi High-Tech Corporation | Etching apparatus and etching method and detecting apparatus of film thickness |
CN109828365B (en) * | 2019-02-25 | 2021-05-04 | 南京理工大学 | Mirau type super-resolution interference microscope objective |
US11910104B2 (en) * | 2019-04-19 | 2024-02-20 | ARIZONA BOARD OF REGENTS on behalf of THE UNIVERSITY OF ARIZONA, A BODY CORPORATE | All-in-focus imager and associated method |
US11921285B2 (en) | 2019-04-19 | 2024-03-05 | Arizona Board Of Regents On Behalf Of The University Of Arizona | On-chip signal processing method and pixel-array signal |
DE102019114405A1 (en) | 2019-05-29 | 2020-04-16 | Polytec Gmbh | Interferometric measuring device and interferometric method for determining the surface topography of a measurement object |
CN110675451B (en) * | 2019-09-17 | 2023-03-17 | 浙江荷湖科技有限公司 | Digital self-adaptive correction method and system based on phase space optics |
US11150195B2 (en) * | 2019-09-25 | 2021-10-19 | Onto Innovation Inc. | Sample surface polarization modification in interferometric defect inspection |
KR102269706B1 (en) * | 2019-11-04 | 2021-06-25 | 재단법인대구경북과학기술원 | Multi channel fiber photometry system using adaptive optics |
GB2593194B (en) * | 2020-03-18 | 2022-09-07 | Refeyn Ltd | Methods and apparatus for optimised interferometric scattering microscopy |
CN111536883B (en) * | 2020-06-10 | 2021-07-23 | 中北大学 | Micro-displacement sensor based on combined type grating |
DE112021003255T5 (en) | 2020-06-15 | 2023-03-30 | Bmv Optical Technologies Inc. | Optical system with improved static fringe detection |
US11860036B2 (en) | 2020-06-24 | 2024-01-02 | Cymer, Llc | Determination of measurement error in an etalon |
CN112066909B (en) * | 2020-08-24 | 2022-04-08 | 南京理工大学 | Anti-vibration interference measurement method based on inclined plane high-precision extraction |
JP7300432B2 (en) * | 2020-10-27 | 2023-06-29 | Ckd株式会社 | Three-dimensional measuring device |
JP7001947B2 (en) * | 2020-12-24 | 2022-01-20 | 株式会社東京精密 | Surface shape measurement method |
WO2022150493A1 (en) * | 2021-01-06 | 2022-07-14 | Sentek Instrument, Llc | Systems and methods for fiber optic fourier spectrometry measurement |
CN112665509B (en) * | 2021-01-08 | 2022-07-08 | 中国工程物理研究院机械制造工艺研究所 | White light interferometry method for self-correcting scanning error |
KR102494082B1 (en) * | 2021-01-28 | 2023-01-31 | 서울대학교산학협력단 | Measuring apparatus for thickness and profile for thin film using interference and wavenumber high frequency modulation, and measuring method using thereof |
US20220373322A1 (en) * | 2021-05-20 | 2022-11-24 | Nanyang Technological University | Surface profile inspection methods and systems |
US20220371152A1 (en) * | 2021-05-20 | 2022-11-24 | Applied Materials, Inc. | Fourier filtering of spectral data for measuring layer thickness during substrate processing |
CN113721233B (en) * | 2021-08-30 | 2023-09-19 | 中国航发沈阳黎明航空发动机有限责任公司 | Three-dimensional optical measurement method for thickness of thermal barrier coating of multi-body turbine guide vane |
CN113985711B (en) * | 2021-10-28 | 2024-02-02 | 无锡卓海科技股份有限公司 | Overlay measuring device |
WO2023114213A1 (en) * | 2021-12-13 | 2023-06-22 | The Board Of Trustees Of The Leland Stanford Junior University | Apparatus and method for multiplexed one-photon and nonlinear microscopy and method for biological tissue alignment |
DE102022102572A1 (en) | 2022-02-03 | 2023-08-03 | Carl Zeiss Microscopy Gmbh | Imaging system and method for imaging and measuring an object |
KR102521324B1 (en) * | 2022-03-03 | 2023-04-20 | (주)오로스 테크놀로지 | Method for aligning off-axis reflection optical system with angle of incidence |
DE102023203568A1 (en) | 2023-04-19 | 2024-04-11 | Carl Zeiss Smt Gmbh | Interferometric measuring device for measuring the roughness of a test surface |
CN117006971A (en) * | 2023-09-25 | 2023-11-07 | 板石智能科技(深圳)有限公司 | Three-dimensional morphology measurement system |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5371588A (en) * | 1993-11-10 | 1994-12-06 | University Of Maryland, College Park | Surface profile and material mapper using a driver to displace the sample in X-Y-Z directions |
US6545761B1 (en) * | 1999-11-30 | 2003-04-08 | Veeco Instruments, Inc. | Embedded interferometer for reference-mirror calibration of interferometric microscope |
Family Cites Families (298)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2612074A (en) | 1949-03-30 | 1952-09-30 | Prec Mecanique Paris Soc | Interferometer |
US4199219A (en) | 1977-04-22 | 1980-04-22 | Canon Kabushiki Kaisha | Device for scanning an object with a light beam |
US4188122A (en) | 1978-03-27 | 1980-02-12 | Rockwell International Corporation | Interferometer |
US4340306A (en) | 1980-02-04 | 1982-07-20 | Balasubramanian N | Optical system for surface topography measurement |
US4355903A (en) | 1980-02-08 | 1982-10-26 | Rca Corporation | Thin film thickness monitor |
DE3145633A1 (en) | 1981-11-17 | 1983-08-11 | Byk-Mallinckrodt Chemische Produkte Gmbh, 4230 Wesel | DEVICE FOR MEASURING COLORS |
US4576479A (en) | 1982-05-17 | 1986-03-18 | Downs Michael J | Apparatus and method for investigation of a surface |
US4523846A (en) | 1982-09-10 | 1985-06-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Integrated optics in an electrically scanned imaging Fourier transform spectrometer |
US4594003A (en) | 1983-07-20 | 1986-06-10 | Zygo Corporation | Interferometric wavefront measurement |
JPS60127403A (en) | 1983-12-13 | 1985-07-08 | Anritsu Corp | Thickness measuring apparatus |
US4618262A (en) | 1984-04-13 | 1986-10-21 | Applied Materials, Inc. | Laser interferometer system and method for monitoring and controlling IC processing |
US4699513A (en) | 1985-02-08 | 1987-10-13 | Stanford University | Distributed sensor and method using coherence multiplexing of fiber-optic interferometric sensors |
US4710642A (en) | 1985-08-20 | 1987-12-01 | Mcneil John R | Optical scatterometer having improved sensitivity and bandwidth |
US4639139A (en) | 1985-09-27 | 1987-01-27 | Wyko Corporation | Optical profiler using improved phase shifting interferometry |
