A basic supercritical solution formulated to include at least one supercritical fluid and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The base may be the supercritical fluid in the basic supercritical solution. A super critical fluid is...http://www.google.de/patents/US20060003271?utm_source=gb-gplus-sharePatent US20060003271 - Basic supercritical solutions for quenching and developing photoresists
