Patterned photoresist layers formed on substrates have features with high aspect ratios. The photoresist layers can be formed as single layers with aspect ratios as high as about 4:1. In addition, the features in the photoresist layers can have a wide range of aspect ratios in a given single layer. The...http://www.google.de/patents/US6294317?utm_source=gb-gplus-sharePatent US6294317 - Patterned photoresist structures having features with high aspect ratios and method of forming such structures