US4818110A (en) | 1986-05-06 | 1989-04-04 | Kla Instruments Corporation | Method and apparatus of using a two beam interference microscope for inspection of integrated circuits and the like |
US4806018A (en) | 1987-07-06 | 1989-02-21 | The Boeing Company | Angular reflectance sensor |
US4869593A (en) | 1988-04-22 | 1989-09-26 | Zygo Corporation | Interferometric surface profiler |
US4923301A (en) | 1988-05-26 | 1990-05-08 | American Telephone And Telegraph Company | Alignment of lithographic system |
US4964726A (en) | 1988-09-27 | 1990-10-23 | General Electric Company | Apparatus and method for optical dimension measurement using interference of scattered electromagnetic energy |
US4948253A (en) | 1988-10-28 | 1990-08-14 | Zygo Corporation | Interferometric surface profiler for spherical surfaces |
GB8903725D0 (en) | 1989-02-18 | 1989-04-05 | Cambridge Consultants | Coherent tracking sensor |
US5042949A (en) | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
US4999014A (en) | 1989-05-04 | 1991-03-12 | Therma-Wave, Inc. | Method and apparatus for measuring thickness of thin films |
US5042951A (en) | 1989-09-19 | 1991-08-27 | Therma-Wave, Inc. | High resolution ellipsometric apparatus |
US5073018A (en) | 1989-10-04 | 1991-12-17 | The Board Of Trustees Of The Leland Stanford Junior University | Correlation microscope |
DE3942896A1 (en) | 1989-12-23 | 1991-06-27 | Zeiss Carl Fa | INTERFEROMETRIC SENSOR FOR MEASURING DISTANCE CHANGES IN A SMALL AREA |
US5594543A (en) | 1990-01-16 | 1997-01-14 | Hughes Danbury Optical Systems, Inc. | Laser diode radar with extended range |
US5112129A (en) | 1990-03-02 | 1992-05-12 | Kla Instruments Corporation | Method of image enhancement for the coherence probe microscope with applications to integrated circuit metrology |
US5343294A (en) | 1990-03-09 | 1994-08-30 | Carl-Zeiss-Stiftung | Method for analyzing periodic brightness patterns |
US5135307A (en) | 1990-05-30 | 1992-08-04 | Hughes Danbury Optical System, Inc. | Laser diode interferometer |
US5122648A (en) | 1990-06-01 | 1992-06-16 | Wyko Corporation | Apparatus and method for automatically focusing an interference microscope |
US5241369A (en) | 1990-10-01 | 1993-08-31 | Mcneil John R | Two-dimensional optical scatterometer apparatus and process |
US5129724A (en) | 1991-01-29 | 1992-07-14 | Wyko Corporation | Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample |
US5127731A (en) | 1991-02-08 | 1992-07-07 | Hughes Aircraft Company | Stabilized two-color laser diode interferometer |
US5164790A (en) | 1991-02-27 | 1992-11-17 | Mcneil John R | Simple CD measurement of periodic structures on photomasks |
DE69231715D1 (en) | 1991-03-04 | 2001-04-12 | At & T Corp | Manufacturing process of semiconductor integrated circuits using latent images |
DE4108944A1 (en) | 1991-03-19 | 1992-09-24 | Haeusler Gerd | Contactless measurement of surface shape of diffusely scattering objects e.g. semiconductor wafers - using interferometric arrangement for three=dimensional measurement with minimal coherence length and illumination aperture angle less than observation aperture angle |
US5153669A (en) | 1991-03-27 | 1992-10-06 | Hughes Danbury Optical Systems, Inc. | Three wavelength optical measurement apparatus and method |
US5194918A (en) | 1991-05-14 | 1993-03-16 | The Board Of Trustees Of The Leland Stanford Junior University | Method of providing images of surfaces with a correlation microscope by transforming interference signals |
US5173746A (en) | 1991-05-21 | 1992-12-22 | Wyko Corporation | Method for rapid, accurate measurement of step heights between dissimilar materials |
US5133601A (en) | 1991-06-12 | 1992-07-28 | Wyko Corporation | Rough surface profiler and method |
US5204734A (en) | 1991-06-12 | 1993-04-20 | Wyko Corporation | Rough surface profiler and method |
JPH05304627A (en) | 1991-08-19 | 1993-11-16 | Fuji Photo Film Co Ltd | Side grip for video camera |
JPH05133711A (en) * | 1991-11-11 | 1993-05-28 | Minolta Camera Co Ltd | Interferometer |
US5181080A (en) | 1991-12-23 | 1993-01-19 | Therma-Wave, Inc. | Method and apparatus for evaluating the thickness of thin films |
US5371587A (en) | 1992-05-06 | 1994-12-06 | The Boeing Company | Chirped synthetic wavelength laser radar |
US6082892A (en) | 1992-05-29 | 2000-07-04 | C.I. Systems Ltd. | Temperature measuring method and apparatus |
WO1993024805A1 (en) | 1992-06-03 | 1993-12-09 | Zygo Corporation | Interferometric method and apparatus to measure surface topography |
US5390023A (en) | 1992-06-03 | 1995-02-14 | Zygo Corporation | Interferometric method and apparatus to measure surface topography |
US5309277A (en) | 1992-06-19 | 1994-05-03 | Zygo Corporation | High intensity illuminator |
GB9213159D0 (en) | 1992-06-22 | 1992-08-05 | British Tech Group | Method of and apparatus for interferometrically inspecting a surface of an object |
CA2074289C (en) | 1992-07-21 | 1999-09-14 | Claude Belleville | Fabry-perot optical sensing device for measuring a physical parameter |
US5402234A (en) | 1992-08-31 | 1995-03-28 | Zygo Corporation | Method and apparatus for the rapid acquisition of data in coherence scanning interferometry |
US5384717A (en) | 1992-11-23 | 1995-01-24 | Ford Motor Company | Non-contact method of obtaining dimensional information about an object |
US5398113A (en) | 1993-02-08 | 1995-03-14 | Zygo Corporation | Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms |
US5777742A (en) | 1993-03-11 | 1998-07-07 | Environmental Research Institute Of Michigan | System and method for holographic imaging with discernible image of an object |
DE4309056B4 (en) | 1993-03-20 | 2006-05-24 | Häusler, Gerd, Prof. Dr. | Method and device for determining the distance and scattering intensity of scattering points |
US5386119A (en) | 1993-03-25 | 1995-01-31 | Hughes Aircraft Company | Apparatus and method for thick wafer measurement |
US5956030A (en) | 1993-06-11 | 1999-09-21 | Apple Computer, Inc. | Computer system with graphical user interface including windows having an identifier within a control region on the display |
JPH074922A (en) | 1993-06-21 | 1995-01-10 | Jasco Corp | Apparatus and method for measurement of film thickness of semiconductor multilayer thin film |
