WO2011041763A3 - Extremely low resistance materials and methods for modifying and creating same - Google Patents

Extremely low resistance materials and methods for modifying and creating same Download PDF

Info

Publication number
WO2011041763A3
WO2011041763A3 PCT/US2010/051238 US2010051238W WO2011041763A3 WO 2011041763 A3 WO2011041763 A3 WO 2011041763A3 US 2010051238 W US2010051238 W US 2010051238W WO 2011041763 A3 WO2011041763 A3 WO 2011041763A3
Authority
WO
WIPO (PCT)
Prior art keywords
elr
materials
low resistance
extremely low
aperture
Prior art date
Application number
PCT/US2010/051238
Other languages
French (fr)
Other versions
WO2011041763A2 (en
Inventor
Douglas J. Gilbert
Original Assignee
Ambature L.L.C.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ambature L.L.C. filed Critical Ambature L.L.C.
Publication of WO2011041763A2 publication Critical patent/WO2011041763A2/en
Publication of WO2011041763A3 publication Critical patent/WO2011041763A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • H01B12/06—Films or wires on bases or cores
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/14—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by the disposition of thermal insulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0856—Manufacture or treatment of devices comprising metal borides, e.g. MgB2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic materials
    • H10N60/857—Ceramic materials comprising copper oxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic materials
    • H10N60/857—Ceramic materials comprising copper oxide
    • H10N60/858—Multi-layered structures, e.g. superlattices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—After-treatment, e.g. patterning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Abstract

In some implementations of the invention, existing extremely low resistance materials ("ELR materials") may be modified and/or new ELR materials may be created by enhancing (in the case of existing ELR materials) and/or creating (in the case of new ELR materials) an aperture within the ELR material such that the aperture is maintained at increased temperatures so as not to impede propagation of electrical charge there through. In some implementations of the invention, as long as the propagation of electrical charge through the aperture remains unimpeded, the material should remain in an ELR state; otherwise, as the propagation of electrical charge through the aperture becomes impeded, the ELR material begins to transition into a non-ELR state.
PCT/US2010/051238 2009-10-02 2010-10-02 Extremely low resistance materials and methods for modifying and creating same WO2011041763A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US24813009P 2009-10-02 2009-10-02
US61/248,130 2009-10-02

Publications (2)

Publication Number Publication Date
WO2011041763A2 WO2011041763A2 (en) 2011-04-07
WO2011041763A3 true WO2011041763A3 (en) 2011-05-26

Family

ID=43823640

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2010/051238 WO2011041763A2 (en) 2009-10-02 2010-10-02 Extremely low resistance materials and methods for modifying and creating same
PCT/US2010/051239 WO2011041764A1 (en) 2009-10-02 2010-10-02 Extremely low resistance films and methods for modifying or creating same

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/US2010/051239 WO2011041764A1 (en) 2009-10-02 2010-10-02 Extremely low resistance films and methods for modifying or creating same

Country Status (11)

Country Link
US (6) US8609593B2 (en)
EP (1) EP2483927A4 (en)
JP (1) JP5795588B2 (en)
KR (1) KR101890667B1 (en)
CN (1) CN102714216B (en)
AU (1) AU2010300364A1 (en)
CA (1) CA2779609C (en)
IL (1) IL218983A (en)
RU (1) RU2567021C2 (en)
TW (2) TWI528606B (en)
WO (2) WO2011041763A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011041765A1 (en) * 2009-10-02 2011-04-07 Ambature L.L.C. High temperature superconducting materials and methods for modifying and creating same
US20240062933A1 (en) * 2009-10-02 2024-02-22 Ambature, Inc. Extremely Low Resistance Films and Methods for Modifying or Creating Same
CA2807054A1 (en) * 2010-08-03 2012-02-09 Brookhaven Science Associates, Llc Iron based superconducting structures and methods for making the same
US11289639B2 (en) * 2011-03-30 2022-03-29 Ambature, Inc. Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials
EP2691996A4 (en) * 2011-03-30 2015-01-28 Ambature Inc Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials
US9741918B2 (en) 2013-10-07 2017-08-22 Hypres, Inc. Method for increasing the integration level of superconducting electronics circuits, and a resulting circuit
KR102088642B1 (en) 2018-06-28 2020-03-13 강일구 Hanger For Plating Apparatus Of PCB Having Marking Function
KR102512502B1 (en) 2021-05-25 2023-03-20 최동기 Plating hanger

