Embodiments concern contacts for use in integrated circuits, and methods of their manufacture, which result in a reduced likelihood of shorting between unrelated portions of an overlying conductive layer across misaligned contacts. Embodiments of the method involve performing a first etching process...http://www.google.de/patents/US20040041185?utm_source=gb-gplus-sharePatent US20040041185 - Self-aligned, integrated circuit contact and formation method