EP0767361B1 (en) | 1993-07-22 | 2000-02-23 | Applied Spectral Imaging Ltd. | Method and apparatus for spectral imaging |
US5856871A (en) | 1993-08-18 | 1999-01-05 | Applied Spectral Imaging Ltd. | Film thickness mapping using interferometric spectral imaging |
GB9320500D0 (en) | 1993-10-05 | 1993-11-24 | Rensihaw Plc | Interferometric distance measuring apparatus |
US5481811A (en) | 1993-11-22 | 1996-01-09 | The Budd Company | Universal inspection workpiece holder |
US5483064A (en) | 1994-01-21 | 1996-01-09 | Wyko Corporation | Positioning mechanism and method for providing coaxial alignment of a probe and a scanning means in scanning tunneling and scanning force microscopy |
US5459564A (en) | 1994-02-18 | 1995-10-17 | Chivers; James T. | Apparatus and method for inspecting end faces of optical fibers and optical fiber connectors |
EP0750757B1 (en) | 1994-03-17 | 2001-02-14 | Dow Benelux N.V. | System for real time optimization and profit depiction |
US5471303A (en) * | 1994-04-29 | 1995-11-28 | Wyko Corporation | Combination of white-light scanning and phase-shifting interferometry for surface profile measurements |
US5473434A (en) | 1994-05-16 | 1995-12-05 | Zygo Corporation | Phase shifting interferometer and method for surface topography measurement |
US5671050A (en) | 1994-11-07 | 1997-09-23 | Zygo Corporation | Method and apparatus for profiling surfaces using diffracative optics |
US5633714A (en) | 1994-12-19 | 1997-05-27 | International Business Machines Corporation | Preprocessing of image amplitude and phase data for CD and OL measurement |
US5596409A (en) | 1995-03-22 | 1997-01-21 | Eastman Kodak Company | Associated dual interferometric measurement method for determining a physical property of an object |
US5659392A (en) | 1995-03-22 | 1997-08-19 | Eastman Kodak Company | Associated dual interferometric measurement apparatus for determining a physical property of an object |
US5598265A (en) | 1995-04-06 | 1997-01-28 | Zygo Corporation | Method for profiling an object surface using a large equivalent wavelength and system therefor |
US5555471A (en) | 1995-05-24 | 1996-09-10 | Wyko Corporation | Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shifting interferometry |
US5589938A (en) | 1995-07-10 | 1996-12-31 | Zygo Corporation | Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration |
US5703692A (en) | 1995-08-03 | 1997-12-30 | Bio-Rad Laboratories, Inc. | Lens scatterometer system employing source light beam scanning means |
JP3602925B2 (en) | 1995-12-08 | 2004-12-15 | 独立行政法人科学技術振興機構 | Simultaneous measuring device of refractive index and thickness of measurement object by optical interferometry |
US5748318A (en) | 1996-01-23 | 1998-05-05 | Brown University Research Foundation | Optical stress generator and detector |
US5602643A (en) | 1996-02-07 | 1997-02-11 | Wyko Corporation | Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface |
US5640270A (en) | 1996-03-11 | 1997-06-17 | Wyko Corporation | Orthogonal-scanning microscope objective for vertical-scanning and phase-shifting interferometry |
JPH09297004A (en) | 1996-05-01 | 1997-11-18 | Olympus Optical Co Ltd | Microscope apparatus |
GB9610471D0 (en) | 1996-05-18 | 1996-07-24 | Univ Nottingham | Optical measurement |
US5880838A (en) | 1996-06-05 | 1999-03-09 | California Institute Of California | System and method for optically measuring a structure |
JP3459327B2 (en) | 1996-06-17 | 2003-10-20 | 理化学研究所 | Method and apparatus for measuring layer thickness and refractive index of laminated structure |
US5898501A (en) | 1996-07-25 | 1999-04-27 | Nikon Corporation | Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens |
US5923423A (en) | 1996-09-12 | 1999-07-13 | Sentec Corporation | Heterodyne scatterometer for detecting and analyzing wafer surface defects |
US5956141A (en) | 1996-09-13 | 1999-09-21 | Olympus Optical Co., Ltd. | Focus adjusting method and shape measuring device and interference microscope using said focus adjusting method |
US5757502A (en) | 1996-10-02 | 1998-05-26 | Vlsi Technology, Inc. | Method and a system for film thickness sample assisted surface profilometry |
US5774224A (en) | 1997-01-24 | 1998-06-30 | International Business Machines Corporation | Linear-scanning, oblique-viewing optical apparatus |
US5777740A (en) | 1997-02-27 | 1998-07-07 | Phase Metrics | Combined interferometer/polarimeter |
US5867276A (en) | 1997-03-07 | 1999-02-02 | Bio-Rad Laboratories, Inc. | Method for broad wavelength scatterometry |
US5784164A (en) | 1997-03-20 | 1998-07-21 | Zygo Corporation | Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means |
JP3275797B2 (en) | 1997-09-10 | 2002-04-22 | 松下電器産業株式会社 | Low pressure mercury vapor discharge lamp |
US6665078B1 (en) | 1997-09-22 | 2003-12-16 | Candela Instruments | System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers |
US6031615A (en) | 1997-09-22 | 2000-02-29 | Candela Instruments | System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness |
US6392749B1 (en) | 1997-09-22 | 2002-05-21 | Candela Instruments | High speed optical profilometer for measuring surface height variation |
US20020015146A1 (en) | 1997-09-22 | 2002-02-07 | Meeks Steven W. | Combined high speed optical profilometer and ellipsometer |
US6219144B1 (en) | 1997-10-02 | 2001-04-17 | Zygo Corporation | Apparatus and method for measuring the refractive index and optical path length effects of air using multiple-pass interferometry |
US5912741A (en) | 1997-10-10 | 1999-06-15 | Northrop Grumman Corporation | Imaging scatterometer |
US5963329A (en) | 1997-10-31 | 1999-10-05 | International Business Machines Corporation | Method and apparatus for measuring the profile of small repeating lines |
US5900633A (en) | 1997-12-15 | 1999-05-04 | On-Line Technologies, Inc | Spectrometric method for analysis of film thickness and composition on a patterned sample |
US6011624A (en) | 1998-01-06 | 2000-01-04 | Zygo Corporation | Geometrically-Desensitized interferometer with adjustable range of measurement depths |
US6124141A (en) | 1998-01-07 | 2000-09-26 | International Business Machines Corporation | Non-destructive method and device for measuring the depth of a buried interface |