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5266815A (en) * 1987-03-27 1993-11-30 Hitachi, Ltd. Semiconductor integrated circuit device having superconductive layer and isolation member with nitride isolation
US20030099871A1 (en) * 2001-02-15 2003-05-29 Iowa State University Research Foundation Synthesis of superconducting magnesium diboride objects
US20050258548A1 (en) * 1999-03-30 2005-11-24 Ngk Spark Plug Co., Ltd. Capacitor-built-in-type printed wiring substrate printed wiring substrate, and capacitor

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3119236A (en) 1962-04-27 1964-01-28 Honeywell Regulator Co Superconductive temperature control
US3421330A (en) 1967-04-17 1969-01-14 United Aircraft Corp Thermomagnetic transfer of heat through a superconductor
FR2045754A1 (en) * 1968-06-19 1971-03-05 Fizitcheski Inst
FR2612507B1 (en) * 1987-03-19 1989-05-05 Comp Generale Electricite COPPER OXIDE WITH SUPERCONDUCTING VALENCIA AND METHOD FOR IMPLEMENTING SAME
US5401716A (en) * 1987-04-15 1995-03-28 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing superconducting patterns
EP0294285A1 (en) * 1987-05-31 1988-12-07 Sumitomo Electric Industries Limited Superconducting thin film
FR2617645B1 (en) * 1987-07-03 1989-10-20 Thomson Csf DEVICE IN SUPERCONDUCTING MATERIAL AND METHOD FOR PRODUCING THE SAME
EP0299870B1 (en) * 1987-07-13 1994-04-13 Sumitomo Electric Industries Limited Method for preparing a superconducting thin film
US4905319A (en) 1987-07-28 1990-02-27 Syracuse University Superconducting device including a thin chromium film with negative susceptibility
DE3854493T2 (en) * 1987-12-20 1996-05-15 Sumitomo Electric Industries Method of manufacturing a thin film superconductor.
US5079218A (en) * 1987-12-31 1992-01-07 Sumitomo Electric Industries, Ltd. Superconducting fiber and a method for preparing the same
JPH029702A (en) * 1988-06-02 1990-01-12 Semiconductor Energy Lab Co Ltd Production of superconductor film
DE68911455T2 (en) * 1988-08-30 1994-07-21 Sumitomo Electric Industries Method of manufacturing a bismuth type oxide superconductor.
JPH031584A (en) * 1989-02-04 1991-01-08 Riken Corp Manufacture of josephson junction element
JPH02273418A (en) * 1989-04-14 1990-11-07 Furukawa Electric Co Ltd:The Manufacture of oxide superconductive conductor
US5120707A (en) 1989-05-22 1992-06-09 Allied-Signal, Inc. Superconducting ceramics by electrodeposition of metals with embedment of particulate matter, followed by oxidation
US5087605A (en) 1989-06-01 1992-02-11 Bell Communications Research, Inc. Layered lattice-matched superconducting device and method of making
US4966885A (en) * 1989-08-25 1990-10-30 At&T Bell Laboratories Method of producing a device comprising a metal oxide superconductor layer
JPH03151231A (en) 1989-10-13 1991-06-27 Internatl Business Mach Corp <Ibm> Multilayer strain lattice copper oxide perovskite structure
US5426094A (en) 1991-01-16 1995-06-20 Arch Development Corporation High temperature superconductor current leads
US6308399B1 (en) 1991-06-18 2001-10-30 Dawei Zhou High-TC superconducting ceramic oxide products and macroscopic and microscopic methods of making the same
EP0584410A1 (en) 1991-07-05 1994-03-02 Conductus, Inc. Superconducting electronic structures and methods of preparing same
US5276398A (en) 1992-06-01 1994-01-04 Conductus, Inc. Superconducting magnetic resonance probe coil
JPH06350153A (en) * 1993-06-10 1994-12-22 Kokusai Chodendo Sangyo Gijutsu Kenkyu Center Manufacture of superconducting device
JP3565881B2 (en) * 1993-10-05 2004-09-15 株式会社フジクラ Stabilizer composite superconductor and method of manufacturing the same
US5846909A (en) * 1995-05-22 1998-12-08 University Of Texas System Molecular level, precision control over the interfacial properties of high-TC superconductor structures and devices
JP2931786B2 (en) * 1996-02-13 1999-08-09 株式会社東芝 Superconducting current limiting device
JP3961593B2 (en) 1996-09-11 2007-08-22 財団法人鉄道総合技術研究所 Oxygen annealing method for bulk superconductor
US6251835B1 (en) 1997-05-08 2001-06-26 Epion Corporation Surface planarization of high temperature superconductors
