An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by simultaneously using a plurality of exposure beams. In an example embodiment it is determined if any of the beams have an actual position relative...http://www.google.de/patents/US7919218?utm_source=gb-gplus-sharePatent US7919218 - Method for a multiple exposure beams lithography tool