US5953124A (en) | 1998-01-19 | 1999-09-14 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
US6028670A (en) | 1998-01-19 | 2000-02-22 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
US5999263A (en) | 1998-01-26 | 1999-12-07 | Zygo Corporation | Method and apparatus for performing interferometric measurements with reduced sensitivity to vibration |
US5995224A (en) | 1998-01-28 | 1999-11-30 | Zygo Corporation | Full-field geometrically-desensitized interferometer employing diffractive and conventional optics |
US6495394B1 (en) * | 1999-02-16 | 2002-12-17 | Sumitomo Metal (Smi) Electronics Devices Inc. | Chip package and method for manufacturing the same |
US6407816B1 (en) | 1998-02-23 | 2002-06-18 | Zygo Corporation | Interferometer and method for measuring the refractive index and optical path length effects of air |
JP3332367B2 (en) | 1998-02-23 | 2002-10-07 | ザイゴ コーポレイション | Interferometer and method for measuring the effects of refractive index and optical path length of air |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
DE59910660D1 (en) | 1998-03-27 | 2004-11-04 | Litef Gmbh | METHOD AND DEVICE FOR ABSOLUTE INTERFEROMETRIC LENGTH MEASUREMENT |
DE19814057B4 (en) | 1998-03-30 | 2009-01-02 | Carl Zeiss Meditec Ag | Arrangement for optical coherence tomography and coherence topography |
US6175669B1 (en) | 1998-03-30 | 2001-01-16 | The Regents Of The Universtiy Of California | Optical coherence domain reflectometry guidewire |
US6242739B1 (en) | 1998-04-21 | 2001-06-05 | Alexander P. Cherkassky | Method and apparatus for non-destructive determination of film thickness and dopant concentration using fourier transform infrared spectrometry |
DE19819762A1 (en) | 1998-05-04 | 1999-11-25 | Bosch Gmbh Robert | Interferometric measuring device |
US6229988B1 (en) | 1998-05-20 | 2001-05-08 | Lojack Corporation | Method of and apparatus for battery and similar power source conservation in periodically operable portable and related radio receivers and the like |
US6034774A (en) | 1998-06-26 | 2000-03-07 | Eastman Kodak Company | Method for determining the retardation of a material using non-coherent light interferometery |
JP2990266B1 (en) * | 1998-08-18 | 1999-12-13 | 株式会社東京精密 | Sinusoidal wavelength scanning interferometer and sinusoidal wavelength scanning light source device |
US6275297B1 (en) | 1998-08-19 | 2001-08-14 | Sc Technology | Method of measuring depths of structures on a semiconductor substrate |
US6208424B1 (en) | 1998-08-27 | 2001-03-27 | Zygo Corporation | Interferometric apparatus and method for measuring motion along multiple axes |
KR100270365B1 (en) * | 1998-09-17 | 2001-01-15 | 김상국 | High Speed Scanning Interferometer System |
US6252667B1 (en) | 1998-09-18 | 2001-06-26 | Zygo Corporation | Interferometer having a dynamic beam steering assembly |
US6313918B1 (en) | 1998-09-18 | 2001-11-06 | Zygo Corporation | Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion |
US6181420B1 (en) | 1998-10-06 | 2001-01-30 | Zygo Corporation | Interferometry system having reduced cyclic errors |
JP2000121317A (en) | 1998-10-12 | 2000-04-28 | Hitachi Electronics Eng Co Ltd | Interference phase detecting system for optical interferometer |
US6067161A (en) | 1998-10-29 | 2000-05-23 | Eastman Kodak Company | Apparatus for measuring material thickness profiles |
US6038027A (en) | 1998-10-29 | 2000-03-14 | Eastman Kodak Company | Method for measuring material thickness profiles |
US6072581A (en) | 1998-10-30 | 2000-06-06 | Zygo Corporation | Geometrically-desensitized interferometer incorporating an optical assembly with high stray-beam management capability |
US6159073A (en) | 1998-11-02 | 2000-12-12 | Applied Materials, Inc. | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing |
JP3569726B2 (en) | 1998-12-15 | 2004-09-29 | 独立行政法人理化学研究所 | Apparatus and method for measuring geometric thickness and refractive index of sample |
US6184984B1 (en) | 1999-02-09 | 2001-02-06 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
US6075601A (en) | 1999-03-03 | 2000-06-13 | Eastman Kodak Company | Optical probe calibration apparatus and method |
KR100290086B1 (en) | 1999-03-23 | 2001-05-15 | 윤덕용 | Method and Apparatus for Three Dimensional Thickness Profile Measurement of Transparent Dielectric Thin-Film by White-Light Scanning Interferometry |
US6417927B2 (en) | 1999-04-28 | 2002-07-09 | Zygo Corporation | Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
US6449066B1 (en) | 1999-04-29 | 2002-09-10 | Kaiser Optical Systems, Inc. | Polarization insensitive, high dispersion optical element |
US6888638B1 (en) | 1999-05-05 | 2005-05-03 | Zygo Corporation | Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
TW477897B (en) | 1999-05-07 | 2002-03-01 | Sharp Kk | Liquid crystal display device, method and device to measure cell thickness of liquid crystal display device, and phase difference plate using the method thereof |
US6507405B1 (en) | 1999-05-17 | 2003-01-14 | Ultratech Stepper, Inc. | Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt |
US6226092B1 (en) | 1999-05-27 | 2001-05-01 | Zygo Corporation | Full-field geometrically desensitized interferometer using refractive optics |
US6249351B1 (en) | 1999-06-03 | 2001-06-19 | Zygo Corporation | Grazing incidence interferometer and method |
US6381009B1 (en) | 1999-06-29 | 2002-04-30 | Nanometrics Incorporated | Elemental concentration measuring methods and instruments |
US6359692B1 (en) | 1999-07-09 | 2002-03-19 | Zygo Corporation | Method and system for profiling objects having multiple reflective surfaces using wavelength-tuning phase-shifting interferometry |
US6201609B1 (en) | 1999-08-27 | 2001-03-13 | Zygo Corporation | Interferometers utilizing polarization preserving optical systems |
US6160621A (en) | 1999-09-30 | 2000-12-12 | Lam Research Corporation | Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
US6259521B1 (en) | 1999-10-05 | 2001-07-10 | Advanced Micro Devices, Inc. | Method and apparatus for controlling photolithography parameters based on photoresist images |
