The invention relates to a wafer rinsing system for rinsing chemicals and particles off of wafers without introducing contaminants. The system reduces the particle count on wafers by filtering the water and the gas used during rinsing at the wet bench. The system includes a rinsing unit, a local water...http://www.google.de/patents/US5542441?utm_source=gb-gplus-sharePatent US5542441 - Apparatus for delivering ultra-low particle counts in semiconductor manufacturing
