The present invention provides a system and method of modifying the mask layout shapes of an integrated circuit layout design to compensate for reticle field location-specific systematic CD variations resulting from mask writing process variations, lens imperfections in lithographic patterning, and photoresist...http://www.google.de/patents/US7318214?utm_source=gb-gplus-sharePatent US7318214 - System and method for reducing patterning variability in integrated circuit manufacturing through mask layout corrections