JP3642996B2 (en) | 1999-11-18 | 2005-04-27 | 独立行政法人科学技術振興機構 | Method for simultaneously measuring refractive index and thickness of object to be measured by optical interferometry and apparatus therefor |
DE10195052B3 (en) | 2000-01-25 | 2015-06-18 | Zygo Corp. | Method and devices for determining a geometric property of a test object and optical profile measuring system |
JP4673955B2 (en) | 2000-03-24 | 2011-04-20 | オリンパス株式会社 | Optical device |
US6429943B1 (en) | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
JP2001343208A (en) * | 2000-03-30 | 2001-12-14 | Fuji Photo Optical Co Ltd | Method and apparatus for fringe analysis using fourier transform |
LU90580B1 (en) | 2000-05-08 | 2001-11-09 | Europ Economic Community | Method of identifying an object |
US6449048B1 (en) | 2000-05-11 | 2002-09-10 | Veeco Instruments, Inc. | Lateral-scanning interferometer with tilted optical axis |
US6597460B2 (en) | 2000-05-19 | 2003-07-22 | Zygo Corporation | Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum |
WO2001090686A1 (en) | 2000-05-19 | 2001-11-29 | Zygo Corporation | In-situ mirror characterization |
US6417109B1 (en) | 2000-07-26 | 2002-07-09 | Aiwa Co., Ltd. | Chemical-mechanical etch (CME) method for patterned etching of a substrate surface |
WO2002010829A2 (en) | 2000-07-27 | 2002-02-07 | Zetetic Institute | Multiple-source arrays with optical transmission enhanced by resonant cavities |
US6775009B2 (en) | 2000-07-27 | 2004-08-10 | Zetetic Institute | Differential interferometric scanning near-field confocal microscopy |
DE10041041A1 (en) | 2000-08-22 | 2002-03-07 | Zeiss Carl | Interferometer device e.g. for eye surgery has beam guide which directs superimposed beam onto surfaces |
US7317531B2 (en) | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
JP4583619B2 (en) * | 2000-09-13 | 2010-11-17 | 富士フイルム株式会社 | Method for detecting fringe image analysis error and method for correcting fringe image analysis error |
US6891627B1 (en) | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
EP1319244A1 (en) | 2000-09-20 | 2003-06-18 | Kla-Tencor Inc. | Methods and systems for semiconductor fabrication processes |
US6694284B1 (en) | 2000-09-20 | 2004-02-17 | Kla-Tencor Technologies Corp. | Methods and systems for determining at least four properties of a specimen |
US6370299B1 (en) | 2000-09-27 | 2002-04-09 | The Boeing Company | Fiber optic collimation apparatus and associated method |
WO2002040938A2 (en) | 2000-11-02 | 2002-05-23 | Zygo Corporation | Height scanning interferometry method and apparatus including phase gap analysis |
US6633389B1 (en) | 2000-11-28 | 2003-10-14 | Nanometrics Incorporated | Profiling method |
JP3871309B2 (en) * | 2001-01-31 | 2007-01-24 | フジノン株式会社 | Phase shift fringe analysis method and apparatus using the same |
US6909509B2 (en) | 2001-02-20 | 2005-06-21 | Zygo Corporation | Optical surface profiling systems |
US6721094B1 (en) | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
JP2004530869A (en) | 2001-03-13 | 2004-10-07 | ザイゴ コーポレーション | Reduction of cyclic error in average interference position measurement |
KR100393429B1 (en) | 2001-04-09 | 2003-08-02 | 한국과학기술원 | Two-wavelength white-light interferometry and interferometer for measuring steps of different metallic materials |
US6788422B2 (en) | 2001-04-17 | 2004-09-07 | Zygo Corporation | Method and apparatus for using quasi-stable light sources in interferometry applications |
US6624893B1 (en) | 2001-06-06 | 2003-09-23 | Veeco Instruments Inc. | Correction of scanning errors in interferometric profiling |
US6624894B2 (en) | 2001-06-25 | 2003-09-23 | Veeco Instruments Inc. | Scanning interferometry with reference signal |
US7382447B2 (en) | 2001-06-26 | 2008-06-03 | Kla-Tencor Technologies Corporation | Method for determining lithographic focus and exposure |
US6721510B2 (en) | 2001-06-26 | 2004-04-13 | Aoptix Technologies, Inc. | Atmospheric optical data transmission system |
US6778280B2 (en) | 2001-07-06 | 2004-08-17 | Zygo Corporation | Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components |
US6867866B1 (en) | 2001-08-10 | 2005-03-15 | Therma-Wave, Inc. | CD metrology analysis using green's function |
US6741357B2 (en) | 2001-08-14 | 2004-05-25 | Seagate Technology Llc | Quadrature phase shift interferometer with unwrapping of phase |
US7286242B2 (en) | 2001-09-21 | 2007-10-23 | Kmac | Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same |
US6714307B2 (en) | 2001-10-16 | 2004-03-30 | Zygo Corporation | Measurement of complex surface shapes using a spherical wavefront |
US6630982B2 (en) | 2001-10-18 | 2003-10-07 | Motorola, Inc. | Color and intensity tunable liquid crystal device |
KR100437024B1 (en) | 2001-10-18 | 2004-06-23 | 엘지전자 주식회사 | The inspection method of thin film and the same apparatus |
WO2003036229A1 (en) * | 2001-10-25 | 2003-05-01 | Toray Engineering Co., Ltd. | Surface shape measuring method and device therefor |
US6847453B2 (en) | 2001-11-05 | 2005-01-25 | Optiphase, Inc. | All fiber autocorrelator |
KR100354613B1 (en) * | 2001-11-06 | 2002-10-11 | 박헌휘 | Repairable immersed hollow fiber membrane module |
US7030995B2 (en) | 2001-12-10 | 2006-04-18 | Zygo Corporation | Apparatus and method for mechanical phase shifting interferometry |
US6856384B1 (en) | 2001-12-13 | 2005-02-15 | Nanometrics Incorporated | Optical metrology system with combined interferometer and ellipsometer |
US6934035B2 (en) | 2001-12-18 | 2005-08-23 | Massachusetts Institute Of Technology | System and method for measuring optical distance |
US6816264B1 (en) | 2001-12-21 | 2004-11-09 | Itt Manufacturing Enterprises, Inc. | Systems and methods for amplified optical metrology |
JP2005516187A (en) | 2002-01-24 | 2005-06-02 | ザ ジェネラル ホスピタル コーポレーション | Apparatus and method for ranging with parallel detection of spectral bands and noise reduction of low coherence interferometry (LCI) and optical coherence tomography (OCT) signals |
US7057739B2 (en) * | 2002-02-12 | 2006-06-06 | Zygo Corporation | Separated beam multiple degree of freedom interferometer |
US6906784B2 (en) | 2002-03-04 | 2005-06-14 | Zygo Corporation | Spatial filtering in interferometry |
GB2385417B (en) | 2002-03-14 | 2004-01-21 | Taylor Hobson Ltd | Surface profiling apparatus |
EP1485675B1 (en) | 2002-03-14 | 2015-01-07 | Taylor Hobson Limited | Surface profiling apparatus |
US6924896B2 (en) | 2002-04-11 | 2005-08-02 | Zygo Corporation | Interferometry system error compensation in twin stage lithography tools |
US7068376B2 (en) | 2002-04-19 | 2006-06-27 | Zygo Corporation | Interferometry method and apparatus for producing lateral metrology images |
KR100984809B1 (en) | 2002-05-02 | 2010-10-04 | 지고 코포레이션 | Phase gap analysis for scanning interferometry |
WO2003098156A1 (en) | 2002-05-17 | 2003-11-27 | Sensor Highway Limited | Fibre-optic interferometric remote sensor |
US7046371B2 (en) | 2002-06-17 | 2006-05-16 | Zygo Corporation | Interferometer having a coupled cavity geometry for use with an extended source |
DE10392754T5 (en) | 2002-06-17 | 2005-08-25 | Zygo Corp., Middlefield | An interferometric optical system and methods providing an optical path length and a focus that are scanned simultaneously |
US6882433B2 (en) | 2002-07-01 | 2005-04-19 | Lightgage, Inc. | Interferometer system of compact configuration |
US7428685B2 (en) * | 2002-07-08 | 2008-09-23 | Zygo Corporation | Cyclic error compensation in interferometry systems |
US7262860B2 (en) | 2002-07-29 | 2007-08-28 | Zygo Corporation | Compensation for errors in off-axis interferometric measurements |
US7139081B2 (en) | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
AU2003266136A1 (en) | 2002-09-09 | 2004-03-29 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US6901176B2 (en) | 2002-10-15 | 2005-05-31 | University Of Maryland | Fiber tip based sensor system for acoustic measurements |
US6842254B2 (en) | 2002-10-16 | 2005-01-11 | Fiso Technologies Inc. | System and method for measuring an optical path difference in a sensing interferometer |
JP3847703B2 (en) * | 2002-12-10 | 2006-11-22 | 直弘 丹野 | Optical coherence tomography device |
US6925860B1 (en) | 2003-02-21 | 2005-08-09 | Nanometrics Incorporated | Leveling a measured height profile |
US7106454B2 (en) | 2003-03-06 | 2006-09-12 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US7324214B2 (en) | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
US7271918B2 (en) | 2003-03-06 | 2007-09-18 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US6985232B2 (en) | 2003-03-13 | 2006-01-10 | Tokyo Electron Limited | Scatterometry by phase sensitive reflectometer |
US7049156B2 (en) | 2003-03-19 | 2006-05-23 | Verity Instruments, Inc. | System and method for in-situ monitor and control of film thickness and trench depth |
US6999180B1 (en) | 2003-04-02 | 2006-02-14 | Kla-Tencor Technologies Corporation | Optical film topography and thickness measurement |
US7016050B2 (en) * | 2003-04-30 | 2006-03-21 | Veeco Instruments Inc. | Microscope with fixed-element autocollimator for tilt adjustment |
DE10327019A1 (en) | 2003-06-12 | 2004-12-30 | Carl Zeiss Sms Gmbh | Method for determining the imaging quality of an optical imaging system |
US7102761B2 (en) | 2003-06-13 | 2006-09-05 | Zygo Corporation | Scanning interferometry |
US7177029B2 (en) | 2003-07-10 | 2007-02-13 | Zygo Corporation | Stroboscopic interferometry with frequency domain analysis |
US6956716B2 (en) | 2003-07-30 | 2005-10-18 | Hitachi Global Storage Technologies Netherlands, B.V. | Magnetic head having multilayer heater for thermally assisted write head and method of fabrication thereof |
FI20031143A0 (en) | 2003-08-08 | 2003-08-08 | Wallac Oy | Optical Focusing Method and Arrangement |
US7488929B2 (en) | 2003-08-13 | 2009-02-10 | Zygo Corporation | Perimeter detection using fiber optic sensors |
US6977730B2 (en) | 2003-08-18 | 2005-12-20 | Zygo Corporation | Method and apparatus for alignment of a precision optical assembly |
US7061623B2 (en) | 2003-08-25 | 2006-06-13 | Spectel Research Corporation | Interferometric back focal plane scatterometry with Koehler illumination |
TWI334921B (en) | 2003-09-15 | 2010-12-21 | Zygo Corp | Surface profiling using an interference pattern matching template |
EP1519144A1 (en) | 2003-09-29 | 2005-03-30 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO | Free-form optical surface measuring apparatus and method |
TWI335417B (en) | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
WO2005045529A2 (en) | 2003-11-04 | 2005-05-19 | Zygo Corporation | Characterization and compensation of errors in multi-axis interferometry system |
WO2005052652A2 (en) | 2003-11-25 | 2005-06-09 | Zygo Corporation | Optical fiber connectors and systems including optical fiber connectors |
WO2005067815A1 (en) | 2004-01-05 | 2005-07-28 | Zygo Corporation | Stage alignment in lithography tools |
JP4790632B2 (en) | 2004-01-06 | 2011-10-12 | ザイゴ コーポレーション | Multi-axis interferometer and method and system using multi-axis interferometer |
US7283250B2 (en) | 2004-01-16 | 2007-10-16 | Veeco Instruments, Inc. | Measurement of object deformation with optical profiler |
US20050179911A1 (en) | 2004-02-17 | 2005-08-18 | Digital Optics Corporation | Aspheric diffractive reference for interferometric lens metrology |
US7492469B2 (en) | 2004-03-15 | 2009-02-17 | Zygo Corporation | Interferometry systems and methods using spatial carrier fringes |
US7417743B2 (en) | 2004-03-15 | 2008-08-26 | Zygo Corporation | Interferometry systems and methods |
US7177030B2 (en) | 2004-04-22 | 2007-02-13 | Technion Research And Development Foundation Ltd. | Determination of thin film topography |
US7321430B2 (en) | 2004-04-22 | 2008-01-22 | Zygo Corporation | Vibration resistant interferometry |
US7187453B2 (en) | 2004-04-23 | 2007-03-06 | Opsens Inc. | Optical MEMS cavity having a wide scanning range for measuring a sensing interferometer |
WO2005114096A2 (en) | 2004-05-18 | 2005-12-01 | Zygo Corporation | Methods and systems for determining optical properties using low-coherence interference signals |
US20050259269A1 (en) * | 2004-05-19 | 2005-11-24 | Asml Holding N.V. | Shearing interferometer with dynamic pupil fill |
US7119909B2 (en) | 2004-06-16 | 2006-10-10 | Veeco Instruments, Inc. | Film thickness and boundary characterization by interferometric profilometry |
