An improved semiconductor processing is disclosed. In the manufacturing process, a semiconductor layer is formed and then undergoes photo annealing. A neutralizer is then introduced to the photoannealed semiconductor. The semiconductor thus formed demonstrates the SEL effect instead of the Staebler-Wronski...http://www.google.de/patents/US5296405?utm_source=gb-gplus-sharePatent US5296405 - Method for photo annealing non-single crystalline semiconductor films
