A test structure for submicrometer metrology as used in integrated circuit manufacture comprises a bridge conductor divided into three segments by pairs of voltage taps. A first segment has no intermediate taps; a second segment has a number of dummy taps intermediate its ends; and a third segment has...http://www.google.de/patents/US5383136?utm_source=gb-gplus-sharePatent US5383136 - Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate