Implantation process for cold cathode plasma immersion ion implantation (C2PI3) without a continuous plasma using very short high voltage, low duty cycle ionization pulses, in conjunction with a synchronously produced electron flow to neutralize positively charged wafer surfaces....http://www.google.de/patents/US6632482?utm_source=gb-gplus-sharePatent US6632482 - Plasma immersion ion implantation process