US7378136B2 (en) * | 2004-07-09 | 2008-05-27 | 3M Innovative Properties Company | Optical film coating |
US20060007599A1 (en) * | 2004-07-12 | 2006-01-12 | Hitachi Global Storage Technologies Netherlands B.V. | System, method, and apparatus for high performance, four-piece suspension with extended hinge plate |
US20060012582A1 (en) | 2004-07-15 | 2006-01-19 | De Lega Xavier C | Transparent film measurements |
US20060066842A1 (en) | 2004-09-30 | 2006-03-30 | Saunders Winston A | Wafer inspection with a customized reflective optical channel component |
US7405833B2 (en) | 2004-11-05 | 2008-07-29 | Zygo Corporation | Method for calibration and removal of wavefront errors |
US7417740B2 (en) | 2004-11-12 | 2008-08-26 | Medeikon Corporation | Single trace multi-channel low coherence interferometric sensor |
JP2006162366A (en) | 2004-12-06 | 2006-06-22 | Fujinon Corp | Optical tomographic imaging system |
JP4429886B2 (en) | 2004-12-09 | 2010-03-10 | 富士フイルム株式会社 | Optical tomography system |
WO2006068875A2 (en) * | 2004-12-14 | 2006-06-29 | Luna Innovations Inc. | Compensating for time varying phase changes in interferometric measurements |
US7446881B2 (en) | 2005-01-12 | 2008-11-04 | Tokyo Electron Limited | System, apparatus, and method for determining temperature/thickness of an object using light interference measurements |
US7884947B2 (en) | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
US7428057B2 (en) | 2005-01-20 | 2008-09-23 | Zygo Corporation | Interferometer for determining characteristics of an object surface, including processing and calibration |
JP2006214856A (en) | 2005-02-03 | 2006-08-17 | Canon Inc | Measuring apparatus and method |
JP2008534954A (en) * | 2005-04-01 | 2008-08-28 | ザイゴ コーポレーション | A method for compensating errors in interferometric surface measurements. |
US7826063B2 (en) | 2005-04-29 | 2010-11-02 | Zygo Corporation | Compensation of effects of atmospheric perturbations in optical metrology |
ES2749378T3 (en) | 2005-05-19 | 2020-03-20 | Zygo Corp | Low coherence interferometry signal analysis for thin film structures |
US7528962B2 (en) | 2005-06-29 | 2009-05-05 | Zygo Corporation | Apparatus and methods for reducing non-cyclic non-linear errors in interferometry |
JP2007014556A (en) * | 2005-07-07 | 2007-01-25 | Ykk Corp | Overedging machine for cloth piece |
US7595891B2 (en) | 2005-07-09 | 2009-09-29 | Kla-Tencor Corporation | Measurement of the top surface of an object with/without transparent thin films in white light interferometry |
US7495770B2 (en) | 2005-08-09 | 2009-02-24 | Zygo Corporation | Beam shear reduction in interferometry systems |
US7532330B2 (en) | 2005-08-16 | 2009-05-12 | Zygo Corporation | Angle interferometers |
EP1946412A2 (en) | 2005-10-11 | 2008-07-23 | Clear Align LLC | Apparatus and method for generating short optical pulses |
EP2444783B1 (en) * | 2005-10-11 | 2015-03-04 | Duke University | Systems and method for fiber-based endoscopic angle-resolved low coherence interferometry |
WO2007044786A2 (en) | 2005-10-11 | 2007-04-19 | Zygo Corporation | Interferometry method and system including spectral decomposition |
US7561278B2 (en) | 2005-10-18 | 2009-07-14 | Zygo Corporation | Interferometer using integrated retarders to reduce physical volume |
JP2007121499A (en) | 2005-10-26 | 2007-05-17 | Nikon Corp | Differential interference observation method and microscope |
US7408649B2 (en) | 2005-10-26 | 2008-08-05 | Kla-Tencor Technologies Corporation | Method and apparatus for optically analyzing a surface |
AU2006314890A1 (en) * | 2005-11-16 | 2007-05-24 | Chemometec A/S | Determination of chemical or physical properties of sample or component of a sample |
US7542148B2 (en) | 2005-12-06 | 2009-06-02 | Tokyo Electron Limited | Method for measuring physical quantity of measurement object in substrate processing apparatus and storage medium storing program for implementing the method |
US20070127036A1 (en) | 2005-12-07 | 2007-06-07 | Chroma Ate Inc. | Interference measurement system self-alignment method |
KR100701974B1 (en) | 2005-12-14 | 2007-03-30 | 나노전광 주식회사 | Apparatus for detecting hazes of photomask surface using phase shifting interferometer and method for detecting thereof |
US7612891B2 (en) | 2005-12-15 | 2009-11-03 | Veeco Instruments, Inc. | Measurement of thin films using fourier amplitude |
EP1963780B1 (en) * | 2005-12-22 | 2012-02-08 | Taylor Hobson Limited | Apparatus for and a method of determining surface characteristics |
JP2007178261A (en) * | 2005-12-28 | 2007-07-12 | Epson Imaging Devices Corp | Inspection method of substrate for electro-optical device, manufacturing method of substrate for electro-optical device, and inspection device |
DE112006003666T5 (en) * | 2006-01-19 | 2009-01-02 | Shofu Inc. | Device for optical coherence tomography and measuring head |
JP2007192675A (en) * | 2006-01-19 | 2007-08-02 | Canon Inc | Interference measuring method and device, and exposing device having it |
WO2007087301A2 (en) | 2006-01-23 | 2007-08-02 | Zygo Corporation | Interferometer system for monitoring an object |
US7564568B2 (en) | 2006-03-02 | 2009-07-21 | Zygo Corporation | Phase shifting interferometry with multiple accumulation |
US7456956B2 (en) | 2006-03-21 | 2008-11-25 | Thermo Electron Scientific Instruments Llc | Vibrational circular dichroism spectrometer using reflective optics |
WO2008011510A2 (en) | 2006-07-21 | 2008-01-24 | Zygo Corporation | Compensation of systematic effects in low coherence interferometry |
US7710580B2 (en) | 2006-10-27 | 2010-05-04 | Zygo Corporation | Vibration resistant interferometry |
WO2008061186A2 (en) | 2006-11-15 | 2008-05-22 | Zygo Corporation | Distance measuring interferometer and encoder metrology systems for use in lithography tools |
JP4869895B2 (en) * | 2006-12-07 | 2012-02-08 | 富士フイルム株式会社 | Optical tomographic imaging system |
WO2008073454A2 (en) | 2006-12-11 | 2008-06-19 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
US7894075B2 (en) | 2006-12-11 | 2011-02-22 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
US7933025B2 (en) | 2006-12-18 | 2011-04-26 | Zygo Corporation | Sinusoidal phase shifting interferometry |
