A method of fabricating a semiconductor device includes forming a first vertical pillar over a semiconductor substrate. A spacer is formed over a sidewall of the first vertical pillar. A portion of the semiconductor substrate exposed between the first vertical pillars is etched to form a recess that...http://www.google.de/patents/US7767565?utm_source=gb-gplus-sharePatent US7767565 - Semiconductor device and method of fabricating the same