US6613463B1 (en) * 1999-09-06 2003-09-02 International Superconductivity Technology Center Superconducting laminated oxide substrate and superconducting integrated circuit
US6516208B1 (en) * 2000-03-02 2003-02-04 Superconductor Technologies, Inc. High temperature superconductor tunable filter
GB0010494D0 (en) 2000-04-28 2000-06-14 Isis Innovation Textured metal article
US6383989B2 (en) * 2000-06-21 2002-05-07 The Regents Of The University Of California Architecture for high critical current superconducting tapes
KR100401124B1 (en) 2001-03-14 2003-10-10 주식회사 텔웨이브 The High Temperature Superconductor low-pass filter for broadband harmonic rejection
KR100388497B1 (en) 2001-06-01 2003-06-25 한국전자통신연구원 Method for fabrication superconductivity epitaxial thin film
WO2003105162A1 (en) * 2002-06-07 2003-12-18 科学技術振興事業団 Ferromagnetic iv group based semiconductor, ferromagnetic iii-v group based compound semiconductor, or ferromagnetic ii-iv group based compound semiconductor, and method for adjusting their ferromagnetic characteristics
US7001345B2 (en) * 2002-08-23 2006-02-21 Cook Incorporated Wire guide
US20040152599A1 (en) 2002-11-21 2004-08-05 Allan Rosencwaig High-temperature superconductivity devices and methods
US6930875B2 (en) * 2003-06-12 2005-08-16 Tdk Corporation Multi-layered unit
FR2858463B1 (en) * 2003-07-28 2007-08-24 Centre Nat Rech Scient METHOD AND SYSTEM FOR MAKING THIN-FILM SUPERCONDUCTING INDUCTIVE COMPONENTS, AND DEVICES INCLUDING SUCH COMPONENTS
JP4118774B2 (en) * 2003-09-18 2008-07-16 株式会社東芝 Thin film laminate and manufacturing method thereof
JP4811552B2 (en) * 2004-03-30 2011-11-09 独立行政法人科学技術振興機構 Neutron detector using superconducting elements
JP4589698B2 (en) * 2004-11-10 2010-12-01 新日本製鐵株式会社 Superconducting bulk material
US7781376B2 (en) * 2005-07-29 2010-08-24 American Superconductor Corporation High temperature superconducting wires and coils
RU2308789C1 (en) * 2006-04-12 2007-10-20 Государственное образовательное учреждение высшего профессионального образования Московский государственный инстиут электронной техники (технический университет) Method for producing thick-film structure around high-temperature superconductor
US7627356B2 (en) 2006-07-14 2009-12-01 Superpower, Inc. Multifilament AC tolerant conductor with striated stabilizer and devices incorporating the same
US7902120B2 (en) 2006-07-24 2011-03-08 American Superconductor Corporation High temperature superconductors having planar magnetic flux pinning centers and methods for making the same
US7560271B2 (en) * 2006-12-20 2009-07-14 Agentase, Llc Seafood spoilage indicator
RU2352025C1 (en) * 2007-07-31 2009-04-10 Государственное образовательное учреждение высшего профессионального образования Московский государственный институт электронной техники (технический университет) Method of manufacturing of thick-film structure on basis of high-temperature superconductor
US8227082B2 (en) * 2007-09-26 2012-07-24 Ut-Battelle, Llc Faceted ceramic fibers, tapes or ribbons and epitaxial devices therefrom
US20090181441A1 (en) 2007-11-27 2009-07-16 Board Of Trustees Of Michigan State University Porous silicon-polymer composites for biosensor applications
US8435473B2 (en) * 2008-02-18 2013-05-07 Japan Science And Technology Agency Superconducting compound and method for producing the same
JP4996511B2 (en) * 2008-03-07 2012-08-08 株式会社東芝 Oxide superconducting conductor
US7772842B2 (en) * 2008-09-17 2010-08-10 Time Medical Holdings Company Limited Dedicated superconductor MRI imaging system
US8692437B2 (en) 2008-09-30 2014-04-08 Silicon Turbine Systems, Inc. Vortex flux generator
US8211833B2 (en) 2010-06-04 2012-07-03 Ambature, Llc Extremely low resistance composition and methods for creating same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5266815A (en) * 1987-03-27 1993-11-30 Hitachi, Ltd. Semiconductor integrated circuit device having superconductive layer and isolation member with nitride isolation
US20050258548A1 (en) * 1999-03-30 2005-11-24 Ngk Spark Plug Co., Ltd. Capacitor-built-in-type printed wiring substrate printed wiring substrate, and capacitor
US20030099871A1 (en) * 2001-02-15 2003-05-29 Iowa State University Research Foundation Synthesis of superconducting magnesium diboride objects

