An improved deposition chamber (2) includes a housing (4) defining a chamber (18) which houses a substrate support (14). A mixture of oxygen and SiF4 is delivered through a set of first nozzles (34) and silane is delivered through a set of second nozzles (34a) into the chamber around the periphery (40)...http://www.google.de/patents/US6416823?utm_source=gb-gplus-sharePatent US6416823 - Deposition chamber and method for depositing low dielectric constant films
