Disclosed formulations of supercritical solutions are useful in wafer cleaning processes. Supercritical solutions of the invention may be categorized by their chemistry, for example, basic, acidic, oxidative, and fluoride chemistries are used. Such solutions may include supercritical carbon dioxide and...http://www.google.de/patents/US6764552?utm_source=gb-gplus-sharePatent US6764552 - Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