Also Published As

Publication number Publication date
CA2779609A1 (en) 2011-04-07
US8609593B2 (en) 2013-12-17
WO2011041763A2 (en) 2011-04-07
IL218983A0 (en) 2012-06-28
US20110082045A1 (en) 2011-04-07
US9431156B2 (en) 2016-08-30
TW201130178A (en) 2011-09-01
EP2483927A1 (en) 2012-08-08
RU2012118038A (en) 2013-11-10
TWI532227B (en) 2016-05-01
WO2011041764A1 (en) 2011-04-07
RU2567021C2 (en) 2015-10-27
US20140364319A1 (en) 2014-12-11
US20210005354A1 (en) 2021-01-07
CA2779609C (en) 2018-02-27
US20160351303A1 (en) 2016-12-01
KR20120093919A (en) 2012-08-23
KR101890667B1 (en) 2018-09-28
JP2013507009A (en) 2013-02-28
EP2483927A4 (en) 2014-08-27
US9472324B2 (en) 2016-10-18
TWI528606B (en) 2016-04-01
US20140336053A1 (en) 2014-11-13
US20110082042A1 (en) 2011-04-07
CN102714216A (en) 2012-10-03
AU2010300364A1 (en) 2012-05-24
TW201130179A (en) 2011-09-01
CN102714216B (en) 2016-05-11
IL218983A (en) 2016-08-31
JP5795588B2 (en) 2015-10-14

Similar Documents

Publication Publication Date Title
WO2011041763A3 (en) Extremely low resistance materials and methods for modifying and creating same
IL254406B (en) Agonists of guanylate cyclase, compositions comprising the same and uses thereof
UY33397A (en) SOLID FORM OF A CARBOXAMIDE NAFTALEN
WO2009120182A3 (en) Sulfo-polymer powder and sulfo-polymer powder blends with carriers and/or actives
IL211284A0 (en) Antibodies binding ccr2, compositions comprising the same and uses thereof
IL216094A0 (en) Self-complementary adeno-associated viral vectors, compositions comprising the same and uses thereof
IL204621A0 (en) Bicyclic - ?? - amino acid derivatives, compositions comprising the same and uses thereof
WO2011084553A3 (en) Compositions and uses of cis-1,1,1,4,4,4-hexafluoro-2-butene
EP2203973A4 (en) Hydroelectric pumped-storage
WO2008080772A3 (en) Low residue antiperspirant stick
IL208744A0 (en) Nucleic acid-lipid particles, compositions comprising the same and uses thereof
EP2058366A4 (en) Casting resin composition, insulating material using the same, and insulating structure
IL212836A0 (en) Azaquinolinone derivatives, compositions comprising the same and uses thereof
IL212278A0 (en) Morpholinopurine derivatives, compositions comprising the same and uses thereof
IL210951A0 (en) Cholest-4-en-3-one oxime derivatives, compositions comprising the same and uses thereof
WO2009036862A3 (en) Compositions with an antimicrobial action
BRPI1008108A2 (en) &#34;water redispersible crosslinkable polymer powder composition&#34;.
FR2925378B1 (en) PARTICLES OF PUNCHING.
IL200102A0 (en) 6-benzyl-3,3 dimethyl-2,3,4,7-tetrahydro-indolo{2,3-c} quinoline compounds, compositions containing the same and uses thereof
MX2015017325A (en) Polyethylene composition having high impact and stress cracking resistance.
WO2008011433A3 (en) Styrenated terpene resin as well as methods of making and using the same
IL206060A0 (en) Conjugates of anti-rg-1 antibodies, compositions comprising the same and uses thereof
IL207639A0 (en) Pyrrolopyrimidinecarboxamide compounds, compositions comprising the same and uses thereof
WO2007016303A3 (en) Unsaturated polyester resin compositions with improved weatherabilty
ATE443740T1 (en) LOW TEMPERATURE TOP LAYER

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10821386

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10821386

Country of ref document: EP

Kind code of ref document: A2