In an atmosphere of processing gas, on a wafer W consisting mainly of silicon, through a planar-array antenna RLSA 60 having a plurality of slits, microwaves are irradiated to generate plasma containing oxygen, or nitrogen, or oxygen and nitrogen and to implement therewith on the surface of the wafer...http://www.google.de/patents/US6470824?utm_source=gb-gplus-sharePatent US6470824 - Semiconductor manufacturing apparatus
