An apparatus for plasma etching comprises a chamber, a gas inlet port provided in the chamber to introduce etching gas into the chamber, a gas outlet port provided in a side portion of the chamber to exhaust the gas from said chamber, a sample stage provided within the chamber, and a spiral coil disposed...http://www.google.de/patents/US6409877?utm_source=gb-gplus-sharePatent US6409877 - Apparatus and method for plasma etching