JP5502491B2 (en) | 2006-12-22 | 2014-05-28 | ザイゴ コーポレーション | Apparatus and method for characterization of surface features |
US7505863B2 (en) | 2007-07-13 | 2009-03-17 | Veeco Instruments, Inc. | Interferometric iterative technique with bandwidth and numerical-aperture dependency |
DE102008001482A1 (en) * | 2008-04-30 | 2009-11-05 | Robert Bosch Gmbh | Interferometric arrangement and method for adjusting a path difference |
DE112009002073B4 (en) * | 2008-08-20 | 2023-06-15 | Hamamatsu Photonics K.K. | Observation device and observation method |
US8004688B2 (en) * | 2008-11-26 | 2011-08-23 | Zygo Corporation | Scan error correction in low coherence scanning interferometry |
US8107084B2 (en) * | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
US8422026B2 (en) * | 2009-06-15 | 2013-04-16 | Artur G. Olszak | Spectrally controllable light sources in interferometry |
-
2009
- 2009-07-24 US US12/509,098 patent/US8004688B2/en not_active Expired - Fee Related
- 2009-07-24 US US12/509,083 patent/US8120781B2/en active Active
- 2009-08-14 US US12/541,325 patent/US7978338B2/en not_active Expired - Fee Related
- 2009-08-31 US US12/551,308 patent/US8379218B2/en active Active
- 2009-11-23 WO PCT/US2009/065572 patent/WO2010062860A2/en active Application Filing
- 2009-11-23 WO PCT/US2009/065529 patent/WO2010062853A2/en active Application Filing
- 2009-11-23 KR KR1020107015982A patent/KR101191842B1/en active IP Right Grant
- 2009-11-23 CN CN200980120703.5A patent/CN102057269B/en active Active
- 2009-11-23 JP JP2010540961A patent/JP5536667B2/en active Active
- 2009-11-23 KR KR1020127007041A patent/KR101530898B1/en active IP Right Grant
- 2009-11-23 EP EP09829736.9A patent/EP2238430B9/en active Active
- 2009-11-25 TW TW098140066A patent/TWI425184B/en active
-
2013
- 2013-02-13 US US13/765,936 patent/US8902431B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5371588A (en) * | 1993-11-10 | 1994-12-06 | University Of Maryland, College Park | Surface profile and material mapper using a driver to displace the sample in X-Y-Z directions |
US6545761B1 (en) * | 1999-11-30 | 2003-04-08 | Veeco Instruments, Inc. | Embedded interferometer for reference-mirror calibration of interferometric microscope |
Non-Patent Citations (2)
Title |
---|
ANBO WANG ET AL.: "Self-Calibrated Interferometric-Intensity-Based Optical Fiber Sensors", JOURNAL OF LIGHTWAVE TECHNOLOGY, vol. 19, no. 10, October 2001 (2001-10-01), pages 1495 - 1501 * |
CHRISTOPHER E. SAXER ET AL.: "High-speed fiber-based polarization-sensitive optical coherence tomography of in vivo human skin", OPTICS LETTERS, vol. 25, no. 18, 15 September 2000 (2000-09-15), pages 1355 - 1357 * |
Also Published As
Publication number | Publication date |
---|---|
EP2238430A4 (en) | 2012-02-01 |
JP5536667B2 (en) | 2014-07-02 |
EP2238430A2 (en) | 2010-10-13 |
US20100128276A1 (en) | 2010-05-27 |
CN102057269A (en) | 2011-05-11 |
KR101191842B1 (en) | 2012-10-18 |
US7978338B2 (en) | 2011-07-12 |
KR20100094584A (en) | 2010-08-26 |
WO2010062853A2 (en) | 2010-06-03 |
US20130155413A1 (en) | 2013-06-20 |
US20100128280A1 (en) | 2010-05-27 |
KR101530898B1 (en) | 2015-06-23 |
US8004688B2 (en) | 2011-08-23 |
US8902431B2 (en) | 2014-12-02 |
WO2010062853A3 (en) | 2010-08-19 |
US20100128278A1 (en) | 2010-05-27 |
US8120781B2 (en) | 2012-02-21 |
US20100128283A1 (en) | 2010-05-27 |
KR20120053043A (en) | 2012-05-24 |
TW201037267A (en) | 2010-10-16 |
WO2010062860A2 (en) | 2010-06-03 |
JP2011508241A (en) | 2011-03-10 |
US8379218B2 (en) | 2013-02-19 |
EP2238430B1 (en) | 2016-03-30 |
TWI425184B (en) | 2014-02-01 |
EP2238430B9 (en) | 2016-07-13 |
CN102057269B (en) | 2014-08-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2010062860A3 (en) | Fiber-based interferometer system for monitoring an imaging interferometer | |
TW201129775A (en) | Fiber-based interferometer system for monitoring an imaging interferometer | |
WO2013012495A3 (en) | System and method of distributed fiber optic sensing including integrated reference path | |
WO2007087040A3 (en) | Demodulation method and apparatus for fiber optic sensors | |
WO2009064670A3 (en) | Interferometer utilizing polarization scanning | |
WO2010136809A3 (en) | Optical sensor and method of use | |
WO2014197786A3 (en) | Apparatus and methods for detecting optical signals from implanted sensors | |
WO2009132360A3 (en) | Systems and methods for performing optical spectroscopy using a self-calibrating fiber optic probe | |
WO2012096847A3 (en) | Apparatus for euv imaging and methods of using same | |
WO2008045609A3 (en) | Interferometer-based real time early fouling detection system and method | |
WO2009028332A1 (en) | Wavefront aberration measuring device and method and wavefront aberration adjusting method | |
WO2009049834A3 (en) | Optical sensor device | |
EP2600114A3 (en) | Multi-point measuring method of fbg sensor and multi-point measuring apparatus | |
WO2009034742A1 (en) | Optical fiber current measuring device and optical fiber current measuring method | |
ATE438837T1 (en) | MEASURING DEVICE | |
WO2008108423A1 (en) | Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method | |
JP2016024009A5 (en) | ||
US20140320866A1 (en) | Shape Measuring Apparatus | |
SG152162A1 (en) | An optical focus sensor, an inspection apparatus and a lithographic apparatus | |
WO2012018674A3 (en) | Optics symmetrization for metrology | |
WO2010006764A3 (en) | Fibre-optic multiwavelength interferometer (mwli) for the absolute measurement of distances and topologies for surfaces at a large operating distance | |
EP2180301A3 (en) | Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method | |
WO2012005952A3 (en) | System and method for interferometric autofocusing | |
PL2159535T3 (en) | Apparatus for optical coherence tomography and non-interferometric imaging | |
WO2012151547A3 (en) | Real-time, dispersion -compensated low-coherence interferometry system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09829739 Country of ref document: EP Kind code of ref document: A2 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 09829739 Country of ref document: EP Kind code of ref document: A2 |